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    Movable detector for charged particle beam inspection or review
    2.
    发明授权
    Movable detector for charged particle beam inspection or review 有权
    用于带电粒子束检测或检查的可移动检测器

    公开(公告)号：US08624186B2

    公开(公告)日：2014-01-07

    申请号：US12787139

    申请日：2010-05-25

    申请人： Yi-Xiang Wang ,  Joe Wang ,  Xuedong Liu ,  Zhongwei Chen

    发明人： Yi-Xiang Wang ,  Joe Wang ,  Xuedong Liu ,  Zhongwei Chen

    IPC分类号： H01J37/244

    CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/2448 ,  H01J2237/24495 ,  H01J2237/2611 ,  H01J2237/2817

    摘要： The present invention generally relates to a detection unit of a charged particle imaging system. More particularly, portion of the detection unit can move into or out of the detection system as imaging condition required. With the assistance of a Wein filter (also known as an E×B charged particle analyzer) and a movable detector design, the present invention provides a stereo imaging system that suitable for both low current, high resolution mode and high current, high throughput mode. Merely by way of example, the invention has been applied to a scanning electron beam inspection system. But it would be recognized that the invention could apply to other system using charged particle beam as an observation tool.

    摘要翻译： 本发明一般涉及带电粒子成像系统的检测单元。 更具体地，检测单元的一部分可以作为所需的成像条件移入或移出检测系统。 在Wein滤波器（也称为E×B带电粒子分析仪）和可移动检测器设计的帮助下，本发明提供了一种适用于低电流，高分辨率模式和高电流，高通量模式的立体成像系统 。 仅作为示例，本发明已经应用于扫描电子束检查系统。 但是应当认识到，本发明可以应用于使用带电粒子束作为观测工具的其它系统。

    Particle detection system
    4.
    发明授权
    Particle detection system 有权
    粒子检测系统

    公开(公告)号：US08237125B2

    公开(公告)日：2012-08-07

    申请号：US12764890

    申请日：2010-04-21

    申请人： Yi-Xiang Wang ,  Joe Wang

    发明人： Yi-Xiang Wang ,  Joe Wang

    IPC分类号： G01T1/28

    CPC分类号： H01J37/244 ,  H01J2237/2441 ,  H01J2237/2444 ,  H01J2237/2445 ,  H01J2237/2448 ,  H01J2237/2449

    摘要： This invention provides a design to process a large range of detection beam current at low noise with a single detector. With such a design, the detection system can generate up to 1010 gain and maximum signal output at more than mini Ampere (mA) level.

    摘要翻译： 本发明提供了利用单个检测器处理低噪声的大范围检测光束电流的设计。 通过这样的设计，检测系统可以以超过小于安培（mA）的电平产生多达1010个增益和最大信号输出。

    Phase detector
    5.
    发明授权
    Phase detector 有权
    相位检测器

    公开(公告)号：US08698070B2

    公开(公告)日：2014-04-15

    申请号：US13271811

    申请日：2011-10-12

    申请人： Yi-Xiang Wang ,  Jian Zhang

    发明人： Yi-Xiang Wang ,  Jian Zhang

    IPC分类号： G01D5/34

    CPC分类号： G01J9/00

    摘要： This invention provides a phase detector with more than two detector units on a printed circuit layer. A detector set includes a pair of detector units or one detector unit, and a detector row includes a plurality of detector sets in one line. The phase detector includes a plurality of detector rows and each row has a detector set in one period, wherein all detector units are interleaved to have the same interval between any two adjacent detector units, which is defined as a pitch and the pitch is equal to one period dividing the detector pair number, which is the half sum of the number of one detector set for all rows.

    摘要翻译： 本发明提供一种在印刷电路层上具有多于两个检测器单元的相位检测器。 检测器组包括一对检测器单元或一个检测器单元，检测器行包括一行中的多个检测器组。 相位检测器包括多个检测器行，并且每行具有在一个周期中设置的检测器，其中所有检测器单元被交错以在任何两个相邻检测器单元之间具有相同的间隔，其被定义为间距，并且间距等于 一个分隔检测器对数的周期，它是所有行的一个检测器的数量的一半。

    Method and apparatus for reducing substrate edge effect during inspection
    7.
    发明授权
    Method and apparatus for reducing substrate edge effect during inspection 有权
    在检查过程中降低基板边缘效应的方法和装置

    公开(公告)号：US08294094B1

    公开(公告)日：2012-10-23

    申请号：US13211206

    申请日：2011-08-16

    申请人： Yan Zhao ,  Jack Jau ,  Yi-Xiang Wang

    发明人： Yan Zhao ,  Jack Jau ,  Yi-Xiang Wang

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： G01N23/225 ,  G01N2223/611 ,  H01J2237/0048 ,  H01J2237/153 ,  H01J2237/2817

    摘要： An apparatus and method are introduced in this invention to reduce the edge effect of a substrate that causes image variation or distortion due to applied substrate bias. An edge plate with an edge effect eliminator are provided such that substrate is inspected by a charged particle beam can capture images without distortion at substrate edge.

    摘要翻译： 在本发明中引入了一种装置和方法，以减少由于所施加的衬底偏压导致图像变化或失真的衬底的边缘效应。 提供具有边缘效应消除器的边缘板，使得通过带电粒子束检查基板可以在基板边缘处捕获图像而不失真。

    Wafer grounding and biasing method, apparatus, and application
    8.
    发明授权
    Wafer grounding and biasing method, apparatus, and application 有权
    晶圆接地和偏置方法，装置和应用

    公开(公告)号：US08908348B2

    公开(公告)日：2014-12-09

    申请号：US12552270

    申请日：2009-09-01

    申请人： Yi-Xiang Wang ,  Juying Dou ,  Kenichi Kanai

    发明人： Yi-Xiang Wang ,  Juying Dou ,  Kenichi Kanai

    IPC分类号： H01L21/683 ,  H01J37/317 ,  H01J37/20 ,  H01J37/28 ,  B82Y10/00 ,  B82Y40/00

    CPC分类号： H01J37/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0044 ,  H01J2237/2008

    摘要： A wafer grounding apparatus and method adaptable to a charged particle beam apparatus is disclosed. A wafer substrate is supported by a wafer mount. A grounding pin is arranged to be in contact with a backside film formed on a backside of the wafer substrate. A grounding pulse generator provides at least one pulse to drive the grounding pin such that dielectric breakdown occurring at the backside film leads to establishment of a current path through the backside films. Accordingly, a current flows in the wafer substrate through this current path and then flows out of the wafer substrate via at least one current return path formed from capacitive coupling between the wafer substrate and the wafer mount.

    摘要翻译： 公开了适用于带电粒子束装置的晶片接地装置和方法。 晶片基板由晶片支架支撑。 接地销布置成与形成在晶片衬底的背面上的背面膜接触。 接地脉冲发生器提供至少一个脉冲来驱动接地引脚，使得在背面薄膜处发生的电介质击穿导致建立通过背面薄膜的电流路径。 因此，电流通过该电流路径流过晶片衬底，然后通过由晶片衬底和晶片座之间的电容耦合形成的至少一个电流返回路径流出晶片衬底。

    Method and system for heating substrate in vacuum environment and method and system for identifying defects on substrate
    9.
    发明授权
    Method and system for heating substrate in vacuum environment and method and system for identifying defects on substrate 有权
    在真空环境中加热基材的方法和系统以及用于识别基材上的缺陷的方法和系统

    公开(公告)号：US08809779B2

    公开(公告)日：2014-08-19

    申请号：US12339558

    申请日：2008-12-19

    申请人： Hong Xiao ,  Yi-Xiang Wang

    发明人： Hong Xiao ,  Yi-Xiang Wang

    IPC分类号： G01N23/00 ,  G01N23/22 ,  H05B3/00

    CPC分类号： H05B3/0047 ,  G01N23/2202

    摘要： A method for heating a substrate in a vacuum environment and a system therefor is provided. The system includes a chamber capable of holding the substrate located in the vacuum environment and a light source capable of projecting a light beam only on a portion of the substrate. The method includes the following steps. First, the substrate is placed in the vacuumed chamber. Thereafter, the light beam emitted from the light source is projected on the portion of the substrate, such that the portion is significantly heated before whole the substrate is heated. When the light beam is a charged particle beam projected by a charged particle beam assembly and projected on defects located on the substrate, the defects are capable of being identified by an examination result provided by an examination assembly after termination of light beam projection.

    摘要翻译： 提供一种在真空环境中加热基板的方法及其系统。 该系统包括能够保持位于真空环境中的衬底的腔室和能够仅将光束投射到衬底的一部分上的光源。 该方法包括以下步骤。 首先，将基板放置在真空室中。 此后，从光源发射的光束被投射在基板的部分上，使得该部分在整个基板被加热之前被显着地加热。 当光束是由带电粒子束组件投射并投影在基板上的缺陷上的带电粒子束时，能够通过在光束投影终止之后由检查组件提供的检查结果来识别缺陷。

    Charged particle system for reticle/wafer defects inspection and review
    10.
    发明授权
    Charged particle system for reticle/wafer defects inspection and review 有权
    带电粒子系统用于掩模/晶圆缺陷检查和检查

    公开(公告)号：US08519333B2

    公开(公告)日：2013-08-27

    申请号：US13463208

    申请日：2012-05-03

    申请人： Chiyan Kuan ,  Yi-Xiang Wang ,  Chung-Shih Pan ,  Zhonghua Dong ,  Zhongwei Chen

    发明人： Chiyan Kuan ,  Yi-Xiang Wang ,  Chung-Shih Pan ,  Zhonghua Dong ,  Zhongwei Chen

    IPC分类号： H01J37/20 ,  H01J37/26 ,  G01N23/225 ,  G01N23/22

    CPC分类号： G01N23/2251 ,  G01N2223/307 ,  G01N2223/611

    摘要： The present invention relates to a charged particle system for reticle or semiconductor wafer defects inspection and review, and more particularly, relates to an E-beam inspection tool for reticle or semiconductor wafer defects inspection and review without gravitational AMC settling. The charged particle system is an upside down electron beam inspection system with an electron beam aimed upward. The face down design may prevent AMC from gravitational settling on the inspected face of the specimen during inspection, thereafter having a cleaner result compared with conventional face-up inspection system.

    摘要翻译： 本发明涉及一种用于掩模版或半导体晶片缺陷检查和审查的带电粒子系统，更具体地涉及一种用于掩模版或半导体晶片缺陷检查和检查的电子束检查工具，而不引力AMC沉降。 带电粒子系统是一个向上的电子束检查系统。 面朝下设计可以防止AMC在检查期间在试样的被检查面上引力沉降，之后与常规的面朝上检查系统相比具有更清洁的结果。