摘要:
A start-up plating process for a flow cell battery is disclosed. Upon start-up of the flow-cell stack, catalysts may have deplated from the electrodes. The catalyst is replated to the electrode by application of currents to the stack prior to circulating electrolyte fluids.
摘要:
Methods for sealing a porous dielectric are presented including: receiving a substrate, the substrate including the porous dielectric; exposing the substrate to an organosilane, where the organosilane includes a hydrolysable group for facilitating attachment with the porous dielectric, and where the organosilane does not include an alkyl group; and forming a layer as a result of the exposing to seal the porous dielectric. In some embodiments, methods are presented where the organosilane includes: alkynyl groups, aryl groups, flouroalkyl groups, heteroarlyl groups, alcohol groups, thiol groups, amine groups, thiocarbamate groups, ester groups, ether groups, sulfide groups, and nitrile groups. In some embodiments, method further include: removing contamination from the porous dielectric and a conductive region of the substrate prior to the exposing; and removing contamination from the conductive region after the forming.
摘要:
Methods for sealing a porous dielectric are presented including: receiving a substrate, the substrate including the porous dielectric; exposing the substrate to an organosilane, where the organosilane includes a hydrolysable group for facilitating attachment with the porous dielectric, and where the organosilane does not include an alkyl group; and forming a layer as a result of the exposing to seal the porous dielectric. In some embodiments, methods are presented where the organosilane includes: alkynyl groups, aryl groups, fluoroalkyl groups, heteroaryl groups, alcohol groups, thiol groups, amine groups, thiocarbamate groups, ester groups, ether groups, sulfide groups, and nitrile groups. In some embodiments, method further include: removing contamination from the porous dielectric and a conductive region of the substrate prior to the exposing; and removing contamination from the conductive region after the forming.
摘要:
Methods for sealing a porous dielectric are presented including: receiving a substrate, the substrate including the porous dielectric; exposing the substrate to an organosilane, where the organosilane includes a hydrolysable group for facilitating attachment with the porous dielectric, and where the organosilane does not include an alkyl group; and forming a layer as a result of the exposing to seal the porous dielectric. In some embodiments, methods are presented where the organosilane includes: alkynyl groups, aryl groups, flouroalkyl groups, heteroarlyl groups, alcohol groups, thiol groups, amine groups, thiocarbamate groups, ester groups, ether groups, sulfide groups, and nitrile groups. In some embodiments, method further include: removing contamination from the porous dielectric and a conductive region of the substrate prior to the exposing; and removing contamination from the conductive region after the forming.
摘要:
The invention relates to a method of forming a quantum dot. A particle that includes a semiconductor material Y selected from the group consisting of Si and Ge is provided. Sound energy and light energy is applied to the particle to form a quantum dot. The quantum dot exhibits photoluminescence with a quantum efficiency that is greater than 10 percent. The quantum dot includes a core, and the core includes Y.
摘要:
A method for preparing a redox flow battery electrolyte is provided. In some embodiments, the method includes the processing of raw materials containing sources of chromium ions in a high oxidation state. In some embodiments, a solution of the raw materials in an acidic aqueous solution is subjected to a reducing process to reduce the chromium in a high oxide state to an aqueous electrolyte containing chromium (III) ions. In some embodiments, the reducing process is electrochemical process. In some embodiments, the reducing process is addition of an inorganic reductant. In some embodiments, the reducing process is addition of an organic reductant. In some embodiments, the inorganic reductant or the organic reductant includes iron powder.
摘要:
A method for preparing a redox flow battery electrolyte is provided. In some embodiments, the method includes the processing of raw materials containing sources of chromium ions and/or iron ions. The method further comprises the removal of impurities such as metal ions from those raw materials. In some embodiments, a reductant may be used to remove metal impurities from an aqueous electrolyte containing chromium ions and/or nickel ions. In some embodiments, the reductant is an amalgam. In some embodiments, the reductant is a zinc amalgam. Also provided is a method for removing ionic impurities from an aqueous acid solution. Further provided a redox flow battery comprising at least one electrolyte prepared from the above-identified methods.
摘要:
A method of producing HCl from H2 and Cl2 is provided. In some embodiments, the method comprises at least one photochemical chamber placed in fluid communication with at least one source of H2 and at least one source of Cl2. In some embodiments, the photochemical chamber effects the formation of HCl through the use of at least one source of ultraviolet radiation contained therein. In some embodiments, the HCl product may be captured and used as a gas. In some embodiments, the HCl product may be absorbed into water to form an aqueous HCl solution.
摘要:
An electrolyte for a flow cell battery is provided. The electrolyte includes a concentration of chromium ions that is greater than the concentration of iron ions.
摘要:
Methods for sealing a porous dielectric are presented including: receiving a substrate, the substrate including the porous dielectric; exposing the substrate to an organosilane, where the organosilane includes a hydrolysable group for facilitating attachment with the porous dielectric, and where the organosilane does not include an alkyl group; and forming a layer as a result of the exposing to seal the porous dielectric. In some embodiments, methods are presented where the organosilane includes: alkynyl groups, aryl groups, flouroalkyl groups, heteroarlyl groups, alcohol groups, thiol groups, amine groups, thiocarbamate groups, ester groups, ether groups, sulfide groups, and nitrile groups. In some embodiments, method further include: removing contamination from the porous dielectric and a conductive region of the substrate prior to the exposing; and removing contamination from the conductive region after the forming.