公开(公告)号：US20130063721A1

公开(公告)日：2013-03-14

申请号：US13414945

申请日：2012-03-08

申请人： Takayoshi FUJII ,  Yusaku KONNO ,  Makoto KANEKO ,  Yuichiro YAMAZAKI ,  Mitsutoshi WATABIKI ,  Kiminori YOSHINO ,  Yusuke IIDA

发明人： Takayoshi FUJII ,  Yusaku KONNO ,  Makoto KANEKO ,  Yuichiro YAMAZAKI ,  Mitsutoshi WATABIKI ,  Kiminori YOSHINO ,  Yusuke IIDA

IPC分类号： G01J3/42

CPC分类号： G01J3/42 ,  G01J3/2803 ,  G01J5/0007 ,  G01N21/95607

摘要： In one embodiment, a pattern inspection apparatus includes a light source configured to generate light, and a condenser configured to shape the light into a line beam to illuminate a wafer with the line beam. The apparatus further includes a spectrometer configured to disperse the line beam reflected from the wafer. The apparatus further includes a two-dimensional detector configured to detect the line beam dispersed by the spectrometer, and output a signal including spectrum information of the line beam. The apparatus further includes a comparison unit configured to compare the spectrum information obtained from corresponding places of a repetitive pattern on the wafer with each other, and a determination unit configured to determine whether the wafer includes a defect, based on a comparison result of the spectrum information.

摘要翻译： 在一个实施例中，图案检查装置包括被配置为产生光的光源和被配置为将光线成形为线束以用线束照射晶片的聚光器。 该装置还包括配置成分散从晶片反射的线束的光谱仪。 该装置还包括二维检测器，被配置为检测由光谱仪分散的线束，并输出包括线束的光谱信息的信号。 该装置还包括：比较单元，被配置为将从晶片上的重复图案的相应位置获得的频谱信息彼此进行比较;以及确定单元，被配置为基于频谱的比较结果来确定晶片是否包括缺陷 信息。

公开(公告)号：US20120242985A1

公开(公告)日：2012-09-27

申请号：US13418940

申请日：2012-03-13

申请人： Mitsutoshi WATABIKI ,  Yusuke Iida ,  Makoto Kaneko ,  Yuichiro Yamazaki ,  Yusaku Konno ,  Shinichi Imai ,  Takayoshi Fujii

发明人： Mitsutoshi WATABIKI ,  Yusuke Iida ,  Makoto Kaneko ,  Yuichiro Yamazaki ,  Yusaku Konno ,  Shinichi Imai ,  Takayoshi Fujii

IPC分类号： G01N21/55

CPC分类号： G01N21/9501 ,  G01N21/95607

摘要： In accordance with an embodiment, a pattern inspection apparatus includes a stage supporting a substrate with a pattern, a light source irradiating the substrate with light, a detection unit, an optical system, a focus position change unit, a control unit, and a determination unit. The detection unit detects reflected light from the substrate. The optical system leads the light from the light source to the substrate and leads the reflected light to the detection unit. The focus position change unit changes a focus position of the light to the substrate in a direction vertical to the surface of the substrate. The control unit associates the movement of the stage with the light irradiation and controls the stage drive unit and the focus position change unit, thereby changing the focus position. The determination unit determines presence/absence of a defect of the pattern based on the signal from the determination unit.

摘要翻译： 根据一个实施例，图案检查装置包括支撑具有图案的基板的台，用光照射基板的光源，检测单元，光学系统，聚焦位置改变单元，控制单元和确定 单元。 检测单元检测来自基板的反射光。 光学系统将来自光源的光引导到基板，并将反射光引导到检测单元。 聚焦位置改变单元将垂直于基底表面的方向的光的聚焦位置改变为基底。 控制单元使舞台的移动与光照射相关联，并且控制舞台驱动单元和对焦位置改变单元，从而改变对焦位置。 确定单元基于来自确定单元的信号来确定模式的缺陷的存在/不存在。

公开(公告)号：US07964637B2

公开(公告)日：2011-06-21

申请号：US11992067

申请日：2006-09-08

申请人： Makoto Harada ,  Hiroyuki Matsuda ,  Kenya Ishida ,  Yuichiro Yamazaki

发明人： Makoto Harada ,  Hiroyuki Matsuda ,  Kenya Ishida ,  Yuichiro Yamazaki

IPC分类号： A61K31/335 ,  C07D307/94

CPC分类号： C12P17/04 ,  A23L2/56 ,  A23L27/2052 ,  A61K8/4973 ,  A61Q19/00 ,  C07B53/00 ,  C07D307/94 ,  C11B9/0076 ,  C12P41/005

摘要： A simplified production method of stereoisomer of theaspiran having high optical purity has been desired. An alcohol compound having a specific skeleton is enantioselectively esterified with an enzyme, or an ester compound having a specific skeleton is enantioselectively hydrolyzed with an enzyme. The resultant optically active ester or optically active alcohol is used. Thus, optically active theaspiran having a desired configuration and having a high optical purity is obtained in a satisfactory yield.

摘要翻译： 期望具有高光学纯度的阿司匹兰的立体异构体的简化制备方法。 具有特定骨架的醇化合物用酶对映体选择性酯化，或者具有特定骨架的酯化合物用酶对映体选择性水解。 使用所得光学活性酯或光学活性醇。 因此，以令人满意的产率获得光学活性的具有所需构型并具有高光学纯度的阿司匹林。

公开(公告)号：US07863580B2

公开(公告)日：2011-01-04

申请号：US11760235

申请日：2007-06-08

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Nobuharu Noji ,  Mamoru Nakasuji ,  Hirosi Sobukawa ,  Satoshi Mori ,  Tsutomu Karimata ,  Yuichiro Yamazaki ,  Ichirota Nagahama

IPC分类号： G21K1/08 ,  H01J3/14 ,  H01J3/26

CPC分类号： H01J37/153 ,  H01J37/065 ,  H01J2237/061 ,  H01J2237/06375 ,  H01J2237/083 ,  H01J2237/1534 ,  H01J2237/24592 ,  H01J2237/28

摘要： An electron beam apparatus for providing an evaluation of a sample, such as a semiconductor wafer, that includes a micro-pattern with a minimum line width not greater than 0.1 μm with high throughput. A primary electron beam generated by an electron gun is irradiated onto a sample and secondary electrons emanating from the sample are formed into an image on a detector by an image projection optical system. An electron gun 61 has a cathode 1 and a drawing electrode 3, and an electron emission surface 1a of the cathode defines a concave surface. The drawing electrode 3 has a convex surface 3a composed of a partial outer surface of a second sphere facing the electron emission surface 1a of the cathode and an aperture 73 formed through the convex surface for passage of the electrons. An aberration correction optical apparatus comprises two identically sized multi-polar Wien filters arranged such that their centers are in alignment with a ¼ plane position and a ¾ plane position, respectively, along an object plane-image plane segment in the aberration correction optical apparatus, and optical elements having bidirectional focus disposed in an object plane position, an intermediate image-formation plane position and an image plane position, respectively, in the aberration correction optical apparatus.

摘要翻译： 一种用于提供诸如半导体晶片的样品的评估的电子束装置，其包括具有不大于0.1μm的最小线宽的微图案，具有高生产量。 由电子枪产生的一次电子束照射在样品上，从样品发出的二次电子通过图像投影光学系统形成检测器上的图像。 电子枪61具有阴极1和牵伸电极3，阴极的电子发射表面1a限定凹面。 拉制电极3具有由与阴极的电子发射表面1a相对的第二球体的局部外表面和由电子通过凸面形成的孔73构成的凸面3a。 像差校正光学装置包括两个相同尺寸的多极维纳滤光器，其布置成使得它们的中心分别沿着像差校正光学装置中的物平面图像平面段与¼平面位置和¾平面位置对准， 以及分别设置在像差校正光学装置中的物平面位置，中间图像形成面位置和像面位置的具有双向焦点的光学元件。

公开(公告)号：US20090231744A1

公开(公告)日：2009-09-17

申请号：US12256202

申请日：2008-10-22

申请人： Katsuji Suzuki ,  Yuichiro Yamazaki

发明人： Katsuji Suzuki ,  Yuichiro Yamazaki

IPC分类号： G11B27/36

CPC分类号： G11B27/36 ,  G11B5/012 ,  G11B2220/2516

摘要： A magnetic disk device testing method includes obtaining index values indicating the signal quality of an adjacent track at different positions scattered in the width direction in the adjacent track located in the vicinity of a target track on a magnetic disk after repeatedly writing data onto the target track, and determining a representative value of the index values indicating the signal quality of the adjacent track based on the obtained results, while incrementing the number of data write times; and estimating an index value indicating the signal quality of the adjacent track to be obtained where data is written onto the target track a larger number of times than the total number of data write times the data has been actually written in obtaining the index values, the index value being estimated with the use of the representative values decided in the representative value deciding.

摘要翻译： 磁盘装置测试方法包括：在将数据重复写入目标轨道之后，获得指示位于磁盘上的目标轨道附近的相邻轨道中在宽度方向上散射的不同位置处的相邻轨道的信号质量的指标值 并且在增加数据写入次数的同时，基于所获得的结果来确定指示相邻轨道的信号质量的索引值的代表值; 并且在获得索引值时，估计指示将数据写入到目标轨道上的要获得的相邻轨道的信号质量的指标值比已经实际写入的数据写入时间的总数更多的次数， 利用代表值决定的代表值估计指标值。

公开(公告)号：US20090072139A1

公开(公告)日：2009-03-19

申请号：US12289846

申请日：2008-11-05

申请人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

发明人： Ichirota Nagahama ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Motosuke Miyoshi

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  H01J2237/2817

摘要： A substrate inspection apparatus includes: an electron beam irradiation device which emits an electron beam and causes the electron beam to irradiate a substrate to be inspected as a primary beam; an electron beam detector which detects at least one of a secondary electron, a reflected electron and a backscattered electron that are generated from the substrate that has been irradiated by the electron beam, and which outputs a signal that forms a one-dimensional or two-dimensional image of a surface of the substrate; a mapping projection optical system which causes imaging of at least one of the secondary electron, the reflected electron and the backscattered electron on the electron beam detector as a secondary beam; and an electromagnetic wave irradiation device which generates an electromagnetic wave and causes the electromagnetic wave to irradiate a location on the surface of the substrate at which the secondary beam is generated.

摘要翻译： 基板检查装置包括：电子束照射装置，其发射电子束并使电子束照射待检查的基板作为主光束; 电子束检测器，其检测从已经被电子束照射的衬底产生的二次电子，反射电子和反向散射电子中的至少一个，并输出形成一维或二维的信号， 基板的表面的三维图像; 映射投影光学系统，其将二次电子，反射电子和背散射电子中的至少一个成像在电子束检测器上作为次级光束; 以及电磁波照射装置，其产生电磁波，并使电磁波照射到产生二次光束的基板的表面上的位置。

公开(公告)号：US07483155B2

公开(公告)日：2009-01-27

申请号：US11051617

申请日：2005-01-27

申请人： Kei Hayasaki ,  Toru Mikami ,  Shinichi Ito ,  Yuichiro Yamazaki ,  Toshiya Kotani

发明人： Kei Hayasaki ,  Toru Mikami ,  Shinichi Ito ,  Yuichiro Yamazaki ,  Toshiya Kotani

IPC分类号： G01B11/14 ,  G06F17/50 ,  G03C1/00

CPC分类号： G03F7/70625 ,  G01N21/956

摘要： Wavelength dispersion of intensity of light reflected from an evaluation object is measured. A complex refractive index of a substance forming the evaluation object and the environment are prepared. Virtual component ratios comprising a mixture ratio of the substances forming the evaluation object and the environment are prepared. Reflectance wavelength dispersions to the virtual component ratios are calculated. Similar reflectance wavelength dispersions having a small difference with the measured wavelength dispersion are extracted from the reflectance wavelength dispersions. Weighted average to the virtual component ratios used for calculating the similar reflectance wavelength dispersions are calculated to obtain a component ratio of the substance forming the evaluation object and the environment so that weighting is larger when the difference is smaller. A structure of the evaluation object is determined from the calculated component ratio.

摘要翻译： 测量从评价对象反射的光的强度的波长色散。 制备形成评价对象的物质和环境的复合折射率。 制备包含形成评价对象的物质与环境的混合比的虚拟成分比例。 计算出虚拟分量比的反射波长色散。 从反射波长分散体中提取与测量的波长色散具有小差异的类似反射率波长色散。 计算用于计算相似反射率波长色散的虚拟分量比的加权平均值，以获得形成评估对象的物质与环境的分量比，使得当差值较小时加权较大。 评估对象的结构根据计算的分量比确定。

公开(公告)号：US07449691B2

公开(公告)日：2008-11-11

申请号：US11435128

申请日：2006-05-17

申请人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji ,  Ichirota Nagahama ,  Yuichiro Yamazaki

发明人： Masahiro Hatakeyama ,  Takeshi Murakami ,  Tohru Satake ,  Nobuharu Noji ,  Ichirota Nagahama ,  Yuichiro Yamazaki

IPC分类号： G01N23/00

CPC分类号： H01J37/244 ,  G01N21/9501 ,  G03F1/84 ,  H01J37/285 ,  H01J2237/2441 ,  H01J2237/2446

摘要： A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.

摘要翻译： 一种用于检测样品表面上的精细几何形状的检测装置，其中照射束照射放置在不同于大气的不同环境中的样品，并且由传感器检测从样品发出的二次辐射，并且其中 传感器设置在不同环境的内部，处理来自传感器的检测信号的处理装置设置在不同环境的外部，传输装置将检测信号从传感器传送到处理装置。

公开(公告)号：US07417814B2

公开(公告)日：2008-08-26

申请号：US11197493

申请日：2005-08-05

申请人： Yuichiro Yamazaki

发明人： Yuichiro Yamazaki

IPC分类号： G11B27/36 ,  G11B5/09 ,  G11C29/00

CPC分类号： G11B20/18 ,  G11B20/182 ,  G11B20/1879 ,  G11B2020/1826 ,  G11B2020/183 ,  G11B2220/2516

摘要： A magnetic recording device comprising a magnetic recording medium, a read-write channel for modulating write data, writing it on the magnetic recording medium, reading data from the magnetic recording medium, and demodulating the read data, and a processor for supplying the write data to the read-write channel and being supplied with the read data from the read-write channel. The processor supplies to the read-write channel a microdefect detection pattern having a first pattern for generating a consecutive magnetization inversion during writing and a second pattern for generating, during reading, a signal having a S/N ratio higher than the signal produced by the first pattern, the read-write channel modulates the microdefect detection pattern, writes it to the magnetic recording medium, reads the microdefect detection pattern, which was written, from the magnetic recording medium, and conducts abnormality detection of the microdefect detection pattern, which was read out.

摘要翻译： 一种磁记录装置，包括磁记录介质，用于调制写数据的读写通道，将其写在磁记录介质上，从磁记录介质读取数据，以及解调读数据;以及处理器，用于提供写数据 到读写通道并从读写通道提供读数据。 处理器向读写通道提供具有用于在写入期间产生连续磁化反转的第一模式的微缺陷检测模式，以及用于在读取期间产生S / N比高于由该信号产生的信号的信号的第二模式 第一模式，读写通道调制微缺陷检测图案，将其写入磁记录介质，读取从磁记录介质写入的微缺陷检测图案，并进行微缺陷检测图案的异常检测，该检测图案是 读出。

公开(公告)号：US20070235644A1

公开(公告)日：2007-10-11

申请号：US11806573

申请日：2007-06-01

申请人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

发明人： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Toshifumi Kimba ,  Hiroshi Sobukawa ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Tsutomu Karimata ,  Shin Oowada ,  Mutsumi Saito ,  Yuichiro Yamazaki ,  Takamitsu Nagai ,  Ichirota Nagahama

IPC分类号： G01N23/00

CPC分类号： H01J29/70 ,  G01N23/225 ,  G01N23/2251 ,  G01N23/227 ,  H01J37/06 ,  H01J37/073 ,  H01J37/141 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01L21/6719 ,  H01L21/67213

摘要： An inspection apparatus by an electron beam comprises: an electron-optical device 70 having an electron-optical system for irradiating the object with a primary electron beam from an electron beam source, and a detector for detecting the secondary electron image projected by the electron-optical system; a stage system 50 for holding and moving the object relative to the electron-optical system; a mini-environment chamber 20 for supplying a clean gas to the object to prevent dust from contacting to the object; a working chamber 31 for accommodating the stage device, the working chamber being controllable so as to have a vacuum atmosphere; at least two loading chambers 41, 42 disposed between the mini-environment chamber and the working chamber, adapted to be independently controllable so as to have a vacuum atmosphere; and a loader 60 for transferring the object to the stage system through the loading chambers.

摘要翻译： 电子束检查装置包括：电子光学装置70，具有用于从电子束源向一个电子束照射物体的电子 - 光学系统;以及用于检测由电子束投射的二次电子图像的检测器， 光学系统; 用于相对于电子 - 光学系统保持和移动物体的平台系统50; 微型环境室20，用于向物体供应清洁气体，以防止灰尘与物体接触; 用于容纳平台装置的工作室31，工作室可控制为具有真空气氛; 设置在微环境室和工作室之间的至少两个装载室41,42适于独立控制以具有真空气氛; 以及用于通过装载室将物体传送到舞台系统的装载器60。