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1.发明授权Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin 有权光敏感或辐射敏感性树脂组合物，抗蚀剂膜，使用其的图案形成方法和树脂公开(公告)号：US08852845B2
公开(公告)日：2014-10-07
申请号：US12641877
申请日：2009-12-18
申请人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Hideaki Tsubaki
发明人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Hideaki Tsubaki
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , Y10S430/122 , Y10S430/123
摘要： Provided is a actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin containing (A) a repeating unit having an ionic structure moiety that contains a cation represented by formula (Ia) and is capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation: wherein each of R1a to R13a independently represents a hydrogen atom or a monovalent substituent and may combine together to form a ring, and Z represents a single bond or a divalent linking group.
摘要翻译： 本发明提供一种光化学射线敏感性或辐射敏感性树脂组合物，其包含（P）含有（A）具有离子性结构部分的重复单元的树脂，所述重复单元含有式（Ia）所示的阳离子，并且能够在 侧光在照射光化学射线或辐射时：其中R 1a至R 13a各自独立地表示氢原子或一价取代基，并且可以结合在一起形成环，Z表示单键或二价连接基团。
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2.发明申请ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 审中-公开丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法公开(公告)号：US20120094235A1
公开(公告)日：2012-04-19
申请号：US13320116
申请日：2010-05-20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (A) whose solubility in an alkali developer is increased by the action of an acid, the resin containing any of the units of general formula (AI) below and any of the units of general formula (AII) below, and a compound (B) that when exposed to actinic rays or radiation, generates an acid with any of the structures of general formula (BI) below.
摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包括其在碱性显影剂中的溶解度通过酸的作用而增加的树脂（A），所述树脂包含任何通式（AI）的单元， 和下述通式（AII）的任何单元和当暴露于光化射线或辐射时产生具有以下通式（BI）的任何结构的酸的化合物（B）。
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3.发明授权Photosensitive composition, pattern-forming method using the composition, and resin used in the composition 有权使用组合物的感光组合物，图案形成方法和组合物中使用的树脂公开(公告)号：US09217919B2
公开(公告)日：2015-12-22
申请号：US13062285
申请日：2009-08-26
申请人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
发明人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/22 , C08F12/30 , C08F12/32 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F222/36 , C08F212/32 , C08F2220/1883
摘要： A radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.
摘要翻译： 一种辐射敏感性组合物，其包含具有离子结构位点的部分结构（A）的化合物（P），并且能够在用光化射线或辐射照射时分解以产生酸和部分结构（B），其具有至少一个 酚羟基，羟基的一部分或全部氢原子或各自被能够通过酸的作用而离开的基团保护的基团，其中化合物中包含的部分结构（A）的离子结构位点（ P）是在通过光化射线或辐射照射时能够在化合物（P）中产生酸阴离子的结构; 使用其的图案形成方法; 和用于组合物中的树脂。
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4.发明申请PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION 有权感光性组合物，使用该组合物的图案形成方法和在组合物中使用的树脂公开(公告)号：US20110159433A1
公开(公告)日：2011-06-30
申请号：US13062285
申请日：2009-08-26
申请人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
发明人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
IPC分类号： G03F7/20 , C07C309/00 , C08F228/02 , G03F7/004 , C08F214/18 , C08F222/40
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/22 , C08F12/30 , C08F12/32 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F222/36 , C08F212/32 , C08F2220/1883
摘要： Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.
摘要翻译： 本发明提供一种辐射敏感性组合物，其包含具有离子结构位点的部分结构（A）的化合物（P），并且能够在用光化射线或辐射照射时分解以产生酸和部分结构（B） 至少一个酚羟基，羟基的一部分或全部氢原子或各自被能够通过酸的作用离开的基团保护，其中部分结构（A）的离子结构位点包含在 化合物（P）是在用光化射线或辐射照射时能够在化合物（P）中产生酸阴离子的结构; 使用其的图案形成方法; 和用于组合物中的树脂。
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5.发明授权Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition 有权光化射线敏感或辐射敏感性树脂组合物和组合物形成图案的方法公开(公告)号：US08900791B2
公开(公告)日：2014-12-02
申请号：US13071153
申请日：2011-03-24
IPC分类号： G03F7/004 , G03F7/028 , C07C309/25 , C07C309/28 , C07C309/42 , C07C309/29 , C07C309/35 , C07C309/38 , C07C309/39 , C07C309/44 , C07C309/59 , C07C323/66 , C07C381/12 , C07D209/82 , C07D339/08 , G03F7/038 , G03F7/039
CPC分类号： C07C309/42 , C07C309/25 , C07C309/29 , C07C309/35 , C07C309/38 , C07C309/39 , C07C309/44 , C07C309/59 , C07C323/66 , C07C381/12 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2601/18 , C07C2602/28 , C07C2602/42 , C07C2602/44 , C07C2603/24 , C07C2603/28 , C07C2603/74 , C07D209/82 , C07D339/08 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , Y10S430/122
摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(═O)—, —S(═O)—, —S(═O)2— and —OS(═O)2—, provided that —C(═O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.
摘要翻译： 光化射线敏感或辐射敏感性树脂组合物包含下列通式（I）的任何化合物; 其中：Ar表示可以具有除 - （A-B）基团以外的取代基的芳香环; n是1或更大的整数; A表示选自单键，亚烷基，-O - ， - S - ， - C（= O） - ， - S（= O） - ， - S（ ≡O）2-和-OS（ΟO）2-，条件是不包括-C（= O）O-; B表示含有具有4个以上碳原子的烃基，其中含有叔或季碳原子的基团，当n为2以上时，两个以上（AB）基可以相同或不同， 其他; M +表示有机鎓离子。
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6.发明申请ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 审中-公开丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法公开(公告)号：US20120003585A1
公开(公告)日：2012-01-05
申请号：US13256167
申请日：2010-03-12
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0046
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises (A) any of the compounds of General Formula (I) below and (B) a resin that contains the residue (c) of a compound having an ionization potential value lower than that of phenol and when acted on by an acid, exhibits an increased solubility in an alkali developer, wherein Ar represents an aromatic ring having Cy groups and optionally further other substituents, n is an integer of 2 or greater, Cy represents a group having a substituted or unsubstituted alkyl group or a group having a substituted or unsubstituted cycloaliphatic group, provided that a plurality of Cy groups may be identical with or different from each other, and M+ represents an organic onium ion.
摘要翻译： 根据一个实施方案，光化射线或辐射敏感性树脂组合物包含（A）下述通式（I）的任何化合物和（B）含有具有电离的化合物的残基（c）的树脂 电位值低于苯酚，当用酸作用时，在碱性显影剂中表现出增加的溶解度，其中Ar表示具有Cy基团和任选进一步其它取代基的芳环，n表示2以上的整数，Cy表示 具有取代或未取代的烷基的基团或具有取代或未取代的脂环族基团的基团，条件是多个Cy基团可以彼此相同或不同，M +表示有机鎓离子。
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7.发明授权Resist pattern forming method, resist pattern, crosslinkable negative chemical amplification resist composition for organic solvent development, resist film and resist-coated mask blanks 有权抗蚀剂图案形成方法，抗蚀剂图案，用于有机溶剂显影的可交联负极化学放大抗蚀剂组合物，抗蚀剂膜和抗蚀剂掩模毛坯公开(公告)号：US08889339B2
公开(公告)日：2014-11-18
申请号：US14035484
申请日：2013-09-24
IPC分类号： G03F1/50 , G03F7/20 , G03F7/32 , C08F8/14 , C08F12/24 , C08F212/14 , C08J3/24 , G03F7/038 , G03F7/004
CPC分类号： G03F7/20 , C08F8/14 , C08F12/24 , C08F212/14 , C08J3/24 , C08J2325/18 , G03F1/50 , G03F7/004 , G03F7/0382 , G03F7/325 , Y10S430/143 , C08F212/32
摘要： A resist pattern forming method contains: in the following order, (1) forming a resist film by using a negative chemical amplification resist composition containing (A) a polymer compound having a repeating unit represented by formula (1) as defined in the specification, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation and (C) a crosslinking agent capable of crosslinking the polymer compound (A) by an action of an acid; (2) exposing the resist film, so as to form an exposed resist film; and (4) developing the exposed resist film by using a developer containing an organic solvent.
摘要翻译： 抗蚀剂图案形成方法包括：（1）通过使用含有（A）具有如说明书中定义的由式（1）表示的重复单元的高分子化合物的负性化学增幅抗蚀剂组合物形成抗蚀剂膜， （B）能够通过光化射线或辐射照射时能够产生酸的化合物和（C）能够通过酸的作用使高分子化合物（A）交联的交联剂; （2）使抗蚀剂膜曝光，形成曝光的抗蚀剂膜; 和（4）通过使用含有有机溶剂的显影剂显影曝光的抗蚀剂膜。
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8.发明申请NEGATIVE RESIST PATTERN FORMING METHOD, DEVELOPER AND NEGATIVE CHEMICAL-AMPLIFICATION RESIST COMPOSITION USED THEREFOR, AND RESIST PATTERN 有权负极电阻图案形成方法，开发商和负极化学放大电阻组合物及其电阻图案公开(公告)号：US20110287234A1
公开(公告)日：2011-11-24
申请号：US13146976
申请日：2010-01-29
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/325
摘要： A resist pattern forming method including in the following order, (1) a step of forming a film by using a negative chemical-amplification resist composition capable of undergoing negative conversion by a crosslinking reaction, (2) a step of exposing the film, and (4) a step of developing the exposed film by using a developer containing an organic solvent; a developer and a negative chemical-amplification resist composition used therefor; and a resist pattern formed by the pattern forming method.
摘要翻译： 一种抗蚀剂图案形成方法，包括以下顺序：（1）通过使用能够通过交联反应进行负转化的负性化学增幅抗蚀剂组合物形成膜的步骤，（2）曝光所述膜的步骤，以及 （4）通过使用含有有机溶剂的显影剂使曝光的膜显影的步骤; 用于此的显影剂和负化学放大抗蚀剂组合物; 以及通过图案形成方法形成的抗蚀剂图案。
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9.发明授权Organic solvent development or multiple development pattern-forming method using electron beams or EUV rays 有权有机溶剂开发或使用电子束或EUV射线的多重显影图案形成方法公开(公告)号：US08546063B2
公开(公告)日：2013-10-01
申请号：US13202389
申请日：2010-02-19
IPC分类号： G03C5/00
CPC分类号： G03F7/325 , G03F7/0392 , G03F7/0397 , G03F7/322
摘要： Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.
摘要翻译： 提供了一种图案形成方法，其包括以下顺序：（1）用含有光敏性或辐射敏感性树脂组合物形成膜的方法，所述树脂组合物包含含有酸可分解重复单元的树脂，并且能够 通过酸的作用降低有机溶剂中的溶解度; （2）用电子束或EUV射线曝光胶片的方法; 和（4）用含有机溶剂的显影剂显影该膜的方法。
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10.发明申请ORGANIC SOLVENT DEVELOPMENT OR MULTIPLE DEVELOPMENT PATTERN-FORMING METHOD USING ELECTRON BEAMS OR EUV RAYS 有权有机溶剂开发或使用电子束或EUV的多种开发方法公开(公告)号：US20110300485A1
公开(公告)日：2011-12-08
申请号：US13202389
申请日：2010-02-19
IPC分类号： G03F7/20
CPC分类号： G03F7/325 , G03F7/0392 , G03F7/0397 , G03F7/322
摘要： Provided is a pattern-forming method including, in the following order: (1) a process of forming a film with an actinic ray-sensitive or radiation-sensitive resin composition comprising a resin which contains an acid-decomposable repeating unit and is capable of decreasing the solubility in an organic solvent by the action of an acid; (2) a process of exposing the film with an electron beam or an EUV ray; and (4) a process of developing the film with a developer containing an organic solvent.
摘要翻译： 提供了一种图案形成方法，其包括以下顺序：（1）用含有光敏性或辐射敏感性树脂组合物形成膜的方法，所述树脂组合物包含含有酸可分解重复单元的树脂，并且能够 通过酸的作用降低有机溶剂中的溶解度; （2）用电子束或EUV射线曝光胶片的方法; 和（4）用含有机溶剂的显影剂显影该膜的方法。
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