公开(公告)号：US08404960B2

公开(公告)日：2013-03-26

申请号：US10930590

申请日：2004-08-31

申请人： Zachary A. Prather ,  Steven E. Reder ,  Michael J. Berman

发明人： Zachary A. Prather ,  Steven E. Reder ,  Michael J. Berman

IPC分类号： H01L35/30 ,  H01L23/34

CPC分类号： H01L35/30 ,  H01L23/38 ,  H01L24/48 ,  H01L24/73 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/01019 ,  H01L2924/15153 ,  H01L2924/15165 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

摘要： A device and method wherein a thermo electric generator device is disposed between stacks of a multiple level device, or is provided on or under a die of a package and is conductively connected to the package. The thermo electric generator device is configured to generate a voltage by converting heat into electric power. The voltage which is generated by the thermo electric generator can be recycled back into the die itself, or to a higher-level unit in the system, even to a cooling fan.

摘要翻译： 一种装置和方法，其中热电发生器装置设置在多级装置的堆叠之间，或者设置在包装的管芯上或下方，并且导电地连接到包装。 热电发生器装置被配置为通过将热量转换成电力来产生电压。 由热电发生器产生的电压可以再循环回模具本身，或再循环回系统中的较高级别的单元，甚至可以再循环回冷却风扇。

公开(公告)号：US07314527B1

公开(公告)日：2008-01-01

申请号：US10012821

申请日：2001-12-10

申请人： Steven E. Reder ,  Preston E. Pillow

发明人： Steven E. Reder ,  Preston E. Pillow

IPC分类号： C23C16/40 ,  C23C16/448 ,  C23C16/453 ,  C23F1/00 ,  H01L21/306

CPC分类号： F23D14/22 ,  F23C2900/9901 ,  F23D14/32 ,  F23D91/02

摘要： A gas delivery system for delivering a gas to a reactor. The reactor has a reactor chamber, a gas inlet port, and a gas exhaust port. The gas delivery system included a torch chamber having an outer wall extending along a first axis. A torch injector extends into the torch chamber at a first end of the torch chamber. The torch injector includes at least one gas intake port for receiving at least one gas and a gas injector section for expelling the at least one gas into the torch chamber. A gas outlet section is disposed at a second end of the torch chamber. The gas outlet section includes a first tubing member disposed along a second axis and a gas outlet port connected to the first tubing member. The gas outlet port of the gas outlet section engages the gas inlet port of the reactor. The torch chamber, the torch injector, and the gas outlet section of the gas delivery system are formed into a unitized structure with no resealable connections between them.

摘要翻译： 用于将气体输送到反应器的气体输送系统。 反应器具有反应室，气体入口和排气口。 气体输送系统包括具有沿着第一轴线延伸的外壁的割炬室。 焊炬喷射器在割炬室的第一端延伸到割炬室内。 火炬喷射器包括用于接收至少一个气体的至少一个气体进入口和用于将至少一个气体排出到炬室中的气体喷射器部分。 气体出口部分设置在割炬室的第二端。 气体出口部分包括沿着第二轴线设置的第一管道部件和连接到第一管道部件的气体出口。 气体出口部分的气体出口接合反应器的气体入口。 气体输送系统的割炬室，火炬喷射器和气体出口部分形成为一体的结构，它们之间不具有可再密封的连接。

公开(公告)号：US06971944B2

公开(公告)日：2005-12-06

申请号：US10779966

申请日：2004-02-17

申请人： Michael J. Berman ,  Steven E. Reder ,  Bruce Whitefield

发明人： Michael J. Berman ,  Steven E. Reder ,  Bruce Whitefield

IPC分类号： B24B37/04 ,  B24B49/10 ,  B24B1/00

CPC分类号： B24B37/005 ,  B24B49/10

摘要： A method and control system for detecting harmonic oscillation in a chemical mechanical polishing process and reacting thereto, such as by taking steps to at least one of: 1) reduce or eliminate the harmonic oscillation; and 2) counter the noise which is associated with the harmonic oscillation. By reducing or eliminating harmonic oscillation, films with reduced structure strengths including low k dielectric films can be used. By countering the noise, the quality of the work environment is improved.

摘要翻译： 一种用于检测化学机械抛光工艺中的谐波振荡并与其反应的方法和控制系统，例如通过采取以下步骤中的至少一个步骤：1）减少或消除谐波振荡; 和2）对抗与谐波振荡相关的噪声。 通过减少或消除谐波振荡，可以使用包括低k电介质膜的具有降低的结构强度的膜。 通过对付噪声，提高了工作环境的质量。

公开(公告)号：US06739953B1

公开(公告)日：2004-05-25

申请号：US10410925

申请日：2003-04-09

申请人： Michael J. Berman ,  Steven E. Reder

发明人： Michael J. Berman ,  Steven E. Reder

IPC分类号： B24B100

CPC分类号： B24B37/046 ,  B24B37/042 ,  B24B49/16 ,  H01L21/32125 ,  Y10S451/908

摘要： According to one embodiment, a method of planarizing of a surface of a semiconductor substrate is provided. A copper layer is inlaid in a dielectric layer of the substrate. The semiconductor substrate is disposed opposite to a polishing pad and relative movement provided between the pad and the substrate. An electrolytic slurry containing abrasive particles is flowed over the substrate or the pad. A voltage is applied between the polishing pad and the substrate to perform electropolishing of the substrate. The rate of chemical mechanical polishing is controlled by the down force applied to a polishing head urging the substrate against the polishing pad.

摘要翻译： 根据一个实施例，提供了半导体衬底的表面的平面化方法。 在衬底的电介质层中镶嵌铜层。 半导体衬底与抛光垫相对设置并且设置在衬垫和衬底之间的相对运动。 含有磨粒的电解浆液流过衬底或衬垫。 在抛光垫和基板之间施加电压以进行基板的电解抛光。 化学机械抛光的速度通过施加到抛光头的向下的力来控制，抛光头将衬底推向抛光垫。

公开(公告)号：US06328347B1

公开(公告)日：2001-12-11

申请号：US09400767

申请日：1999-09-22

申请人： Steven E. Reder ,  Preston E. Pillow ,  William L. Emery

发明人： Steven E. Reder ,  Preston E. Pillow ,  William L. Emery

IPC分类号： F16L2704

CPC分类号： F16L27/04 ,  Y10S285/911

摘要： A system for coupling a ball fitting connected to a first tubing to a socket fitting connected to a second tubing. A first coupling forms an aperture having a diameter that is larger than the diameter of the ball fitting, and receives the ball fitting. The first coupling forms an annular race, with an annular surface disposed between the annular race and the aperture. First split ring pieces are assembled into a first ring that forms an aperture having a diameter that is smaller than the diameter of the ball fitting, and receives the first tubing. The first ring forms an annular ridge that engages the annular race, and aligns the first split ring pieces. The annular surface applies uniform axial pressure to a first surface of the first ring. The first ring has a second surface opposing the first surface that applies uniform axial pressure to a back portion of the ball fitting. A second coupling forms an aperture having a diameter that is larger than the diameter of the socket fitting, and receives the socket fitting. The second coupling forms an annular race, with an annular surface disposed between the annular race and the aperture. Second split ring pieces are assembled into a second ring that forms an aperture having a diameter that is smaller than the diameter of the socket fitting, and receives the second tubing. The second ring forms an annular ridge that engages the annular race, and aligns the second split ring pieces. The annular surface applies uniform axial pressure to a first surface of the second ring. The second ring has a second surface opposing the first surface that applies uniform axial pressure to a back portion of the socket fitting. Engagement means reversibly draw the first coupling and the second coupling toward each other, and releasably hold them together with uniform axial pressure.

摘要翻译： 用于将连接到第一管道的球配件连接到连接到第二管道的插座配件的系统。 第一联接器形成直径大于球配件的直径的孔，并接收球配件。 第一联接器形成环形座圈，环形表面设置在环形座圈和孔之间。 第一分割环件组装成形成直径小于球配件直径的孔的第一环，并且接收第一管。 第一环形成与环形圈接合的环形脊，并对准第一开口环件。 环形表面对第一环的第一表面施加均匀的轴向压力。 第一环具有与第一表面相对的第二表面，其对球配件的后部施加均匀的轴向压力。 第二联接器形成直径大于插座接头的直径的孔，并接收插座接头。 第二联接器形成环形圈，环形表面设置在环形座圈和孔之间。 第二分割环件组装成形成直径小于插座配件的直径的孔的第二环，并接收第二管。 第二环形成与环形圈接合的环形脊，并对准第二分割环件。 环形表面对第二环的第一表面施加均匀的轴向压力。 第二环具有与第一表面相对的第二表面，其对插座配件的后部施加均匀的轴向压力。 接合装置可逆地将第一联接件和第二联接件朝向彼此拉动，并且以均匀的轴向压力可释放地将它们保持在一起。

公开(公告)号：US06927177B2

公开(公告)日：2005-08-09

申请号：US10693110

申请日：2003-10-24

申请人： Steven E. Reder ,  Michael J. Berman

发明人： Steven E. Reder ,  Michael J. Berman

IPC分类号： B24B37/04 ,  C25F3/02 ,  H01L21/31 ,  H01L21/469

CPC分类号： C25F3/02 ,  B24B37/042 ,  H01L21/32125 ,  Y10S438/907

摘要： A system for thinning a layer on a substrate without damaging a delicate underlying layer in the substrate. The system includes means for mechanically eroding the layer on the substrate, and means for electropolishing the layer on the substrate. In this manner, portions of the layer that cannot be removed by electropolishing can be removed by the mechanical erosion. However, electropolishing can preferentially be used on some portions of the layer so that unnecessary mechanical stresses can be avoided. Thus, the system imparts less mechanical stress to the substrate during the removal of the layer, and the delicate underlying layer receives less damage during the process, and preferably no damage whatsoever.

摘要翻译： 一种用于在衬底上稀薄层而不损坏衬底中精细的下层的系统。 该系统包括用于机械腐蚀衬底上的层的装置，以及用于电镀抛光衬底上的层的装置。 以这种方式，通过电解抛光不能除去的层的部分可以通过机械侵蚀去除。 然而，电解抛光可优先用于层的某些部分，从而可以避免不必要的机械应力。 因此，在去除层期间，该系统对基板施加较少的机械应力，并且精细的下层在该过程期间受到较少的损伤，并且优选地不受任何损害。

公开(公告)号：US06649537B1

公开(公告)日：2003-11-18

申请号：US10044215

申请日：2001-11-19

申请人： Steven E. Reder ,  Hemanshu D. Bhatt

发明人： Steven E. Reder ,  Hemanshu D. Bhatt

IPC分类号： H07L2131

CPC分类号： H01L21/0214 ,  H01L21/02238 ,  H01L21/02255 ,  H01L21/02332 ,  H01L21/02337 ,  H01L21/31662 ,  Y10S438/913

摘要： The present invention provides a method of forming a dielectric on a semiconductor substrate. A dielectric is grown at a substrate interface in a plurality of increments. Stress is relieved at the dielectric substrate interface between each increment. In another aspect, stress relief is performed by annealing the substrate. The annealing is performed by placing the substrate in an inert environment and by raising the temperature surrounding the substrate.

摘要翻译： 本发明提供一种在半导体衬底上形成电介质的方法。 电介质以多个增量在衬底界面处生长。 在每个增量之间的电介质基板界面处，应力消除。 另一方面，通过对衬底进行退火来进行应力释放。 通过将衬底放置在惰性环境中并通过提高衬底周围的温度来进行退火。

公开(公告)号：US06982206B1

公开(公告)日：2006-01-03

申请号：US10679004

申请日：2003-10-02

申请人： Michael J. Berman ,  Steven E. Reder ,  Hemanshu Bhatt

发明人： Michael J. Berman ,  Steven E. Reder ,  Hemanshu Bhatt

IPC分类号： H01L21/76

CPC分类号： H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

摘要： According to one embodiment, a method of forming a low-k dielectric composite film is provided. A low-k interconnect dielectric layer is strengthened by forming whiskers in the low-k film. The whiskers are formed simultaneously with the low-k layer. In one embodiment, the low-k structure is removed by heating a volatile matrix film, leaving a whisker residue.

摘要翻译： 根据一个实施例，提供了形成低k电介质复合膜的方法。 通过在低k膜中形成晶须来增强低k互连电介质层。 晶须与低k层同时形成。 在一个实施方案中，通过加热挥发性基质膜除去低k结构，留下晶须残留物。

公开(公告)号：US06574525B1

公开(公告)日：2003-06-03

申请号：US10105483

申请日：2002-03-25

申请人： Steven E. Reder ,  Hemanshu D. Bhatt

发明人： Steven E. Reder ,  Hemanshu D. Bhatt

IPC分类号： G06F1900

CPC分类号： H01L21/67253

摘要： A reaction chamber of the type used to create a reaction at a surface of a substrate disposed within the reaction chamber. A transmitter produces a transmitted beam having first characteristics, where the transmitter is disposed outside of the reaction chamber. A view port is disposed in a boundary wall of the reaction chamber, where the view port is formed of a material that is transparent at least in part to the transmitted beam. The transmitter, the view port, and the substrate are aligned such that the transmitted beam is directable to and reflected at least in part from the surface of the substrate, thereby producing a reflected beam having second characteristics. A receiver is disposed outside of the reaction chamber, and the receiver receives the reflected beam from the surface of the substrate through the view port. The receiver also senses the second characteristics of the reflected beam and reports the second characteristics. A controller receives the second characteristics from the receiver and compares the second characteristics to the first characteristics to determine a difference between the first characteristics and the second characteristics. The difference relates to a progress of the reaction at the surface of the substrate. The controller also reports the progress of the reaction. A view port shield shields the view port from the reaction without substantially inhibiting the transmitted beam from reaching the surface of the substrate and the reflected beam from reaching the receiver. The transmitted beam is produced by the transmitter and the reflected beam is received and sensed by the receiver and the controller determines the progress of the reaction while the reaction is conducted.

摘要翻译： 用于在设置在反应室内的基板的表面产生反应的类型的反应室。 发射器产生具有第一特性的透射光束，其中发射器设置在反应室外。 视图端口设置在反应室的边界壁中，其中视口由至少部分透射的透射束的材料形成。 发射器，视图端口和基板被对准，使得透射光束可以被定向至少部分地从衬底的表面反射，从而产生具有第二特性的反射光束。 接收器设置在反应室的外部，并且接收器通过视口从基板的表面接收反射光束。 接收器还感测反射光束的第二特性并报告第二特性。 控制器从接收器接收第二特性，并将第二特性与第一特性进行比较，以确定第一特性和第二特性之间的差异。 该差异涉及在基材表面的反应进展。 控制人还报告反应的进展。 视口端口屏蔽将视口从反应屏蔽，基本上不阻止透射光束到达衬底的表面，并且反射光束到达接收器。 发射光束由发射器产生，反射光束由接收器接收和感测，控制器在反应进行时确定反应进程。

公开(公告)号：US5146869A

公开(公告)日：1992-09-15

申请号：US535811

申请日：1990-06-11

申请人： Kenneth W. Bohannon ,  Kuppuswamy Srikrishna ,  Anthony F. Sholing ,  Steven E. Reder

发明人： Kenneth W. Bohannon ,  Kuppuswamy Srikrishna ,  Anthony F. Sholing ,  Steven E. Reder

IPC分类号： C23C16/44 ,  C23C16/455

CPC分类号： C23C16/45512 ,  C23C16/455 ,  Y10S156/912

摘要： A gas injector apparatus and process, having a gas injector tube ending at the top of a vertical reaction chamber, improves the thickness and resistivity uniformity of films deposited in CVD process reactors. The injection tube has a plurality of baffles to increase the residence time of reactant gases flowing toward the reaction chamber.

摘要翻译： 具有终止于垂直反应室顶部的气体注入管的气体注入装置和方法改善了沉积在CVD工艺反应器中的薄膜的厚度和电阻率均匀性。 注射管具有多个挡板，以增加朝向反应室流动的反应气体的停留时间。