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1.发明申请Novel black matrix, method for the preparation thereof, flat display device and electromagnetic interference filter employing the same 失效新型黑色矩阵，其制备方法，平面显示装置和采用该方法的电磁干扰滤波器公开(公告)号：US20060019182A1
公开(公告)日：2006-01-26
申请号：US11185695
申请日：2005-07-21
IPC分类号： G02B5/20
CPC分类号： H01J11/10 , G02F1/133512 , G02F2001/133334 , H01J2211/444
摘要： A novel black matrix, a method for preparing the same, and a flat display device and an electromagnetic interference filter to which the black matrix is applied. The black matrix is prepared by exposing a photoactive compound to form a latent pattern of nuclei for crystal growth and treating the latent pattern of nuclei for crystal growth with a metal salt solution to give a metal particle-deposited pattern; forming an electroless Ni-plated layer on the metal particle-deposited pattern; and forming an electroless Cu-plated layer on the electroless Ni-plated layer. Exhibiting improved black tone, which is achieved only by a selective multilayer plating process, without using expensive vacuum sputtering apparatus or a photolithographic process, the black matrix can be applied to various flat display devices. In addition, due to improved electric conductivity, the black matrix can be used in an electromagnetic interference filter, without employing an additional front surface blackening process.
摘要翻译： 一种新颖的黑色矩阵，其制备方法以及应用黑矩阵的平面显示装置和电磁干扰滤波器。 通过使光活性化合物曝光以形成晶体生长的核的潜在图案并用金属盐溶液处理晶核生长的细胞核的潜在图案以得到金属颗粒沉积图案来制备黑色矩阵; 在金属颗粒沉积图案上形成化学镀Ni层; 并在无电Ni镀层上形成化学镀Cu层。 通过选择性多层电镀工艺实现的改进的黑色调，不使用昂贵的真空溅镀装置或光刻工艺，可以将黑色矩阵应用于各种平面显示装置。 此外，由于电导率的提高，黑矩阵可以用于电磁干扰滤波器，而不需要额外的前表面变黑处理。
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2.发明申请公开(公告)号：US20060183061A1
公开(公告)日：2006-08-17
申请号：US11325339
申请日：2006-01-05
IPC分类号： G03F7/00
CPC分类号： G03F7/0047 , G03F7/0007 , G03F7/095 , G03F7/405
摘要： A method for forming a positive metal pattern that includes the steps of (i) coating a photocatalytic compound on a substrate to form a photocatalytic film, (ii) coating a composition comprising a water-soluble polymer and a Pd compound on the photocatalytic film to form a photosensitive layer, (iii) selectively exposing the photocatalytic film and the photosensitive layer to light to form a latent pattern acting as a nucleus for crystal growth, and (iv) plating the latent pattern to grow a metal crystal thereon. Further disclosed is an electromagnetic interference (EMI) filter comprising a metal pattern formed by the method. According to the method, a high-resolution metal pattern can be formed in a rapid and efficient manner when compared to conventional methods for forming a metal pattern. In addition, since the EMI filter has superior performance and is easy to manufacture at low costs, it can be advantageously applied to flat display panels, including plasma display panels (PDPs).
摘要翻译： 一种形成正极金属图案的方法，包括以下步骤：（i）在基材上涂布光催化化合物以形成光催化膜，（ii）在光催化膜上涂布包含水溶性聚合物和Pd化合物的组合物， 形成感光层，（iii）将光催化膜和感光层选择性地曝光以形成用作晶体生长的核的潜伏图案，以及（iv）电镀潜像以在其上生长金属晶体。 另外公开了一种电磁干扰（EMI）滤波器，其包括通过该方法形成的金属图案。 根据该方法，与用于形成金属图案的常规方法相比，可以以快速且有效的方式形成高分辨率金属图案。 此外，由于EMI滤波器具有优异的性能并且易于以低成本制造，因此可以有利地应用于包括等离子体显示面板（PDP）的平板显示面板。
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3.发明申请公开(公告)号：US20060144713A1
公开(公告)日：2006-07-06
申请号：US11283902
申请日：2005-11-22
IPC分类号： C25D5/02
CPC分类号： C25D5/022 , C23C18/1605 , C23C18/1608 , C23C18/1612 , C23C18/1868 , C23C18/1889 , C23C18/1893 , C23C18/204 , C23C18/208 , C23C18/2086 , C23C18/405 , C25D5/54
摘要： An optical filter that may include a transparent substrate, a photocatalytic film formed on the back surface of the transparent substrate, a metal pattern formed by selectively exposing the photocatalytic film to light and growing a metal crystal thereon by plating, and a near-infrared ray shielding and photoselective absorbing layer formed on the metal pattern. Since the optical filter may exhibit superior color reproduction and excellent shielding performance against electromagnetic waves, near-infrared rays and neon light, it may be applied to a variety of image display devices, e.g., PDPs.
摘要翻译： 可以包括透明基板的光学滤光器，在透明基板的背面形成的光催化膜，通过选择性地将光催化膜曝光并通过电镀生长金属结晶而形成的金属图案，以及近红外线 屏蔽和光电吸收层形成在金属图案上。 由于光学滤波器可以表现出优异的色彩再现性和对电磁波，近红外线和氖光的优异的屏蔽性能，所以可以应用于各种图像显示装置，例如PDP。
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公开(公告)号：US20060097622A1
公开(公告)日：2006-05-11
申请号：US11263866
申请日：2005-11-02
CPC分类号： C23C18/204 , C23C18/1608 , C23C18/1612 , C23C18/1651 , C23C18/1653 , C23C18/1868 , C23C18/1893 , C23C18/2086 , C23C18/31 , H01J2211/446
摘要： A method for forming a metal pattern with a low resistivity. The method may include the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film layer; (ii) coating a water-soluble polymeric compound onto the photocatalytic film layer to form a water-soluble polymer layer; (iii) selectively exposing the two layers to light to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern with a metal to grow metal crystals thereon. According to the method, a multilayer wiring pattern including a low resistivity metal may be formed in a relatively simple manner at low cost, and the metals constituting the respective layers can be freely selected according to the intended application. The low resistivity metal pattern may be advantageously applied to flat panel display devices, e.g., LCDs, PDPs and ELDs.
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5.发明申请Black matrix, method for preparing the same, and flat panel display and electromagnetic interference filter using the same 失效黑色矩阵，其制备方法，以及使用其的平板显示器和电磁干扰滤波器公开(公告)号：US20060105251A1
公开(公告)日：2006-05-18
申请号：US11270545
申请日：2005-11-10
IPC分类号： G03F1/00
CPC分类号： G02B5/285 , G02F1/133512 , G02F2001/133334
摘要： A black matrix, a method for preparing the black matrix, a flat panel display and an electromagnetic interference filter using the black matrix. The black matrix may comprise a substrate, a titanium oxide layer, a Ni plating layer, and a Ni/Pd alloy layer. The method may comprise the steps of forming a titanium oxide layer, forming a metal particle-deposited pattern on the titanium oxide layer, forming a Ni electroless plating layer on the metal particle-deposited pattern, and forming a Ni/Pd alloy layer on the Ni electroless plating layer. Since the black matrix may have a high blackening density via simple selective multilayer plating without using a high-price vacuum sputtering apparatus and undergoing photolithography, unlike conventional chromium-based black matrices, it may be employed in various flat panel displays. In addition, since the black matrix may exhibit superior electrical conductivity, it may be used in electromagnetic interference filters without additional front-surface blackening.
摘要翻译： 黑矩阵，黑矩阵的制备方法，平板显示器和使用黑矩阵的电磁干扰滤波器。 黑色矩阵可以包括基底，氧化钛层，Ni镀层和Ni / Pd合金层。 该方法可以包括以下步骤：在氧化钛层上形成氧化钛层，形成金属颗粒沉积图案，在金属颗粒沉积图案上形成Ni化学镀层，并在其上形成Ni / Pd合金层 镍化学镀层。 由于黑色矩阵可以通过简单的选择性多层电镀具有高的黑化密度，而不使用高价格的真空溅射装置并进行光刻，与常规的铬基黑色矩阵不同，它可以用于各种平板显示器。 此外，由于黑矩阵可以表现出优异的导电性，所以它可以用于电磁干扰滤光器中，而没有额外的前表面变黑。
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6.发明申请Organometallic composition for forming a metal alloy pattern and a method of forming such a pattern using the composition 有权用于形成金属合金图案的有机金属组合物和使用该组合物形成这种图案的方法公开(公告)号：US20050250051A1
公开(公告)日：2005-11-10
申请号：US10718809
申请日：2003-11-24
申请人： Jin Kim , Soon Hwang , Young Byun , Euk Hwang , Sang Lee
发明人： Jin Kim , Soon Hwang , Young Byun , Euk Hwang , Sang Lee
CPC分类号： G03F7/0043 , G03F7/0042
摘要： An organometallic composition containing an organometallic compound (I) containing Ag, an organometallic compound (II) containing Au, Pd, or Ru, and an organometallic compound (III) containing Ti, Ta, Cr, Mo, Ru, Ni, Pd, Cu, Au, or Al, wherein the metal components of organometallic compounds (II) and (III), respectively, are present in an amount of 0.01˜10 mol % based on the amount of Ag in the organometallic compound (I), and a method of forming a metal alloy pattern using the same. Silver alloy patterns can be obtained through a simplified manufacturing process, which patterns have enhanced heat resistance, adhesiveness and chemical stability. The method may be applied to making a reflective film for LCD and metal wiring (gate, source, drain electrode) for flexible displays or flat panel displays, and further to CMP-free damascene processing and PR-free ITO film deposition.
摘要翻译： 含有含Ag的有机金属化合物（I），含有Au，Pd或Ru的有机金属化合物（II）和含有Ti，Ta，Cr，Mo，Ru，Ni，Pd，Cu的有机金属化合物（III）的有机金属组合物 ，Au或Al，其中有机金属化合物（II）和（III）的金属组分分别以有机金属化合物（I）中的Ag的量为0.01〜10mol％的量存在，以及 使用其形成金属合金图案的方法。 可以通过简化的制造工艺获得银合金图案，该图案具有增强的耐热性，粘合性和化学稳定性。 该方法可以应用于制造用于LCD和用于柔性显示器或平板显示器的LCD和金属布线（栅极，源极，漏极）的反射膜，并且还可用于制造无CMP的镶嵌加工和无PR的ITO膜沉积。
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公开(公告)号：US20050023957A1
公开(公告)日：2005-02-03
申请号：US10876623
申请日：2004-06-28
CPC分类号： G03F7/0043 , H01J9/025 , Y10S977/70
摘要： Disclosed herein are a method for forming a pattern of a one-dimensional nanostructure, and a pattern of a one-dimensional nanostructure formed by the method. The method comprises the steps of (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, and selectively exposing the photocatalytic film to light to form latent image centers for crystal growth, (ii) growing metal crystals by plating the latent pattern to form a metal pattern, and (iii) selectively growing a one-dimensional nanostructure on the metal pattern acting as a catalyst.
摘要翻译： 本文公开了一种形成一维纳米结构的图案的方法和通过该方法形成的一维纳米结构的图案。 该方法包括以下步骤：（i）将光催化化合物涂覆到基底上以形成光催化膜，并将光催化膜选择性地曝光以形成晶体生长的潜像中心，（ii）通过电镀潜在图案生长金属晶体 以形成金属图案，和（iii）在用作催化剂的金属图案上选择性地生长一维纳米结构。
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8.发明申请Method for manufacturing high-transmittance optical filter for image display devices 有权用于制造用于图像显示装置的高透光率滤光器的方法公开(公告)号：US20060127818A1
公开(公告)日：2006-06-15
申请号：US11280393
申请日：2005-11-17
IPC分类号： G03F7/00
CPC分类号： G03F7/0007 , G03F7/0042 , G03F7/11 , G03F7/265 , G03F7/32 , G03F7/423
摘要： A method for manufacturing a high-transmittance optical filter for image display devices, which may include the steps of coating a photocatalytic compound on a transparent substrate to form a photocatalytic film, selectively exposing the photocatalytic film to light and growing a metal crystal thereon by plating to form a metal pattern, and selectively etching and removing the photocatalytic compound remaining on the transparent substrate using a buffered oxide etchant (BOE). According to the method, a high-transmittance, high-resolution and low-resistivity optical filter can be manufactured in a simple manner at low costs.
摘要翻译： 一种用于图像显示装置的高透光率滤光器的制造方法，其可以包括在透明基板上涂布光催化剂以形成光催化膜的步骤，选择性地将光催化膜曝光并通过电镀在其上生长金属结晶 以形成金属图案，并使用缓冲氧化物蚀刻剂（BOE）选择性地蚀刻和除去留在透明基板上的光催化化合物。 根据该方法，可以以低成本以简单的方式制造高透光率，高分辨率和低电阻率的滤光器。
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公开(公告)号：US20060019076A1
公开(公告)日：2006-01-26
申请号：US11014703
申请日：2004-12-20
CPC分类号： H05K3/20 , H05K1/0393 , H05K3/185 , H05K3/386 , H05K2203/121 , Y10T428/24917
摘要： Disclosed herein is a method for forming a highly conductive metal pattern which comprises forming a metal pattern on a substrate by the use of a photocatalyst and a selective electroless or electroplating process, and transferring the metal pattern to a flexible plastic substrate. According to the method, a highly conductive metal pattern can be effectively formed on a flexible plastic substrate within a short time, compared to conventional formation methods. Further disclosed is an EMI filter comprising a metal pattern formed by the method. The EMI filter not only exhibits high performances, but also is advantageous in terms of low manufacturing costs and simple manufacturing process. Accordingly, the EMI filter can be applied to a variety of flat panel display devices, including PDPs and organic ELs.
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10.发明申请Organometallic precursor composition and method of forming metal film or pattern using the same 失效有机金属前体组合物及使用其形成金属膜或图案的方法公开(公告)号：US20050084689A1
公开(公告)日：2005-04-21
申请号：US10874284
申请日：2004-06-24
申请人： Euk Hwang , Sang Lee , Young Byun , Joon Ryu , Hae Son
发明人： Euk Hwang , Sang Lee , Young Byun , Joon Ryu , Hae Son
CPC分类号： C23C18/06 , C23C18/08 , C23C18/1216 , C23C18/14 , Y10T428/31678
摘要： A composition of (i) an organometallic precursor containing a hydrazine compound coordinating with a central metal thereof and (ii) an organometallic compound of a main group metal and a method of forming metal film or pattern using this composition.
摘要翻译： （i）含有与中心金属配位的肼化合物的有机金属前体和（ii）主族金属的有机金属化合物的组合物和使用该组合物形成金属膜或图案的方法。
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