公开(公告)号：US20060078676A1

公开(公告)日：2006-04-13

申请号：US11228223

申请日：2005-09-19

申请人： Aaron Lukas ,  Mark O'Neill ,  Eugene Karwacki ,  Raymond Vrtis ,  Jean Vincent

发明人： Aaron Lukas ,  Mark O'Neill ,  Eugene Karwacki ,  Raymond Vrtis ,  Jean Vincent

IPC分类号： C23C16/00 ,  B32B17/06 ,  B32B13/04 ,  B32B9/00 ,  B32B19/00

CPC分类号： C03C3/045 ,  C23C16/30 ,  C23C16/401 ,  C23C16/56 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/02274 ,  H01L21/02348 ,  H01L21/3105 ,  H01L21/3122 ,  H01L21/31695 ,  Y10T428/31663

摘要： A porous organosilicate glass (OSG) film: SivOwCxHyFz, where v+w+x+y+z=100%, v is 10 to 35 atomic %, w is 10 to 65 atomic %, x is 5 to 30 atomic %, y is 10 to 50 atomic % and z is 0 to 15 atomic %, has a silicate network with carbon bonds as methyl groups (Si—CH3) and contains pores with diameter less than 3 nm equivalent spherical diameter and dielectric constant less than 2.7. A preliminary film is deposited by a chemical vapor deposition method from organosilane and/or organosiloxane precursors, and independent pore-forming precursors. Porogen precursors form pores within the preliminary film and are subsequently removed to provide the porous film. Compositions, film forming kits, include organosilane and/or organosiloxane compounds containing at least one Si—H bond and porogen precursors of hydrocarbons containing alcohol, ether, carbonyl, carboxylic acid, ester, nitro, primary amine, secondary amine, and/or tertiary amine functionality or combinations.

摘要翻译： 多孔有机硅酸盐玻璃（OSG）膜：其中，X，Y，X，Y， 其中v + w + x + y + z = 100％，v为10〜35原子％，w为10〜65原子％，x为5〜30原子％，y为10〜 z为0〜15原子％，具有作为甲基（Si-CH 3 3）的碳原子的硅酸盐网络，并且含有直径小于3nm的等效球径，介电常数小于2.7的孔 。 通过化学气相沉积法从有机硅烷和/或有机硅氧烷前体和独立的成孔前体沉积初步膜。 致孔剂前体在预备膜内形成孔，随后被除去以提供多孔膜。 组合物，成膜试剂盒包括含有至少一个Si-H键的有机硅烷和/或有机硅氧烷化合物，以及含有醇，醚，羰基，羧酸，酯，硝基，伯胺，仲胺和/或叔碳原子的烃的致孔剂前体 胺官能团或组合。

公开(公告)号：US20080038934A1

公开(公告)日：2008-02-14

申请号：US11693707

申请日：2007-03-29

申请人： RAYMOND VRTIS ,  DINGJUN WU ,  MARK O'NEILL ,  MARK BITNER ,  JEAN VINCENT ,  EUGENE KARWACKI ,  AARON LUKAS

发明人： RAYMOND VRTIS ,  DINGJUN WU ,  MARK O'NEILL ,  MARK BITNER ,  JEAN VINCENT ,  EUGENE KARWACKI ,  AARON LUKAS

IPC分类号： H01L21/312

CPC分类号： H01L21/764 ,  H01L21/02115 ,  H01L21/02126 ,  H01L21/02172 ,  H01L21/02203 ,  H01L21/02205 ,  H01L21/02263 ,  H01L21/02274 ,  H01L21/02282 ,  H01L21/30604 ,  H01L21/31695 ,  H01L21/423 ,  H01L21/7682 ,  H01L2221/1047

摘要： The present invention is a process for forming an air gap within a substrate, the process comprising: providing a substrate; depositing a sacrificial material by deposition of at least one sacrificial material precursor; depositing a composite layer; removale of the porogen material in the composite layer to form a porous layer and contacting the layered substrate with a removal media to substantially remove the sacrificial material and provide the air gaps within the substrate; wherein the at least one sacrificial material precursor is selected from the group consisting of: an organic porogen; silicon, and a polar solvent soluble metal oxide and mixtures thereof.

摘要翻译： 本发明是一种在衬底内形成气隙的方法，该方法包括：提供衬底; 通过沉积至少一种牺牲材料前体来沉积牺牲材料; 沉积复合层; 去除复合层中的致孔剂材料以形成多孔层并使分层的基底与去除介质接触，以基本上去除牺牲材料并在基底内提供气隙; 其中所述至少一种牺牲材料前体选自：有机致孔剂; 硅和极性溶剂可溶性金属氧化物及其混合物。

公开(公告)号：US20060196525A1

公开(公告)日：2006-09-07

申请号：US11070994

申请日：2005-03-03

申请人： Raymond Vrtis ,  Aaron Lukas ,  Mark O'Neill ,  Mark Bitner ,  Xiaohai Xiang ,  Eugene Karwacki

发明人： Raymond Vrtis ,  Aaron Lukas ,  Mark O'Neill ,  Mark Bitner ,  Xiaohai Xiang ,  Eugene Karwacki

IPC分类号： B08B3/12

CPC分类号： C23C16/4405

摘要： A method for removing a residue from a surface is disclosed herein. In one aspect, the method includes: providing a chamber containing the surface coated with the residue; providing in the chamber a cleaning composition of an oxidizing gas and optionally an organic species; and irradiating the cleaning composition with ultraviolet light to remove the residue from the surface. The surface can be, for example, a window of a processing chamber. In certain aspects, a reflective surface can be located within close proximity to the window to enhance cleaning efficiency.

摘要翻译： 本文公开了从表面除去残余物的方法。 一方面，该方法包括：提供包含涂有残留物的表面的室; 在室中提供氧化气体和任选的有机物质的清洁组合物; 并用紫外线照射清洗组合物以从表面除去残留物。 表面可以是例如处理室的窗口。 在某些方面，反射表面可以位于靠近窗口的位置，以提高清洁效率。

公开(公告)号：US20060027249A1

公开(公告)日：2006-02-09

申请号：US11178545

申请日：2005-07-12

申请人： Andrew Johnson ,  Hoshang Subawalla ,  Bing Ji ,  Raymond Vrtis ,  Eugene Karwacki ,  Robert Ridgeway ,  Peter Maroulis ,  Mark O'Neill ,  Aaron Lukas ,  Stephen Motika

发明人： Andrew Johnson ,  Hoshang Subawalla ,  Bing Ji ,  Raymond Vrtis ,  Eugene Karwacki ,  Robert Ridgeway ,  Peter Maroulis ,  Mark O'Neill ,  Aaron Lukas ,  Stephen Motika

IPC分类号： C25F5/00

CPC分类号： C23C16/4405

摘要： A process for removing carbon-containing residues from a substrate is described herein. In one aspect, there is provided a process for removing carbon-containing residue from at least a portion of a surface of a substrate comprising: providing a process gas comprising an oxygen source, a fluorine source, an and optionally additive gas wherein the molar ratio of oxygen to fluorine contained within the process gas ranges from about 1 to about 10; activating the process gas using at least one energy source to provide reactive species; and contacting the surface of the substrate with the reactive species to volatilize and remove the carbon-containing residue from the surface.