Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout
    7.
    发明授权
    Method for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout 失效
    用于确定用于产生集成电路布局的掩模版的可接受的掩模版公差的方法

    公开(公告)号:US07754400B2

    公开(公告)日:2010-07-13

    申请号:US11442036

    申请日:2006-05-26

    Applicant: Yasushi Tanaka

    Inventor: Yasushi Tanaka

    CPC classification number: G03F7/70641 G03F1/84

    Abstract: A method and apparatus is provided for determining an acceptable reticle tolerance for a reticle used to produce an integrated circuit layout. The method begins by specifying a wafer target CD and a wafer CD tolerance for the integrated circuit layout. A reticle target CD is provided for the reticle that is producing the wafer target CD. A critical reticle pattern pitch is selected for the reticle target CD. The critical pattern pitch defines a relationship between the wafer CD and illumination dose exposing the reticle for producing the wafer CD which exhibits a maximum gradient. For the critical reticle pattern pitch, a relationship is established between wafer CD and a deviation from the reticle target CD that arises from use of different illumination doses. From the relationship between wafer CD and the deviation from the reticle target CD, a reticle target CD deviation interval is identified that gives rise to the wafer CD tolerance that is provided. Finally, the reticle target CD deviation interval is selected as the acceptable reticle tolerance.

    Abstract translation: 提供了一种用于确定用于产生集成电路布局的掩模版的可接受的掩模版公差的方法和装置。 该方法通过为集成电路布局指定晶片目标CD和晶片CD容差开始。 为生产晶片靶CD的掩模版提供掩模版目标CD。 对于掩模版目标CD选择关键的标线图案间距。 临界图案间距限定了晶片CD和曝光用于产生呈现最大梯度的晶片CD的掩模版的照射剂量之间的关系。 对于关键标线图案间距,在使用不同的照射剂量时,晶片CD与标线板目标CD的偏离之间建立了关系。 根据晶片CD与标线板目标CD的偏离之间的关系,识别出产生所提供的晶片CD容限的标线片目标CD偏差间隔。 最后,将掩模版目标CD偏差间隔选为可接受的掩模版公差。

    Oxygen Absorbent and Oxygen-Absorbing Multi-Layer Body
    8.
    发明申请
    Oxygen Absorbent and Oxygen-Absorbing Multi-Layer Body 失效
    吸氧和吸氧多层体

    公开(公告)号:US20090061249A1

    公开(公告)日:2009-03-05

    申请号:US11886024

    申请日:2006-03-17

    Abstract: [Problem] To provide an oxygen absorbent that has excellent oxygen absorbability at room temperature, has a low content of metals and is less odorous after oxygen absorption and an oxygen-absorbing multi-layer body comprising an oxygen absorbent layer comprising this oxygen absorbent.[Means for Dissolution] The oxygen absorbent comprises a cyclized product (A) of a conjugated diene polymer and a cyclized product (B) of a conjugated diene polymer, wherein a rate of reduction of unsaturated bonds (%) of the cyclized product (B) of a conjugated diene polymer is at least 5 points smaller than a rate of reduction of unsaturated bonds (%) of the cyclized product (A) of a conjugated diene polymer. It is preferable that the rate of reduction of unsaturated bonds of the cyclized product (A) of a conjugated diene polymer is 60% or more and that the rate of reduction of unsaturated bonds of the cyclized product (B) of a conjugated diene polymer is less than 60%. The oxygen-absorbing multi-layer body comprises a gas barrier material layer, an oxygen absorbent layer comprising the foregoing oxygen absorbent and a sealing material layer laminated in this order.

    Abstract translation: 为了提供在室温下具有优异的氧吸收性的氧吸收剂,具有低的金属含量,并且在氧吸收之后具有较少的恶臭性,以及包含包含该氧吸收剂的氧吸收层的吸氧多层体。 [溶解手段]氧吸收剂包括共轭二烯聚合物的环化产物(A)和共轭二烯聚合物的环化产物(B),其中环化产物(B)的不饱和键(%)的还原速率 )比共轭二烯聚合物的环化产物(A)的不饱和键(%)的还原速率小至少5分。 共轭二烯系聚合物的环化物(A)的不饱和键的还原率优选为60%以上,共轭二烯系聚合物的环化物(B)的不饱和键的还原率为 小于60%。 吸氧多层体包括阻气材料层,包含上述氧吸收剂的氧吸收层和依次层压的密封材料层。

    Laser scanner
    9.
    发明申请
    Laser scanner 有权
    激光扫描仪

    公开(公告)号:US20080074637A1

    公开(公告)日:2008-03-27

    申请号:US11899289

    申请日:2007-09-05

    CPC classification number: G01C15/002 G01S7/4817 G01S17/42

    Abstract: A laser scanner, comprising a mirror rotatably provided, a driving unit for rotating the mirror, a distance measuring unit for projecting a distance measuring light for scanning to a measurement range via the mirror and for obtaining a position data by receiving the reflected distance measuring light via the mirror, a measuring direction observing means for indicating a projecting direction of the distance measuring light, and an operation unit for setting the measurement range by designating at least two measuring directions based on the result of observation of the measuring direction obtained by the measuring direction observing means.

    Abstract translation: 一种激光扫描仪,包括可旋转地设置的反射镜,用于旋转反射镜的驱动单元,用于经由反射镜将用于扫描的距离测量光投射到测量范围的距离测量单元,以及通过接收反射距离测量光来获得位置数据 通过反射镜,用于指示距离测量光的投影方向的测量方向观察装置,以及用于通过基于通过测量获得的测量方向的观察结果指定至少两个测量方向来设置测量范围的操作单元 方向观察装置。

    Composite molding with adhesive composition layer comprising conjugated diene polymer having cyclic structure, and coating material
    10.
    发明授权
    Composite molding with adhesive composition layer comprising conjugated diene polymer having cyclic structure, and coating material 失效
    具有包含具有环状结构的共轭二烯聚合物的粘合剂组合物层的复合成型和涂层材料

    公开(公告)号:US07267887B2

    公开(公告)日:2007-09-11

    申请号:US10492821

    申请日:2002-10-16

    Abstract: A shaped composite article comprising a substrate and an adherend, which are comprised of different materials and are bonded together through a layer of an adhesive composition comprising as the main ingredient (i) a cyclic structure-containing conjugated diene polymer having a degree of cyclization of 30-95%, or (ii) a modified cyclic structure-containing conjugated diene polymer having a degree of cyclization of 30-95%, and having added thereto 0.1-20 wt. % of an α,β-ethylenically unsaturated carboxylic acid anhydride, wherein the ratio of {amount of (I)/[amount of (I)+amount of (II)]} is at least 60 wt. %, where (I) is an acid anhydride group added and (II) is a dicarboxylic acid group formed by hydrolysis of an acid anhydride group (I).

    Abstract translation: 一种成型复合制品,其包括基材和被粘物,所述基材和被粘物由不同的材料组成,并通过粘合剂组合物层粘合在一起,所述粘合剂组合物包含作为主要成分的(i)含环状共轭二烯聚合物,其环化度为 30-95%,或(ii)环化度为30-95%的改性环状结构的共轭二烯聚合物,并加入其中0.1-20重量% %的α,β-烯键式不饱和羧酸酐,其中{(I)/ [(I)的量)(II)的量]}的比率为至少60重量%。 %,其中(I)是加入的酸酐基团,(II)是通过酸酐基团(I)的水解形成的二羧酸基团。

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