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公开(公告)号：US20100247803A1
公开(公告)日：2010-09-30
申请号：US12730088
申请日：2010-03-23
申请人： Eric M. LEE , Raymond Nicholas VRTIS , Mark Leonard O'NEILL , Patrick Timothy HURLEY , Jacques FAGUET , Takashi MATSUMOTO , Osayuki AKIYAMA
发明人： Eric M. LEE , Raymond Nicholas VRTIS , Mark Leonard O'NEILL , Patrick Timothy HURLEY , Jacques FAGUET , Takashi MATSUMOTO , Osayuki AKIYAMA
CPC分类号： C23C16/30 , C23C16/18 , C23C16/401 , C23C16/4557 , C23C16/46 , C23C16/56
摘要： A chemical vapor deposition (CVD) method for depositing a thin film on a surface of a substrate is described. The CVD method comprises disposing a substrate on a substrate holder in a process chamber, and introducing a process gas to the process chamber, wherein the process gas comprises a chemical precursor. The process gas is exposed to a non-ionizing heat source separate from the substrate holder to cause decomposition of the chemical precursor. A thin film is deposited upon the substrate.
摘要翻译： 描述了用于在衬底的表面上沉积薄膜的化学气相沉积（CVD）方法。 CVD方法包括将衬底设置在处理室中的衬底保持器上，并将工艺气体引入到处理室中，其中工艺气体包括化学前体。 处理气体暴露于与基板保持器分离的非电离热源以引起化学前体的分解。 薄膜沉积在基底上。
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公开(公告)号：US08535760B2
公开(公告)日：2013-09-17
申请号：US12872806
申请日：2010-08-31
IPC分类号： C23C16/24
CPC分类号： C23C16/24 , H01L21/02529 , H01L21/02532 , H01L21/0262 , H01L31/1824 , H01L31/202 , Y02E10/545 , Y02P70/521
摘要： Chemical additives are used to increase the rate of deposition for the amorphous silicon film (αSi:H) and/or the microcrystalline silicon film (μCSi:H). The electrical current is improved to generate solar grade films as photoconductive films used in the manufacturing of Thin Film based Photovoltaic (TFPV) devices.
摘要翻译： 化学添加剂用于增加非晶硅膜（αSi：H）和/或微晶硅膜（μCSi：H）的沉积速率。 改善电流以产生用于制造基于薄膜的光伏（TFPV）器件的光电导膜的太阳能级膜。
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公开(公告)号：US08088088B2
公开(公告)日：2012-01-03
申请号：US12273920
申请日：2008-11-19
CPC分类号： A61F5/026
摘要： A support system designed to reduce the stress exerted on the back of a wearer when he bends over to lift a load. It comprises a harness and a yoke for distributing the load on the shoulder of the wearer and a tension system equipped with elastic cables. It further comprises leggings including straps designed to wrap around the sole of the wearer and to maintain the force acting on the leg as close as possible to the bone structure of the leg of the wearer, thereby relieving stress on his back and along his legs.
摘要翻译： 一种支撑系统，设计用于减轻当他弯曲以抬起负载时施加在佩戴者背部的应力。 它包括用于将负载分配在佩戴者的肩膀上的线束和轭，以及配备有弹性线的张力系统。 它还包括绑带，其包括设计成围绕穿着者的鞋底包裹的带，并且保持作用在腿上的力尽可能靠近穿着者的腿部的骨骼结构，从而减轻了他的背部和腿部的压力。
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公开(公告)号：US20110061733A1
公开(公告)日：2011-03-17
申请号：US12872806
申请日：2010-08-31
IPC分类号： H01L31/0376 , H01L31/18 , H01L31/0384
CPC分类号： C23C16/24 , H01L21/02529 , H01L21/02532 , H01L21/0262 , H01L31/1824 , H01L31/202 , Y02E10/545 , Y02P70/521
摘要： The objective of this invention is to use chemical additives to increase the rate of deposition processes for the amorphous silicon film (αSi:H) and/or the microcrystalline silicon film (μCSi:H), and improve the electrical current generating capability of the deposited films for photoconductive films used in the manufacturing of Thin Film based Photovoltaic (TFPV) devices.
摘要翻译： 本发明的目的是使用化学添加剂来提高非晶硅膜（αSi：H）和/或微晶硅膜（μCSi：H）的沉积过程速率，并提高沉积物的电流产生能力 用于制造基于薄膜的光伏（TFPV）器件的光导膜的膜。
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公开(公告)号：US20090095346A1
公开(公告)日：2009-04-16
申请号：US12244455
申请日：2008-10-02
申请人： Patrick Timothy Hurley , Robert Gordon Ridgeway , Raymond Nicholas Vrtis , Mark Leonard O'Neill , Andrew David Johnson
发明人： Patrick Timothy Hurley , Robert Gordon Ridgeway , Raymond Nicholas Vrtis , Mark Leonard O'Neill , Andrew David Johnson
CPC分类号： C23C16/30 , H01L21/3148 , H01L31/02168 , H01L31/0236 , H01L31/02363 , H01L31/18 , Y02E10/50 , Y02E10/547
摘要： A process is provided for making a photovoltaic device comprising a silicon substrate comprising a p-n junction, the process comprising the steps of: forming an amorphous silicon carbide antireflective coating over at least one surface of the silicon substrate by chemical vapor deposition of a composition comprising a precursor selected from the group consisting of an organosilane, an aminosilane, and mixtures thereof, wherein the amorphous silicon carbide antireflective coating is a film represented by the formula SivCxNuHyFz, wherein v+x+u+y+z=100%, v is from 1 to 35 atomic %, x is from 5 to 80 atomic %, u is from 0 to 50 atomic %, y is from 10 to 50 atomic % and z is from 0 to 15 atomic %.
摘要翻译： 提供了一种用于制造包括包括pn结的硅衬底的光伏器件的方法，该方法包括以下步骤：通过化学气相沉积在含硅化合物的组合物的化学气相沉积中在硅衬底的至少一个表面上形成非晶碳化硅抗反射涂层 选自有机硅烷，氨基硅烷及其混合物的前体，其中非晶碳化硅抗反射涂层是由式SivCxNuHyFz表示的膜，其中v + x + u + y + z = 100％，v来自 1〜35原子％，x为5〜80原子％，u为0〜50原子％，y为10〜50原子％，z为0〜15原子％。
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公开(公告)号：US08987039B2
公开(公告)日：2015-03-24
申请号：US12244455
申请日：2008-10-02
申请人： Patrick Timothy Hurley , Robert Gordon Ridgeway , Raymond Nicholas Vrtis , Mark Leonard O'Neill , Andrew David Johnson
发明人： Patrick Timothy Hurley , Robert Gordon Ridgeway , Raymond Nicholas Vrtis , Mark Leonard O'Neill , Andrew David Johnson
IPC分类号： H01L31/18 , C23C16/30 , H01L21/314 , H01L31/0216 , H01L31/0236 , H01L31/04
CPC分类号： C23C16/30 , H01L21/3148 , H01L31/02168 , H01L31/0236 , H01L31/02363 , H01L31/18 , Y02E10/50 , Y02E10/547
摘要： A process is provided for making a photovoltaic device comprising a silicon substrate comprising a p-n junction, the process comprising the steps of: forming an amorphous silicon carbide antireflective coating over at least one surface of the silicon substrate by chemical vapor deposition of a composition comprising a precursor selected from the group consisting of an organosilane, an aminosilane, and mixtures thereof, wherein the amorphous silicon carbide antireflective coating is a film represented by the formula SivCxNuHyFz, wherein v+x+u+y+z=100%, v is from 1 to 35 atomic %, x is from 5 to 80 atomic %, u is from 0 to 50 atomic %, y is from 10 to 50 atomic % and z is from 0 to 15 atomic %.
摘要翻译： 提供了一种用于制造包括包括pn结的硅衬底的光伏器件的方法，该方法包括以下步骤：通过化学气相沉积在含硅化合物的组合物的化学气相沉积中在硅衬底的至少一个表面上形成非晶碳化硅抗反射涂层 选自有机硅烷，氨基硅烷及其混合物的前体，其中非晶碳化硅抗反射涂层是由式SivCxNuHyFz表示的膜，其中v + x + u + y + z = 100％，v来自 1〜35原子％，x为5〜80原子％，u为0〜50原子％，y为10〜50原子％，z为0〜15原子％。
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公开(公告)号：US09212420B2
公开(公告)日：2015-12-15
申请号：US12730088
申请日：2010-03-23
申请人： Eric M. Lee , Raymond Nicholas Vrtis , Mark Leonard O'Neill , Patrick Timothy Hurley , Jacques Faguet , Takashi Matsumoto , Osayuki Akiyama
发明人： Eric M. Lee , Raymond Nicholas Vrtis , Mark Leonard O'Neill , Patrick Timothy Hurley , Jacques Faguet , Takashi Matsumoto , Osayuki Akiyama
CPC分类号： C23C16/30 , C23C16/18 , C23C16/401 , C23C16/4557 , C23C16/46 , C23C16/56
摘要： A chemical vapor deposition (CVD) method for depositing a thin film on a surface of a substrate is described. The CVD method comprises disposing a substrate on a substrate holder in a process chamber, and introducing a process gas to the process chamber, wherein the process gas comprises a chemical precursor. The process gas is exposed to a non-ionizing heat source separate from the substrate holder to cause decomposition of the chemical precursor. A thin film is deposited upon the substrate.
摘要翻译： 描述了用于在衬底的表面上沉积薄膜的化学气相沉积（CVD）方法。 CVD方法包括将衬底设置在处理室中的衬底保持器上，并将工艺气体引入到处理室中，其中工艺气体包括化学前体。 处理气体暴露于与基板保持器分离的非电离热源以引起化学前体的分解。 薄膜沉积在基底上。
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公开(公告)号：US20100125230A1
公开(公告)日：2010-05-20
申请号：US12273920
申请日：2008-11-19
CPC分类号： A61F5/026
摘要： This invention is a back support system designed to reduce the stress exerted on the back of a wearer when he bends over to lift a load. This back support system comprises a harness and a yoke for distributing the load on the shoulder of the wearer. The back support also comprises a tension system equipped with elastic cables. The back support further comprises leggings including straps designed to wrap around the sole of the wearer and to maintain the force acting on the leg as close as possible to the bone structure of the leg of the wearer, thereby relieving stress on his back and along his legs.
摘要翻译： 本发明是一种背部支撑系统，其设计成当弯曲以提升负载时，减轻施加在穿着者背部上的应力。 该背部支撑系统包括用于将负载分布在佩戴者的肩部上的线束和轭。 背部支撑件还包括配备有弹性电缆的张力系统。 背部支撑件还包括绑带，其包括设计成围绕穿着者的鞋底缠绕的带，并且保持作用在腿上的力尽可能靠近穿着者的腿部的骨骼结构，从而缓解他的背部和沿着他的身体的压力 腿
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