公开(公告)号：US20080090186A1

公开(公告)日：2008-04-17

申请号：US11906760

申请日：2007-10-02

申请人： Masahiko Harumoto ,  Akira Yamaguchi ,  Akhiro Hisai

发明人： Masahiko Harumoto ,  Akira Yamaguchi ,  Akhiro Hisai

IPC分类号： G03C5/29

CPC分类号： G03F7/3028 ,  H01L21/67028 ,  H01L21/6715 ,  H01L21/67253

摘要： A method of eliminating an occurrence of concentration differences in a developer depending on position on a substrate surface when a developer on the substrate is replaced with a rinse, preventing occurrence of stain-like defects on a resist film surface, and reducing amount of the developer used is disclosed. While a substrate is being rotated about a vertical axis by a rotation motor while held in a horizontal posture by a spin chuck, after the developer has been fed onto the resist film on the substrate surface from a developer discharge nozzle to conduct processing, the substrate continues to be rotated and thus the developer on the resist film is dispersed and removed by a centrifugal force, and when an interference fringe seen on the substrate surface is reduced in level or not present, a rinse is fed onto the resist film from a rinse discharge nozzle to conduct rinsing.

摘要翻译： 当衬底上的显影剂被冲洗替代时，消除显影剂中基于衬底表面上的位置的浓度差异的发生的方法，防止在抗蚀剂膜表面上出现污点状缺陷，并减少显影剂的量 使用被披露。 当基片通过旋转马达通过旋转马达围绕垂直轴线旋转，同时通过旋转卡盘保持在水平姿态时，在显影剂从显影剂排出喷嘴馈送到基板表面上的抗蚀剂膜上以进行处理之后，基板 继续旋转，因此抗蚀剂膜上的显影剂通过离心力被分散和去除，并且当在基底表面上看到的干涉条纹水平降低或不存在时，将冲洗液从冲洗液 排放喷嘴进行冲洗。

公开(公告)号：US20080025823A1

公开(公告)日：2008-01-31

申请号：US11828863

申请日：2007-07-26

申请人： Masahiko Harumoto

发明人： Masahiko Harumoto

IPC分类号： H01L21/677

CPC分类号： H01L21/67201

摘要： A load lock chamber includes a chamber. A vacuum pump is connected to the bottom of the chamber through a pipe. A cooling pipe is buried in the upper part of the chamber. One and the other ends of the cooling pipe are connected with a refrigerant circulator. When the pressure in the chamber is reduced, the chamber continues to be cooled during the period between when the pressure in the chamber becomes lower than a threshold and immediately before the inside of the chamber is released to atmospheric pressure.

摘要翻译： 负载锁定室包括室。 真空泵通过管道连接到腔室的底部。 冷却管埋在室的上部。 冷却管的一端和另一端与制冷剂循环器连接。 当腔室内的压力降低时，在室内的压力变得低于阈值之间并且在室的内部释放到大气压之前的期间，腔室继续被冷却。

公开(公告)号：US07597491B2

公开(公告)日：2009-10-06

申请号：US11245347

申请日：2005-10-06

申请人： Masahiko Harumoto ,  Masakazu Sanada

发明人： Masahiko Harumoto ,  Masakazu Sanada

IPC分类号： G03D5/00 ,  G03F1/00

CPC分类号： G03F7/3021 ,  H01L21/6715

摘要： A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a development reaction to proceed. Subsequently, deionized water is supplied from a deionized water discharge nozzle to the substrate to stop the development reaction, and the substrate is rotated while part of the puddle of developer is allowed to remain on the surface of the substrate. This makes a dissolution product easy to diffuse in the developer remaining on the surface of the substrate to promote the dissolution of the resist. A rinsing process and a drying process are performed to complete the development process.

摘要翻译： 将从显影剂排出喷嘴供应的显影剂的水坑放置在保持静止的基板上。 接下来，将基板保持静止一段预定的时间长度，使显影剂的熔池保持在基板上。 这导致开发反应进行。 随后，去离子水从去离子水排出喷嘴供应到基底以停止显影反应，并且基板旋转，同时使得显影剂的一部分水坑保留在基板的表面上。 这使得溶解产物易于在保留在基材表面上的显影剂中扩散以促进抗蚀剂的溶解。 执行漂洗处理和干燥处理以完成显影过程。

公开(公告)号：US09375748B2

公开(公告)日：2016-06-28

申请号：US13943198

申请日：2013-07-16

申请人： Masahiko Harumoto ,  Tadashi Miyagi ,  Yukihiko Inagaki ,  Koji Kaneyama

发明人： Masahiko Harumoto ,  Tadashi Miyagi ,  Yukihiko Inagaki ,  Koji Kaneyama

IPC分类号： G03D5/00 ,  B05C11/00 ,  H01J37/02 ,  H01L21/033 ,  H01L21/67 ,  G03F7/00 ,  G03F7/16 ,  G03F7/30

CPC分类号： C23C16/56 ,  B05C11/00 ,  C23C16/0227 ,  G03F7/0002 ,  G03F7/162 ,  G03F7/20 ,  G03F7/3021 ,  G03F7/32 ,  H01J37/02 ,  H01L21/0335 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/67115 ,  H01L21/67126 ,  H01L21/6715 ,  H01L21/67178

摘要： An underlayer is formed to cover the upper surface of a substrate and a guide pattern is formed on the underlayer. A DSA film constituted by two types of polymers is formed in a region on the underlayer where the guide pattern is not formed. Thermal processing is performed while a solvent is supplied to the DSA film on the substrate. Thus, a microphase separation of the DSA film occurs. As a result, patterns made of the one polymer and patterns made of another polymer are formed. Exposure processing and development processing are performed in this order on the DSA film after the microphase separation such that the patterns made of another polymer are removed.

摘要翻译： 形成底层以覆盖基板的上表面，并且在底层上形成引导图案。 在未形成引导图案的底层上的区域中形成由两种类型的聚合物构成的DSA膜。 在向基板上的DSA膜供给溶剂的同时进行热处理。 因此，发生DSA膜的微相分离。 结果，形成由一种聚合物制成的图案和由另一种聚合物制成的图案。 在微相分离之后，在DSA膜上依次进行曝光处理和显影处理，从而除去由另一种聚合物制成的图案。

公开(公告)号：US09028621B2

公开(公告)日：2015-05-12

申请号：US13116793

申请日：2011-05-26

申请人： Tadashi Miyagi ,  Masahiko Harumoto ,  Sadayasu Suyama

发明人： Tadashi Miyagi ,  Masahiko Harumoto ,  Sadayasu Suyama

IPC分类号： H01L21/02 ,  H01L21/67

CPC分类号： H01L21/67028 ,  H01L21/02052 ,  H01L21/67051

摘要： A substrate rotates, and a liquid nozzle of a gas/liquid supply nozzle moves to a position above the center of the rotating substrate. In this state, a rinse liquid is discharged from the liquid nozzle onto the rotating substrate. The gas/liquid supply nozzle moves toward a position outside the substrate. A gas nozzle reaches the position above the center of the rotating substrate, so that the gas/liquid supply nozzle temporarily stops. With the gas/liquid supply nozzle stopping, an inert gas is discharged onto the center of the rotating substrate for a given period of time. After that, the gas/liquid supply nozzle again moves toward the position outside the substrate.

摘要翻译： 基板旋转，气/液供给喷嘴的液体喷嘴移动到旋转基板的中心上方的位置。 在该状态下，将冲洗液从液体喷嘴排出到旋转基板上。 气体/液体供给喷嘴朝向基板外侧的位置移动。 气体喷嘴到达旋转基板的中心上方的位置，使气/液供给喷嘴临时停止。 在气/液供给喷嘴停止的情况下，将惰性气体排出到旋转基板的中心一定时间。 之后，气体/液体供给喷嘴再次朝向基板外侧的位置移动。

公开(公告)号：US08781308B2

公开(公告)日：2014-07-15

申请号：US13239517

申请日：2011-09-22

申请人： Masahiko Harumoto

发明人： Masahiko Harumoto

IPC分类号： F27B5/06 ,  F27B5/14 ,  F27D9/00 ,  F27D11/02

CPC分类号： F27B17/0025

摘要： The back surface of a substrate having a front surface coated with a resist film is irradiated with flashes of light emitted from flash lamps. Heat conduction from the back surface of the substrate abruptly raised in temperature by the irradiation with flashes of light toward the front surface thereof occurs to heat the resist film formed on the front surface of the substrate, so that a post-applied bake process is performed. After the completion of the post-applied bake process, a cooling plate cools down the substrate. Regardless of the type of resist film formed on the front surface of the substrate, the substrate has a constant absorptance of flashes of light to allow the resist film to be heated to a constant treatment temperature, because the back surface of the substrate is irradiated with flashes of light.

摘要翻译： 用闪光灯发出的闪光灯照射具有涂覆有抗蚀剂膜的正面的基板的背面。 通过用闪光灯照射到其前表面，从衬底的背面突然升高的热传导发生在衬底前表面上形成的抗蚀膜，从而进行后施加烘烤处理 。 在完成后施加烘烤过程之后，冷却板冷却衬底。 不管形成在基板的前表面上的抗蚀剂膜的种类如何，基板具有恒定的闪光吸收率，从而允许将抗蚀剂膜加热到恒定的处理温度，因为基板的背面被照射 闪烁的光芒

公开(公告)号：US06869234B2

公开(公告)日：2005-03-22

申请号：US10637774

申请日：2003-08-07

申请人： Masakazu Sanada ,  Masahiko Harumoto ,  Hiroshi Kobayashi ,  Minobu Matsunaga ,  Akihiko Morita

发明人： Masakazu Sanada ,  Masahiko Harumoto ,  Hiroshi Kobayashi ,  Minobu Matsunaga ,  Akihiko Morita

IPC分类号： G03D5/00

CPC分类号： G03D5/00

摘要： A substrate (SW) is rotatably held in an approximately horizontal position by a wafer holding and rotation mechanism (810). One end of a rinsing liquid supply nozzle (840) is rotatably supported by a rinsing liquid supply nozzle rotation supporting mechanism (850) to pass over the substrate (SW). In response to rotation of the rinsing liquid supply nozzle (840), the rotation axis of the rinsing liquid supply nozzle (840) moves in a direction closer to or away from the rotation axis of the substrate (SW), whereby the amount of projection of a tip portion of the rinsing liquid supply nozzle (840) is reduced.

摘要翻译： 基板（SW）通过晶片保持旋转机构（810）可旋转地保持在大致水平的位置。 冲洗液供给喷嘴（840）的一端由冲洗液供给喷嘴旋转支撑机构（850）可旋转地支撑，从而越过基板（SW）。 响应于冲洗液体供给喷嘴（840）的旋转，冲洗液体供给喷嘴（840）的旋转轴线在更靠近或远离基板（SW）的旋转轴线的方向上移动，由此投影量 的清洗液供给喷嘴（840）的顶端部分减少。

公开(公告)号：US06749351B2

公开(公告)日：2004-06-15

申请号：US10330883

申请日：2002-12-26

申请人： Masakazu Sanada ,  Masahiko Harumoto

发明人： Masakazu Sanada ,  Masahiko Harumoto

IPC分类号： G03D500

CPC分类号： H01L21/6715 ,  G03F7/3021 ,  Y10S134/902

摘要： A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing time, a rinse discharge nozzle moves from the first end toward the second end of the substrate for supplying a rinse to the overall main surface of the substrate. A partition plate is provided for preventing the rinse discharged from a slit discharge port of the rinse discharge nozzle onto the substrate from flowing frontward in the direction of movement of the rinse discharge nozzle or washing away the developer supplied onto the substrate frontward.

摘要翻译： 显影剂供应喷嘴从用于将显影剂供应到基板的整个主表面的基板的第一端移向第二端。 在经过所需的显影时间之后，冲洗排出喷嘴从基板的第一端向第二端移动，以向基板的整个主表面提供冲洗。 提供隔板，用于防止从冲洗排放喷嘴的狭缝排出口排出到基板上的冲洗物沿着冲洗排放喷嘴的运动方向向前流动或者将前面提供的显影剂洗掉。

公开(公告)号：US06692165B2

公开(公告)日：2004-02-17

申请号：US10090099

申请日：2002-02-28

申请人： Akiko Tanaka ,  Masakazu Sanada ,  Osamu Tamada ,  Masahiko Harumoto ,  Kayoko Nakano

发明人： Akiko Tanaka ,  Masakazu Sanada ,  Osamu Tamada ,  Masahiko Harumoto ,  Kayoko Nakano

IPC分类号： G03D500

CPC分类号： H01L21/67051 ,  G03F7/3021

摘要： A developer is supplied onto a substrate and thereafter a rinse discharge nozzle is moved toward an operating direction. The rinse discharge nozzle is so moved on the substrate as to continuously supply pure water onto the substrate from a slit discharge port of the rinse discharge nozzle while sucking and recovering the pure water from the surface of the substrate through a slit suction port, and a series of development is performed in a stationary state of the substrate.

摘要翻译： 将显影剂供应到基板上，然后将冲洗放电喷嘴朝向操作方向移动。 冲洗排出喷嘴在基板上移动，从而通过狭缝吸引口从基板的表面吸引回收纯水，从冲洗排出口的狭缝排出口向基板连续供给纯水， 一系列显影在基板的静止状态下进行。

公开(公告)号：US08956695B2

公开(公告)日：2015-02-17

申请号：US13359388

申请日：2012-01-26

申请人： Masahiko Harumoto ,  Akira Yamaguchi ,  Akihiro Hisai ,  Minoru Sugiyama ,  Takuya Kuroda

发明人： Masahiko Harumoto ,  Akira Yamaguchi ,  Akihiro Hisai ,  Minoru Sugiyama ,  Takuya Kuroda

IPC分类号： B05D3/12 ,  G03C5/29 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/30 ,  B05D1/005 ,  G03F7/2041 ,  G03F7/3021 ,  H01L21/6715

摘要： A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.

摘要翻译： 用于显影衬底的方法包括用旋转保持器旋转衬底并将显影剂从显影剂供给器上排列成排的多个排气口排出到衬底。 该方法还包括使移动机构在平面图中沿着延伸到基板中心的一个方向移动所述显影剂供给器，同时保持所述排气口在所述一个方向上的布置方向，从而使所述显影剂进料器基本上 中心和基底的边缘。 所述方法还包括使从所述排气口排出的显影剂在基板上分离的流中撞击，并使每一个分离的流在基板上螺旋地冲击，从而显影基板。 对应于所述排气口的显影剂冲击位置的至少两个轨迹彼此重叠。