公开(公告)号：US4382182A

公开(公告)日：1983-05-03

申请号：US266290

申请日：1981-05-22

Applicant: Takashi Matsuzaka ,  Hideo Todokoro

Inventor： Takashi Matsuzaka ,  Hideo Todokoro

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28

CPC classification number: H01J37/28

Abstract: A method of and apparatus for displaying an image of phase contrast in a scanning transmission electron microscope, in which an electron beam flux transmitted through a specimen is deflected with a high frequency and repeatedly moved on an aperture provided in a region where a transmitted electron beam and a scattered electron beam interfere, and among signal components detected by a detector through the aperture, only a signal synchronous with the high frequency is sampled and detection-rectified, whereby the difference of the intensities of the region where both the electron beams interfere is detected so as to display the image of phase contrast of the specimen.

Abstract translation: 一种用于在扫描透射电子显微镜中显示相位对比度的图像的方法和装置，其中透射通过样本的电子束通量以高频率偏转并在设置在透射电子束的区域中的孔上重复移动 并且散射电子束干扰，并且在通过孔径由检测器检测的信号分量中，仅对与高频同步的信号进行采样和检测整流，由此两个电子束干涉的区域的强度差为 以便显示样本的相位对比度的图像。

公开(公告)号：US4897628A

公开(公告)日：1990-01-30

申请号：US116986

申请日：1987-11-05

Applicant: Masamichi Ippommatsu ,  Takeshi Matsumoto ,  Shingo Yakushizi ,  Katsuyuki Kuroki ,  Takashi Matsuzaka

Inventor： Masamichi Ippommatsu ,  Takeshi Matsumoto ,  Shingo Yakushizi ,  Katsuyuki Kuroki ,  Takashi Matsuzaka

IPC: G01N27/12

CPC classification number: G01N27/12

Abstract: A gas sensor using an n-type metal oxide semiconductor and a method for manufacturing such a gas sensor is provided. More particularly, a gas sensor for detecting an inflammable gas and a method for manufacturing the same.

Abstract translation: 提供了使用n型金属氧化物半导体的气体传感器和制造这种气体传感器的方法。 更具体地，涉及一种用于检测易燃气体的气体传感器及其制造方法。

公开(公告)号：US4701620A

公开(公告)日：1987-10-20

申请号：US893180

申请日：1986-08-05

Applicant: Masahide Okumura ,  Takashi Matsuzaka ,  Genya Matsuoka ,  Norio Saitou

Inventor： Masahide Okumura ,  Takashi Matsuzaka ,  Genya Matsuoka ,  Norio Saitou

IPC: H01L21/30 ,  H01J37/141 ,  H01J37/153 ,  H01J37/21 ,  H01J37/304 ,  H01L21/027 ,  G21K1/093 ,  H01J37/07

CPC classification number: H01J37/153 ,  H01J37/304

Abstract: Disclosed is an electron beam exposure apparatus which includes an objective lens focusing an electron beam, and a dynamic focus correction lens dynamically correcting the focusing by the objective lens. The apparatus comprises a control circuit which, in order to prevent a current variation induced in the objective lens by the dynamic focus correction lens, controls current supplied to the objective lens so as to cancel the current variation induced in the objective lens due to the coil current of the dynamic focus correction lens.

Abstract translation: 公开了一种电子束曝光装置，其包括聚焦电子束的物镜和动态校正透镜，动态校正物镜的聚焦。 该装置包括一个控制电路，为了防止物镜由动态聚焦校正透镜引起的电流变化，控制提供给物镜的电流，以消除由于线圈而引起的物镜中的电流变化 电流的动态聚焦校正镜头。

公开(公告)号：US4687435A

公开(公告)日：1987-08-18

申请号：US717882

申请日：1985-03-29

Applicant: Takashi Matsuzaka ,  Toshihiko Saito ,  Satoshi Hisaoka

Inventor： Takashi Matsuzaka ,  Toshihiko Saito ,  Satoshi Hisaoka

IPC: F23C15/00 ,  F23C11/04

CPC classification number: F23C15/00 ,  Y10T137/7861

Abstract: A pulse combustor has a casing in which a combustion chamber is defined. Air is supplied to the combustion chamber through an air supply pipe. A valve mechanism for controlling the air supply to the chamber is provided in the air supply pipe. The valve mechanism has a base plate with a plurality of air supply holes for the passage of air, and a flapper valve for opening and closing the air supply holes in accordance with the change of pressure inside the chamber. The flapper valve is composed of a plurality of ring-shaped segments with different diameters. These segments are arranged concentrically with one another.

Abstract translation: 脉冲燃烧器具有限定燃烧室的壳体。 空气通过供气管道供应到燃烧室。 用于控制向腔室供气的阀机构设置在供气管中。 阀机构具有基板，其具有用于空气通过的多个供气孔，以及根据室内的压力变化来打开和关闭空气供给孔的挡板阀。 挡板阀由具有不同直径的多个环形段组成。 这些片段彼此同心地排列。

公开(公告)号：US4896514A

公开(公告)日：1990-01-30

申请号：US264875

申请日：1988-10-31

Applicant: Akihiko Sugiyama ,  Takashi Matsuzaka

Inventor： Akihiko Sugiyama ,  Takashi Matsuzaka

IPC: B01D53/047 ,  F24F1/00 ,  F24F3/16

CPC classification number: B01D53/047 ,  F24F1/0003 ,  F24F3/16 ,  B01D2253/108 ,  B01D2256/12 ,  B01D2257/102 ,  B01D2259/40003 ,  B01D2259/402 ,  F24F2003/1692

Abstract: An air-conditioning apparatus includes an air-conditioner and an oxygen ratio increasing device. The air-conditioner has an indoor unit having an indoor heat exchanger and arranged in a room to be air-conditioned, and an outdoor unit having an outdoor heat exchanger and arranged outdoors. These units are connected to each other through a coolant pipe. The increasing device has an oxygen ratio increasing mechanism for producing oxygen-ratio increased air having a high oxygen concentration, and an air supply pipe for supplying the produced oxygen-ratio increased air into the room. The mechanism is arranged in the outdoor unit, and includes an adsorbing material for adsorbing nitrogen in air to produce the oxygen-ratio increased air and an air compressor for supplying air to the air supply pipe through the adsorbing material.

Abstract translation: 空调装置包括空调和氧比增加装置。 空调机具有室内单元，其具有室内热交换器，并配置在要进行空调的房间中，室外单元具有室外热交换器并配置在室外。 这些单元通过冷却剂管彼此连接。 增加装置具有用于产生具有高氧浓度的氧比增加空气的氧比率增加机构，以及用于将产生的氧比率增加的空气供应到房间中的供气管。 该机构设置在室外机中，具有吸附空气中的氮吸附以产生增氧空气的吸附材料和通过吸附材料向空气供给管供给空气的空气压缩机。

公开(公告)号：US4642046A

公开(公告)日：1987-02-10

申请号：US643384

申请日：1984-08-23

Applicant: Kazuo Saito ,  Takashi Matsuzaka ,  Mitsuyoshi Chiba ,  Shigeto Sumitani ,  Masami Yodo ,  Hiroyuki Araya

Inventor： Kazuo Saito ,  Takashi Matsuzaka ,  Mitsuyoshi Chiba ,  Shigeto Sumitani ,  Masami Yodo ,  Hiroyuki Araya

IPC: F02K7/02 ,  F23C15/00 ,  F23R7/00 ,  F23D14/62 ,  F23C11/04

CPC classification number: F23C15/00 ,  F02K7/02 ,  F23R7/00

Abstract: A pulse combustor has a main body in which a cylindrical mixing chamber and a combustion chamber are formed. An air inlet port and a fuel inlet port are formed in the body to open into the mixing chamber. These inlet ports are located on the same circumference of the inner periphery of the mixing chamber and spaced from each other. An air supply pipe for introducing air into the mixing chamber is connected at one end to the air inlet port, and a fuel supply pipe for introducing fuel gas into the mixing chamber is connected at one end to the fuel inlet port. The air supply pipe extends in a predetermined direction so as to cause the air introduced into the mixing chamber to flow while rotating in one direction along the inner periphery of the mixing chamber. The fuel supply pipe extends in a predetermined direction to cause the fuel to be introduced into the mixing chamber along a direction opposite the direction in which the air rotates.

Abstract translation: 脉冲燃烧器具有形成圆柱形混合室和燃烧室的主体。 空气入口和燃料入口形成在主体中以进入混合室。 这些入口位于混合室的内周边的相同圆周上并且彼此间隔开。 用于将空气引入混合室的供气管的一端连接到进气口，并且用于将燃料气体引入混合室的燃料供给管的一端连接到燃料入口。 空气供给管沿预定方向延伸，以便沿着混合室的内周沿一个方向旋转，引入到混合室中的空气流动。 燃料供给管沿预定方向延伸，以使燃料沿与空气旋转方向相反的方向被引入混合室。

公开(公告)号：US4442682A

公开(公告)日：1984-04-17

申请号：US421773

申请日：1982-09-23

Applicant: Hirotsugu Sakata ,  Shigemi Nagatomo ,  Takashi Matsuzaka

Inventor： Hirotsugu Sakata ,  Shigemi Nagatomo ,  Takashi Matsuzaka

IPC: F01K25/10 ,  F01D1/06 ,  F25B11/00 ,  F25B11/02 ,  F25D9/00

CPC classification number: F25B11/02 ,  F25B2400/13 ,  F25B2400/141 ,  F25B2400/23

Abstract: A turbine for use in refrigeration cycle comprising a closed casing, a turbine runner housed in said casing, an injection nozzle through which refrigerating medium having at least one of pressure-based and knetic energies is blown to rotate the turbine runner, a liquid refrigerating medium receiving section arranged at the lower end of said casing to collect liquid refrigerating medium, and a refrigerating medium discharging outlet through which refrigerating medium is fed to an evaporator arranged in a refrigeration cycle.

Abstract translation: 一种用于制冷循环的涡轮机，包括封闭的壳体，容纳在所述壳体中的涡轮机转子，喷射喷嘴，通过该喷嘴吹送具有压力和能量的至少一种的冷冻介质以使涡轮机转动，液体冷冻介质 接收部，其布置在所述壳体的下端以收集液体冷冻介质;以及冷藏介质排出口，冷藏介质通过该排出口被供给到布置在制冷循环中的蒸发器。

公开(公告)号：US4414139A

公开(公告)日：1983-11-08

申请号：US428269

申请日：1982-09-29

Applicant: Takashi Matsuzaka ,  Toshio Ohtsuki ,  Minoru Komori ,  Tsutomu Sakuma

Inventor： Takashi Matsuzaka ,  Toshio Ohtsuki ,  Minoru Komori ,  Tsutomu Sakuma

IPC: B01D53/94 ,  B01D53/86 ,  B01J21/16 ,  B01J23/40 ,  B01J23/58

CPC classification number: B01J23/58 ,  B01D53/864 ,  B01D53/865

Abstract: Disclosed are a catalyst carrier for purification of waste gas which comprises a carrier comprising a calcined clay material composed of 1 to 5% by weight of lithium oxide (Li.sub.2 O), not less than 20% by weight of aluminum oxide (Al.sub.2 O.sub.3) and not less than 60% by weight of silicon dioxide (SiO.sub.2), the total thereof being substantially 100; an aluminum oxide supported on the surface of the said clay material; and a platinum group element having further supported on said aluminum oxide; and a process for preparing the same.

Abstract translation: 公开了一种用于净化废气的催化剂载体，其包括载体，其包含由1-5重量％的氧化锂（Li 2 O）组成的煅烧粘土材料，不小于20重量％的氧化铝（Al 2 O 3），并且不少于 超过60重量％的二氧化硅（SiO 2），其总量基本上为100; 负载在所述粘土材料的表面上的氧化铝; 以及进一步负载在所述氧化铝上的铂族元素; 及其制备方法。

公开(公告)号：US06511048B1

公开(公告)日：2003-01-28

申请号：US09191383

申请日：1998-11-13

Applicant: Yasunari Sohda ,  Yasuhiro Someda ,  Hiroya Ohta ,  Takashi Matsuzaka ,  Norio Saitou ,  Yoshinori Nakayama

Inventor： Yasunari Sohda ,  Yasuhiro Someda ,  Hiroya Ohta ,  Takashi Matsuzaka ,  Norio Saitou ,  Yoshinori Nakayama

IPC: H01J3730

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31776

Abstract: An electron beam lithography apparatus and a semiconductor device pattern forming method for precisely writing patterns near the periphery of a cell mask so that large scale integrated circuits and fine structure devices are fabricated at high yield rates. Cell figures with lower aperture rates are located peripherally and cell figures with higher aperture rates are located closer to a central portion within each of aperture groups furnished on a second mask of the inventive apparatus adopting cell projection. Illustratively, on a mask for use in semiconductor device fabrication, cell figures for forming line patterns and gate patterns are located centrally and cell figures for forming hole patterns are positioned peripherally in each aperture group. This allows the peripherally located figures to be written precisely in each aperture group.

Abstract translation: 一种电子束光刻设备和用于在单元掩模的周围精确地写入图案的半导体器件图案形成方法，从而以高产率制造大规模集成电路和精细结构器件。 具有较低孔径率的单元图形位于外围，并且具有较高孔径率的单元图形位于更接近于采用单元投影的本发明设备的第二掩模上提供的每个孔组内的中心部分。 示例性地，在用于半导体器件制造的掩模上，用于形成线图案和栅极图案的单元图形位于中央，并且用于形成孔图案的单元图形周边地定位在每个孔组中。 这允许在每个孔径组中精确地写入外围定位的图形。

公开(公告)号：US06225011B1

公开(公告)日：2001-05-01

申请号：US09294428

申请日：1999-04-20

Applicant: Yasuko Gotoh ,  Norio Hasegawa ,  Naoko Asai ,  Katsuya Hayano ,  Takashi Matsuzaka ,  Katsuhiro Kawasaki

Inventor： Yasuko Gotoh ,  Norio Hasegawa ,  Naoko Asai ,  Katsuya Hayano ,  Takashi Matsuzaka ,  Katsuhiro Kawasaki

IPC: G03F900

CPC classification number: G03F7/7045 ,  H01J37/3045 ,  H01J2237/3175 ,  Y10S430/143

Abstract: A pattern can be written in accordance with a distortion which changes depending upon exposure conditions of the optical exposure system and exposed pattern features, and a pattern can be written with a high alignment accuracy by the optical exposure system and an electron beam lithography system or two optical exposure systems. A pattern which is exposed by optical exposure system divided into very small areas shown by broken lines, and pattern feature amounts (fx), (fy) at each area are calculated. A correction amount is obtained by using the pattern feature amount and the position within an exposure field as parameters based on exposure distortion examined by a standard pattern predeterminedly.

Abstract translation: 可以根据根据光学曝光系统的曝光条件和曝光图案特征而变化的失真来写入图案，并且可以通过光学曝光系统和电子束光刻系统或两个方式以高对准精度写入图案 光学曝光系统 计算出被分为由虚线示出的非常小的区域的光学曝光系统曝光的图案，以及每个区域的图案特征量（fx），（fy）。 通过使用图案特征量和曝光区域内的位置作为基于通过标准图案检查的曝光失真的参数来获得校正量。