摘要:
A method of fabricating an electrical interconnect are provided. A first transparent dielectric layer is disposed on top of a support structure. A conductive circuit layer is plated above the first dielectric layer. Separate conductive layers are plated on top of the conductive circuit layer to produce conductive vias. A second transparent dielectric layer is disposed around the conductive layers. Contact tips are electrically connected to the top surface of the separate conductive layers. The interconnect may be visually aligned so that the contact tips brought into contact with target connections. In addition, the support structure may be partially removed to allow a flexible interconnect.
摘要:
A method for animating a map resource is provided, the method includes receiving a plurality of Uniform Resource Locators (URLs) from a third party website, the plurality of URLs comprising one or more attributes; receiving a user selection to create an animation sequence of one or more of the attributes; querying a current value of the one or more attributes from an external resource and returning the queried value; receiving, from the user, a first keyframe and a second keyframe for the animation sequence; interpolating one or more additional keyframes with assigned values; and creating the animation sequence based on the first keyframe, the second keyframe, and the one or more additional keyframes.
摘要:
A clothing pocket structure including a first sheet of fabric at least partially spaced apart from a second sheet of fabric, the first and second sheets of fabric together at least partially defining a semi-enclosed volume; and a retention device disposed between the first and second sheets of fabric, first and second side portions of the retention device being attached to one of the first and second sheets of fabric, a middle portion of the retention device being at least partially spaced apart from the one of the first and second sheets of fabric to which the retention device is attached so as to define a securement space between the retention device and the one of the first and second sheets of fabric, and the securement space being generally open at a top edge of the retention device so as to permit the passage of a device therein.
摘要:
An electrical interconnect and a method of fabricating an electrical interconnect are provided. A first transparent dielectric layer is disposed on top of a support structure. A conductive circuit layer is plated above the first dielectric layer. Separate conductive layers are plated on top of the conductive circuit layer to produce conductive vias. A second transparent dielectric layer is disposed around the conductive layers. Contact tips are electrically connected to the top surface of the separate conductive layers. The interconnect may be visually aligned so that the contact tips brought into contact with target connections. In addition, the support structure may be partially removed to allow a flexible interconnect.