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1.发明授权Oscillating slide machine that pumps different fluid mediums at different pressures 有权摆动滑块机在不同压力下泵送不同的流体介质公开(公告)号：US09394893B2
公开(公告)日：2016-07-19
申请号：US13581316
申请日：2011-02-17
申请人： André Mäder , Christian Richter , Mark Tepler , Bernd Morthorst , Jens Struckmann , Wolfgang Vöge
发明人： André Mäder , Christian Richter , Mark Tepler , Bernd Morthorst , Jens Struckmann , Wolfgang Vöge
CPC分类号： F04B23/10 , F01C21/0809 , F04B23/12 , F04C2/336 , F04C11/005
摘要： A controllable hydraulic oscillating slide machine includes an inner rotor arranged in a housing and having cylindrical recesses. A bearing is formed in the housing, in which a co-rotating outer rotor is mounted eccentrically to the inner rotor, the outer rotor having several pivotably suspended slide drivers that engage into the recesses of the inner rotor for rotationally driving the outer rotor by way of the inner rotor and form modifiable chambers. The slide drivers may each be coupled to a piston that is guided in a respective associated recess. A pressure level different from that in the chambers between the inner and the outer rotor may be set in the chambers delimited by the recesses and the associated pistons so that two different pressure levels may be generated and two different consumers can be supplied using the oscillating slide machine.
摘要翻译： 一种可控制的液压摆动滑动机器，其包括设置在壳体中并具有圆柱形凹部的内转子。 轴承形成在壳体中，其中同向旋转的外转子偏心地安装到内转子，外转子具有几个可枢转地悬挂的滑动驱动器，其接合到内转子的凹部中，用于通过方式旋转地驱动外转子 的内转子并形成可修改的腔室。 滑动驱动器可以各自联接到在相应的相关联的凹部中被引导的活塞。 可以在由凹部和相关联的活塞限定的室中设置与内转子和外转子之间的腔室中不同的压力水平，使得可以产生两个不同的压力水平，并且可以使用摆动滑块 机。
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公开(公告)号：US09051933B2
公开(公告)日：2015-06-09
申请号：US13155041
申请日：2011-06-07
CPC分类号： F04C2/332 , F01C21/08 , F04C2/3441 , F04C14/226 , F04C15/0049 , F04C2240/20 , F04C2270/13 , F04C2270/14
摘要： A vane pump is disclosed. The vane pump includes at least an inner rotor and at least one vane. The inner rotor is rotatably mounted in a cage and the at least one vane is configured in at least one substantially radial slot, the slot is configured in the inner rotor, wherein the slots and the vanes are arranged asymmetrically on the inner rotor.
摘要翻译： 公开了一种叶片泵。 叶片泵至少包括内转子和至少一个叶片。 内转子可旋转地安装在保持架中，并且至少一个叶片构造在至少一个基本上径向的槽中，该槽配置在内转子中，其中槽和叶片不对称地布置在内转子上。
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公开(公告)号：US06746828B2
公开(公告)日：2004-06-08
申请号：US10134105
申请日：2002-04-29
IPC分类号： G03C500
CPC分类号： G03F7/38 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/095 , Y10S430/111
摘要： A method for structuring a photoresist layer includes the steps of providing a substrate on which a photoresist layer has been applied at least in some areas. The photoresist layer includes a film-forming polymer that contains molecule groups that can be converted into alkali-soluble groups by acid-catalyzed elimination reactions. The polymer further includes a photobase generator that, on exposure to light from a defined wavelength range, releases a base. The polymer additionally includes a thermoacid generator that releases an acid when the temperature is raised. The photoresist layer is initially exposed, in some areas, to light from the defined wavelength range. The photoresist layer is then heated to a temperature at which the thermoacid generator releases an acid and the acid-catalyzed elimination reaction takes place. Finally, the photoresist layer is developed.
摘要翻译： 用于构造光致抗蚀剂层的方法包括以下步骤：至少在一些区域中提供其上已经施加有光致抗蚀剂层的基板。 光致抗蚀剂层包括含有可通过酸催化消除反应转化为碱溶性基团的分子基团的成膜聚合物。 聚合物还包括光源产生器，其在暴露于来自限定波长范围的光时释放基底。 聚合物还包括当温度升高时释放酸的热酸发生剂。 光致抗蚀剂层最初在一些区域中暴露于来自限定波长范围的光。 然后将光致抗蚀剂层加热至热酸发生器释放酸的温度，并进行酸催化的消除反应。 最后，显影光致抗蚀剂层。
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4.发明授权Method for experimentally verifying imaging errors in optical exposure units 失效用于实验验证光学曝光单元中的成像误差的方法公开(公告)号：US06696208B2
公开(公告)日：2004-02-24
申请号：US10135471
申请日：2002-04-30
IPC分类号： G03F900
CPC分类号： G03F1/84 , G03F7/265 , G03F7/38 , G03F7/70616
摘要： Imaging errors in optical exposure units for the lithographic structuring of semiconductors are determined. First, a latent image of a mask is first produced in a photoactivatable layer by exposure using the optical exposure unit to be tested. After heat treating for increasing the contrast and developing the exposed resist, the latter is treated with an amplification agent which preferably diffuses into the exposed parts of the photoresist. There, it reacts with groups of the photoresist. This leads to an increase in the layer thickness of the resist in the exposed parts. A topographical image of the surface of the photoresist, which can be created, for example, by scanning electron microscopy, then indicates imaging errors by protuberances which are located outside the image of the mask. The method permits testing of optical exposure units under production conditions and thus facilitates the adjustment and the checking of all components of the exposure system used for the production of microchips.
摘要翻译： 确定半导体光刻结构的光学曝光单元中的成像误差。 首先，首先通过使用要测试的光学曝光单元的曝光在可光活化层中产生掩模的潜像。 在热处理以增加对比度和显影曝光的抗蚀剂之后，后者用优选扩散到光致抗蚀剂的暴露部分中的扩增剂处理。 在那里，它与光致抗蚀剂的组反应。 这导致暴露部分中抗蚀剂的层厚度增加。 例如通过扫描电子显微镜可以产生光致抗蚀剂表面的形貌图，然后通过位于掩模图像之外的突起来指示成像误差。 该方法允许在生产条件下对光学曝光单元进行测试，从而有助于调整和检查用于生产微芯片的曝光系统的所有部件。
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公开(公告)号：US20130345296A1
公开(公告)日：2013-12-26
申请号：US13819538
申请日：2011-08-31
申请人： Torsten Heilmann , Heiko Noack , Christian Richter , Sabine Post
发明人： Torsten Heilmann , Heiko Noack , Christian Richter , Sabine Post
IPC分类号： A61K31/337 , A61K31/27 , A61K31/198
CPC分类号： A61K31/337 , A61K31/145 , A61K31/164 , A61K45/06 , A61L27/34 , A61L27/54 , A61L29/085 , A61L29/16 , A61L31/10 , A61L31/16 , A61L2300/416 , A61K2300/00
摘要： The present invention relates a pharmaceutical composition comprising a taxane and an inhibitory compound capable of inhibiting the enzyme acetaldehyde dehydrogenase e.g. disulfiram. The pharmaceutical compositions of the invention can be used to coat medical devices such as implants. Such implant can be an expansible hollow part, having at least one opening, which consists of an elastic biocompatible material that comprises elongated micro-cavities in its surface. Medical devices coated with a pharmaceutical composition of the invention exhibit an enhanced transfer of taxane from the surface of said medical device into the target tissue.
摘要翻译： 本发明涉及一种药物组合物，其包含紫杉烷和能够抑制乙醛脱氢酶的抑制化合物，例如 双硫仑 本发明的药物组合物可用于涂覆诸如植入物之类的医疗装置。 这样的植入物可以是可膨胀的中空部分，其具有至少一个开口，该开口由弹性生物相容性材料组成，该材料在其表面上包括细长的微型腔。 用本发明的药物组合物涂覆的医疗装置显示出将紫杉烷从所述医疗装置的表面增强转移到靶组织中。
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6.发明授权公开(公告)号：US07579945B1
公开(公告)日：2009-08-25
申请号：US12142968
申请日：2008-06-20
IPC分类号： G08B29/00
摘要： An emergency response system capable of directing building occupants to a safe location in real-time is disclosed. The system comprises a plurality of sensors which detect and monitor an emergency condition, a central processing unit which evaluates the data, calculates accessible evacuation routes, and sends the result to output devices which provide directional information to occupants. By combining an analysis of the flow of evacuees with changes in building structural information and the evolution of an emergency condition the system combines situation-aware data with contextual information to thereby provide the best available evacuation route to evacuees. In this manner, some evacuees may be redirected to alternate evacuation routes during the evacuation process itself, thereby minimizing problems due to congestion, potential panic of the evacuees, and changes in the emergency condition while increasing the probability that evacuees will reach a safe location.
摘要翻译： 公开了能够将建筑物居住者实时地指向安全位置的应急响应系统。 该系统包括检测和监视紧急情况的多个传感器，评估数据的中央处理单元，计算可访问的撤离路线，并将结果发送给向乘客提供方向信息的输出设备。 通过结合对撤离人员流动的分析与建筑结构信息的变化以及紧急情况的演变，系统将情境感知数据与情境信息相结合，从而为撤离人员提供最佳的可行撤离路线。 以这种方式，在撤离过程本身期间，一些撤离人员可能被重定向到交替的疏散路线，从而最大限度地减少了由于拥塞引起的问题，撤离人员的潜在恐慌以及紧急情况的变化，同时增加了撤离人员到达安全位置的可能性。
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7.发明授权System and method for enhancing the sharing of application libraries between different JVM's and systems with a dynamic relocation based on usage patterns 有权基于使用模式，通过动态重定位来增强应用程序库在不同JVM和系统之间共享的系统和方法公开(公告)号：US07503047B1
公开(公告)日：2009-03-10
申请号：US12099355
申请日：2008-04-08
申请人： Christian Richter
发明人： Christian Richter
IPC分类号： G06F9/46 , G06F9/44 , G06F15/177 , G06F7/00 , G06F12/00
CPC分类号： G06F9/445 , G06F9/5033
摘要： The present disclosure is a method for storing possible classes or class containers (Jars) based on usage patterns of JVMs. The classes may be stored in the memory area of the JVM that may use those most and is closest to the actual system for access. Distributed environments where memory is shared across all systems can access memory across all systems but access speed is only high close to the current system with a fast connection and bandwidth towards this memory area.
摘要翻译： 本公开是基于JVM的使用模式来存储可能的类或类容器（Jars）的方法。 这些类可以存储在可以使用那些最多并且最接近实际系统进行访问的JVM的存储器区域中。 跨所有系统共享存储器的分布式环境可以访问所有系统的内存，但访问速度仅靠近当前系统高速连接和带宽朝向该内存区域。
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公开(公告)号：US06800407B2
公开(公告)日：2004-10-05
申请号：US10135684
申请日：2002-04-30
IPC分类号： G03F900
CPC分类号： G03F1/84 , G03F7/70616
摘要： The method enables determining imaging errors of photomasks for the lithographic structuring of semiconductors. A latent image of the mask is first produced in a photoactivatable layer by exposure. After heat treatment carried out for increasing the contrast and development of the exposed resist, the latter is treated with an amplification agent which preferably diffuses into the exposed parts of the photoresist. There, it reacts with groups of the photoresist, which leads to an increase in the layer thickness of the resist in the exposed parts. A topographical image of the surface of the photoresist, which can be created, for example, by scanning electron microscopy, then indicates imaging errors by protuberances which are located outside the image of the mask. The mask layout can be tested under production conditions and the adjustment and the checking of all components of the phototransfer system used for the production of microchips is facilitated.
摘要翻译： 该方法能够确定用于半导体的光刻结构的光掩模的成像误差。 首先通过曝光在可光活化层中产生掩模的潜像。 在进行热处理以增加曝光的抗蚀剂的对比度和显影后，后者用优选扩散到光致抗蚀剂的暴露部分中的扩增剂处理。 在那里，它与光致抗蚀剂的组反应，这导致暴露部分中抗蚀剂的层厚度增加。 例如通过扫描电子显微镜可以产生光致抗蚀剂表面的形貌图，然后通过位于掩模图像之外的突起来指示成像误差。 掩模布局可以在生产条件下进行测试，并且促进了用于生产微芯片的光转移系统的所有组件的调整和检查。
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公开(公告)号：US06746821B2
公开(公告)日：2004-06-08
申请号：US09999323
申请日：2001-10-31
IPC分类号： G03C556
CPC分类号： G03F7/038 , G03F7/0046 , G03F7/0392 , H01L21/0273
摘要： A method structures a chemical amplification photoresist layer, in which a photoresist layer of the chemically amplified type is brought into contact, before or after the exposure for structuring, with a base which is capable of diffusing into the photoresist layer. As a result of this treatment with the base, greater steepness and less roughness of the resist profiles are achieved in the subsequent development step.
摘要翻译： 一种方法结构化化学放大光致抗蚀剂层，其中化学放大型光致抗蚀剂层在用于结构的曝光之前或之后与能够扩散到光致抗蚀剂层中的基底接触。 通过用碱处理的结果，在随后的显影步骤中实现了抗蚀剂轮廓的更大的陡度和更小的粗糙度。
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公开(公告)号：US5934644A
公开(公告)日：1999-08-10
申请号：US652472
申请日：1996-06-18
申请人： Pierre Boillat , Ralf Martin , Urs Portmann , Christian Richter , Rudolf Scholz , Leopold Seczer
发明人： Pierre Boillat , Ralf Martin , Urs Portmann , Christian Richter , Rudolf Scholz , Leopold Seczer
CPC分类号： F24F11/04 , B60H1/00835 , F24F13/1426
摘要： The invention relates to a setting device for a ventilation flap (12, 12a,2b) in an air duct, particularly in a heating and ventilation system of an automobile, with an electric motor (2) executing setting movements and with a control unit (3) for the electric motor (2). In order to minimize the outlay in terms of assembly and the replacement parts to be kept available, there is provision for designing the electric motor (2) as a stepping motor activated by output signals from a control unit (3) adjacent to this stepping motor, and the control unit (3) has encoding inputs (K1, K2) for selecting the direction of rotation and/or the rotary angle.
摘要翻译： PCT No.PCT / EP94 / 04120 Sec。 371日期1996年6月18日 102（e）1996年6月18日PCT 1994年12月12日PCT PCT。 公开号WO95 / 16582 日期：1995年6月22日本发明涉及一种用于空气管道中的通风翼片（12,12a，12b）的设置装置，特别是在汽车的加热和通风系统中，电动机（2）执行设定运动， 具有用于电动机（2）的控制单元（3）。 为了最大限度地减少组装和替换部件的费用，可以将电动机（2）设计为由来自与该步进电动机相邻的控制单元（3）的输出信号启动的步进电动机 ，并且控制单元（3）具有用于选择旋转方向和/或旋转角度的编码输入（K1，K2）。
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