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    Fluid supply device and fluid supply method
    3.
    发明授权
    Fluid supply device and fluid supply method 有权

    公开(公告)号：US11569101B2

    公开(公告)日：2023-01-31

    申请号：US16634681

    申请日：2018-07-31

    Applicant: FUJIKIN INCORPORATED ,  TOKYO ELECTRON LTD.

    Inventor： Toshihide Yoshida ,  Yukio Minami ,  Tsutomu Shinohara

    IPC: H01L21/67 ,  H01L21/02

    Abstract: A fluid supply device and a fluid supply method capable of stably supplying a supercritical fluid includes a fluid supply device for supplying a fluid in a liquid state before being changed to a supercritical fluid toward a processing chamber. The fluid supply device comprises a condenser that condenses and liquefies a fluid in a gas state, a tank that stores the fluid condensed and liquefied by the condenser, a pump that pressure-feeds the liquefied fluid stored in the tank toward the processing chamber, and a heating means provided to a flow path communicating with a discharge side of the pump and for partially changing the liquid in the flow path to a supercritical fluid.

    DEVICE AND METHOD FOR SUPPLYING GAS WHILE DIVIDING TO CHAMBER FROM GAS SUPPLYING FACILITY EQUIPPED WITH FLOW CONTROLLER
    4.
    发明申请
    DEVICE AND METHOD FOR SUPPLYING GAS WHILE DIVIDING TO CHAMBER FROM GAS SUPPLYING FACILITY EQUIPPED WITH FLOW CONTROLLER 有权
    从配有流量控制器的气体供应设备分配到室内的气体供应装置和方法

    公开(公告)号：US20130340837A1

    公开(公告)日：2013-12-26

    申请号：US13927786

    申请日：2013-06-26

    Applicant: Tokyo Electron Ltd. ,  Fujikin Incorporated

    Inventor： Kazuhiko Sugiyama ,  Nobukazu Ikeda ,  Kouji Nishino ,  Ryousuke Dohi ,  Toyomi Uenoyama

    IPC: G05D7/00

    CPC classification number: G05D7/00 ,  G05D7/0623 ,  G05D7/0652 ,  G05D7/0658 ,  G05D7/0664 ,  G05D11/132 ,  Y10T137/0379 ,  Y10T137/0396 ,  Y10T137/2521 ,  Y10T137/2529 ,  Y10T137/2562 ,  Y10T137/263 ,  Y10T137/2663 ,  Y10T137/7761 ,  Y10T137/8175

    Abstract: The invention supplies a quantity Q of gas while dividing at flow rate ratio Q1/Q2 from a gas supply facility equipped with a flow controller. A total quantity Q=Q1+Q2 of gas is supplied into a chamber at flow rate Q1 and Q2 through shower plates fixed to ends of branch supply lines by providing open/close valves with a plurality of branch supply lines GL1 and GL2, respectively, to supply the specified quantity of gas from the gas supply facility, and by utilizing bypass line BL1 on the downstream side of the open/close valve OV1 and branched from GL1, bypass line BL2 on the downstream side of the open/close valve OV2 and branched from GL2, pressure type division quantity controller connected to the bypass line BL1 and the bypass line BL2, a sensor measuring pressure inside branch supply line GL1, and another sensor measuring pressure inside branch supply line GL2.

    Abstract translation: 本发明提供一种气体量Q，同时以具有流量控制器的气体供给设备的流量比Q1 / Q2分压。 通过分别提供具有多个分支供应线GL1和GL2的开闭阀将气体的总量Q = Q1 + Q2以流量Q1和Q2供给到固定到分支供应管线的端部的喷淋板， 从气体供给装置供给规定量的气体，通过在开/关阀OV1的下游侧利用旁路管线BL1，从开关阀OV2的下游侧的GL1分支的旁通管线BL2， 从GL2分支，连接到旁路线BL1和旁路线BL2的压力分型量控制器，测量分支供给线GL1内的压力的传感器和测量分支供给线GL2内的压力的另一传感器。

    Coating and developing method
    6.
    发明授权
    Coating and developing method 失效
    涂层和显影方法

    公开(公告)号：US6444409B2

    公开(公告)日：2002-09-03

    申请号：US87502201

    申请日：2001-06-07

    Applicant: TOKYO ELECTRON LTD

    Inventor： ARAKI SHINICHIRO ,  MATSUMOTO SHINKO ,  ANAI NORIYUKI

    IPC: H01L21/027 ,  B05C11/08 ,  G02B5/20 ,  G03F7/00 ,  G03F7/16 ,  G03F7/30 ,  H01L21/00 ,  G02F1/1335 ,  G03F7/20 ,  G03F7/26

    CPC classification number: H01L21/6715 ,  B05C11/08 ,  G02B5/201 ,  G03F7/0007 ,  G03F7/162 ,  G03F7/3021 ,  Y10S430/136

    Abstract: A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.

    Abstract translation: 一种涂覆和显影装置，用于用多种着色剂涂覆基材并在曝光后将其显影，包括：用于洗涤基材的洗涤单元; 涂覆单元，具有多个抗蚀剂排出喷嘴，用于分别在洗涤的基板上排出多个着色抗蚀剂; 以及显影单元，用于在曝光之后显影涂有彩色抗蚀剂的基材。 因此，可以实现装置的尺寸的减小和空间的节省，并且还可以降低制造成本。

    Probing method
    10.
    发明申请
    Probing method 失效
    探测方法

    公开(公告)号：US20030025495A1

    公开(公告)日：2003-02-06

    申请号：US10259605

    申请日：2002-09-30

    Applicant: TOKYO ELECTRON LTD.

    Inventor： Shinji Ilno ,  Haruhiko Yoshioka

    IPC: G01R001/00

    CPC classification number: G01R31/2887 ,  G01R31/2886

    Abstract: A prober of this invention includes a probe card, a main chuck, a shaft member fixed on and extending downwardly from the main chuck, an X table and Y table for retaining the shaft member by use of a guide to be freely movable in a vertical direction, and a contact body fixed on the shaft member. The undersurface of the contact body is made parallel to the mounting surface of the main chuck. The prober further includes an elevation body whose center coincides with an extension line downwardly extending from the test center of the probe card, and an elevation body elevating mechanism for vertically moving the elevation body and a ball provided on the upper portion of the elevation body is slidably set in contact with the undersurface of the contact body.

    Abstract translation: 本发明的探测器包括探针卡，主卡盘，固定在主卡盘上并从主卡盘向下延伸的轴构件，X台和Y台，用于通过引导件将轴构件保持在垂直方向上可自由移动 方向和固定在轴构件上的接触体。 接触体的下表面与主卡盘的安装面平行。 探测器还包括一个仰角体，其中心与从探针卡的测试中心向下延伸的延伸线重合，并且用于垂直移动仰角体的升降体升降机构和设置在仰角上部的球体 可滑动地设置成与接触体的下表面接触。

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