公开(公告)号：US06396062B1

公开(公告)日：2002-05-28

申请号：US09454693

申请日：1999-12-03

申请人： Jesse D. Buck ,  Robert G. Ozarski

发明人： Jesse D. Buck ,  Robert G. Ozarski

IPC分类号： G01J142

CPC分类号： G03F7/70483 ,  G01J1/4257 ,  G01J1/58

摘要： A portable laser beam monitor utilizes a plurality of optical trains to monitor ultraviolet laser beam profiles at a plurality of positions along a laser beam path. A preferred embodiment useful for monitoring beam profiles of lithography lasers measures the beam profile at the front aperture, the rear aperture, the shutter plane and at infinity (the divergence plane). The beam profiles are imaged on a fluorescent screen which is monitored by a visible light camera. Images of the profiles may be discharged on the screen of a lap top computer.

摘要翻译： 便携式激光束监视器利用多个光学列车来监视沿着激光束路径的多个位置处的紫外激光束轮廓。 用于监测光刻激光器的光束轮廓的优选实施例测量前孔，后孔，快门平面和无限远（发散平面）处的光束轮廓。 光束轮廓在由可见光相机监测的荧光屏上成像。 配置文件的图像可能会在笔记本电脑的屏幕上放电。

公开(公告)号：US06229639B1

公开(公告)日：2001-05-08

申请号：US09112631

申请日：1998-07-09

申请人： Robert G. Ozarski ,  Alexander I. Ershov

发明人： Robert G. Ozarski ,  Alexander I. Ershov

IPC分类号： G02B2608

CPC分类号： G03F7/7005 ,  G03F7/70991

摘要： A laser lithography system in which two or more lasers provide laser illumination for two or more lithography exposure tools through a laser beam multiplexer. The mulitplexer contain several mirror devices each having a multi-reflectance mirror with surfaces of different reflectance and an adjusting mechanism for positioning one of the surfaces to intersect a laser beam from at least one of the lasers and direct a portion of it to at least one of the exposure tools.

摘要翻译： 激光光刻系统，其中两个或更多个激光器通过激光束多路复用器为两个或更多个光刻曝光工具提供激光照明。 多路复用器包含多个反射镜装置，每个反射镜具有不同反射率的表面的多反射镜，以及调整机构，用于将一个表面定位成与来自至少一个激光器的激光束交叉，并将其一部分引导至至少一个 的曝光工具。

公开(公告)号：US5991324A

公开(公告)日：1999-11-23

申请号：US41474

申请日：1998-03-11

申请人： David S. Knowles ,  James H. Azzola ,  Herve A. Besaucele ,  Palash P. Das ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Tibor Juhasz ,  Robert G. Ozarski ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Richard C. Ujazdowski ,  Tom A. Watson ,  Richard M. Ness

发明人： David S. Knowles ,  James H. Azzola ,  Herve A. Besaucele ,  Palash P. Das ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Tibor Juhasz ,  Robert G. Ozarski ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Richard C. Ujazdowski ,  Tom A. Watson ,  Richard M. Ness

IPC分类号： H01S3/038 ,  G03F7/20 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/139 ,  H01S3/225 ,  H01S3/22

CPC分类号： G01J9/0246 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/225 ,  H01S3/1392

摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.

摘要翻译： 一种可靠，模块化，生产质量好的窄带KrF准分子激光器，能够以1000Hz的频率产生10mJ的激光脉冲，带宽约为0.6μm或更小。 本发明特别适用于集成电路的平版印刷生产中的长期全天候操作。 现有技术的激光器的改进包括单个上游预分解器管和声学挡板。 优选的实施例包括减少的氟浓度，阳极支撑杆形状以减小鼓风机轴承上的空气动力反作用力，改进的脉冲电源系统提供更快的脉冲上升时间，输出耦合器具有显着增加的反射率，具有CaF棱镜扩束器的线窄化模块 ，更准确的波长计，激光计算机控制器编程，具有新的改进的脉冲能量控制算法。

公开(公告)号：US4857738A

公开(公告)日：1989-08-15

申请号：US135119

申请日：1987-12-18

申请人： David W. Myers ,  Robert G. Ozarski ,  Thiloma I. Perera ,  John F. Schipper ,  Raul V. Tan ,  Michael P. C. Watts

发明人： David W. Myers ,  Robert G. Ozarski ,  Thiloma I. Perera ,  John F. Schipper ,  Raul V. Tan ,  Michael P. C. Watts

IPC分类号： G01N21/84 ,  G03F7/20

CPC分类号： G03F7/70483 ,  G01N21/8422

摘要： Two methods of determination of the chemical changes induced in a film of material such as photoresist that has been exposed to electromagnetic radiation. Two methods use measurement of polarized light reflected by the film mounted on a substrate to determine a real refractive index or a complex refractive index of the film. Two other methods use measurement of polarized light by the film mounted on a (partly) transparent substrate to determine a real refractive index or a complex refractive index of the film.

摘要翻译： 确定在已经暴露于电磁辐射的光致抗蚀剂等材料的膜中引起的化学变化的两种方法。 两种方法使用由安装在衬底上的膜反射的偏振光的测量来确定膜的实际折射率或复折射率。 另外两种方法使用通过安装在（部分）透明衬底上的膜来测量偏振光，以确定膜的实际折射率或复合折射率。

公开(公告)号：US6128323A

公开(公告)日：2000-10-03

申请号：US157067

申请日：1998-09-18

申请人： David W. Myers ,  Herve A. Besaucele ,  Palash P. Das ,  Thomas P. Duffey ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Thomas Hofmann ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  Robert G. Ozarski ,  Gamaralalage G. Padmabandu ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Paul S. Thompson ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb ,  Paolo Zambon

发明人： David W. Myers ,  Herve A. Besaucele ,  Palash P. Das ,  Thomas P. Duffey ,  Alexander I. Ershov ,  Igor V. Fomenkov ,  Thomas Hofmann ,  Richard G. Morton ,  Richard M. Ness ,  Peter C. Newman ,  Robert G. Ozarski ,  Gamaralalage G. Padmabandu ,  William N. Partlo ,  Daniel A. Rothweil ,  Richard L. Sandstrom ,  Paul S. Thompson ,  Richard C. Ujazdowski ,  Tom A. Watson ,  R. Kyle Webb ,  Paolo Zambon

IPC分类号： G03F7/20 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/041 ,  H01S3/08 ,  H01S3/081 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/139 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80 ,  H01S3/00

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/02 ,  H01S3/03 ,  H01S3/036 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/225 ,  H03K17/80 ,  H03K3/57 ,  H01S3/08009 ,  H01S3/0812 ,  H01S3/1392 ,  H01S3/2251 ,  H01S3/2256

摘要： The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod. A novel design for the compression head saturable inductor greatly reduces the quantity of transformer oil required and virtually eliminates the possibility of oil leakage which in the past has posed a hazard.

摘要翻译： 本发明提供了一种可靠的模块化生产质量准分子激光器，其能够在2000Hz下产生10mJ激光脉冲，全宽度为一半，最大带宽为约0.6μm或更小。 可更换模块包括激光室; 由三个模块组成的脉冲电源系统; 光学谐振器，包括线窄模块和输出耦合器模块; 波形计模块，电气控制模块，冷却水模块和气体控制模块。 允许更高脉冲速率和改进的带宽性能的激光室的改进包括单个上游预分解器管和高效室。 该室设计用于在较低的氟浓度下运行。 在脉冲功率单元中已经提供了重要的改进，以产生更快的上升时间和改进的脉冲能量控制。 这些改进包括增加容量的高压电源，具有用于精确电压调整的电压降低电路，改进的换向模块，其从由高压电源充电的电容器产生高电压脉冲，并用脉冲电压放大23次 具有由单个四段不锈钢棒组成的次级绕组的非常快速的电压互感器。 用于压缩头可饱和电感器的新颖设计大大减少了所需的变压器油的数量，并且几乎消除了过去漏油的可能性。

公开(公告)号：US6111907A

公开(公告)日：2000-08-29

申请号：US271040

申请日：1999-03-17

申请人： Robert G. Ozarski

发明人： Robert G. Ozarski

IPC分类号： H01S3/03 ,  H01S3/225 ,  H01S3/08

CPC分类号： H01S3/03 ,  H01S3/225

摘要： A system for providing support for the movement of a laser chamber of a laser system during the installation and removal of the laser chamber from the laser system housing. The system includes a rail assembly that is retractable and extendible from the laser system housing and provides support for moving the laser chamber between an operating position within the housing and a position outside of the housing for removal. The rail assembly is retractable to reside within the housing when not in use. The system may also include at least one actuator for controlling the movement of the laser chamber in a direction having a vertical component. Actuator types that may be used include rotary, piston cylinder, hydraulic, pneumatic, and/or electrical mechanical. One type of rail assembly includes opposing rail structures that retract and extend by moving laterally out from the housing or by pivoting out from the housing. The system may be implemented with a gas laser system such as an excimer laser system.

摘要翻译： 一种用于在从激光系统壳体安装和移除激光室期间为激光系统的激光室的移动提供支撑的系统。 该系统包括可从激光系统壳体缩回和延伸的轨道组件，并且提供支撑件，用于将激光室在壳体内的操作位置与壳体外部的位置之间移动以便移除。 轨道组件可缩回以在不使用时驻留在壳体内。 该系统还可以包括至少一个用于在具有垂直分量的方向上控制激光室的运动的致动器。 可以使用的致动器类型包括旋转，活塞气缸，液压，气动和/或电气机械。 一种类型的轨道组件包括相对的轨道结构，其通过从壳体侧向移出或通过从壳体枢转而缩回和延伸。 该系统可以用诸如准分子激光系统的气体激光系统来实现。

公开(公告)号：US5336325A

公开(公告)日：1994-08-09

申请号：US644235

申请日：1991-01-18

申请人： John J. Devilbiss ,  Steve Lugosi ,  Robert G. Ozarski

发明人： John J. Devilbiss ,  Steve Lugosi ,  Robert G. Ozarski

IPC分类号： F27B17/00 ,  H01L21/00 ,  H01L21/677 ,  C23C16/00

CPC分类号： H01L21/67115 ,  F27B17/0025 ,  H01L21/67769 ,  H01L21/67778 ,  Y10S414/137

摘要： An enhanced vertical thermal reactor system provides three isolated chambers including a wafer handling chamber, a process chamber including an elevator, and a cool down chamber, each sealed from the other. The sealing of these individual chambers, each from the other, has the effect of minimizing processing delays associated with the cooling process and the loading and unloading process to thereby improve the productivity of the furnace. The process chamber includes non-metallic media such that it can be operated in oxidation systems so that corrosive acids will not affect the process chamber operation.

摘要翻译： 增强的垂直热反应器系统提供三个隔离的室，包括晶片处理室，包括电梯的处理室和冷却室，每个冷却室彼此密封。 这些各个腔室彼此的密封具有使与冷却过程和加载和卸载过程相关联的加工延迟最小化的效果，从而提高炉的生产率。 处理室包括非金属介质，使得其可以在氧化系统中操作，使得腐蚀性酸不会影响处理室操作。

公开(公告)号：US4909631A

公开(公告)日：1990-03-20

申请号：US134638

申请日：1987-12-18

申请人： Raul Y. Tan ,  David W. Myers ,  Robert G. Ozarski ,  John F. Schipper ,  Michael P. C. Watts

发明人： Raul Y. Tan ,  David W. Myers ,  Robert G. Ozarski ,  John F. Schipper ,  Michael P. C. Watts

IPC分类号： G01B11/06 ,  G01N21/41

CPC分类号： G01N21/41 ,  G01B11/065 ,  G01N2021/4126

摘要： Two methods for determination of thickness of a film of known material that is mounted on one face of a solid substrate of known material are disclosed, using: (1) inversion of an optical beam reflectivity equation; or (2) determination of the film thickness that minimizes the variance of the optical beam reflectivity, computed at each of a predetermined sequence of optical beam wavelengths. Four methods for determination of the (real) refractive index of a film of known thickness mounted on a face of a solid substrate of known material are disclosed, using: (1) minimization of absolute differences of computed and measured optical beam reflectivity, summed over a sequence of known film thicknesses, for assumed values of the refractive index; (2 and 3) two iterative techniques of promote convergence of an estimate of the index to a final value of the refractive index; or (4) solution of a quadratic equation whose coefficients are slowly varying functions of the solution variable.

摘要翻译： 公开了两种用于确定安装在已知材料的固体基板的一个面上的已知材料的膜的厚度的方法：（1）反射光束反射率方程; 或（2）确定在预定的光束波长序列中计算出的光束反射率的方差最小化的膜厚度。 公开了用于确定安装在已知材料的固体基板的表面上的已知厚度的膜的（实际）折射率的四种方法，其使用：（1）最小化计算和测量的光束反射率的绝对差， 已知膜厚度序列，用于折射率的假设值; （2和3）两种迭代技术来促进指数估计与折射率的最终值的收敛; 或（4）二次方程的解，其系数是解变量的缓慢变化函数。

公开(公告)号：US4874240A

公开(公告)日：1989-10-17

申请号：US162431

申请日：1988-03-01

申请人： Michael P. C. Watts ,  Thiloma I. Perera ,  David W. Myers ,  Robert G. Ozarski ,  John F. Schipper ,  Raul V. Tan

发明人： Michael P. C. Watts ,  Thiloma I. Perera ,  David W. Myers ,  Robert G. Ozarski ,  John F. Schipper ,  Raul V. Tan

IPC分类号： G03F7/26 ,  G03F7/16 ,  G03F7/38

CPC分类号： G03F7/168

摘要： Several methods for evaluating certain changes induced in a film of semiconductor resist material after the coat process and before or at completion of the softbake process, by monitoring thickness of and absorption by a film of resist material.

公开(公告)号：US6067306A

公开(公告)日：2000-05-23

申请号：US81374

申请日：1998-05-19

申请人： Richard L. Sandstrom ,  Palash P. Das ,  Igor V. Fomenkov ,  Herve A. Besaucele ,  Robert G. Ozarski

发明人： Richard L. Sandstrom ,  Palash P. Das ,  Igor V. Fomenkov ,  Herve A. Besaucele ,  Robert G. Ozarski

IPC分类号： G03F7/20 ,  H01S3/03 ,  H01S3/036 ,  H01S3/08 ,  H01S3/134 ,  H01S3/225 ,  H01S3/00

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/134 ,  H01S3/225 ,  H01S3/036 ,  H01S3/08009 ,  H01S3/2251 ,  H01S3/2256

摘要： A laser-illuminated wafer-exposing system such as a stepper or scanner having a first light intensity detector located within the exposing system near a mask and second light intensity detector located near the output of the laser. A feedback control system controls the output of the laser based on signals detected by at least one of the detectors. The feedback control system includes a processor programmed with an algorithm which is used to control the laser discharge voltage in order to provide light pulses having desired intensity at the mask with the laser operating in a burst mode. The algorithm utilizes at least the following parameters; a previously measured pulse energy, a calculated energy error, a calculated dose error, a value for the rate of change of pulse energy with voltage, and at least one reference voltage. In a preferred embodiment the algorithm uses the pulse energy measured with the light intensity detector located near the mark to provide the feedback control and uses the light intensity detector at the output of the laser to assure that the output of the laser is maintained within a predetermined range.

摘要翻译： 激光照射的晶片曝光系统，例如步进器或扫描仪，其具有位于掩模附近的曝光系统内的第一光强度检测器和位于激光器输出附近的第二光强度检测器。 反馈控制系统基于由至少一个检测器检测到的信号来控制激光器的输出。 反馈控制系统包括用算法编程的处理器，该算法用于控制激光放电电压，以在激光器以突发模式工作的情况下在掩模处提供具有期望强度的光脉冲。 该算法至少使用以下参数; 先前测量的脉冲能量，计算的能量误差，计算的剂量误差，脉冲能量随电压的变化率的值和至少一个参考电压。 在优选实施例中，算法使用位于标记附近的光强度检测器测量的脉冲能量来提供反馈控制，并且在激光器的输出处使用光强度检测器，以确保激光器的输出保持在预定的 范围。