Multi-axis magnetic lens for focusing a plurality of charged particle beams
    1.
    发明授权
    Multi-axis magnetic lens for focusing a plurality of charged particle beams 有权
    用于聚焦多个带电粒子束的多轴磁性透镜

    公开(公告)号:US09000394B2

    公开(公告)日:2015-04-07

    申请号:US13464261

    申请日:2012-05-04

    IPC分类号: H01J37/14

    摘要: The present invention provides two ways to form a special permeability-discontinuity unit inside every sub-lens of a multi-axis magnetic lens, which either has a simpler configuration or has more flexibility in manufacturing such as material selection and mechanical structure. Accordingly several types of multi-axis magnetic lens are proposed for various applications. One type is for general application such as a multi-axis magnetic condenser lens or a multi-axis magnetic transfer lens, another type is a multi-axis magnetic non-immersion objective which can require a lower magnetomotive force, and one more type is a multi-axis magnetic immersion objective lens which can generate smaller aberrations. Due to using permeability-discontinuity units, every multi-axis magnetic lens in this invention can also be electrically excited to function as a multi-axis electromagnetic compound lens so as to further reduce aberrations thereof and/or realize electron beam retarding for low-voltage irradiation on specimen.

    摘要翻译: 本发明提供了在多轴磁性透镜的每个子透镜内部形成特殊的渗透率不连续单元的两种方式,其具有更简单的构造或者在诸如材料选择和机械结构的制造中具有更大的灵活性。 因此,针对各种应用提出了几种类型的多轴磁性透镜。 一种用于一般应用,例如多轴磁聚焦透镜或多轴磁转移透镜,另一种类型是可以要求较低磁动势的多轴磁性非浸没物镜,另一种类型是 可以产生较小像差的多轴磁浸物镜。 由于使用导磁率不连续单位,本发明中的每个多轴磁性透镜也可以被电激励以用作多轴电磁复合透镜,以便进一步降低其像差和/或实现低电压的电子束延迟 对样品照射

    Monochromator for charged particle beam apparatus
    2.
    发明授权
    Monochromator for charged particle beam apparatus 有权
    带电粒子束装置的单色器

    公开(公告)号:US08274046B1

    公开(公告)日:2012-09-25

    申请号:US13111851

    申请日:2011-05-19

    IPC分类号: G21K1/08 H01J37/21 H01J37/20

    摘要: This invention provides a monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus, which comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a double symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually cannot be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. Therefore, using the monochromator in SEM can reduce chromatic aberrations without additionally incurring adverse impacts, so as to improve the ultimate imaging resolution. The improvement of the ultimate imaging resolution will be more distinct for Low-Voltage SEM and the related apparatuses which are based on LVSEM principle, such as the defect inspection and defect review in semiconductor yield management. The present invention also provides two ways to build a monochromator into a SEM, one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.

    摘要翻译: 本发明提供一种用于减少带电粒子装置中的初级带电粒子束的能量扩散的单色仪,其包括光束调节元件,两个维恩滤波器型色散单元和能量限制孔径。 在单色仪中,形成沿着直线光轴的偏转色散和基本轨迹的双重对称性,其不仅从根本上避免了实际上不能被补偿的偏轴像差,而且还确保出射光束具有虚拟的虚拟交叉, 无色分离和单色仪内部。 因此,在SEM中使用单色仪可以减少色差,而不会产生不利影响,从而提高最终的成像分辨率。 对于低电压SEM和基于LVSEM原理的相关设备,如半导体产量管理中的缺陷检查和缺陷检查,最终成像分辨率的提高将会更加明显。 本发明还提供了在扫描电镜中构建单色仪的两种方法,一种是在电子源和电容器之间定位单色仪,另一种是在光束极限孔径和物镜之间定位单色仪。 前者提供额外的能量角取决于滤波,并获得较小的有效能量扩展。

    PARTICLE DETECTION SYSTEM
    3.
    发明申请
    PARTICLE DETECTION SYSTEM 有权
    颗粒检测系统

    公开(公告)号:US20120145898A1

    公开(公告)日:2012-06-14

    申请号:US12968229

    申请日:2010-12-14

    IPC分类号: G21K7/00 H01J3/14

    摘要: This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level. A condenser lens is configured to increase bandwidth of the detector that scan speed can be enhanced.

    摘要翻译: 本发明提供了利用单个检测器处理低噪声的大范围检测光束电流的设计。 通过这样的设计,检测系统可以以超过小于安培(mA)的电平产生多达1010个增益和最大信号输出。 配置聚光透镜以增加检测器的带宽,可以提高扫描速度。

    MULTI-AXIS MAGNETIC LENS
    4.
    发明申请
    MULTI-AXIS MAGNETIC LENS 有权
    多轴磁性镜片

    公开(公告)号:US20110139996A1

    公开(公告)日:2011-06-16

    申请号:US12636007

    申请日:2009-12-11

    IPC分类号: H01J1/50

    CPC分类号: H01J37/141 H01J2237/1405

    摘要: The present invention relates to a multi-axis magnetic lens for a charged particle beam system. The apparatus eliminates the undesired non-axisymmetric transverse magnetic field components from the magnetic field generated by a common excitation coil and leaves the desired axisymmetric field for focusing each particle beam employed within the system.

    摘要翻译: 本发明涉及带电粒子束系统的多轴磁透镜。 该装置从由公共的励磁线圈产生的磁场中消除不期望的非轴对称的横向磁场分量,并且留下用于聚焦在系统内采用的每个粒子束的期望的轴对称场。

    E-BEAM DEFECT REVIEW SYSTEM
    5.
    发明申请
    E-BEAM DEFECT REVIEW SYSTEM 有权
    电子束缺陷评估系统

    公开(公告)号:US20100150429A1

    公开(公告)日:2010-06-17

    申请号:US12335458

    申请日:2008-12-15

    IPC分类号: G06K9/00

    摘要: The present invention relates to a defect review system, and/or particularly, to an apparatus and method of defect review sampling, review method and classification on a semiconductor wafer or a pattern lithography reticle during integrated circuit fabrication. These objects are achieved in comparing a reviewed image with a reference image pick-up through a smart sampling filter. A clustering computer system base on high speed network will provide data cache and save operation time and memory. A smart review sampling filter automatically relocate abnormal pattern or defects and classify the device location extracted from design database and/or from golden die image on the same substrate. The column of the present defect review system is comprised of the modified SORIL type objective lens. This column provides solution of improving throughput during sample review, material identification better image quality, and topography image of defect. One embodiment of the present invent adopts an optical auto focusing system to compromise micro height variation due wafer surface topography. And another embodiment adopts surface charge control system to regulate the charge accumulation due to electron irradiation during the review process.

    摘要翻译: 本发明涉及一种缺陷评估系统,和/或特别涉及在集成电路制造期间对半导体晶片或图案光刻掩模版进行缺陷评估抽样,评估方法和分类的装置和方法。 通过智能采样滤波器将经检查的图像与参考图像拾取进行比较,实现了这些目的。 基于高速网络的集群计算机系统将提供数据缓存,节省操作时间和内存。 智能检查采样过滤器自动重新定位异常模式或缺陷,并将从设计数据库中提取的设备位置和/或从相同基板上的金色模具图像分类。 本缺陷检查系统的列由改进的SORIL型物镜组成。 该栏提供了在样本审查期间提高吞吐量,材料识别更好的图像质量和缺陷的地形图像的解决方案。 本发明的一个实施例采用光学自动聚焦系统来破坏由晶片表面形貌引起的微高度变化。 另一个实施例采用表面电荷控制系统来调节在检查过程中由电子辐射引起的电荷累积。

    PROJECTION ELECTRONIC MICROSCOPE FOR REDUCING GEOMETRIC ABERRATION AND SPACE CHARGE EFFECT
    6.
    发明申请
    PROJECTION ELECTRONIC MICROSCOPE FOR REDUCING GEOMETRIC ABERRATION AND SPACE CHARGE EFFECT 有权
    投影电子显微镜,用于减少几何异常和空间充电效应

    公开(公告)号:US20080121820A1

    公开(公告)日:2008-05-29

    申请号:US11944503

    申请日:2007-11-23

    IPC分类号: H01J37/26 G02B21/00

    摘要: A projection electronic microscope is provided for improving geometric aberration and a space charge effect within a zooming range using a zoom type transfer lens system in a projection/image formation optical system. The projection electronic microscope comprises an irradiation system for emitting a primary electron beam irradiated to a sample, and a projection/image formation optical system for guiding a second electron beams emitted from the sample with the irradiation of the primary electron beam to a detection system. The projection/image formation optical system includes a zoom type transfer lens system having a first zoom lens and a second zoom lens. The first zoom lens includes a plurality of electrodes. A predetermined electrode of said plurality of electrodes is made thicker and is applied with a positive voltage to form a space having zero field strength and a high positive potential between said first zoom lens and said second zoom lens, and a cross-over by said first zoom lens is defined in said space within a zooming range.

    摘要翻译: 提供投影电子显微镜,用于在投影/图像形成光学系统中使用变焦型转印透镜系统来改善变焦范围内的几何像差和空间电荷效应。 投影电子显微镜包括用于发射照射到样品的一次电子束的照射系统,以及用于通过一次电子束的照射将从样品发射的第二电子束引导到检测系统的投影/图像形成光学系统。 投影/成像光学系统包括具有第一变焦透镜和第二变焦透镜的变焦型转印透镜系统。 第一变焦透镜包括多个电极。 所述多个电极中的预定电极被制成较厚的并且施加正电压以在所述第一变焦透镜和所述第二变焦透镜之间形成具有零场强和高正电位的空间,并且由所述第一 在变焦范围内在所述空间中定义变焦镜头。

    Multi-axis Magnetic Lens for Focusing a Plurality of Charged Particle Beams
    8.
    发明申请
    Multi-axis Magnetic Lens for Focusing a Plurality of Charged Particle Beams 有权
    用于聚焦多个带电粒子束的多轴磁镜

    公开(公告)号:US20130153782A1

    公开(公告)日:2013-06-20

    申请号:US13464261

    申请日:2012-05-04

    IPC分类号: H01J3/20 H01F7/02

    摘要: The present invention provides two ways to form a special permeability-discontinuity unit inside every sub-lens of a multi-axis magnetic lens, which either has a simpler configuration or has more flexibility in manufacturing such as material selection and mechanical structure. Accordingly several types of multi-axis magnetic lens are proposed for various applications. One type is for general application such as a multi-axis magnetic condenser lens or a multi-axis magnetic transfer lens, another type is a multi-axis magnetic non-immersion objective which can require a lower magnetomotive force, and one more type is a multi-axis magnetic immersion objective lens which can generate smaller aberrations. Due to using permeability-discontinuity units, every multi-axis magnetic lens in this invention can also be electrically excited to function as a multi-axis electromagnetic compound lens so as to further reduce aberrations thereof and/or realize electron beam retarding for low-voltage irradiation on specimen.

    摘要翻译: 本发明提供了在多轴磁性透镜的每个子透镜内部形成特殊的渗透率不连续单元的两种方式,其具有更简单的构造或者在诸如材料选择和机械结构的制造中具有更大的灵活性。 因此,针对各种应用提出了几种类型的多轴磁性透镜。 一种用于一般应用,例如多轴磁聚焦透镜或多轴磁性转印透镜,另一种类型是可能需要较低磁动势的多轴磁性非浸没物镜,另外一种类型是 可以产生较小像差的多轴磁浸物镜。 由于使用导磁率不连续单位,本发明中的每个多轴磁性透镜也可以被电激励以用作多轴电磁复合透镜,以便进一步降低其像差和/或实现低电压的电子束延迟 对样品照射

    Monochromator for Charged Particle Beam Apparatus
    9.
    发明申请
    Monochromator for Charged Particle Beam Apparatus 有权
    用于带电粒子束装置的单色器

    公开(公告)号:US20120318978A1

    公开(公告)日:2012-12-20

    申请号:US13551947

    申请日:2012-07-18

    IPC分类号: H01J3/26 H01J37/26

    摘要: The monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a dual proportional-symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually can not be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. The present invention also provides two ways to build a monochromator into a SEM, in which one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.

    摘要翻译: 用于减少带电粒子装置中的初级带电粒子束的能量扩散的单色仪包括光束调节元件,两个维恩滤波器型色散单元和能量限制孔径。 在单色仪中,形成了沿着直线光轴的偏转色散和基本轨迹中的双比例对称性,其不仅从根本上避免了实际上不能被补偿的偏轴像差,而且确保出射光束具有虚拟交叉, 是单色的,是无色的,不分​​散的。 本发明还提供了将单色仪构建到SEM中的两种方法,其中一种是在电子源和电容器之间定位单色器,另一种是在光束极限孔径和物镜之间定位单色仪。 前者提供额外的能量角取决于滤波,并获得较小的有效能量扩展。

    ELECTRON BEAM APPARATUS
    10.
    发明申请
    ELECTRON BEAM APPARATUS 有权
    电子束设备

    公开(公告)号:US20100102227A1

    公开(公告)日:2010-04-29

    申请号:US12257304

    申请日:2008-10-23

    IPC分类号: G01N23/00 H01J3/20

    摘要: The present invention relates to a charged particle beam apparatus which employs a scanning electron microscope for sample inspection and defect review.The present invent provides solution of improving imaging resolution by utilizing a field emission cathode tip with a large tip radius, applying a large accelerating voltage across ground potential between the cathode and anode, positioning the beam limit aperture before condenser lens, utilizing condenser lens excitation current to optimize image resolution, applying a high tube bias to shorten electron travel time, adopting and modifying SORIL objective lens to ameliorate aberration at large field of view and under electric drifting and reduce the urgency of water cooling objective lens while operating material analysis.The present invent provides solution of improving throughput by utilizing fast scanning ability of SORIL and providing a large voltage difference between sample and detectors.

    摘要翻译: 本发明涉及采用扫描电子显微镜进行样品检查和缺陷检查的带电粒子束装置。 本发明提供了通过利用具有大的尖端半径的场致发射阴极尖端来提高成像分辨率的解决方案,在阴极和阳极之间的地电位上施加大的加速电压,将光束极限孔定位在聚光透镜之前,利用聚光透镜激发电流 优化图像分辨率,应用高管偏压缩短电子行进时间,采用和修正SORIL物镜,以改善大视野和电漂移下的像差,并减少水冷物镜在操作材料分析时的紧迫性。 本发明提供了通过利用SORIL的快速扫描能力并在样品和检测器之间提供大的电压差来提高产量的解决方案。