公开(公告)号：US09279774B2

公开(公告)日：2016-03-08

申请号：US13544954

申请日：2012-07-09

申请人： Anatoly Romanovsky ,  Ivan Maleev ,  Daniel Kavaldjiev ,  Yury Yuditsky ,  Dirk Woll ,  Stephen Biellak ,  Mehdi Vaez-Iravani ,  Guoheng Zhao

发明人： Anatoly Romanovsky ,  Ivan Maleev ,  Daniel Kavaldjiev ,  Yury Yuditsky ,  Dirk Woll ,  Stephen Biellak ,  Mehdi Vaez-Iravani ,  Guoheng Zhao

IPC分类号： G01N21/00 ,  G01N21/95 ,  G01N21/47 ,  G01N21/956

CPC分类号： G01N21/9501 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/8851 ,  G01N21/956

摘要： Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to simultaneously form multiple illumination areas on the wafer with substantially no illumination flux between each of the areas. The system also includes a scanning subsystem configured to scan the multiple illumination areas across the wafer. In addition, the system includes a collection subsystem configured to simultaneously and separately image light scattered from each of the areas onto two or more sensors. Characteristics of the two or more sensors are selected such that the scattered light is not imaged into gaps between the two or more sensors. The two or more sensors generate output responsive to the scattered light. The system further includes a computer subsystem configured to detect defects on the wafer using the output of the two or more sensors.

摘要翻译： 提供了配置用于检查晶片的系统。 一个系统包括照明子系统，该照明子系统配置成在晶片上同时形成多个照明区域，其中每个区域之间基本上没有照明通量。 该系统还包括扫描子系统，被配置为扫描晶片上的多个照明区域。 另外，该系统包括一个收集子系统，该收集子系统配置成同时并分别将从每个区域散射的光分别映射到两个或更多个传感器上。 选择两个或更多个传感器的特征，使得散射光不被成像到两个或更多个传感器之间的间隙中。 两个或多个传感器响应散射光产生输出。 该系统还包括被配置为使用两个或更多个传感器的输出来检测晶片上的缺陷的计算机子系统。

公开(公告)号：US20130016346A1

公开(公告)日：2013-01-17

申请号：US13544954

申请日：2012-07-09

申请人： Anatoly Romanovsky ,  Ivan Maleev ,  Daniel Kavaldjiev ,  Yury Yuditsky ,  Dirk Woll ,  Stephen Biellak

发明人： Anatoly Romanovsky ,  Ivan Maleev ,  Daniel Kavaldjiev ,  Yury Yuditsky ,  Dirk Woll ,  Stephen Biellak

IPC分类号： G01N21/956

CPC分类号： G01N21/9501 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/8851 ,  G01N21/956

摘要： Systems configured to inspect a wafer are provided.

摘要翻译： 提供了配置用于检查晶片的系统。

公开(公告)号：US08294887B1

公开(公告)日：2012-10-23

申请号：US12841319

申请日：2010-07-22

申请人： Stephen Biellak ,  Daniel Kavaldjiev ,  George J. Kren ,  Anatoly Romanovsky ,  Christian Wolters

发明人： Stephen Biellak ,  Daniel Kavaldjiev ,  George J. Kren ,  Anatoly Romanovsky ,  Christian Wolters

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/95607 ,  G01N2021/8822 ,  G01N2201/069

摘要： An inspection system may include, but is not limited to: an illumination subsystem for directing light to an inspection specimen comprising: a power attenuator subsystem configured for altering the power level of a light beam emitted by the illumination subsystem; and a power attenuation control subsystem configured to provide control signals to the power attenuator subsystem according to a detected level of light scattering by the inspection specimen upon illumination by the illumination subsystem. A method for scatterometry inspection may include, but is not limited to: directing light having a power level to an inspection specimen from a light source; detecting light scattered from the specimen; and modifying a power level of one or more intermediate light beams within the light source according to a level of light scattering by the specimen upon illumination by the light source.

摘要翻译： 检查系统可以包括但不限于：用于将光引导到检查样本的照明子系统，包括：功率衰减器子系统，被配置为改变由照明子系统发射的光束的功率电平; 以及功率衰减控制子系统，被配置为根据所述照明子系统照明时检测样本的检测到的光散射水平向所述功率衰减子系统提供控制信号。 用于散射检查的方法可以包括但不限于：将来自光源的具有功率水平的光引导到检查样本; 检测从样品散射的光; 以及根据光源照射时样品的光散射水平来修改光源内的一个或多个中间光束的功率电平。

公开(公告)号：US09091666B2

公开(公告)日：2015-07-28

申请号：US13369294

申请日：2012-02-09

申请人： Zhongping Cai ,  Yury Yuditsky ,  Anatoly Romanovsky ,  Alexander Slobodov

发明人： Zhongping Cai ,  Yury Yuditsky ,  Anatoly Romanovsky ,  Alexander Slobodov

IPC分类号： G01N21/88 ,  G01N21/95

CPC分类号： G01N21/9501

摘要： Various embodiments for extended defect sizing range for wafer inspection are provided. One inspection system includes an illumination subsystem configured to direct light to the wafer. The system also includes an image sensor configured to detect light scattered from wafer defects and to generate output responsive to the scattered light. The image sensor is also configured to not have an anti-blooming feature such that when a pixel in the image sensor reaches full well capacity, excess charge flows from the pixel to one or more neighboring pixels in the image sensor. The system further includes a computer subsystem configured to detect the defects on the wafer using the output and to determine a size of the defects on the wafer using the output generated by a pixel and any neighboring pixels of the pixel to which the excess charge flows.

摘要翻译： 提供了用于晶片检查的扩展缺陷尺寸范围的各种实施例。 一个检查系统包括配置成将光引导到晶片的照明子系统。 该系统还包括图像传感器，其被配置为检测从晶片缺陷散射的光并且响应于散射光产生输出。 图像传感器还被配置为不具有防喷射特征，使得当图像传感器中的像素达到满井容量时，过量电荷从图像传感器中的像素流向一个或多个相邻像素。 该系统还包括被配置为使用输出来检测晶片上的缺陷的计算机子系统，并且使用由像素和多余电荷流过的像素的任何相邻像素产生的输出来确定晶片上的缺陷的尺寸。

公开(公告)号：US20130208269A1

公开(公告)日：2013-08-15

申请号：US13369294

申请日：2012-02-09

申请人： Zhongping Cai ,  Yury Yuditsky ,  Anatoly Romanovsky ,  Alexander Slobodov

发明人： Zhongping Cai ,  Yury Yuditsky ,  Anatoly Romanovsky ,  Alexander Slobodov

IPC分类号： G01N21/88

CPC分类号： G01N21/9501

摘要： Various embodiments for extended defect sizing range for wafer inspection are provided.

摘要翻译： 提供了用于晶片检查的扩展缺陷尺寸范围的各种实施例。

公开(公告)号：US08134698B1

公开(公告)日：2012-03-13

申请号：US12049091

申请日：2008-03-14

申请人： Christian Wolters ,  Anatoly Romanovsky ,  Daniel Kavaldjiev ,  Bret Whiteside

发明人： Christian Wolters ,  Anatoly Romanovsky ,  Daniel Kavaldjiev ,  Bret Whiteside

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N2201/1241

摘要： In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target a radiation beam onto a surface; and a scattered radiation collecting assembly that collects radiation scattered from the surface. The radiation targeting assembly generates primary and secondary beams. Data collected from the reflections of the primary and secondary beams may be used in a dynamic range extension routine, alone or in combination with a power attenuation routine.

摘要翻译： 在一个实施例中，表面分析器系统包括将辐射束对准到表面上的辐射瞄准组件; 以及收集从表面散射的辐射的散射的辐射收集组件。 辐射瞄准组件产生主光束和次光束。 从主波束和次波束的反射中收集的数据可以单独使用或者与功率衰减程序组合在动态范围扩展程序中使用。

公开(公告)号：US07773212B1

公开(公告)日：2010-08-10

申请号：US12124778

申请日：2008-05-21

申请人： Christian Wolters ,  Anatoly Romanovsky

发明人： Christian Wolters ,  Anatoly Romanovsky

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/9503

摘要： In one embodiment, a surface analyzer system comprises a first radiation source to generate radiation at a first wavelength, a surface inspection assembly, and an edge detection assembly. In operation, the system enables contemporaneous surface inspection and edge detection.

摘要翻译： 在一个实施例中，表面分析器系统包括用于产生第一波长的辐射的第一辐射源，表面检查组件和边缘检测组件。 在操作中，该系统实现了同时的表面检测和边缘检测。

公开(公告)号：US07746462B2

公开(公告)日：2010-06-29

申请号：US11751293

申请日：2007-05-21

申请人： Zhongping Cai ,  Alexander Slobodov ,  Anatoly Romanovsky ,  Christian H. Wolters

发明人： Zhongping Cai ,  Alexander Slobodov ,  Anatoly Romanovsky ,  Christian H. Wolters

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/8851 ,  G01N2201/1241 ,  G01N2201/12769 ,  H01J43/18 ,  H01J43/30

摘要： An inspection system and method is provided herein for increasing the detection range of the inspection system. According to one embodiment, the inspection system may include a photodetector having a plurality of stages, which are adapted to convert light scattered from a specimen into an output signal, and a voltage divider network coupled for extending the detection range of the photodetector (and thus, the detection range of the inspection system) by saturating at least one of the stages. This forces the photodetector to operate in a non-linear manner. However, measurement inaccuracies are avoided by calibrating the photodetector output to remove any non-linear effects that may be created by intentionally saturating the at least one of the stages. In one example, a table of values may be generated during a calibration phase to convert the photodetector output into an actual amount of scattered light.

摘要翻译： 本文提供了一种用于增加检查系统的检测范围的检查系统和方法。 根据一个实施例，检查系统可以包括具有多个级的光电检测器，其适于将从样本散射的光转换成输出信号，以及耦合的用于扩展光电检测器的检测范围的分压器网络 ，检查系统的检测范围）通过饱和至少一个级。 这迫使光电探测器以非线性方式工作。 然而，通过校准光电检测器输出以消除可能通过故意饱和至少一个级而产生的任何非线性效应来避免测量不准确。 在一个示例中，可以在校准阶段期间生成值表，以将光电检测器输出转换成实际的散射光量。

公开(公告)号：US20080291454A1

公开(公告)日：2008-11-27

申请号：US11751293

申请日：2007-05-21

申请人： Zhongping Cai ,  Alexander Slobodov ,  Anatoly Romanovsky ,  Christian H. Wolters

发明人： Zhongping Cai ,  Alexander Slobodov ,  Anatoly Romanovsky ,  Christian H. Wolters

IPC分类号： G01N21/55

CPC分类号： G01N21/9501 ,  G01N21/8851 ,  G01N2201/1241 ,  G01N2201/12769 ,  H01J43/18 ,  H01J43/30

摘要： An inspection system and method is provided herein for increasing the detection range of the inspection system. According to one embodiment, the inspection system may include a photodetector having a plurality of stages, which are adapted to convert light scattered from a specimen into an output signal, and a voltage divider network coupled for extending the detection range of the photodetector (and thus, the detection range of the inspection system) by saturating at least one of the stages. This forces the photodetector to operate in a non-linear manner. However, measurement inaccuracies are avoided by calibrating the photodetector output to remove any non-linear effects that may be created by intentionally saturating the at least one of the stages. In one example, a table of values may be generated during a calibration phase to convert the photodetector output into an actual amount of scattered light.

摘要翻译： 本文提供了一种用于增加检查系统的检测范围的检查系统和方法。 根据一个实施例，检查系统可以包括具有多个级的光电检测器，其适于将从样本散射的光转换成输出信号，以及耦合的用于扩展光电检测器的检测范围的分压器网络 ，检查系统的检测范围）通过饱和至少一个级。 这迫使光电探测器以非线性方式工作。 然而，通过校准光电检测器输出以消除可能通过故意饱和至少一个级而产生的任何非线性效应来避免测量不准确。 在一个示例中，可以在校准阶段期间生成值表，以将光电检测器输出转换成实际的散射光量。

公开(公告)号：US07423250B2

公开(公告)日：2008-09-09

申请号：US11181237

申请日：2005-07-14

申请人： Christian H. Wolters ,  Anatoly Romanovsky ,  Alexander Slobodov

发明人： Christian H. Wolters ,  Anatoly Romanovsky ,  Alexander Slobodov

IPC分类号： H03F3/08

CPC分类号： H03F3/08

摘要： Inspection systems, circuits and methods are provided to enhance defect detection by addressing saturation levels of the amplifier and analog-digital circuitry as a limiting factor of the measurement detection range of an inspection system. In accordance with one embodiment of the invention, a method for inspecting a specimen includes directing light to the specimen and detecting light scattered from the specimen. However, the step of detecting may use only one photodetector for detecting the light scattered from the specimen and for converting the light into an electrical signal. The step of detecting also includes generating a first signal and a second signal in response to the electrical signal, where the second signal differs from the first. For example, the first signal may be generated to have a higher resolution than the second signal for detecting substantially lower levels of the scattered light. In most cases, the method may use the first signal for detecting features, defects or light scattering properties of the specimen until the first signal reaches a predetermined threshold value. Once the predetermined threshold value is reached, however, the method may use the second signal for said detecting.

摘要翻译： 提供了检查系统，电路和方法，以通过解决放大器和模拟数字电路的饱和电平作为检查系统的测量检测范围的限制因素来增强缺陷检测。 根据本发明的一个实施例，用于检查样本的方法包括将光引导到样本并检测从样本散射的光。 然而，检测步骤可以仅使用一个光电检测器来检测从样本散射的光并将光转换成电信号。 检测步骤还包括响应于电信号产生第一信号和第二信号，其中第二信号与第一信号不同。 例如，可以产生第一信号以具有比用于检测基本上较低级别的散射光的第二信号更高的分辨率。 在大多数情况下，该方法可以使用第一信号来检测样本的特征，缺陷或光散射性质，直到第一信号达到预定阈值。 然而，一旦达到预定阈值，该方法可以使用第二信号进行所述检测。