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公开(公告)号：US20210107116A1
公开(公告)日：2021-04-15
申请号：US17114633
申请日：2020-12-08
Applicant: Applied Materials, Inc.
Inventor： Rajeev BAJAJ , Daniel REDFIELD , Mahendra C. ORILALL , Boyi FU , Aniruddh Jagdish KHANNA , Jason G. FUNG , Ashwin CHOCKALINGAM , Mayu YAMAMURA , Veera Raghava Reddy KAKIREDDY , Gregory E. MENK , Nag B. PATIBANDLA
Abstract: Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one resin precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions.
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2.发明申请公开(公告)号：US20200147750A1
公开(公告)日：2020-05-14
申请号：US16746065
申请日：2020-01-17
Applicant: Applied Materials, Inc.
Inventor： Rajeev BAJAJ , Kasiraman KRISHNAN , Mahendra C. ORILALL , Daniel REDFIELD , Fred C. REDEKER , Nag B. PATIBANDLA , Gregory E. MENK , Jason G. FUNG , Russell Edward PERRY , Robert E. DAVENPORT
Abstract: Embodiments of the disclosure generally provide polishing pads having a composite pad body and methods for forming the polishing pads. In one embodiment, the composite pad body includes one or more first features formed from a first material or a first composition of materials, and one or more second features formed from a second material or a second composition of materials, wherein the one or more first features and the one or more second features are formed by depositing a plurality of layers comprising the first material or first composition of materials and second material or second composition of materials.
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3.发明申请公开(公告)号：US20180043613A1
公开(公告)日：2018-02-15
申请号：US15722810
申请日：2017-10-02
Applicant: Applied Materials, Inc.
Inventor： Kasiraman KRISHNAN , Daniel REDFIELD , Russell Edward PERRY , Gregory E. MENK , Rajeev BAJAJ , Fred C. REDEKER , Nag B. PATIBANDLA , Mahendra C. ORILALL , Jason G. FUNG
IPC: B24B37/26 , B24B37/22 , B29L31/00 , B29K105/16
Abstract: A polishing article manufacturing system includes a feed section and a take-up section, the take-up section comprising a supply roll having a polishing article disposed thereon for a chemical mechanical polishing process, a print section comprising a plurality of printheads disposed between the feed section and the take-up section, and a curing section disposed between the feed section and the take-up section, the curing section comprising one or both of a thermal curing device and an electromagnetic curing device.
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公开(公告)号：US20240003000A1
公开(公告)日：2024-01-04
申请号：US18201055
申请日：2023-05-23
Applicant: Applied Materials, Inc.
Inventor： Mingwei ZHU , Zihao YANG , Nag B. PATIBANDLA , Ludovic GODET , Yong CAO , Daniel Lee DIEHL , Zhebo CHEN
CPC classification number: C23C14/564 , C23C14/0641 , C23C14/34 , H01J2237/24514 , H01J37/3441 , H01J37/3405 , H01J37/3464
Abstract: A structure including a metal nitride layer is formed on a workpiece by pre-conditioning a chamber that includes a metal target by flowing nitrogen gas and an inert gas at a first flow rate ratio into the chamber and igniting a plasma in the chamber before placing the workpiece in the chamber, evacuating the chamber after the preconditioning, placing the workpiece on a workpiece support in the chamber after the preconditioning, and performing physical vapor deposition of a metal nitride layer on the workpiece in the chamber by flowing nitrogen gas and the inert gas at a second flow rate ratio into the chamber and igniting a plasma in the chamber. The second flow rate ratio is less than the first flow rate ratio.
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公开(公告)号：US20220111579A1
公开(公告)日：2022-04-14
申请号：US17070854
申请日：2020-10-14
Applicant: Applied Materials, Inc.
Inventor： Daihua ZHANG , Uma SRIDHAR , Hou T. NG , Sivapackia GANAPATHIAPPAN , Nag B. PATIBANDLA
IPC: B29C64/112 , B29C64/264 , B29C64/209 , B29C64/245 , B29C64/232 , B33Y70/00 , A61F2/02
Abstract: A method of forming a three dimensional object includes dispensing droplets of an electromagnetic energy curable liquid onto a surface to form a plurality of layers of the three dimensional object in liquid form, wherein each droplet forms a layer of liquid on the surface which is larger than a minimum feature size of a structure to be formed by curing the curable liquid, and directing electromagnetic energy capable of curing the liquid and having a beam width intersecting the layer of liquid which is at least as small as the smallest feature of a structure to be formed in the curable liquid.
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Patent Agency Ranking
公开(公告)号：US20210347005A1
公开(公告)日：2021-11-11
申请号：US17382194
申请日：2021-07-21
Applicant: Applied Materials, Inc.
Inventor： Boyi FU , Sivapackia GANAPATHIAPPAN , Daniel REDFIELD , Rajeev BAJAJ , Ashwin CHOCKALINGAM , Dominic J. BENVEGNU , Mario Dagio CORNEJO , Mayu YAMAMURA , Nag B. PATIBANDLA , Ankit VORA
Abstract: Embodiments of the present disclosure provide for polishing pads that include at least one endpoint detection (EPD) window disposed through the polishing pad material and methods of forming thereof. In one embodiment, a method of forming a polishing pad includes forming a first layer of the polishing pad by dispensing a first precursor composition and a window precursor composition, the first layer comprising at least portions of each of a first polishing pad element and a window feature, and partially curing the dispensed first precursor composition, and the dispensed window precursor composition disposed within the first layer.
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公开(公告)号：US20190047112A1
公开(公告)日：2019-02-14
申请号：US16050442
申请日：2018-07-31
Applicant: Applied Materials, Inc.
Inventor： Boyi FU , Sivapackia GANAPATHIAPPAN , Daniel REDFIELD , Rajeev BAJAJ , Ashwin CHOCKALINGAM , Dominic J. BENVEGNU , Mario Dagio CORNEJO , Mayu YAMAMURA , Nag B. PATIBANDLA , Ankit VORA
IPC: B24B37/20
Abstract: Embodiments of the present disclosure provide for polishing pads that include at least one endpoint detection (EPD) window disposed through the polishing pad material, and methods of forming thereof. In one embodiment a method of forming a polishing pad includes forming a first layer of the polishing pad by dispensing a first precursor composition and a window precursor composition, the first layer comprising at least portions of each of a first polishing pad element and a window feature, and partially curing the dispensed first precursor composition and the dispensed window precursor composition disposed within the first layer.
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公开(公告)号：US20170259499A1
公开(公告)日：2017-09-14
申请号：US15452053
申请日：2017-03-07
Applicant: Applied Materials, Inc.
Inventor： Hou T. NG , Nag B. PATIBANDLA , Rajeev BAJAJ , Daniel REDFIELD , Ashwin CHOCKALINGAM , Mayu YAMAMURA , Mario CORNEJO
CPC classification number: B33Y10/00 , B24B37/22 , B29K2105/0058 , B33Y30/00 , B33Y80/00 , G03F7/0035 , G03F7/2014
Abstract: A method and apparatus for manufacturing polishing articles used in polishing processes are provided. In one implementation, a method of forming a polishing pad is provided. The method comprises depositing an uncured first layer of a pad forming photopolymer on a substrate. The method further comprises positioning a first optical mask over the first layer of the uncured pad forming photopolymer. The first optical mask includes a patterned sheet of material having at least one aperture. The method further comprises exposing the uncured first layer of the pad forming photopolymer to electromagnetic radiation to selectively polymerize exposed portions of the uncured first layer of the pad forming photopolymer to form pad-supporting structures within the first layer of pad forming photopolymer.
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公开(公告)号：US20240136485A1
公开(公告)日：2024-04-25
申请号：US18490847
申请日：2023-10-19
Applicant: Applied Materials, Inc.
Inventor： Zhiyong LI , Sivapackia GANAPATHIAPPAN , Mingwei ZHU , Nag B. PATIBANDLA , Hou T. NG , Lisong XU , Ding KAI , Kulandaivelu SIVANANDAN
CPC classification number: H01L33/60 , H01L25/167 , H01L2933/0058
Abstract: Embodiments of the present disclosure generally relate to LED pixels and methods of fabricating LED pixels. A device includes a backplane, at least three LEDs disposed on the backplane, subpixel isolation (SI) structures disposed defining wells of at least three subpixels, a reflection material is disposed on sidewalls and a top surface of the SI structures, at least three of the subpixels have a color conversion material disposed in the wells, an encapsulation layer disposed over the subpixel isolation structures and the subpixels, a light filter layer disposed over the encapsulation layer and micro-lenses disposed over the light filter layer and over each of the wells of the subpixels.
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公开(公告)号：US20230294239A1
公开(公告)日：2023-09-21
申请号：US18202013
申请日：2023-05-25
Applicant: Applied Materials, Inc.
Inventor： Sivapackia GANAPATHIAPPAN , Ankit VORA , Boyi FU , Venkat HARIHARAN , Mayu YAMAMURA , Mario CORNEJO , Igor ABRAMSON , Mo YANG , Daniel REDFIELD , Rajeev BAJAJ , Nag B. PATIBANDLA
IPC: B24B37/24 , C08F283/00 , B33Y10/00 , B29C64/112 , B33Y70/10
CPC classification number: B24B37/24 , C08F283/008 , B33Y10/00 , B29C64/112 , B33Y70/10 , B29L2031/736
Abstract: Methods and formulations for manufacturing polishing articles used in polishing processes are provided. In one implementation, a UV curable resin precursor composition is provided. The UV curable resin precursor comprises a precursor formulation. The precursor formulation comprises a first resin precursor component that comprises a semi-crystalline radiation curable oligomeric material, wherein the semi-crystalline radiation curable oligomeric material is selected from a semi-crystalline aliphatic polyester urethane acrylate, a semi-crystalline aliphatic polycarbonate urethane acrylate, a semi-crystalline aliphatic polyether urethane acrylate, or combinations thereof. The precursor formulation further comprises a second resin precursor component that comprises a monofunctional or multifunctional acrylate monomer. The resin precursor formulation further comprises a photoinitiator, wherein the precursor formulation has a viscosity that enables the precursor formulation to be dispensed to form a portion of a polishing article by an additive manufacturing process.
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