Solid-state imaging device and manufacturing method of solid-state imaging device
    1.
    发明授权
    Solid-state imaging device and manufacturing method of solid-state imaging device 有权
    固态成像装置及固态成像装置的制造方法

    公开(公告)号:US08963267B2

    公开(公告)日:2015-02-24

    申请号:US13601165

    申请日:2012-08-31

    摘要: According to one embodiment, there is provided a solid-state imaging device including a first photoelectric conversion layer and a color filter. The color filter includes a multi-layer interference filter and a guided mode resonant grating. The guided mode resonant grating includes a plurality of diffraction gratings and a plurality of inter-grating regions. The plurality of diffraction gratings are formed of a material having a first index of refraction and periodically arrayed at least one-dimensionally. The plurality of inter-grating regions are arranged between at least the plurality of diffraction gratings. Each of the plurality of inter-grating regions includes an insulating film region and an air gap region. The insulating film region is formed of a material having a second index of refraction lower than the first index of refraction.

    摘要翻译: 根据一个实施例,提供了一种包括第一光电转换层和滤色器的固态成像装置。 滤色器包括多层干涉滤光器和导模谐振光栅。 导模谐振光栅包括多个衍射光栅和多个光栅间区域。 多个衍射光栅由具有第一折射率并且至少一维地周期性排列的材料形成。 多个光栅间区域布置在至少多个衍射光栅之间。 多个光栅间区域中的每一个包括绝缘膜区域和气隙区域。 绝缘膜区域由具有低于第一折射率的第二折射率的材料形成。

    Solid-state imaging device
    2.
    发明授权
    Solid-state imaging device 失效
    固态成像装置

    公开(公告)号:US08759929B2

    公开(公告)日:2014-06-24

    申请号:US12726938

    申请日:2010-03-18

    IPC分类号: H01L31/0232

    摘要: A solid-state imaging device includes: a substrate including a plurality of light receiving sections; and a color filter including a guided-mode resonant grating provided immediately above each of the plurality of light receiving sections, at least one of an upper surface and a lower surface of the guided-mode resonant grating being covered with a layer having a lower refractive index than the guided-mode resonant grating.

    摘要翻译: 固态成像装置包括:基板,包括多个光接收部分; 以及包括紧邻在多个光接收部分之上的导模谐振光栅的滤色器,所述导模谐振光栅的上表面和下表面中的至少一个被具有较低折射率的层覆盖 指数比导模谐振光栅。

    Solid-state imaging device and method for manufacturing same
    3.
    发明授权
    Solid-state imaging device and method for manufacturing same 失效
    固态成像装置及其制造方法

    公开(公告)号:US08648435B2

    公开(公告)日:2014-02-11

    申请号:US12726718

    申请日:2010-03-18

    申请人: Yusaku Konno

    发明人: Yusaku Konno

    IPC分类号: H01L31/0232 H01L31/062

    摘要: A solid-state imaging device includes: a substrate including a plurality of light receiving sections; an optical waveguide provided above each of the plurality of light receiving sections and surrounded by a cladding layer; a color filter provided above each of the optical waveguides; and a lens provided above the color filter, the optical waveguide including a first layer having a first refractive index and a second layer being in contact with the first layer and having a second refractive index higher than the first refractive index.

    摘要翻译: 固态成像装置包括:基板,包括多个光接收部分; 光波导,设置在所述多个光接收部的上方,被包层所包围; 设置在每个光波导上的滤色器; 以及设置在所述滤色器上方的透镜,所述光波导包括具有第一折射率的第一层和与所述第一层接触并具有高于所述第一折射率的第二折射率的第二层。

    SOLID-STATE IMAGE SENSOR
    4.
    发明申请
    SOLID-STATE IMAGE SENSOR 有权
    固态图像传感器

    公开(公告)号:US20130154041A1

    公开(公告)日:2013-06-20

    申请号:US13601439

    申请日:2012-08-31

    IPC分类号: H01L31/0232

    摘要: According to one embodiment, there is provided a solid-state image sensor including a photoelectric conversion layer, and a multilayer interference filter. The multilayer interference filter is arranged to conduct light of a particular color, of incident light, selectively to the photoelectric conversion layer. The multilayer interference filter has a laminate structure in which a first layer having a first refraction index and a second layer having a second refraction index are repeatedly laminated, and a third layer which is in contact with a lower surface of the laminate structure and has a third refraction index. A lowermost layer of the laminate structure is the second layer. The third refraction index is not equal to the first refraction index and is higher than the second refraction index.

    摘要翻译: 根据一个实施例,提供了一种包括光电转换层和多层干涉滤光器的固态图像传感器。 多层干涉滤光器被布置成将特定颜色的入射光的光选择性地导入光电转换层。 多层干涉滤光器具有层叠结构,其中具有第一折射率的第一层和具有第二折射率的第二层被重复层压,以及与层压结构的下表面接触的第三层, 第三折射指数。 层压结构的最下层是第二层。 第三折射率不等于第一折射率并且高于第二折射率。

    PATTERN INSPECTION APPARATUS AND METHOD
    5.
    发明申请
    PATTERN INSPECTION APPARATUS AND METHOD 审中-公开
    图案检查装置及方法

    公开(公告)号:US20130063721A1

    公开(公告)日:2013-03-14

    申请号:US13414945

    申请日:2012-03-08

    IPC分类号: G01J3/42

    摘要: In one embodiment, a pattern inspection apparatus includes a light source configured to generate light, and a condenser configured to shape the light into a line beam to illuminate a wafer with the line beam. The apparatus further includes a spectrometer configured to disperse the line beam reflected from the wafer. The apparatus further includes a two-dimensional detector configured to detect the line beam dispersed by the spectrometer, and output a signal including spectrum information of the line beam. The apparatus further includes a comparison unit configured to compare the spectrum information obtained from corresponding places of a repetitive pattern on the wafer with each other, and a determination unit configured to determine whether the wafer includes a defect, based on a comparison result of the spectrum information.

    摘要翻译: 在一个实施例中,图案检查装置包括被配置为产生光的光源和被配置为将光线成形为线束以用线束照射晶片的聚光器。 该装置还包括配置成分散从晶片反射的线束的光谱仪。 该装置还包括二维检测器,被配置为检测由光谱仪分散的线束,并输出包括线束的光谱信息的信号。 该装置还包括:比较单元,被配置为将从晶片上的重复图案的相应位置获得的频谱信息彼此进行比较;以及确定单元,被配置为基于频谱的比较结果来确定晶片是否包括缺陷 信息。

    PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD
    6.
    发明申请
    PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD 审中-公开
    图案检查装置和图案检查方法

    公开(公告)号:US20120242985A1

    公开(公告)日:2012-09-27

    申请号:US13418940

    申请日:2012-03-13

    IPC分类号: G01N21/55

    CPC分类号: G01N21/9501 G01N21/95607

    摘要: In accordance with an embodiment, a pattern inspection apparatus includes a stage supporting a substrate with a pattern, a light source irradiating the substrate with light, a detection unit, an optical system, a focus position change unit, a control unit, and a determination unit. The detection unit detects reflected light from the substrate. The optical system leads the light from the light source to the substrate and leads the reflected light to the detection unit. The focus position change unit changes a focus position of the light to the substrate in a direction vertical to the surface of the substrate. The control unit associates the movement of the stage with the light irradiation and controls the stage drive unit and the focus position change unit, thereby changing the focus position. The determination unit determines presence/absence of a defect of the pattern based on the signal from the determination unit.

    摘要翻译: 根据一个实施例,图案检查装置包括支撑具有图案的基板的台,用光照射基板的光源,检测单元,光学系统,聚焦位置改变单元,控制单元和确定 单元。 检测单元检测来自基板的反射光。 光学系统将来自光源的光引导到基板,并将反射光引导到检测单元。 聚焦位置改变单元将垂直于基底表面的方向的光的聚焦位置改变为基底。 控制单元使舞台的移动与光照射相关联,并且控制舞台驱动单元和对焦位置改变单元,从而改变对焦位置。 确定单元基于来自确定单元的信号来确定模式的缺陷的存在/不存在。

    PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD
    7.
    发明申请
    PATTERN INSPECTION APPARATUS AND PATTERN INSPECTION METHOD 失效
    模式检查装置和模式检查方法

    公开(公告)号:US20110063621A1

    公开(公告)日:2011-03-17

    申请号:US12835271

    申请日:2010-07-13

    申请人: Yusaku KONNO

    发明人: Yusaku KONNO

    IPC分类号: G01B9/02

    摘要: According to one embodiment, a pattern inspection apparatus includes a light source, a beam splitter, a first optical system, a second optical system, a controller, a phase controller and a detector. The beam splitter splits an emitted light into first and second optical paths. The first optical system delivers the light to a first pattern and delivers a first reflected light from the first pattern. The second optical system delivers the light to a second pattern and delivers a second reflected light from the second pattern. The controller is provided on the optical path, and intensities of the first and second reflected lights are substantially equal. The phase controller is provided on the optical path, and phases of the first and second reflected lights are inverted. In addition, the detector detects a light that the first and second reflected lights are made to interfere with each other.

    摘要翻译: 根据一个实施例,图案检查装置包括光源,分束器,第一光学系统,第二光学系统,控制器,相位控制器和检测器。 分束器将发射的光分成第一和第二光路。 第一光学系统将光传送到第一图案并且从第一图案传送第一反射光。 第二光学系统将光传送到第二图案并且从第二图案传送第二反射光。 控制器设置在光路上,第一和第二反射光的强度基本相等。 相位控制器设置在光路上,第一和第二反射光的相位反转。 此外,检测器检测使第一和第二反射光彼此干涉的光。

    SOLID-STATE IMAGING DEVICE
    8.
    发明申请
    SOLID-STATE IMAGING DEVICE 失效
    固态成像装置

    公开(公告)号:US20100244168A1

    公开(公告)日:2010-09-30

    申请号:US12726938

    申请日:2010-03-18

    IPC分类号: H01L31/0232

    摘要: A solid-state imaging device includes: a substrate including a plurality of light receiving sections; and a color filter including a guided-mode resonant grating provided immediately above each of the plurality of light receiving sections, at least one of an upper surface and a lower surface of the guided-mode resonant grating being covered with a layer having a lower refractive index than the guided-mode resonant grating.

    摘要翻译: 固态成像装置包括:基板,包括多个光接收部分; 以及包括紧邻在多个光接收部分之上的导模谐振光栅的滤色器,所述导模谐振光栅的上表面和下表面中的至少一个被具有较低折射率的层覆盖 指数比导模谐振光栅。

    Pattern inspection apparatus and pattern inspection method
    9.
    发明授权
    Pattern inspection apparatus and pattern inspection method 失效
    图案检验装置和图案检验方法

    公开(公告)号:US08502988B2

    公开(公告)日:2013-08-06

    申请号:US12835271

    申请日:2010-07-13

    申请人: Yusaku Konno

    发明人: Yusaku Konno

    IPC分类号: G01B11/02 G01B9/02

    摘要: According to one embodiment, a pattern inspection apparatus includes a light source, a beam splitter, a first optical system, a second optical system, a controller, a phase controller and a detector. The beam splitter splits an emitted light into first and second optical paths. The first optical system delivers the light to a first pattern and delivers a first reflected light from the first pattern. The second optical system delivers the light to a second pattern and delivers a second reflected light from the second pattern. The controller is provided on the optical path, and intensities of the first and second reflected lights are substantially equal. The phase controller is provided on the optical path, and phases of the first and second reflected lights are inverted. In addition, the detector detects a light that the first and second reflected lights are made to interfere with each other.

    摘要翻译: 根据一个实施例,图案检查装置包括光源,分束器,第一光学系统,第二光学系统,控制器,相位控制器和检测器。 分束器将发射的光分成第一和第二光路。 第一光学系统将光传送到第一图案并且从第一图案传送第一反射光。 第二光学系统将光传送到第二图案并且从第二图案传送第二反射光。 控制器设置在光路上,第一和第二反射光的强度基本相等。 相位控制器设置在光路上,第一和第二反射光的相位反转。 此外,检测器检测使第一和第二反射光彼此干涉的光。

    IMAGING DEVICE AND METHOD FOR MANUFACTURING SAME, AND IMAGING METHOD
    10.
    发明申请
    IMAGING DEVICE AND METHOD FOR MANUFACTURING SAME, AND IMAGING METHOD 审中-公开
    成像装置及其制造方法以及成像方法

    公开(公告)号:US20100224760A1

    公开(公告)日:2010-09-09

    申请号:US12716758

    申请日:2010-03-03

    CPC分类号: H01L27/14627 H01L27/14629

    摘要: An imaging device includes: an imaging lens; a light receiving element including a light receiving portion configured to sense light transmitted through the imaging lens; and a high refractive index member packed between the imaging lens and the light receiving element and having a higher refractive index than air.

    摘要翻译: 成像装置包括:成像透镜; 光接收元件,包括被配置为感测透过成像透镜的光的光接收部分; 以及高折射率构件,其被填充在所述摄像透镜和所述光接收元件之间并且具有比空气更高的折射率。