公开(公告)号：US20200272050A1

公开(公告)日：2020-08-27

申请号：US16284069

申请日：2019-02-25

申请人： Alex P. G. Robinson ,  Carmen Popescu ,  John Roth ,  Andreas Frommhold ,  Edward Jackson ,  Alexandra McClelland ,  Tom Lada ,  Greg O'Callahan

发明人： Alex P. G. Robinson ,  Carmen Popescu ,  John Roth ,  Andreas Frommhold ,  Edward Jackson ,  Alexandra McClelland ,  Tom Lada ,  Greg O'Callahan

IPC分类号： G03F7/021 ,  G03F7/20 ,  G03F7/038

摘要： The present disclosure relates to novel negative-type photoresist composition and methods of their use. The disclosure further relates to multiple trigger photoresist processes which allow for the improvement in contrast, resolution, and/or line edges roughness in some systems without giving up sensitivity. The photoresist compositions and the methods of the current disclosure are ideal for fine patent processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays and changed particle. The disclosure further relates to sensitivity enhancing materials useful in the disclosed compositions and methods.

公开(公告)号：US09229322B2

公开(公告)日：2016-01-05

申请号：US14520037

申请日：2014-10-21

申请人： Alex Phillip Graham Robinson ,  Dongxu Yang ,  Andreas Frommhold ,  Thomas Lada ,  John L. Roth ,  Xiang Xue ,  Edward A. Jackson

发明人： Alex Phillip Graham Robinson ,  Dongxu Yang ,  Andreas Frommhold ,  Thomas Lada ,  John L. Roth ,  Xiang Xue ,  Edward A. Jackson

IPC分类号： G03F7/004 ,  C07D223/00 ,  G03F7/027 ,  C07D487/14 ,  C07D498/14 ,  C07D245/02 ,  G03F7/20 ,  G03F7/38 ,  H01L51/00

CPC分类号： G03F7/027 ,  C07D245/02 ,  C07D487/14 ,  C07D498/14 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/20 ,  G03F7/38 ,  H01L51/0018 ,  H01L51/0047

摘要： Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.

摘要翻译： 本文公开和要求保护的是具有选自（I），（II），（III）或（IV））的一般结构的物质组合物; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团。

公开(公告)号：US09519215B2

公开(公告)日：2016-12-13

申请号：US14977520

申请日：2015-12-21

申请人： Alex Phillip Graham Robinson ,  Dongxu Yang ,  Andreas Frommhold ,  Thomas Lada ,  John L. Roth ,  Xiang Xue ,  Edward A. Jackson

发明人： Alex Phillip Graham Robinson ,  Dongxu Yang ,  Andreas Frommhold ,  Thomas Lada ,  John L. Roth ,  Xiang Xue ,  Edward A. Jackson

IPC分类号： G03F7/004 ,  C07D223/00 ,  C07D245/02 ,  C07D487/14 ,  C07D498/14 ,  G03F7/027 ,  H01L51/00 ,  G03F7/38

CPC分类号： G03F7/0045 ,  C07D245/02 ,  C07D487/04 ,  C07D487/08 ,  C07D487/14 ,  C07D498/14 ,  G03F7/027 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/38 ,  H01L51/0018 ,  H01L51/0047

摘要： The present application for patent discloses a composition of matter comprising: comprising a solvent; and an ester having a chemical structure chosen from (I), (II), or (III); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms and A− is an anion.

摘要翻译： 本专利申请公开了一种物质组合物，包括：包含溶剂; 和具有选自（I），（II）或（III）的化学结构的酯; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团，A-是阴离子。

公开(公告)号：US09323149B2

公开(公告)日：2016-04-26

申请号：US14187649

申请日：2014-02-24

申请人： Alex Philip Graham Robinson ,  Jon Andrew Preece ,  Richard Edward Palmer ,  Andreas Frommhold ,  Dongxu Yang ,  Alexandra McClelland ,  Drew Athans ,  Xiang Xue

发明人： Alex Philip Graham Robinson ,  Jon Andrew Preece ,  Richard Edward Palmer ,  Andreas Frommhold ,  Dongxu Yang ,  Alexandra McClelland ,  Drew Athans ,  Xiang Xue

IPC分类号： G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/38

CPC分类号： G03F7/0384 ,  A61B5/042 ,  A61B5/065 ,  A61B5/6852 ,  A61B5/7221 ,  A61B34/20 ,  A61B2505/03 ,  A61B2505/05 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/2024 ,  G03F7/38 ,  Y02P70/521

摘要： The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays. Negative photosensitive compositions are also disclosed.

摘要翻译： 本公开内容涉及新型甲基富勒烯衍生物，由其制备的负型光致抗蚀剂组合物及其使用方法。 衍生物，它们的光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超出极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。 还公开了负光敏组合物。

公开(公告)号：US20150140489A1

公开(公告)日：2015-05-21

申请号：US14520037

申请日：2014-10-21

申请人： Alex Philip Graham Robinson ,  Dongxu Yang ,  Andreas Frommhold ,  Thomas Lada ,  John L. Roth ,  Xiang Xue

发明人： Alex Philip Graham Robinson ,  Dongxu Yang ,  Andreas Frommhold ,  Thomas Lada ,  John L. Roth ,  Xiang Xue

IPC分类号： G03F7/027 ,  G03F7/004 ,  C07D245/02 ,  C07D487/14 ,  C07D498/14

CPC分类号： G03F7/027 ,  C07D245/02 ,  C07D487/14 ,  C07D498/14 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/20 ,  G03F7/38 ,  H01L51/0018 ,  H01L51/0047

摘要： Disclosed and claimed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.

摘要翻译： 本文公开和要求保护的是具有选自（I），（II），（III）或（IV））的一般结构的物质组合物; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团。

公开(公告)号：US20140134843A1

公开(公告)日：2014-05-15

申请号：US14068254

申请日：2013-10-31

申请人： Alex Philip Graham Robinson ,  Jon Andrew Preece ,  Richard Edward Palmer ,  Andreas Frommhold ,  Dongxu Yang ,  Alexandra McClelland ,  Drew Athens ,  Xiang Xu

发明人： Alex Philip Graham Robinson ,  Jon Andrew Preece ,  Richard Edward Palmer ,  Andreas Frommhold ,  Dongxu Yang ,  Alexandra McClelland ,  Drew Athens ,  Xiang Xu

IPC分类号： G03F7/027 ,  H01L51/00 ,  G03F7/38 ,  G03F7/20 ,  C07C69/96 ,  C07C69/76

CPC分类号： G03F7/027 ,  C07C69/753 ,  C07C69/96 ,  C07C2604/00 ,  G03F7/0046 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/038 ,  G03F7/0382 ,  G03F7/20 ,  G03F7/325 ,  G03F7/38 ,  H01L51/0047

摘要： The present disclosure relates to novel methanofullerene derivatives, negative-type photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

摘要翻译： 本公开内容涉及新型甲基富勒烯衍生物，由其制备的负型光致抗蚀剂组合物及其使用方法。 衍生物，它们的光致抗蚀剂组合物和方法对于使用例如紫外线辐射，超出极紫外辐射，极紫外辐射，X射线和带电粒子射线的精细图案处理是理想的。

公开(公告)号：US10438808B2

公开(公告)日：2019-10-08

申请号：US15164801

申请日：2016-05-25

申请人： Alex Philip Graham Robinson ,  Thomas Lada ,  John L. Roth ,  Alan G. Brown ,  Andreas Frommhold ,  Edward A. Jackson

发明人： Alex Philip Graham Robinson ,  Thomas Lada ,  John L. Roth ,  Alan G. Brown ,  Andreas Frommhold ,  Edward A. Jackson

IPC分类号： H01L21/308 ,  C08J3/24 ,  C08J3/28 ,  C09D4/06 ,  C09D167/02 ,  H01L21/3065 ,  C09C1/44 ,  H01L21/02 ,  C08K3/04 ,  C09D163/00

摘要： Disclosed and claimed herein is a composition for forming a spin-on hard-mask, having a fullerene derivative and a crosslinking agent. Further disclosed is a process for forming a hard-mask.

公开(公告)号：US20190137876A1

公开(公告)日：2019-05-09

申请号：US15687449

申请日：2017-08-26

申请人： Alex Philip Graham Robinson ,  Alexandra McClelland ,  Andreas Frommhold ,  Dongxu Yang ,  John Roth ,  David Ure

发明人： Alex Philip Graham Robinson ,  Alexandra McClelland ,  Andreas Frommhold ,  Dongxu Yang ,  John Roth ,  David Ure

IPC分类号： G03F7/038 ,  G03F7/039 ,  G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32

摘要： The present disclosure relates to novel multiple trigger monomer containing negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions utilize novel monomers and mixtures of novel monomers. The methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

公开(公告)号：US10095112B2

公开(公告)日：2018-10-09

申请号：US15441919

申请日：2017-02-24

申请人： Alex Phillip Graham Robinson ,  Alexandra McClelland ,  Andreas Frommhold ,  Dongxu Yang ,  John Roth

发明人： Alex Phillip Graham Robinson ,  Alexandra McClelland ,  Andreas Frommhold ,  Dongxu Yang ,  John Roth

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  C08G83/00 ,  H01L21/027

摘要： The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

公开(公告)号：US20150140491A1

公开(公告)日：2015-05-21

申请号：US14519924

申请日：2014-10-21

申请人： Alex Philip Graham Robinson ,  Dongxu Yang ,  Andreas Frommhold ,  Thomas Lada ,  John L. Roth ,  Xiang Xue

发明人： Alex Philip Graham Robinson ,  Dongxu Yang ,  Andreas Frommhold ,  Thomas Lada ,  John L. Roth ,  Xiang Xue

IPC分类号： G03F7/027

CPC分类号： G03F7/027 ,  C07D223/04 ,  C07D487/04 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/0382 ,  H01L51/0018

摘要： Disclosed herein is a composition of matter having a general structure chosen from (I), (II), (III) or (IV); at least one photo acid generator; at least one crosslinker; and at least one solvent; wherein X and Y are the same or different, wherein at least one of X and Y comprises an acid labile group, wherein R1 is a saturated or unsaturated group having from 1-4 carbon atoms, R2 is chosen from hydrogen or a saturated or unsaturated group having from 1-4 carbon atoms, R3 is a saturated or unsaturated group having from 1-4 carbon atoms, and R4 is a saturated or unsaturated group having from 1-4 carbon atoms.

摘要翻译： 本文公开了具有选自（I），（II），（III）或（IV）的一般结构的物质组合物; 至少一个光产酸剂; 至少一种交联剂; 和至少一种溶剂; 其中X和Y相同或不同，其中X和Y中的至少一个包含酸不稳定基团，其中R1是具有1-4个碳原子的饱和或不饱和基团，R2选自氢或饱和或不饱和的 具有1-4个碳原子的基团，R3是具有1-4个碳原子的饱和或不饱和基团，R4是具有1-4个碳原子的饱和或不饱和基团。