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12 条记录 (耗时 0.018 秒)

    Method of and apparatus for analyzing ions adsorbed on surface of mask
    1.
    发明授权
    Method of and apparatus for analyzing ions adsorbed on surface of mask 有权
    用于分析吸附在面罩表面上的离子的方法和装置

    公开(公告)号：US07842916B2

    公开(公告)日：2010-11-30

    申请号：US12197052

    申请日：2008-08-22

    申请人： Dong-Hun Lee ,  Hae-Young Jeong ,  Byung-Cheol Cha ,  Sung-Jae Han

    发明人： Dong-Hun Lee ,  Hae-Young Jeong ,  Byung-Cheol Cha ,  Sung-Jae Han

    IPC分类号： G01N33/00

    CPC分类号： G01N1/4055 ,  G01N30/96 ,  G01N2001/4061 ,  G03F1/84 ,  Y10T436/25125

    摘要： A method of analyzing ions adsorbed on a surface of a mask for pattern formation of a semiconductor device, and an apparatus using the same are disclosed. The ion analyzing method includes: filling a heating container within a main chamber with a predetermined amount of a solvent; immersing a mask in the solvent-filled heating container; raising an internal pressure of the chamber to a predetermined level by supplying gas into the chamber; separating ions from a surface of the mask by heating the solvent within the heating container at a predetermined temperature for a predetermined period; and analyzing the ions by collecting the solvent.

    摘要翻译： 公开了分析吸附在掩模的表面上用于图案形成半导体器件的离子的方法和使用其的装置。 离子分析方法包括：用预定量的溶剂填充主室内的加热容器; 将掩模浸入溶剂填充的加热容器中; 通过将气体供应到室中来将室的内部压力提高到预定水平; 通过在预定温度下将加热容器内的溶剂加热预定的时间，从而将掩模与掩模的表面分离; 并通过收集溶剂分析离子。

    Methods of measuring critical dimensions and related devices
    2.
    发明授权
    Methods of measuring critical dimensions and related devices 有权
    测量关键尺寸和相关设备的方法

    公开(公告)号：US07803506B2

    公开(公告)日：2010-09-28

    申请号：US11811979

    申请日：2007-06-13

    申请人： Kyoung-Yoon Bang ,  Hae-Young Jeong ,  Yong-Hoon Kim ,  Yo-Han Choi ,  Hyung-Joo Lee

    发明人： Kyoung-Yoon Bang ,  Hae-Young Jeong ,  Yong-Hoon Kim ,  Yo-Han Choi ,  Hyung-Joo Lee

    IPC分类号： G03F9/00 ,  G01B11/08

    CPC分类号： G01B11/24 ,  G03F7/70625 ,  G06T7/001 ,  G06T2207/30148

    摘要： A method of measuring a critical dimension may include forming an object pattern on a substrate and forming a plurality of reference patterns on the substrate, wherein each of the plurality of reference patterns has a different critical dimension. An optical property of each of the plurality of reference patterns may be measured to provide a respective measured optical property for each of the reference patterns, and an optical property of the object pattern may be measured to provide a measured optical property of the object pattern. The measured optical property of the object pattern may be compared with the measured optical properties of the reference patterns, and a critical dimension of the object pattern may be determined as being the same as the critical dimension of the reference pattern having the measured optical property that is closest to the measured optical property of the object pattern. Related devices are also discussed.

    摘要翻译： 测量临界尺寸的方法可以包括在衬底上形成对象图案并在衬底上形成多个参考图案，其中多个参考图案中的每一个具有不同的临界尺寸。 可以测量多个参考图案中的每一个的光学特性以为每个参考图案提供相应的测量光学特性，并且可以测量对象图案的光学特性以提供对象图案的测量光学特性。 可以将对象图案的测量光学性质与参考图案的测量光学性质进行比较，并且可以将对象图案的临界尺寸确定为与具有测量的光学性质的参考图案的临界尺寸相同， 最接近被测物体图案的光学特性。 还讨论了相关设备。

    METHOD OF AND APPARATUS FOR ANALYZING IONS ADSORBED ON SURFACE OF MASK
    4.
    发明申请
    METHOD OF AND APPARATUS FOR ANALYZING IONS ADSORBED ON SURFACE OF MASK 有权
    用于分析吸附在面膜表面的离子的方法和装置

    公开(公告)号：US20090101811A1

    公开(公告)日：2009-04-23

    申请号：US12197052

    申请日：2008-08-22

    申请人： Dong-Hun Lee ,  Hae-Young Jeong ,  Byung-Cheol Cha ,  Sung-Jae Han

    发明人： Dong-Hun Lee ,  Hae-Young Jeong ,  Byung-Cheol Cha ,  Sung-Jae Han

    IPC分类号： B01D59/44

    CPC分类号： G01N1/4055 ,  G01N30/96 ,  G01N2001/4061 ,  G03F1/84 ,  Y10T436/25125

    摘要： A method of analyzing ions adsorbed on a surface of a mask for pattern formation of a semiconductor device, and an apparatus using the same are disclosed. The ion analyzing method includes: filling a heating container within a main chamber with a predetermined amount of a solvent; immersing a mask in the solvent-filled heating container; raising an internal pressure of the chamber to a predetermined level by supplying gas into the chamber; separating ions from a surface of the mask by heating the solvent within the heating container at a predetermined temperature for a predetermined period; and analyzing the ions by collecting the solvent.

    摘要翻译： 公开了分析吸附在掩模的表面上用于图案形成半导体器件的离子的方法和使用其的装置。 离子分析方法包括：用预定量的溶剂填充主室内的加热容器; 将掩模浸入溶剂填充的加热容器中; 通过将气体供应到室中来将室的内部压力提高到预定水平; 通过在预定温度下将加热容器内的溶剂加热预定的时间，从而将掩模与掩模的表面分离; 并通过收集溶剂分析离子。

    Condensation particle counter
    5.
    发明授权
    Condensation particle counter 失效
    冷凝颗粒计数器

    公开(公告)号：US06980284B2

    公开(公告)日：2005-12-27

    申请号：US10381251

    申请日：2001-09-20

    申请人： Kang-Ho Ahn ,  Sang-Soo Kim ,  Hae-Young Jeong

    发明人： Kang-Ho Ahn ,  Sang-Soo Kim ,  Hae-Young Jeong

    IPC分类号： H01L21/02 ,  G01N15/00 ,  G01N15/06 ,  G01N15/14 ,  G01N1/00

    CPC分类号： G01N15/065 ,  G01N15/14 ,  G01N2015/0049 ,  G01N2015/0681

    摘要： A condensation particle counter measures the number of ultra-fine particles by growing the ultra-fine particles through a condensing process. The counter includes a capillary in which vapor of operating liquid is condensed and the ultra-fine particles grow. An insulating material surrounds the capillary to shut out heat flow between the capillary and the environment. The condensation particle counter can use various operating liquids including alcohol and water, and can be also applied to semiconductor clean rooms.

    摘要翻译： 冷凝颗粒计数器通过冷凝过程生长超细颗粒来测量超细颗粒的数量。 计数器包括毛细管，其中工作液体的蒸气被冷凝并且超细颗粒生长。 绝缘材料围绕毛细管以截断毛细管和环境之间的热流。 冷凝颗粒计数器可以使用各种操作液体，包括酒精和水，也可以应用于半导体洁净室。

    PLASMA ETCHING CHAMBER AND METHOD FOR MANUFACTURING PHOTOMASK USING THE SAME
    8.
    发明申请
    PLASMA ETCHING CHAMBER AND METHOD FOR MANUFACTURING PHOTOMASK USING THE SAME 有权
    等离子体蚀刻室及其制造方法

    公开(公告)号：US20070231716A1

    公开(公告)日：2007-10-04

    申请号：US11758258

    申请日：2007-06-05

    申请人： Jeong-Yun LEE ,  Jin-Min KIM ,  Hae-Young JEONG ,  Young-Hwa NO ,  Sang-Joon YOON ,  Sung-Yong CHO

    发明人： Jeong-Yun LEE ,  Jin-Min KIM ,  Hae-Young JEONG ,  Young-Hwa NO ,  Sang-Joon YOON ,  Sung-Yong CHO

    IPC分类号： G03F1/00

    CPC分类号： H01J37/32724 ,  G03F1/80 ,  H01J37/32009 ,  H01J2237/2001

    摘要： A plasma etching chamber of a plasma etching apparatus used in an etching process for manufacturing a photomask and a method for manufacturing a photomask using the same. The plasma etching chamber includes an electrode having a supporting surface for supporting a photomask substrate and a top surface surrounding the supporting surface, a heat transfer element installed along a peripheral edge of the supporting surface, and a heater for supplying heat to the heat transfer element. In the method for manufacturing a photomask, a shading layer is formed on a transparent substrate. A photoresist layer pattern is formed on the shading layer to partially expose the shading layer. The shading layer is etched to form a shading layer pattern, using plasma with the photoresist layer pattern as an etching mask, under a state in which the temperature of at least one portion of the peripheral edge of the transparent substrate is maintained higher than a temperature at a center of the transparent substrate.

    摘要翻译： 用于制造光掩模的蚀刻工艺中使用的等离子体蚀刻装置的等离子体蚀刻室和使用其的光掩模的制造方法。 等离子体蚀刻室包括具有用于支撑光掩模基板的支撑表面和围绕支撑表面的顶表面的电极，沿着支撑表面的周缘安装的传热元件，以及用于向传热元件供热的加热器 。 在光掩模的制造方法中，在透明基板上形成遮光层。 在遮光层上形成光致抗蚀剂层图案，以部分地曝光遮光层。 在使透明基板的周边边缘的至少一部分的温度保持高于温度的状态下，将遮光层蚀刻以形成遮光层图案，使用具有光致抗蚀剂层图案的等离子体作为蚀刻掩模 在透明基板的中心。

    Mammary gland tissue-specific expression system using &bgr;-casein promoter site of Korean native goat
    9.
    发明授权
    Mammary gland tissue-specific expression system using &bgr;-casein promoter site of Korean native goat 失效
    乳腺组织特异性表达系统使用韩国本地山羊的β-酪蛋白启动子位点

    公开(公告)号：US06635474B1

    公开(公告)日：2003-10-21

    申请号：US09582490

    申请日：2000-11-14

    申请人： Ook Joon Yoo ,  Kyung Kwang Lee ,  Young Mahn Han ,  Sun Jung Kim ,  Hae Young Jeong ,  Jung Ho Ko ,  Won Jun Oh

    发明人： Ook Joon Yoo ,  Kyung Kwang Lee ,  Young Mahn Han ,  Sun Jung Kim ,  Hae Young Jeong ,  Jung Ho Ko ,  Won Jun Oh

    IPC分类号： C12N1563

    CPC分类号： A01K67/0275 ,  A01K2217/05 ,  A01K2227/105 ,  A01K2267/01 ,  C07K14/4732 ,  C07K14/535 ,  C12N15/63 ,  C12N15/85 ,  C12N15/8509 ,  C12N2830/008 ,  C12N2830/42 ,  C12N2830/85

    摘要： There are disclosed mammary gland tissue-specific expression systems using the promoter site for the &bgr;-casein gene of Korean native goats, by use of which physiological activating substances can be produced. In each of the expression systems, that is, novel plasmids pGbc, pGbc_L and pGbc_S (deposition Nos. KCTC 0515BP, 0514BP and 0513BP, respectively), a &bgr;-casein gene expression-regulating region, a physiological activating substance gene and a termination-regulating region are linked. Human granulocyte colony stimulating factor (hG-CSF) or human granulocyte macrophage colony stimulating factor (hGM-CSF) can be produced in HC11 cells, a mouse mammary gland tissue-derived cell line, and in the milk secreted from the transgenic mice by use of a hG-CSF or hGM-CSF gene-carrying pGbc, pGbc_L or pGbc_S in transfection into cell and microinjection to mouse. The proteins are those which experience the posttranslational modification and maintain their normal activity in the human body. The expression systems make it possible to easily produce the proteins at a great amount, to scale up protein production to the extent of industrialization, and to isolate and purify the desired protein with ease and safety.

    摘要翻译： 已经公开了使用韩国本地山羊的β-酪蛋白基因的启动子位点的乳腺组织特异性表达系统，通过使用可以产生生理活化物质。 在每个表达系统中，即新型质粒pGbc，pGbc_L和pGbc_S（分别为沉积编号KCTC 0515BP，0514BP和0513BP），β-酪蛋白基因表达调节区，生理活化物质基因和终止 - 调节区域相连。 人类粒细胞集落刺激因子（hG-CSF）或人粒细胞巨噬细胞集落刺激因子（hGM-CSF）可以在HC11细胞，小鼠乳腺组织来源的细胞系和转基因小鼠分泌的乳中产生 的hG-CSF或携带hGM-CSF基因的pGbc，pGbc_L或pGbc_S转染入细胞和显微注射到小鼠。 蛋白质是经历翻译后修饰并维持其在人体中的正常活性的蛋白质。 表达系统使得可以容易地大量生产蛋白质，将蛋白质生产扩大到工业化程度，并且容易且安全地分离和纯化所需的蛋白质。