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公开(公告)号：US07773212B1
公开(公告)日：2010-08-10
申请号：US12124778
申请日：2008-05-21
Applicant: Christian Wolters , Anatoly Romanovsky
Inventor： Christian Wolters , Anatoly Romanovsky
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/9503
Abstract: In one embodiment, a surface analyzer system comprises a first radiation source to generate radiation at a first wavelength, a surface inspection assembly, and an edge detection assembly. In operation, the system enables contemporaneous surface inspection and edge detection.
Abstract translation: 在一个实施例中，表面分析器系统包括用于产生第一波长的辐射的第一辐射源，表面检查组件和边缘检测组件。 在操作中，该系统实现了同时的表面检测和边缘检测。
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2.发明授权Inspection systems and methods for extending the detection range of an inspection system by forcing the photodetector into the non-linear range 有权用于通过强制光电探测器进入非线性范围来扩展检查系统的检测范围的检查系统和方法公开(公告)号：US07746462B2
公开(公告)日：2010-06-29
申请号：US11751293
申请日：2007-05-21
Applicant: Zhongping Cai , Alexander Slobodov , Anatoly Romanovsky , Christian H. Wolters
Inventor： Zhongping Cai , Alexander Slobodov , Anatoly Romanovsky , Christian H. Wolters
IPC: G01N21/00
CPC classification number: G01N21/9501 , G01N21/8851 , G01N2201/1241 , G01N2201/12769 , H01J43/18 , H01J43/30
Abstract: An inspection system and method is provided herein for increasing the detection range of the inspection system. According to one embodiment, the inspection system may include a photodetector having a plurality of stages, which are adapted to convert light scattered from a specimen into an output signal, and a voltage divider network coupled for extending the detection range of the photodetector (and thus, the detection range of the inspection system) by saturating at least one of the stages. This forces the photodetector to operate in a non-linear manner. However, measurement inaccuracies are avoided by calibrating the photodetector output to remove any non-linear effects that may be created by intentionally saturating the at least one of the stages. In one example, a table of values may be generated during a calibration phase to convert the photodetector output into an actual amount of scattered light.
Abstract translation: 本文提供了一种用于增加检查系统的检测范围的检查系统和方法。 根据一个实施例，检查系统可以包括具有多个级的光电检测器，其适于将从样本散射的光转换成输出信号，以及耦合的用于扩展光电检测器的检测范围的分压器网络 ，检查系统的检测范围）通过饱和至少一个级。 这迫使光电探测器以非线性方式工作。 然而，通过校准光电检测器输出以消除可能通过故意饱和至少一个级而产生的任何非线性效应来避免测量不准确。 在一个示例中，可以在校准阶段期间生成值表，以将光电检测器输出转换成实际的散射光量。
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3.发明申请Inspection Systems and Methods for Extending the Detection Range of an Inspection System by Forcing the Photodetector into the Non-Linear Range 有权检测系统和方法通过强制光检测器进入非线性范围来扩展检测系统的检测范围公开(公告)号：US20080291454A1
公开(公告)日：2008-11-27
申请号：US11751293
申请日：2007-05-21
Applicant: Zhongping Cai , Alexander Slobodov , Anatoly Romanovsky , Christian H. Wolters
Inventor： Zhongping Cai , Alexander Slobodov , Anatoly Romanovsky , Christian H. Wolters
IPC: G01N21/55
CPC classification number: G01N21/9501 , G01N21/8851 , G01N2201/1241 , G01N2201/12769 , H01J43/18 , H01J43/30
Abstract: An inspection system and method is provided herein for increasing the detection range of the inspection system. According to one embodiment, the inspection system may include a photodetector having a plurality of stages, which are adapted to convert light scattered from a specimen into an output signal, and a voltage divider network coupled for extending the detection range of the photodetector (and thus, the detection range of the inspection system) by saturating at least one of the stages. This forces the photodetector to operate in a non-linear manner. However, measurement inaccuracies are avoided by calibrating the photodetector output to remove any non-linear effects that may be created by intentionally saturating the at least one of the stages. In one example, a table of values may be generated during a calibration phase to convert the photodetector output into an actual amount of scattered light.
Abstract translation: 本文提供了一种用于增加检查系统的检测范围的检查系统和方法。 根据一个实施例，检查系统可以包括具有多个级的光电检测器，其适于将从样本散射的光转换成输出信号，以及耦合的用于扩展光电检测器的检测范围的分压器网络 ，检查系统的检测范围）通过饱和至少一个级。 这迫使光电探测器以非线性方式工作。 然而，通过校准光电检测器输出以消除可能通过故意饱和至少一个级而产生的任何非线性效应来避免测量不准确。 在一个示例中，可以在校准阶段期间生成值表，以将光电检测器输出转换成实际的散射光量。
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4.发明授权Systems, circuits and methods for extending the detection range of an inspection system by avoiding circuit saturation 有权通过避免电路饱和来延长检查系统的检测范围的系统，电路和方法公开(公告)号：US07423250B2
公开(公告)日：2008-09-09
申请号：US11181237
申请日：2005-07-14
Applicant: Christian H. Wolters , Anatoly Romanovsky , Alexander Slobodov
Inventor： Christian H. Wolters , Anatoly Romanovsky , Alexander Slobodov
IPC: H03F3/08
CPC classification number: H03F3/08
Abstract: Inspection systems, circuits and methods are provided to enhance defect detection by addressing saturation levels of the amplifier and analog-digital circuitry as a limiting factor of the measurement detection range of an inspection system. In accordance with one embodiment of the invention, a method for inspecting a specimen includes directing light to the specimen and detecting light scattered from the specimen. However, the step of detecting may use only one photodetector for detecting the light scattered from the specimen and for converting the light into an electrical signal. The step of detecting also includes generating a first signal and a second signal in response to the electrical signal, where the second signal differs from the first. For example, the first signal may be generated to have a higher resolution than the second signal for detecting substantially lower levels of the scattered light. In most cases, the method may use the first signal for detecting features, defects or light scattering properties of the specimen until the first signal reaches a predetermined threshold value. Once the predetermined threshold value is reached, however, the method may use the second signal for said detecting.
Abstract translation: 提供了检查系统，电路和方法，以通过解决放大器和模拟数字电路的饱和电平作为检查系统的测量检测范围的限制因素来增强缺陷检测。 根据本发明的一个实施例，用于检查样本的方法包括将光引导到样本并检测从样本散射的光。 然而，检测步骤可以仅使用一个光电检测器来检测从样本散射的光并将光转换成电信号。 检测步骤还包括响应于电信号产生第一信号和第二信号，其中第二信号与第一信号不同。 例如，可以产生第一信号以具有比用于检测基本上较低级别的散射光的第二信号更高的分辨率。 在大多数情况下，该方法可以使用第一信号来检测样本的特征，缺陷或光散射性质，直到第一信号达到预定阈值。 然而，一旦达到预定阈值，该方法可以使用第二信号进行所述检测。
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公开(公告)号：US09091666B2
公开(公告)日：2015-07-28
申请号：US13369294
申请日：2012-02-09
Applicant: Zhongping Cai , Yury Yuditsky , Anatoly Romanovsky , Alexander Slobodov
Inventor： Zhongping Cai , Yury Yuditsky , Anatoly Romanovsky , Alexander Slobodov
CPC classification number: G01N21/9501
Abstract: Various embodiments for extended defect sizing range for wafer inspection are provided. One inspection system includes an illumination subsystem configured to direct light to the wafer. The system also includes an image sensor configured to detect light scattered from wafer defects and to generate output responsive to the scattered light. The image sensor is also configured to not have an anti-blooming feature such that when a pixel in the image sensor reaches full well capacity, excess charge flows from the pixel to one or more neighboring pixels in the image sensor. The system further includes a computer subsystem configured to detect the defects on the wafer using the output and to determine a size of the defects on the wafer using the output generated by a pixel and any neighboring pixels of the pixel to which the excess charge flows.
Abstract translation: 提供了用于晶片检查的扩展缺陷尺寸范围的各种实施例。 一个检查系统包括配置成将光引导到晶片的照明子系统。 该系统还包括图像传感器，其被配置为检测从晶片缺陷散射的光并且响应于散射光产生输出。 图像传感器还被配置为不具有防喷射特征，使得当图像传感器中的像素达到满井容量时，过量电荷从图像传感器中的像素流向一个或多个相邻像素。 该系统还包括被配置为使用输出来检测晶片上的缺陷的计算机子系统，并且使用由像素和多余电荷流过的像素的任何相邻像素产生的输出来确定晶片上的缺陷的尺寸。
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Patent Agency Ranking
公开(公告)号：US20130208269A1
公开(公告)日：2013-08-15
申请号：US13369294
申请日：2012-02-09
Applicant: Zhongping Cai , Yury Yuditsky , Anatoly Romanovsky , Alexander Slobodov
Inventor： Zhongping Cai , Yury Yuditsky , Anatoly Romanovsky , Alexander Slobodov
IPC: G01N21/88
CPC classification number: G01N21/9501
Abstract: Various embodiments for extended defect sizing range for wafer inspection are provided.
Abstract translation: 提供了用于晶片检查的扩展缺陷尺寸范围的各种实施例。
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公开(公告)号：US20130016346A1
公开(公告)日：2013-01-17
申请号：US13544954
申请日：2012-07-09
Applicant: Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak
Inventor： Anatoly Romanovsky , Ivan Maleev , Daniel Kavaldjiev , Yury Yuditsky , Dirk Woll , Stephen Biellak
IPC: G01N21/956
CPC classification number: G01N21/9501 , G01N21/47 , G01N21/8806 , G01N21/8851 , G01N21/956
Abstract: Systems configured to inspect a wafer are provided.
Abstract translation: 提供了配置用于检查晶片的系统。
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8.发明授权Systems, circuits and methods for reducing thermal damage and extending the detection range of an inspection system 有权用于减少热损伤并延长检查系统检测范围的系统，电路和方法公开(公告)号：US07436508B2
公开(公告)日：2008-10-14
申请号：US11181228
申请日：2005-07-14
Applicant: Christian H. Wolters , Anatoly Romanovsky
Inventor： Christian H. Wolters , Anatoly Romanovsky
IPC: G01N21/00
CPC classification number: G01N21/47 , G01N21/21 , G01N21/9501 , G01N21/95607
Abstract: Inspection systems, circuits, and methods are provided to enhance defect detection by reducing thermal damage to large particles by dynamically altering the incident laser beam power level supplied to the specimen during a surface inspection scan. In one embodiment, an inspection system includes an illumination subsystem for directing light to a specimen at a first power level, a detection subsystem for detecting light scattered from the specimen, and a power attenuator subsystem for dynamically altering the power level directed to the specimen based on the scattered light detected from the specimen. For example, the power attenuator subsystem may reduce the directed light to a second power level, which is lower than the first, if the detected scattered light exceeds a predetermined threshold level. In addition reducing thermal damage, the systems and methods described herein may be used to extend the measurement detection range of an inspection system by providing a variable-power inspection system.
Abstract translation: 提供检查系统，电路和方法以通过在表面检查扫描期间动态地改变提供给样本的入射激光束功率水平来减小对大颗粒的热损伤来增强缺陷检测。 在一个实施例中，检查系统包括用于将光引导到第一功率级的样本的照明子系统，用于检测从样本散射的光的检测子系统和用于动态地改变针对标本的功率水平的功率衰减器子系统 对从样品检测到的散射光。 例如，如果检测到的散射光超过预定的阈值电平，则功率衰减器子系统可以将定向光减少到低于第一功率电平的第二功率电平。 此外，减少热损伤，本文所述的系统和方法可以用于通过提供可变功率检查系统来扩展检查系统的测量检测范围。
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9.发明授权Method and apparatus for producing and measuring dynamically focussed, steered, and shaped oblique laser illumination for spinning wafer inspection system 有权用于旋转晶片检测系统的动态聚焦，转向和成形斜激光照明的生产和测量方法和装置公开(公告)号：US09068952B2
公开(公告)日：2015-06-30
申请号：US12584294
申请日：2009-09-02
Applicant: Aleksey Petrenko , Christian Wolters , Zhongping Cai , Anatoly Romanovsky , Bret Whiteside
Inventor： Aleksey Petrenko , Christian Wolters , Zhongping Cai , Anatoly Romanovsky , Bret Whiteside
CPC classification number: G01N21/9501 , G01N21/8806 , G01N2201/06113 , G01N2201/0633 , G02B27/0972
Abstract: A method and apparatus for producing high frequency dynamically focused oblique laser illumination for a spinning wafer inspection system. The focus is changed by changing the beam direction incidence angle so as to bring focal spot onto the wafer surface.Disclosed herein is a system and method for automatic beam shaping (i.e., spot size) and steering (i.e., position) for a spinning wafer inspection system, combined into a single module. Also disclosed is a method and system for measuring the beam position/size/shape and angle with sufficient resolution to make corrections using feedback from the monitor.
Abstract translation: 一种用于生产用于旋转晶片检测系统的高频动态聚焦倾斜激光照明的方法和装置。 通过改变光束方向入射角来改变焦点，以便将焦斑引入晶片表面。 本文公开了一种用于旋转晶片检查系统的自动光束成形（即光点尺寸）和转向（即，位置）的系统和方法，其组合成单个模块。 还公开了一种用于以足够的分辨率测量光束位置/尺寸/形状和角度以使用来自监视器的反馈进行校正的方法和系统。
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10.发明申请公开(公告)号：US20110315897A1
公开(公告)日：2011-12-29
申请号：US13153942
申请日：2011-06-06
Applicant: Anatoly Romanovsky , George Kren , Bret Whiteside
Inventor： Anatoly Romanovsky , George Kren , Bret Whiteside
CPC classification number: G02B27/0068 , G01J1/4257 , G01N21/9501 , G02B5/04
Abstract: Disclosed herein is a method and apparatus for automatic correction of beam waist position drift in real time, using wafer inspection data taken during normal tool operation.Also disclosed herein is an improved laser astigmatism corrector for use either internal or external to the laser.
Abstract translation: 这里公开了一种使用在正常工具操作期间所采用的晶片检查数据来实时自动校正光束腰部位置漂移的方法和装置。 本文还公开了一种用于激光器内部或外部的改进的激光像散校正器。
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