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    Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels
    2.
    发明授权
    Critical dimension edge placement and slope enhancement with central pixel dose addition and modulated inner pixels 有权
    关键尺寸边缘放置和中心像素剂量加法和调制内像素的斜率增强

    公开(公告)号：US06998217B2

    公开(公告)日：2006-02-14

    申请号：US10326953

    申请日：2003-01-06

    申请人： Jerry Martyniuk ,  H. Christopher Hamaker ,  Matthew J. Jolley ,  Peter Pirogovsky ,  Asher Klatchko ,  Richard E. Crandall

    发明人： Jerry Martyniuk ,  H. Christopher Hamaker ,  Matthew J. Jolley ,  Peter Pirogovsky ,  Asher Klatchko ,  Richard E. Crandall

    IPC分类号： G03C5/00

    CPC分类号： G03F1/78

    摘要： Systems and methods for gray scale lithography for defining edges such as on microelectronic device patterns during integrated circuit fabrication are disclosed. Methods for critical dimension edge placement and slope enhancement utilize central pixel dose addition or modulated inner pixels. A method for gray scale lithography for defining edges of features generally comprises identifying a center pixel of a feature, exposing the general width of the feature including the identified center pixel with full doses, and enhancing the identified center pixel by exposing the identified center pixel with additional dose to accurately place the edge of the feature, whereby the edge of the feature is defined and moved by exposing the center pixel with the additional dose. Another method for gray scale lithography generally comprises identifying a proximal interior pixel immediately interior to an unbiased edge of the feature, exposing the general width of the feature full dosages, and exposing the proximal interior pixel with a dosage of elevated intensity selected from a set of gray levels, the elevated intensities being above the full dosage, the set of gray levels biases the edge of the feature and facilitates in further moving the edge of the feature in fractional increments of a pixel depending upon the gray level selected.

    摘要翻译： 公开了用于在集成电路制造期间用于限定边缘（例如微电子器件图案）上的灰度光刻的系统和方法。 关键尺寸边缘放置和斜率增强的方法利用中心像素剂量加法或调制内像素。 用于定义特征边缘的灰度光刻的方法通常包括识别特征的中心像素，以全剂量暴露包括所识别的中心像素的特征的一般宽度，以及通过将所识别的中心像素曝光于所识别的中心像素， 附加剂量以精确地放置特征的边缘，由此通过用附加剂量暴露中心像素来限定和移动特征的边缘。 用于灰度光刻的另一种方法通常包括：在特征的非偏向边缘内部识别近端内部像素，暴露特征全部剂量的总体宽度，以及从一组 灰度级，提高的强度高于全剂量，灰度级集合偏置特征的边缘，并且有助于根据所选择的灰度级进一步移动像素的分数增量中的特征边缘。

    Enhanced edge resolution and critical dimension linearity in lithography
    3.
    发明授权
    Enhanced edge resolution and critical dimension linearity in lithography 失效
    光刻中增强的边缘分辨率和临界尺寸线性度

    公开(公告)号：US06819450B1

    公开(公告)日：2004-11-16

    申请号：US09538848

    申请日：2000-03-28

    申请人： Matthew J. Jolley ,  Jerry Martyniuk ,  H. Christopher Hamaker

    发明人： Matthew J. Jolley ,  Jerry Martyniuk ,  H. Christopher Hamaker

    IPC分类号： G06K1500

    CPC分类号： G03F7/70283 ,  G03F7/70383

    摘要： A semiconductor fabrication gray level photolithography strategy, in which the energy beam intensities corresponding to each gray level are selected from a set of non-linear, non-monotonic intensities. Rasterized geometric shape edges are defined by associating one or more intermediate gray levels with pixels in at least one row of pixels. The geometric shape is printed or imaged on an energy sensitive layer by modulating an energy beam to the intensity corresponding to the associated gray level, and directing the modulated beam to the pixel location on the layer. The intensities corresponding to the gray levels are selected so as to optimize critical dimension (CD) characteristics and other printing features.

    摘要翻译： 半导体制造灰度光刻策略，其中对应于每个灰度级的能量束强度从一组非线性非单调强度中选择。 通过将一个或多个中间灰度级别与至少一行像素中的像素相关联来定义光栅化几何形状边缘。 通过将能量束调制到与相关联的灰度级相对应的强度，并将调制的光束引导到层上的像素位置，将几何形状印刷或成像在能量敏感层上。 选择对应于灰度级的强度，以便优化临界尺寸（CD）特性和其他印刷特征。

    Pattern generation method and apparatus using cached cells of hierarchical data
    4.
    发明授权
    Pattern generation method and apparatus using cached cells of hierarchical data 失效

    公开(公告)号：US06812474B2

    公开(公告)日：2004-11-02

    申请号：US09905561

    申请日：2001-07-13

    申请人： Matthew J. Jolley ,  Asher Klatchko ,  Robert Marc Sills

    发明人： Matthew J. Jolley ,  Asher Klatchko ,  Robert Marc Sills

    IPC分类号： G21G500

    CPC分类号： G03F7/70383 ,  H01J37/3026 ,  H01J2237/3175

    摘要： A pattern generation method and system in which hierarchical image data (determining a pattern to be imaged on a target) is received at a graphics engine having a memory, at least one cell determining a repeated feature or set of features of the pattern is stored in the memory, and beam control data is generated in response to the image data. The image data includes residual data including at least two subroutine call commands for each cell stored in the memory. In response to each subroutine call command, the graphics engine retrieves a cell (identified by the command) from the memory, and asserts beam control data that determines a feature or feature set determined by the cell to be imaged at (or beginning at) a location on the target identified by the command. The subroutine call commands can be distributed throughout the image data, including in at least one cell to be cached as well as in the residual data. Preferably, the graphics engine caches each cell of the image data in the memory and generates a set of beam control data in response to each subroutine call command including by retrieving a cached cell from the memory and generating the beam control data in response to the retrieved cell. Alternatively, the graphics engine generates a cell of beam control data in response to each cell of image data, caches each such beam control data cell in the memory, and responds to each subroutine call command of the image data by retrieving a cached beam control data cell from the memory and asserting the retrieved beam control data cell as part of a set of beam control data that determines a feature or feature set (determined by the retrieved cell) to be imaged on the target. Another aspect of the invention is a method and apparatus for determining cells of hierarchical image data (to be transferred to a graphics engine) by analyzing hierarchical raw image data and transforming the raw image data into optimized hierarchical image data including the cells.

    Rasterizer for a pattern generation apparatus
    5.
    发明授权
    Rasterizer for a pattern generation apparatus 失效
    光栅化器用于图案生成装置

    公开(公告)号：US5533170A

    公开(公告)日：1996-07-02

    申请号：US344417

    申请日：1994-11-22

    申请人： Robin L. Teitzel ,  Matthew J. Jolley ,  James B. Campbell ,  Richard K. George ,  John Wipfli

    发明人： Robin L. Teitzel ,  Matthew J. Jolley ,  James B. Campbell ,  Richard K. George ,  John Wipfli

    IPC分类号： G03F1/08 ,  G03F7/20 ,  G06T11/20 ,  H01L21/027 ,  G06K15/00

    CPC分类号： G03F7/704 ,  G03F7/70508 ,  G06T11/203

    摘要： A rasterizer for generating pixel values for a pattern generation apparatus. The pixel values drive the printing mechanism of the pattern generation apparatus. The rasterizer receives a file defining the pattern to be printed, fractures the pattern into sub frames, rasterizes each sub frame and then coordinates the provision of the shaded pixel values to the pattern generation apparatus. The rasterizer of the present invention is comprised primarily of a host processing means for fracturing and translating the file into one or more sub frames of pixels; geometry engines for rasterizing each sub frame; beam boards for providing the pixel shading values to a pattern generation system; a serial bus for coupling the host processor means to the geometry engines and beam boards and a pixel bus for coupling each of the geometry engines to each of the beam boards.

    摘要翻译： 一种用于生成图案生成装置的像素值的光栅化器。 像素值驱动图案生成装置的打印机构。 光栅化器接收定义要打印的图案的文件，将图案断裂成子帧，对每个子帧进行光栅化，然后协调向图案生成装置提供阴影像素值。 本发明的光栅化器主要包括用于将文件压缩并转换成一个或多个像素子帧的主机处理装置; 用于光栅化每个子帧的几何引擎; 光束板，用于将像素着色值提供给图案生成系统; 用于将主处理器装置耦合到几何引擎和波束板的串行总线和用于将每个几何引擎耦合到每个波束板的像素总线。