公开(公告)号：US20050052634A1

公开(公告)日：2005-03-10

申请号：US10897120

申请日：2004-07-23

申请人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

发明人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

IPC分类号： G01B11/02 ,  G02B7/28 ,  G02B21/26 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7088 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

摘要： An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.

摘要翻译： 一种自动对焦装置，包括：保持基板的台阶，与基板面对面配置的物镜;从倾斜方向用点状光束照射基板表面的照明光学元件;检测来自基板面的反射光的光电检测器;位置检测 检测从光电检测器获得的电信号的基板表面的垂直位置以输出位置信号，校正电路实时监控位置信号，并减去超过与基板的表面形状变化相对应的信号变化的剩余量 当位置信号的每单位时间的变化量超过预定值并输出校正的位置信号时，根据位置信号，以及基于校正位置信号控制舞台的垂直位置的舞台控制电路。

公开(公告)号：US07123345B2

公开(公告)日：2006-10-17

申请号：US10897120

申请日：2004-07-23

申请人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

发明人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

IPC分类号： G03B27/42

CPC分类号： G03F9/7088 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

摘要： An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.

摘要翻译： 一种自动对焦装置，包括：保持基板的台阶，与基板面对面配置的物镜;从倾斜方向用点状光束照射基板表面的照明光学元件;检测来自基板面的反射光的光电检测器;位置检测 检测从光电检测器获得的电信号的基板表面的垂直位置以输出位置信号，校正电路实时监控位置信号，并减去超过与基板的表面形状变化相对应的信号变化的剩余量 当位置信号的每单位时间的变化量超过预定值并输出校正的位置信号时，根据位置信号，以及基于校正位置信号控制舞台的垂直位置的舞台控制电路。

公开(公告)号：US20060087649A1

公开(公告)日：2006-04-27

申请号：US11248124

申请日：2005-10-13

申请人： Riki Ogawa ,  Toru Tojo

发明人： Riki Ogawa ,  Toru Tojo

IPC分类号： G01N21/88

CPC分类号： G03F1/74 ,  G01N21/9501 ,  G01N21/95607

摘要： In a defect inspecting apparatus, an illumination optical system illuminate a mask having a patterned surface, the optical beam passing through the mask is split into two beam components which is guided in first and second image pickup sensors. The pickup sensors has first and second pickup fields on the patterned surface, which pick up first and second parts of the mask image. The first and second pickup fields are parallel to each other and displaced from each other by (2n+1)×d/2 in the longitudinal direction thereof, where d denotes a longitudinal dimension of each pixel image in the first and second pick up fields and n denotes an integer equal to or larger than 0. The first and second parts of the mask image are merged to form a pattern image, and a defect in the mask is detected on the basis of the pattern image.

摘要翻译： 在缺陷检查装置中，照明光学系统照射具有图案化表面的掩模，通过掩模的光束被分割成在第一和第二图像拾取传感器中被引导的两个光束分量。 拾取传感器在图案化表面上具有第一和第二拾取场，其拾取掩模图像的第一和第二部分。 第一拾取场和第二拾取场彼此平行并且在其纵向彼此相互错位（2n + 1）xd / 2，其中d表示第一和第二拾取场中每个像素图像的纵向尺寸， n表示等于或大于0的整数。掩模图像的第一部分和第二部分被合并以形成图案图像，并且基于图案图像检测掩模中的缺陷。

公开(公告)号：US07508526B2

公开(公告)日：2009-03-24

申请号：US11249359

申请日：2005-10-14

申请人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

发明人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

IPC分类号： G01B9/02 ,  G01B11/02

CPC分类号： G01N21/95607 ,  G03F1/84

摘要： In a defect inspecting apparatus, a differential interference optical system forms a differential interference image which is produced from an optical interference of images in a predetermined direction, the images corresponding to inspecting parts of a pattern formed on a mask. A control part varies the predetermined direction so as to cause the differential interference optical system to produce another differential interference image. An image pickup sensor picks up the differential interference images in accordance with the variation of the predetermined direction. A defect detecting unit detects a defect in the pattern formed on the mask from comparing the differential interference images with reference images, respectively.

摘要翻译： 在缺陷检查装置中，差分干涉光学系统形成由预定方向的图像的光学干涉产生的差分干涉图像，图像对应于形成在掩模上的图案的检查部分。 控制部分改变预定方向，以使差分干涉光学系统产生另一个差分干涉图像。 图像拾取传感器根据预定方向的变化来拾取差分干涉图像。 缺陷检测单元分别通过将差分干涉图像与参考图像进行比较来检测形成在掩模上的图案中的缺陷。

公开(公告)号：US07345755B2

公开(公告)日：2008-03-18

申请号：US11248124

申请日：2005-10-13

申请人： Riki Ogawa ,  Toru Tojo

发明人： Riki Ogawa ,  Toru Tojo

IPC分类号： G01N21/00

CPC分类号： G03F1/74 ,  G01N21/9501 ,  G01N21/95607

摘要： In a defect inspecting apparatus, an illumination optical system illuminate a mask having a patterned surface, the optical beam passing through the mask is split into two beam components which is guided in first and second image pickup sensors. The pickup sensors has first and second pickup fields on the patterned surface, which pick up first and second parts of the mask image. The first and second pickup fields are parallel to each other and displaced from each other by (2n+1)×d/2 in the longitudinal direction thereof, where d denotes a longitudinal dimension of each pixel image in the first and second pick up fields and n denotes an integer equal to or larger than 0. The first and second parts of the mask image are merged to form a pattern image, and a defect in the mask is detected on the basis of the pattern image.

摘要翻译： 在缺陷检查装置中，照明光学系统照射具有图案化表面的掩模，通过掩模的光束被分割成在第一和第二图像拾取传感器中被引导的两个光束分量。 拾取传感器在图案化表面上具有第一和第二拾取场，其拾取掩模图像的第一和第二部分。 第一拾取场和第二拾取场彼此平行并且在其纵向彼此相互错位（2n + 1）xd / 2，其中d表示第一和第二拾取场中每个像素图像的纵向尺寸， n表示等于或大于0的整数。掩模图像的第一部分和第二部分被合并以形成图案图像，并且基于图案图像检测掩模中的缺陷。

公开(公告)号：US20060082782A1

公开(公告)日：2006-04-20

申请号：US11249359

申请日：2005-10-14

申请人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

发明人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

IPC分类号： G01B9/02

CPC分类号： G01N21/95607 ,  G03F1/84

摘要： In a defect inspecting apparatus, a differential interference optical system forms a differential interference image which is produced from an optical interference of images in a predetermined direction, the images corresponding to inspecting parts of a pattern formed on a mask. A control part varies the predetermined direction so as to cause the differential interference optical system to produce another differential interference image. An image pickup sensor picks up the differential interference images in accordance with the variation of the predetermined direction. A defect detecting unit detects a defect in the pattern formed on the mask from comparing the differential interference images with reference images, respectively.

公开(公告)号：US07590277B2

公开(公告)日：2009-09-15

申请号：US11175360

申请日：2005-07-07

申请人： Junji Oaki ,  Shinji Sugihara ,  Ikunao Isomura ,  Toru Tojo

发明人： Junji Oaki ,  Shinji Sugihara ,  Ikunao Isomura ,  Toru Tojo

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： The present invention is to allow rapid detection of such a defect as buried in a pixel positional deviation, expansion/contraction noise or sensing noise on an image. A relationship between an inspection reference pattern image and a pattern image to be inspected is identified during inspection to construct a mathematical model obtained by absorbing (applying fitting on) a pixel positional deviation, expansion/contraction noise or sensing noise on an image, and a defect is detected by comparing a new inspection reference pattern image (model image) obtained by simulating the mathematical model and a pattern image to be inspected.

摘要翻译： 本发明可以快速检测像图像中的像素位置偏差，扩张/收缩噪声或感测噪声那样的缺陷。 在检查中识别出检查基准图案图像与待检查图案图像之间的关系，构成通过吸收（贴合）图像上的像素位置偏差，扩张/收缩噪声或感测噪声而获得的数学模型，以及 通过比较通过模拟数学模型获得的新的检查参考图案图像（模型图像）和待检查的图案图像来检测缺陷。

公开(公告)号：US20050232477A1

公开(公告)日：2005-10-20

申请号：US11072317

申请日：2005-03-07

申请人： Shinji Sugihara ,  Ikunao Isomura ,  Junji Oaki ,  Toru Tojo

发明人： Shinji Sugihara ,  Ikunao Isomura ,  Junji Oaki ,  Toru Tojo

IPC分类号： G01B11/24 ,  G01N21/956 ,  G01R31/311 ,  G03F1/84 ,  G06K9/00 ,  G06T1/00 ,  G06T5/20 ,  G06T7/00 ,  H01L21/027 ,  H01L21/66

CPC分类号： G06T7/001 ,  G01R31/311 ,  G03F1/84 ,  G06T2207/30148

摘要： A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.

摘要翻译： 缺陷检查方法包括用光照射包括检查中的图案的样品，基于由样品反射的光的强度获取图案的测量图案数据，生成包括与来自样品的设计数据相对应的测量图案数据的像素数据的转换数据 将FIR滤波处理应用于转换数据，通过用第一像素数据替换具有不大于第一参考值的像素数据来重构转换数据，用第二像素替换具有大于第一参考值的值的大于第二参考值的像素数据 具有大于第一像素数据的数据的数据，替换具有大于第一参考值且小于第二参考值的像素数据，其中第三像素数据具有在第一和第二像素数据的值之间的值，具有较大值的像素数据被替换为 第三像素数据具有较高的值。

公开(公告)号：US07359546B2

公开(公告)日：2008-04-15

申请号：US11072317

申请日：2005-03-07

申请人： Shinji Sugihara ,  Ikunao Isomura ,  Junji Oaki ,  Toru Tojo

发明人： Shinji Sugihara ,  Ikunao Isomura ,  Junji Oaki ,  Toru Tojo

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01R31/311 ,  G03F1/84 ,  G06T2207/30148

摘要： A defect inspection method comprises irradiating a sample including a pattern under inspection with light, acquiring measurement pattern data of the pattern based on intensity of light reflected by the sample, generating conversion data including pixel data corresponding to the measurement pattern data from design data of the sample, applying FIR filter process to the conversion data, reconstructing the conversion data by replacing pixel data having value not larger than first reference value with first pixel data, replacing pixel data having value larger than second reference value larger than first reference value with second pixel data having value larger than first pixel data, replacing pixel data having value larger than first reference value and less than second reference value with third pixel data having value between the value of first and second pixel data, the pixel data having larger value being replaced with third pixel data having higher value.

摘要翻译： 缺陷检查方法包括用光照射包括检查中的图案的样品，基于由样品反射的光的强度获取图案的测量图案数据，生成包括与来自样品的设计数据相对应的测量图案数据的像素数据的转换数据 将FIR滤波处理应用于转换数据，通过用第一像素数据替换具有不大于第一参考值的像素数据来重构转换数据，用第二像素替换具有大于第一参考值的值的大于第二参考值的像素数据 具有大于第一像素数据的数据的数据，替换具有大于第一参考值且小于第二参考值的像素数据，其中第三像素数据具有在第一和第二像素数据的值之间的值，具有较大值的像素数据被替换为 第三像素数据具有较高的值。

公开(公告)号：US20060018530A1

公开(公告)日：2006-01-26

申请号：US11175360

申请日：2005-07-07

申请人： Junji Oaki ,  Shinji Sugihara ,  Ikunao Isomura ,  Toru Tojo

发明人： Junji Oaki ,  Shinji Sugihara ,  Ikunao Isomura ,  Toru Tojo

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： The present invention is to allow rapid detection of such a defect as buried in a pixel positional deviation, expansion/contraction noise or sensing noise on an image. A relationship between an inspection reference pattern image and a pattern image to be inspected is identified during inspection to construct a mathematical model obtained by absorbing (applying fitting on) a pixel positional deviation, expansion/contraction noise or sensing noise on an image, and a defect is detected by comparing a new inspection reference pattern image (model image) obtained by simulating the mathematical model and a pattern image to be inspected.