摘要:
A semiconductor device includes a substrate including an active region having an isolated shape and a field region. A gate insulation layer is provided on an upper surface of the active region of the substrate. A gate electrode is provided on the gate insulation layer and spaced apart from the boundary of the active region to cover the middle portion of the active region. An impurity region is provided under a surface of the active region that is exposed by the gate electrode.
摘要:
Provided are a phase change memory device and a method for forming the phase change memory device. The method includes forming a phase change material layer by providing reactive radicals to a substrate. The reactive radicals may comprise precursors for a phase change material and nitrogen.
摘要:
The present invention provides metal precursors for low temperature deposition. The metal precursors include a metal ring compound including at least one metal as one of a plurality of elements forming a ring. Methods of forming a metal thin layer and manufacturing a phase change memory device including use of the metal precursors is also provided.
摘要:
Example embodiments may provide phase-change material layers and a method of forming a phase-change material layer and devices using the same by generating a plasma including helium and/or argon in a reaction chamber, forming a first material layer on the object by introducing a first source gas including a first material, forming a first composite material layer on the object by introducing a second source gas including a second material into the reaction chamber, forming a third material layer on the first composite material layer by introducing a third source gas including a third material, and forming a second composite material layer on the first composite material layer by introducing a fourth source gas including a fourth material. Example embodiment phase-change material layers including carbon may be more easily and/or quickly formed at lower temperatures under the helium/argon plasma environment by providing the source gases for various feeding times. Example embodiments may also include memory devices using phase-change memory layers.
摘要:
Provided are methods of forming a material layer by chemically adsorbing metal atoms to a substrate having anions formed on the surface thereof, and a method of fabricating a memory device by using the material layer forming method. Accordingly, a via hole with a small diameter can be filled with a material layer without forming voids or seams. Thus, a reliable memory device can be obtained.
摘要:
In one aspect, a method of forming a phase change material layer is provided. The method includes supplying a reaction gas including the composition of Formula 1 into a reaction chamber, supplying a first source which includes Ge(II) into the reaction chamber, and supplying a second source into the reaction chamber. Formula 1 is NR1R2R3, where R1, R2 and R3 are each independently at least one selected from the group consisting of H, CH3, C2H5, C3H7, C4H9, Si(CH3)3, NH2, NH(CH3), N(CH3)2, NH(C2H5) and N(C2H5)2.
摘要翻译:一方面,提供了形成相变材料层的方法。 该方法包括将包含式1的组合物的反应气体供应到反应室中,将包含Ge(II)的第一源供应到反应室中,并将第二源供应到反应室中。 式1是NR1R2R3,其中R1,R2和R3各自独立地选自H,CH3,C2H5,C3H7,C4H9,Si(CH3)3,NH2,NH(CH3),N(CH3) 2,NH(C 2 H 5)和N(C 2 H 5)2。
摘要:
Provided are a phase change memory device and a method for forming the phase change memory device. The method includes forming a phase change material layer by providing reactive radicals to a substrate. The reactive radicals may comprise precursors for a phase change material and nitrogen.
摘要:
Disclosed is an optical fiber suitable for WDM system, particularly whose zero-dispersion wavelength is positioned in a short wavelength band less than 1,300 mm. In the optical fiber, dispersion has a positive value, not zero, at 1,310 nm, and a dispersion slope is positive at 1,550 nm with dispersion of 25 ps/nm-km or less. In addition, an effective sectional area is 65 μm2 or less at 1,310 nm, and 80 μm2 or less at 1,550 nm.Thus, though a transmission signal is Raman-amplified at a wavelength band of 1,300˜1,700 nm, transmission characteristics are not deteriorated due to crosstalk between pump signals. In addition, since the optical fiber has smaller effective sectional area than a general single-mode optical fiber with having substantially the same dispersion feature, it gives better Raman gain efficiency than a general single-mode optical fiber.
摘要:
A phase-changeable layer and a method of forming the same are disclosed. In the method, a first hydrogen gas is introduced into a reaction chamber into which a substrate is loaded at a first flow rate to form first plasma. A primary cyclic CVD process is carried out using precursors in the reaction chamber to form a lower phase-changeable layer having a first grain size on the substrate. A second hydrogen gas is introduced into the reaction chamber at a second flow rate less than the first flow rate to form second plasma. A secondary cyclic CVD process is carried out using the precursors in the reaction chamber to form an upper phase-changeable layer having a second grain size smaller than the first grain size on the substrate, thereby forming a phase-changeable layer. Thus, the phase-changeable layer may have strong adhesion strength with respect to a lower layer and good electrical characteristics.
摘要:
Disclosed is an optical fiber suitable for an optical transmission line used in WDM system, particularly a single-mode optical fiber whose zero-dispersion wavelength is positioned in a short wavelength band (less than 1,370 mm) so as to enable high-speed mass-storage signal transmission over S-C-L bands (1,460˜1,625 nm) and whose dispersion value and effective sectional area are optimized. In the optical fiber, a dispersion value is at least 9 ps/nm-km at 1,460 nm, an effective sectional area is 45-65 μm2 at 1,460 rim, a zero-dispersion wavelength exists at 1,370 nm or less, and a dispersion slope is positive. In addition, RDS (Relative Dispersion Slope) is 0.0032˜0.0038 nm−1 at 1,550 nm. Thus, the optical fiber enables to repress non-linearity and signal distortion to the maximum during 320 km repeaterless transmission with a transmission rate of 10 Gb/s or more over S-C-L bands, a channel spacing of 50 GHz or less, 16 channels, and a signal power of 0 dBm/ch or 2 dBm/ch.