公开(公告)号：US07123345B2

公开(公告)日：2006-10-17

申请号：US10897120

申请日：2004-07-23

申请人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

发明人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

IPC分类号： G03B27/42

CPC分类号： G03F9/7088 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

摘要： An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.

摘要翻译： 一种自动对焦装置，包括：保持基板的台阶，与基板面对面配置的物镜;从倾斜方向用点状光束照射基板表面的照明光学元件;检测来自基板面的反射光的光电检测器;位置检测 检测从光电检测器获得的电信号的基板表面的垂直位置以输出位置信号，校正电路实时监控位置信号，并减去超过与基板的表面形状变化相对应的信号变化的剩余量 当位置信号的每单位时间的变化量超过预定值并输出校正的位置信号时，根据位置信号，以及基于校正位置信号控制舞台的垂直位置的舞台控制电路。

公开(公告)号：US20050052634A1

公开(公告)日：2005-03-10

申请号：US10897120

申请日：2004-07-23

申请人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

发明人： Shinji Sugihara ,  Riki Ogawa ,  Toru Tojo

IPC分类号： G01B11/02 ,  G02B7/28 ,  G02B21/26 ,  G03B27/52 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7088 ,  G03F7/70725 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

摘要： An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.

摘要翻译： 一种自动对焦装置，包括：保持基板的台阶，与基板面对面配置的物镜;从倾斜方向用点状光束照射基板表面的照明光学元件;检测来自基板面的反射光的光电检测器;位置检测 检测从光电检测器获得的电信号的基板表面的垂直位置以输出位置信号，校正电路实时监控位置信号，并减去超过与基板的表面形状变化相对应的信号变化的剩余量 当位置信号的每单位时间的变化量超过预定值并输出校正的位置信号时，根据位置信号，以及基于校正位置信号控制舞台的垂直位置的舞台控制电路。

公开(公告)号：US20060087649A1

公开(公告)日：2006-04-27

申请号：US11248124

申请日：2005-10-13

申请人： Riki Ogawa ,  Toru Tojo

发明人： Riki Ogawa ,  Toru Tojo

IPC分类号： G01N21/88

CPC分类号： G03F1/74 ,  G01N21/9501 ,  G01N21/95607

摘要： In a defect inspecting apparatus, an illumination optical system illuminate a mask having a patterned surface, the optical beam passing through the mask is split into two beam components which is guided in first and second image pickup sensors. The pickup sensors has first and second pickup fields on the patterned surface, which pick up first and second parts of the mask image. The first and second pickup fields are parallel to each other and displaced from each other by (2n+1)×d/2 in the longitudinal direction thereof, where d denotes a longitudinal dimension of each pixel image in the first and second pick up fields and n denotes an integer equal to or larger than 0. The first and second parts of the mask image are merged to form a pattern image, and a defect in the mask is detected on the basis of the pattern image.

摘要翻译： 在缺陷检查装置中，照明光学系统照射具有图案化表面的掩模，通过掩模的光束被分割成在第一和第二图像拾取传感器中被引导的两个光束分量。 拾取传感器在图案化表面上具有第一和第二拾取场，其拾取掩模图像的第一和第二部分。 第一拾取场和第二拾取场彼此平行并且在其纵向彼此相互错位（2n + 1）xd / 2，其中d表示第一和第二拾取场中每个像素图像的纵向尺寸， n表示等于或大于0的整数。掩模图像的第一部分和第二部分被合并以形成图案图像，并且基于图案图像检测掩模中的缺陷。

公开(公告)号：US07760349B2

公开(公告)日：2010-07-20

申请号：US11083323

申请日：2005-03-18

申请人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

发明人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (18a, 20a) for adjusting an angle of an aperture.

摘要翻译： 一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射形成有图案（6）的掩模（4）上的不同区域（14a，14b）;物镜（OL） 所述掩模和至少一对检测光学系统（15,16），每个具有检测传感器（17,19）以形成所述图案的图像并且用于通过所述物镜接收来自每个所述不同区域的照明光， 每个检测光学系统具有用于调整孔的角度的机构（18a，20a）。

公开(公告)号：US07508526B2

公开(公告)日：2009-03-24

申请号：US11249359

申请日：2005-10-14

申请人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

发明人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

IPC分类号： G01B9/02 ,  G01B11/02

CPC分类号： G01N21/95607 ,  G03F1/84

摘要： In a defect inspecting apparatus, a differential interference optical system forms a differential interference image which is produced from an optical interference of images in a predetermined direction, the images corresponding to inspecting parts of a pattern formed on a mask. A control part varies the predetermined direction so as to cause the differential interference optical system to produce another differential interference image. An image pickup sensor picks up the differential interference images in accordance with the variation of the predetermined direction. A defect detecting unit detects a defect in the pattern formed on the mask from comparing the differential interference images with reference images, respectively.

摘要翻译： 在缺陷检查装置中，差分干涉光学系统形成由预定方向的图像的光学干涉产生的差分干涉图像，图像对应于形成在掩模上的图案的检查部分。 控制部分改变预定方向，以使差分干涉光学系统产生另一个差分干涉图像。 图像拾取传感器根据预定方向的变化来拾取差分干涉图像。 缺陷检测单元分别通过将差分干涉图像与参考图像进行比较来检测形成在掩模上的图案中的缺陷。

公开(公告)号：US07345755B2

公开(公告)日：2008-03-18

申请号：US11248124

申请日：2005-10-13

申请人： Riki Ogawa ,  Toru Tojo

发明人： Riki Ogawa ,  Toru Tojo

IPC分类号： G01N21/00

CPC分类号： G03F1/74 ,  G01N21/9501 ,  G01N21/95607

摘要： In a defect inspecting apparatus, an illumination optical system illuminate a mask having a patterned surface, the optical beam passing through the mask is split into two beam components which is guided in first and second image pickup sensors. The pickup sensors has first and second pickup fields on the patterned surface, which pick up first and second parts of the mask image. The first and second pickup fields are parallel to each other and displaced from each other by (2n+1)×d/2 in the longitudinal direction thereof, where d denotes a longitudinal dimension of each pixel image in the first and second pick up fields and n denotes an integer equal to or larger than 0. The first and second parts of the mask image are merged to form a pattern image, and a defect in the mask is detected on the basis of the pattern image.

摘要翻译： 在缺陷检查装置中，照明光学系统照射具有图案化表面的掩模，通过掩模的光束被分割成在第一和第二图像拾取传感器中被引导的两个光束分量。 拾取传感器在图案化表面上具有第一和第二拾取场，其拾取掩模图像的第一和第二部分。 第一拾取场和第二拾取场彼此平行并且在其纵向彼此相互错位（2n + 1）xd / 2，其中d表示第一和第二拾取场中每个像素图像的纵向尺寸， n表示等于或大于0的整数。掩模图像的第一部分和第二部分被合并以形成图案图像，并且基于图案图像检测掩模中的缺陷。

公开(公告)号：US20060082782A1

公开(公告)日：2006-04-20

申请号：US11249359

申请日：2005-10-14

申请人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

发明人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

IPC分类号： G01B9/02

CPC分类号： G01N21/95607 ,  G03F1/84

摘要： In a defect inspecting apparatus, a differential interference optical system forms a differential interference image which is produced from an optical interference of images in a predetermined direction, the images corresponding to inspecting parts of a pattern formed on a mask. A control part varies the predetermined direction so as to cause the differential interference optical system to produce another differential interference image. An image pickup sensor picks up the differential interference images in accordance with the variation of the predetermined direction. A defect detecting unit detects a defect in the pattern formed on the mask from comparing the differential interference images with reference images, respectively.

公开(公告)号：US20100247085A1

公开(公告)日：2010-09-30

申请号：US12729307

申请日：2010-03-23

申请人： Masataka Shiratsuchi ,  Yoshinori Honguh ,  Masatoshi Hirono ,  Riki Ogawa ,  Shinji Sugihara

发明人： Masataka Shiratsuchi ,  Yoshinori Honguh ,  Masatoshi Hirono ,  Riki Ogawa ,  Shinji Sugihara

IPC分类号： G03B13/00

CPC分类号： G03B13/00

摘要： In an automatic focus adjusting mechanism, a test sample having a patterned surface is mounted on a mount table, and an light beam passing through a slit formed in a field stop is applied to the patterned surface of the test sample. The light beam reflected from the test sample is split into two segment light beams. Focus adjusting aperture stops having respective apertures formed rhomboid are provided across the optical paths of the segment light beams. The amounts of the segment light beams passing through the rhomboid apertures are detected by light receiving units. Based on the difference between the detected light amounts, the position of the mount table is controlled by the focus adjusting unit.

摘要翻译： 在自动聚焦调节机构中，将具有图案化表面的测试样品安装在安装台上，并且将通过形成在场停止器中的狭缝的光束施加到测试样品的图案化表面。 从测试样品反射的光束被分成两段光束。 在分段光束的光路上设置聚焦调节孔径，具有形成菱形的各个孔。 穿过菱形孔的分段光束的量由光接收单元检测。 基于检测到的光量之差，通过焦点调节单元来控制安装台的位置。

公开(公告)号：US20050213084A1

公开(公告)日：2005-09-29

申请号：US11083323

申请日：2005-03-18

申请人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

发明人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

IPC分类号： G01N21/88 ,  G01N21/956 ,  G03F1/84 ,  H01L21/027

CPC分类号： G01N21/956

摘要： A mask-defect inspection apparatus including a plurality of illumination optical systems (2) for illuminating different areas (14a, 14b) on a mask (4) on which a pattern (6) is formed, an objective lens (OL) disposed to face the mask, and at least a pair of detection optical systems (15, 16) each having a detection sensor (17, 19) to form an image of the pattern and for receiving illumination light from each of the different areas through the objective lens, each of the detection optical systems having a mechanism (13a, 13b) for adjusting an angle of an aperture.

摘要翻译： 一种掩模缺陷检查装置，包括：多个照明光学系统（2），用于照射在其上形成有图案（6）的掩模（4）上的不同区域（14a，14b），物镜（OL） 以及至少一对具有检测传感器（17,19）的检测光学系统（15,16），以形成图案的图像，并且用于通过该目标接收来自每个不同区域的照明光 每个检测光学系统具有用于调整光圈角度的机构（13a，13b）。

公开(公告)号：US07551273B2

公开(公告)日：2009-06-23

申请号：US12081852

申请日：2008-04-22

申请人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

发明人： Akihiko Sekine ,  Ikunao Isomura ,  Toshiyuki Watanabe ,  Shinji Sugihara ,  Riki Ogawa

IPC分类号： G01N21/00

CPC分类号： G03F1/84 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/95607 ,  G01N2021/95676

摘要： The mask defect inspection apparatus including an illumination optical system for illuminating a mask on which a pattern is formed; an objective lens facing the mask; at least a pair of detection optical systems having a detection sensor for obtaining an image of the pattern, respectively, and which receive illumination light from illumination areas different from each other through the objective lens, respectively; and focusing changing means for changing a position of focusing between sites of the pattern in a film-thickness direction of the mask and the pattern images obtained by the detection sensors, such that the pattern images obtained by the detection sensors are changed corresponding to the film-thickness direction of the mask.

摘要翻译： 掩模缺陷检查装置包括用于照亮其上形成有图案的掩模的照明光学系统; 面对面罩的物镜; 至少一对检测光学系统，具有分别用于获得图案的图像的检测传感器，并分别通过物镜从彼此不同的照明区域接收照明光; 以及聚焦改变装置，用于改变在掩模的膜厚度方向上的图案的位置之间的聚焦位置和由检测传感器获得的图案图像，使得由检测传感器获得的图案图像相应地变化 面膜方向。