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    Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition
    2.
    发明申请
    Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition 有权
    鎓盐化合物，包含盐化合物的高分子化合物，包含高分子化合物的化学增幅抗蚀剂组合物，以及使用该组合物进行图案化的方法

    公开(公告)号：US20100075256A1

    公开(公告)日：2010-03-25

    申请号：US12321111

    申请日：2009-01-15

    申请人： Hyun-Sang Joo ,  Joo-Hyeon Park ,  Jung-Hoon Oh ,  Dae-Hyeon Shin

    发明人： Hyun-Sang Joo ,  Joo-Hyeon Park ,  Jung-Hoon Oh ,  Dae-Hyeon Shin

    IPC分类号： G03F7/004 ,  C07C69/52 ,  C07D333/02 ,  C08F14/18 ,  G03F7/20

    CPC分类号： C07C381/12 ,  C07C309/12 ,  C08F20/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： A compound represented by the following formula (1) is provided: wherein R1 represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the following formula (2) or formula (3): wherein R2, R3, R4, R5 and R6 each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted allyl group, a substituted or unsubstituted perfluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted aryl group; and two or more of R2, R3 and R4 may be linked to each other to form a saturated or unsaturated carbon ring or a saturated or unsaturated heterocyclic ring.The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation, which is represented by KrF excimer laser or ArF excimer laser.

    摘要翻译： 提供由下式（1）表示的化合物：其中R1表示氢原子，三氟甲基，烷基或烷氧基; A表示由下式（2）或式（3）表示的基团：其中R 2，R 3，R 4，R 5和R 6各自独立地表示取代或未取代的烷基，取代或未取代的烯丙基，取代或未取代的 取代或未取代的苄基或取代或未取代的芳基; R2，R3和R4中的两个或多个可以彼此连接形成饱和或不饱和的碳环或饱和或不饱和的杂环。 包含由根据本发明的式1化合物制备的高分子化合物的化学放大抗蚀剂组合物提供对由KrF准分子激光器或ArF准分子激光器表示的远紫外辐射敏感的化学放大抗蚀剂。

    Polymer and chemically amplified resist composition containing the same
    4.
    发明授权
    Polymer and chemically amplified resist composition containing the same 有权
    含有其的聚合物和化学放大抗蚀剂组合物

    公开(公告)号：US07285373B2

    公开(公告)日：2007-10-23

    申请号：US10940469

    申请日：2004-09-14

    申请人： Young-Taek Lim ,  Joo-Hyeon Park ,  Dong-Chul Seo ,  Chang-Min Kim ,  Seong-Duk Cho ,  Hyun-Sang Joo

    发明人： Young-Taek Lim ,  Joo-Hyeon Park ,  Dong-Chul Seo ,  Chang-Min Kim ,  Seong-Duk Cho ,  Hyun-Sang Joo

    IPC分类号： G03F7/039

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/0397

    摘要： A chemically amplified resist composition includes a novel polymer, a photoacid generator, and a solvent.The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF Excimer laser or ArF Excimer laser, dry etch resistance, sensitivity, resolution, and developability. In addition, the polymer contains a maximum number of saturated aliphatic rings to enhance etching resistance, and additionally includes an alkoxyalkyl acrylate monomer introduced as a solution to the problem with the conventional polyacrylate resist in regard to edge roughness of the pattern, to form a uniform edge of the pattern because the alkylalcohol compound generated together with a formaldehyde and a carboxylate compound by a deprotection reaction of the alkoxyalkyl acrylate monomer with an acid acts as a solvent or an antifoaming agent in the pattern.

    摘要翻译： 化学放大抗蚀剂组合物包括新型聚合物，光致酸产生剂和溶剂。 化学放大抗蚀剂可以形成粘合性优异，对基板的依赖性低，抗紫外波长范围如KrF准分子激光器或ArF准分子激光器的透光性，耐干蚀刻性，灵敏度，分辨率和显影性。 此外，聚合物含有最大数量的饱和脂肪族环，以提高耐蚀刻性，并且还包括作为溶液的烷基烷基酯单体引入的常规聚丙烯酸酯抗蚀剂相对于图案的边缘粗糙度的问题，形成均匀的 由于通过丙烯酸烷氧基烷基酯单体与酸的脱保护反应与甲醛和羧酸酯化合物一起产生的烷基醇化合物作为图案中的溶剂或消泡剂，因此图案的边缘。

    Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition
    5.
    发明授权
    Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition 有权
    鎓盐化合物，包含盐化合物的高分子化合物，包含高分子化合物的化学增幅抗蚀剂组合物，以及使用该组合物进行图案化的方法

    公开(公告)号：US08158327B2

    公开(公告)日：2012-04-17

    申请号：US12321111

    申请日：2009-01-15

    申请人： Hyun-Sang Joo ,  Joo-Hyeon Park ,  Jung-Hoon Oh ,  Dae-Hyeon Shin

    发明人： Hyun-Sang Joo ,  Joo-Hyeon Park ,  Jung-Hoon Oh ,  Dae-Hyeon Shin

    IPC分类号： G03F7/004 ,  G03F7/30 ,  C08F228/02

    CPC分类号： C07C381/12 ,  C07C309/12 ,  C08F20/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111

    摘要： A compound represented by the following formula (1) is provided: wherein R1 represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the following formula (2) or formula (3): wherein R2, R3, R4, R5 and R6 each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted allyl group, a substituted or unsubstituted perfluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted aryl group; and two or more of R2, R3 and R4 may be linked to each other to form a saturated or unsaturated carbon ring or a saturated or unsaturated heterocyclic ring. The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation, which is represented by KrF excimer laser or ArF excimer laser.

    摘要翻译： 提供由下式（1）表示的化合物：其中R1表示氢原子，三氟甲基，烷基或烷氧基; A表示由下式（2）或式（3）表示的基团：其中R 2，R 3，R 4，R 5和R 6各自独立地表示取代或未取代的烷基，取代或未取代的烯丙基，取代或未取代的 取代或未取代的苄基或取代或未取代的芳基; R2，R3和R4中的两个或多个可以彼此连接形成饱和或不饱和的碳环或饱和或不饱和的杂环。 包含由根据本发明的式1化合物制备的高分子化合物的化学放大抗蚀剂组合物提供对由KrF准分子激光器或ArF准分子激光器表示的远紫外辐射敏感的化学放大抗蚀剂。

    Novel polymer and chemically amplified resist composition containing the same
    7.
    发明申请
    Novel polymer and chemically amplified resist composition containing the same 有权
    含有其的新型聚合物和化学增幅抗蚀剂组合物

    公开(公告)号：US20050153236A1

    公开(公告)日：2005-07-14

    申请号：US10940469

    申请日：2004-09-14

    申请人： Young-Taek Lim ,  Joo-Hyeon Park ,  Dong-Chul Seo ,  Chang-Min Kim ,  Seong-Duk Cho ,  Hyun-Sang Joo

    发明人： Young-Taek Lim ,  Joo-Hyeon Park ,  Dong-Chul Seo ,  Chang-Min Kim ,  Seong-Duk Cho ,  Hyun-Sang Joo

    IPC分类号： G03F7/033 ,  C08F212/08 ,  C08F216/12 ,  C08F220/10 ,  C08F222/06 ,  C08F232/00 ,  C08G61/04 ,  G03C1/76 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0395 ,  G03F7/0397

    摘要： The present invention provides a chemically amplified resist composition including a novel polymer, a photoacid generator, and a solvent: The chemically amplified resist can form a resist pattern that is excellent in adhesiveness with a low dependency to the substrate, transparency at the far ultraviolet wavelength range such as KrF Excimer laser or ArF Excimer laser, dry etch resistance, sensitivity, resolution, and developability. In addition, the polymer contains a maximum number of saturated aliphatic rings to enhance etching resistance, and additionally includes an alkoxyalkyl acrylate monomer introduced as a solution to the problem with the conventional polyacrylate resist in regard to edge roughness of the pattern, to form a uniform edge of the pattern because the alkylalcohol compound generated together with a formaldehyde and a carboxylate compound by a deprotection reaction of the alkoxyalkyl acrylate monomer with an acid acts as a solvent or an antifoaming agent in the pattern.

    摘要翻译： 本发明提供一种包含新型聚合物，光酸产生剂和溶剂的化学放大抗蚀剂组合物：化学增幅抗蚀剂可以形成粘合性优异，对基材的依赖性低的抗蚀剂图案，远紫外线波长的透明度 范围如KrF准分子激光器或ArF准分子激光器，干蚀刻电阻，灵敏度，分辨率和显影性。 此外，聚合物含有最大数量的饱和脂肪族环，以提高耐蚀刻性，并且还包括作为溶液的烷基烷基酯单体引入的常规聚丙烯酸酯抗蚀剂相对于图案的边缘粗糙度的问题，形成均匀的 由于通过丙烯酸烷氧基烷基酯单体与酸的脱保护反应与甲醛和羧酸酯化合物一起产生的烷基醇化合物作为图案中的溶剂或消泡剂，因此图案的边缘。

    Acid generating agent for chemically amplified resist compositions
    8.
    发明授权
    Acid generating agent for chemically amplified resist compositions 有权
    用于化学放大抗蚀剂组合物的酸产生剂

    公开(公告)号：US08779183B2

    公开(公告)日：2014-07-15

    申请号：US12214429

    申请日：2008-06-19

    申请人： Jung-Hoon Oh ,  Dong-Cheol Seo ,  Hyun-Sang Joo ,  Chang-Soo Lee

    发明人： Jung-Hoon Oh ,  Dong-Cheol Seo ,  Hyun-Sang Joo ,  Chang-Soo Lee

    IPC分类号： C07C309/17

    CPC分类号： C07C309/12 ,  C07C25/18 ,  C07C43/225 ,  C07C69/712 ,  C07C309/08 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/28 ,  C07C2602/42 ,  C07C2603/74 ,  C07C2603/86 ,  C07D333/46

    摘要： An acid generating agent used for chemically amplified resist compositions is provided, which agent is represented by the following formula (1): wherein X represents a monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and having at least one hydrogen atom on the ring substituted by an alkyl or alkoxy group which may be unsubstituted or substituted with a group selected from an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group and an aldehyde group, or by a perfluoroalkyl group, a hydroxyalkyl group, or a cyano group; R6 is an alkyl group, an alkoxy group, or a heteroatom selected from the group consisting of N, S and F; m is an integer from 0 to 2; and A+ is an organic counterion.

    摘要翻译： 提供了用于化学放大抗蚀剂组合物的酸产生剂，该试剂由下式（1）表示：其中X表示具有3至30个碳原子的单环或多环烃基，并且其上具有至少一个氢原子 可被未取代的或被选自醚基，酯基，羰基，缩醛基，环氧基，腈基和醛基中的基团取代的烷基或烷氧基取代的环，或由 全氟烷基，羟烷基或氰基; R6是烷基，烷氧基或选自N，S和F的杂原子; m为0〜2的整数; 而A +是一种有机的抗衡离子。

    Acid generating agent for chemically amplified resist compositions
    9.
    发明申请
    Acid generating agent for chemically amplified resist compositions 有权
    用于化学放大抗蚀剂组合物的酸产生剂

    公开(公告)号：US20090234155A1

    公开(公告)日：2009-09-17

    申请号：US12214429

    申请日：2008-06-19

    申请人： Jung-Hoon Oh ,  Dong-Cheol Seo ,  Hyun-Sang Joo ,  Chang-Soo Lee

    发明人： Jung-Hoon Oh ,  Dong-Cheol Seo ,  Hyun-Sang Joo ,  Chang-Soo Lee

    IPC分类号： C07C309/19 ,  C07C309/02 ,  C07C309/24

    CPC分类号： C07C309/12 ,  C07C25/18 ,  C07C43/225 ,  C07C69/712 ,  C07C309/08 ,  C07C381/12 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/28 ,  C07C2602/42 ,  C07C2603/74 ,  C07C2603/86 ,  C07D333/46

    摘要： An acid generating agent used for chemically amplified resist compositions is provided, which agent is represented by the following formula (1): wherein X represents a monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, and having at least one hydrogen atom on the ring substituted by an alkyl or alkoxy group which and may be unsubstituted or substituted with a group selected from an ether group, an ester group, a carbonyl group, an acetal group, an epoxy group, a nitrile group and an aldehyde group, or by a perfluoroalkyl group, a hydroxyalkyl group, or a cyano group; R6 is an alkyl group, an alkoxy group, or a heteroatom selected from the group consisting of N, S and F; m is an integer from 0 to 2; and A+ is an organic counterion.

    摘要翻译： 提供了用于化学放大抗蚀剂组合物的酸产生剂，该试剂由下式（1）表示：其中X表示具有3至30个碳原子的单环或多环烃基，并且其上具有至少一个氢原子 可被未取代的或被选自醚基，酯基，羰基，缩醛基，环氧基，腈基和醛基中的基团取代的烷基或烷氧基取代的环，或由 全氟烷基，羟烷基或氰基; R6是烷基，烷氧基或选自N，S和F的杂原子; m为0〜2的整数; 而A +是一种有机的抗衡离子。