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    Method for removal of flux and other residue in dense fluid systems
    1.
    发明授权
    Method for removal of flux and other residue in dense fluid systems 失效
    在稠密流体系统中去除助焊剂和其他残留物的方法

    公开(公告)号：US07195676B2

    公开(公告)日：2007-03-27

    申请号：US10890502

    申请日：2004-07-13

    Applicant: Wayne Thomas McDermott ,  Gene Everad Parris ,  Dean Van-John Roth ,  Hoshang Subawalla

    Inventor： Wayne Thomas McDermott ,  Gene Everad Parris ,  Dean Van-John Roth ,  Hoshang Subawalla

    IPC: C23G1/00

    CPC classification number: B08B7/0021 ,  B08B1/00 ,  B08B3/02 ,  B08B3/12 ,  Y10S134/902

    Abstract: Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid comprising a dense fluid, at least one processing agent, and optionally a cosolvent to provide a partially treated article; and contacting the partially treated article with a dense rinse fluid comprising the dense fluid and optionally the cosolvent to provide a treated article wherein an agitation source is introducing during at least a portion of the first and/or the second contacting step.

    Abstract translation: 本文公开了使用致密加工流体和致密冲洗流体从制品中除去助熔剂残余物和脱硫残渣的方法。 在一个实施方案中，提供了一种方法，包括：将包含污染物的制品引入处理室; 使所述制品与包含致密流体，至少一种加工剂和任选的共溶剂的致密加工流体接触以提供部分处理的制品; 以及使所述部分处理的制品与包含所述致密流体和任选的共溶剂的致密冲洗流体接触以提供经处理的制品，其中在所述第一和/或所述第二接触步骤的至少一部分期间引入搅拌源。

    Immersion lithography fluids
    4.
    发明授权
    Immersion lithography fluids 有权
    浸没光刻液

    公开(公告)号：US07879531B2

    公开(公告)日：2011-02-01

    申请号：US11030132

    申请日：2005-01-07

    Applicant: Peng Zhang ,  Bridgette Maria Budhlall ,  Gene Everad Parris ,  Leslie Cox Barber

    Inventor： Peng Zhang ,  Bridgette Maria Budhlall ,  Gene Everad Parris ,  Leslie Cox Barber

    IPC: G02B1/06 ,  G02F1/361

    CPC classification number: G03F7/2041

    Abstract: Suitable additives that may be added into immersion fluids, immersion fluids comprising at least one carrier medium selected from an aqueous fluid, a non-aqueous fluid, and mixtures thereof, and immersions fluids comprising at least one carrier medium and at least one additive useful for performing immersion lithography at an operating wavelength ranging from 140 nm to 365 nm are disclosed herein.

    Abstract translation: 可以加入到浸渍流体中的合适的添加剂，包含至少一种选自水性流体，非水性流体及其混合物的载体介质的浸液，以及包含至少一种载体介质和至少一种可用于 本文公开了在140nm至365nm范围内的工作波长的浸没式光刻技术。

    Dimethyl ether for methyl group attachment on a carbon adjacent to an electron withdrawing group
    6.
    发明授权
    Dimethyl ether for methyl group attachment on a carbon adjacent to an electron withdrawing group 有权
    甲基的二甲醚连接在与吸电子基团相邻的碳上

    公开(公告)号：US06329549B1

    公开(公告)日：2001-12-11

    申请号：US09544672

    申请日：2000-04-06

    Applicant: Francis Joseph Waller ,  Gene Everad Parris

    Inventor： Francis Joseph Waller ,  Gene Everad Parris

    IPC: C07C5142

    CPC classification number: C07C67/343 ,  C07B37/04 ,  C07C69/54

    Abstract: A process for methylating an alpha carbon adjacent to an electron withdrawing group includes reacting dimethyl ether with a molecule containing the alpha carbon and the electron withdrawing group to substitute a methyl group on the alpha carbon. The process can be conducted in a vapor phase and can be represented by Equation I: R(CH2)nCH2-EWG+CH3OCH3→R(CH2)nCH(CH3)-EWG+CH3OH  (I) where EWG is the electron withdrawing group, and R is H when n is 0, 1 or 2, and R is alkyl, EWG or aryl when n>2. For example, the molecule reacted with dimethyl ether can be acetic acid, propionic acid, methyl acetate, methyl propionate, acetonitrile, propionitrile and acetone. The process is catalyzed by an acid catalyst containing a Lewis acid functionality. When the electron withdrawing group is an acid, a methyl ester can be formed by esterifying the electron withdrawing group with methanol liberated from dimethyl ether. When the process is conducted in the presence of an oxidant, such as oxygen, an &agr;,&bgr;-unsaturated bond can be formed in the molecule according to Equation II: R(CH2)nCH(CH3)-EWG+½O2→R(CH2)nC(═CH2)-EWG+H2O  (II) where EWG is the electron withdrawing group, and R is H when n is 0, 1 or 2, and R is alkyl, EWG or aryl when n>2.

    Abstract translation: 用于甲基化与吸电子基团相邻的α碳的方法包括使二甲醚与含有α碳和吸电子基团的分子反应以取代α碳上的甲基。 该方法可以在气相中进行，并且可以由式I表示：其中EWG是吸电子基团，当n是0,1或2时R是H，当n> 2时R是烷基，EWG或芳基 。 例如，与二甲醚反应的分子可以是乙酸，丙酸，乙酸甲酯，丙酸甲酯，乙腈，丙腈和丙酮。 该方法由含有路易斯酸官能团的酸催化剂催化。 当吸电子基团是酸时，可以通过用从二甲醚中释出的甲醇酯化吸电子基团而形成甲酯。 当该方法在诸如氧的氧化剂存在下进行时，可以根据式II在分子中形成α，β-不饱和键：其中EWG是吸电子基团，当n为0时，R为H ，1或2，当n> 2时，R为烷基，EWG或芳基。

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