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公开(公告)号:US20130221074A1
公开(公告)日:2013-08-29
申请号:US13406198
申请日:2012-02-27
申请人: Cheng-Chang WEI , Su-Chun YANG , Hsiao-Yun CHEN , Chih-Hang TUNG , Da-Yuan SHIH , Chen-Hua YU
发明人: Cheng-Chang WEI , Su-Chun YANG , Hsiao-Yun CHEN , Chih-Hang TUNG , Da-Yuan SHIH , Chen-Hua YU
IPC分类号: H05K13/04
CPC分类号: H05K13/0465 , H01L24/13 , H01L24/16 , H01L24/81 , H01L2224/1132 , H01L2224/11334 , H01L2224/1134 , H01L2224/1145 , H01L2224/11462 , H01L2224/13014 , H01L2224/131 , H01L2224/13111 , H01L2224/13139 , H01L2224/13147 , H01L2224/16057 , H01L2224/16058 , H01L2224/16225 , H01L2224/16227 , H01L2224/75252 , H01L2224/75744 , H01L2224/75745 , H01L2224/81121 , H01L2224/81191 , H01L2224/81815 , H01L2224/8193 , H01L2924/00013 , H01L2924/014 , H01L2924/00014 , H01L2924/00012 , H01L2224/13099 , H01L2224/05099 , H01L2224/05599
摘要: A method includes heating a solder bump above a melting temperature of the solder bump. The solder bump is stretched to increase a height of the solder bump. The solder bump is cooled down.
摘要翻译: 一种方法包括将焊料凸块加热到焊料凸块的熔化温度以上。 焊料凸块被拉伸以增加焊料凸块的高度。 焊锡凸块被冷却。
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公开(公告)号:US20110186989A1
公开(公告)日:2011-08-04
申请号:US12883950
申请日:2010-09-16
申请人: Yi-Li Hsiao , Chen-Hua Yu , Shin-Puu Jeng , Chih-Hang Tung , Cheng-Chang Wei
发明人: Yi-Li Hsiao , Chen-Hua Yu , Shin-Puu Jeng , Chih-Hang Tung , Cheng-Chang Wei
CPC分类号: H01L24/11 , H01L21/44 , H01L21/76885 , H01L23/49811 , H01L23/52 , H01L24/03 , H01L24/05 , H01L24/13 , H01L2224/0347 , H01L2224/0361 , H01L2224/03912 , H01L2224/10126 , H01L2224/10145 , H01L2224/11 , H01L2224/1147 , H01L2224/11823 , H01L2224/11825 , H01L2224/11849 , H01L2224/13018 , H01L2224/13562 , H01L2224/13565 , H01L2224/80815 , H01L2224/81815 , H01L2924/01322 , H01L2924/1305 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/00 , H01L2924/00012
摘要: A semiconductor device includes a solder bump overlying and electrically connected to a pad region, and a metal cap layer formed on at least a portion of the solder bump. The metal cap layer has a melting temperature greater than the melting temperature of the solder bump.
摘要翻译: 半导体器件包括覆盖并电连接到焊盘区域的焊料凸块和形成在焊料凸块的至少一部分上的金属盖层。 金属盖层的熔融温度大于焊料凸块的熔化温度。
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