Etching process for semiconductors
    5.
    发明授权
    Etching process for semiconductors 失效
    半导体蚀刻工艺

    公开(公告)号:US08765611B2

    公开(公告)日:2014-07-01

    申请号:US12917826

    申请日:2010-11-02

    IPC分类号: H01L21/027

    摘要: A process for etching semiconductors, such as II-VI or III-V semiconductors is provided. The method includes sputter etching the semiconductor through an etching mask using a nonreactive gas, removing the semiconductor and cleaning the chamber with a reactive gas. The etching mask includes a photoresist. Using this method, light-emitting diodes with light extracting elements or nano/micro-structures etched into the semiconductor material can be fabricated.

    摘要翻译: 提供了蚀刻半导体的方法,例如II-VI或III-V半导体。 该方法包括通过使用非反应性气体的蚀刻掩模溅射半导体蚀刻,去除半导体并用反应气体清洁室。 蚀刻掩模包括光致抗蚀剂。 使用这种方法,可以制造具有光提取元件的发光二极管或蚀刻到半导体材料中的纳米/微结构。

    SECOND-HARMONIC GENERATION NONLINER FRENQUENCY CONVERTER
    10.
    发明申请
    SECOND-HARMONIC GENERATION NONLINER FRENQUENCY CONVERTER 有权
    第二谐波发生器非线性转换器

    公开(公告)号:US20120194900A1

    公开(公告)日:2012-08-02

    申请号:US13218462

    申请日:2011-08-26

    IPC分类号: G02F1/37

    摘要: A second-harmonic generation nonlinear frequency converter includes a nonlinear optical crystal. The nonlinear optical crystal includes a plurality of sections. The sections connect to each other in sequence, and each section has a phase different from others. Each of the phases includes a positive domain and a negative domain. Each of the sections includes a plurality of quasi-phase-matching structures. The quasi-phase-matching structures connect to each other in sequence and have the same phase in one section.

    摘要翻译: 二次谐波发生非线性频率转换器包括非线性光学晶体。 非线性光学晶体包括多个部分。 这些部分依次相互连接,每个部分的阶段与其他部分不同。 每个相包括正域和负域。 每个部分包括多个准相位匹配结构。 准相位匹配结构依次相互连接,在一个部分中具有相同的相位。