METHOD OF FABRICATING SEMICONDUCTOR DEVICE
    1.
    发明申请
    METHOD OF FABRICATING SEMICONDUCTOR DEVICE 审中-公开
    制造半导体器件的方法

    公开(公告)号:US20160329414A1

    公开(公告)日:2016-11-10

    申请号:US15093145

    申请日:2016-04-07

    摘要: A method of fabricating a semiconductor device includes forming an active pattern protruding from a substrate, forming a liner layer on the active pattern, forming a sacrificial gate pattern on the liner layer and crossing the active pattern, forming source/drain regions on the active pattern and at both sides of the sacrificial gate pattern, forming an interlayer insulating layer to cover the source/drain regions, forming capping insulating patterns on the interlayer insulating layer to expose the sacrificial gate pattern, and removing the sacrificial gate pattern and the liner layer by an etching process using the capping insulating patterns as an etch mask to form a gap region exposing the active pattern. The active pattern includes a material having a lattice constant greater than a lattice constant of the substrate, and the capping insulating patterns include a material having an etch selectivity with respect to the liner layer.

    摘要翻译: 制造半导体器件的方法包括形成从衬底突出的有源图案,在有源图案上形成衬垫层,在衬垫层上形成牺牲栅极图案并与有源图案交叉,在活性图案上形成源极/漏极区域 在牺牲栅极图案的两侧形成层间绝缘层以覆盖源极/漏极区域,在层间绝缘层上形成覆盖绝缘图案以暴露牺牲栅极图案,以及通过以下步骤去除牺牲栅极图案和衬底层: 使用封盖绝缘图案作为蚀刻掩模的蚀刻工艺来形成暴露活性图案的间隙区域。 活性图案包括晶格常数大于衬底的晶格常数的材料,并且封盖绝缘图案包括相对于衬垫层具有蚀刻选择性的材料。

    Method of fabricating semiconductor device

    公开(公告)号:US10411119B2

    公开(公告)日:2019-09-10

    申请号:US15093145

    申请日:2016-04-07

    摘要: A method of fabricating a semiconductor device includes forming an active pattern protruding from a substrate, forming a liner layer on the active pattern, forming a sacrificial gate pattern on the liner layer and crossing the active pattern, forming source/drain regions on the active pattern and at both sides of the sacrificial gate pattern, forming an interlayer insulating layer to cover the source/drain regions, forming capping insulating patterns on the interlayer insulating layer to expose the sacrificial gate pattern, and removing the sacrificial gate pattern and the liner layer by an etching process using the capping insulating patterns as an etch mask to form a gap region exposing the active pattern. The active pattern includes a material having a lattice constant greater than a lattice constant of the substrate, and the capping insulating patterns include a material having an etch selectivity with respect to the liner layer.

    SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
    3.
    发明申请
    SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME 审中-公开
    半导体器件及其制造方法

    公开(公告)号:US20160300949A1

    公开(公告)日:2016-10-13

    申请号:US15062553

    申请日:2016-03-07

    摘要: Semiconductor devices and methods of fabricating the same are provided. The methods of fabricating the semiconductor devices may include providing a substrate including an active pattern protruding from the substrate, forming a first liner layer and a field isolating pattern on the substrate to cover a lower portion of the active pattern, forming a second liner layer on an upper portion of the active pattern and the field isolation pattern, and forming a dummy gate on the second liner layer.

    摘要翻译: 提供半导体器件及其制造方法。 制造半导体器件的方法可以包括提供包括从衬底突出的有源图案的衬底,在衬底上形成第一衬里层和场隔离图案以覆盖有源图案的下部,形成第二衬垫层 有源图案的上部和场隔离图案,并且在第二衬垫层上形成伪栅极。

    Network system and control method thereof
    4.
    发明授权
    Network system and control method thereof 有权
    网络系统及其控制方法

    公开(公告)号:US09407114B2

    公开(公告)日:2016-08-02

    申请号:US13473225

    申请日:2012-05-16

    IPC分类号: H02J13/00 G06Q50/06

    摘要: Provided are a network system and a method of controlling the network system supplied with energy from an energy generation component. The network system includes an energy consumption component consuming the energy generated from the energy generation component, and driving a driving component for processing or managing a consumable. The energy consumption component is provided with one or more courses classified according to a determination factor related to the consumable. The determination factor includes a performance factor denoting a processed or managed result of the consumable. One of the courses is recommended as a driving course when the energy consumption component recognizes information about the consumable.

    摘要翻译: 提供了一种网络系统和一种控制从能量产生部件供应能量的网络系统的方法。 网络系统包括消耗从能量产生部件产生的能量的能量消耗部件,以及驱动用于处理或管理消耗品的驱动部件。 能量消耗部件具有根据与消耗品相关的确定因素分类的一个或多个课程。 决定因素包括表示消耗品的处理或管理结果的性能因素。 其中一个课程被建议作为驾驶课程,当能源部件识别关于消耗品的信息。

    NETWORK SYSTEM AND CONTROL METHOD THEREOF
    6.
    发明申请
    NETWORK SYSTEM AND CONTROL METHOD THEREOF 有权
    网络系统及其控制方法

    公开(公告)号:US20120292997A1

    公开(公告)日:2012-11-22

    申请号:US13473225

    申请日:2012-05-16

    IPC分类号: H02J3/00

    摘要: Provided are a network system and a method of controlling the network system supplied with energy from an energy generation component. The network system includes an energy consumption component consuming the energy generated from the energy generation component, and driving a driving component for processing or managing a consumable. The energy consumption component is provided with one or more courses classified according to a determination factor related to the consumable. The determination factor includes a performance factor denoting a processed or managed result of the consumable. One of the courses is recommended as a driving course when the energy consumption component recognizes information about the consumable.

    摘要翻译: 提供了一种网络系统和一种控制从能量产生部件供应能量的网络系统的方法。 网络系统包括消耗从能量产生部件产生的能量的能量消耗部件,以及驱动用于处理或管理消耗品的驱动部件。 能量消耗部件具有根据与消耗品相关的确定因素分类的一个或多个课程。 决定因素包括表示消耗品的处理或管理结果的性能因素。 其中一个课程被建议作为驾驶课程,当能源部件识别关于消耗品的信息。