公开(公告)号：US20240261937A1

公开(公告)日：2024-08-08

申请号：US18106538

申请日：2023-02-07

申请人： Shaoxing Ziyuan Polishing Co., Ltd.

发明人： SENJUN CHEN ,  CUILAN BA ,  JIN ZHANG ,  XIA JIANG ,  JIMIN LI

IPC分类号： B24D11/04 ,  B24D11/02

CPC分类号： B24D11/04 ,  B24D11/02

摘要： A composite abrasive paper has at least three surfaces which polished and ground to improve the utilization rate of the abrasive paper and reduce the cost of grinding and polishing abrasive tools. The abrasive paper comprises a first abrasive comprising a first substrate, a first stereo particle layer provided on a surface of the first substrate, a flexible microsphere layer provided on a back surface of the first substrate; a second abrasive comprising a second substrate, a second stereo particle layer provided on surface of the second substrate, a third stereo particle layer provided on a back surface of the first substrate; the first and second abrasive are connected at an edge to form a connection part, the middle non-connection part of the first substrate and the second substrate forms a sealed cavity, the third stereo particle layer is provided opposite to the flexible microsphere layer in the sealed cavity.

公开(公告)号：US11980992B2

公开(公告)日：2024-05-14

申请号：US17946547

申请日：2022-09-16

申请人： Applied Materials, Inc.

发明人： Ashavani Kumar ,  Ashwin Chockalingam ,  Sivapackia Ganapathiappan ,  Rajeev Bajaj ,  Boyi Fu ,  Daniel Redfield ,  Nag B. Patibandla ,  Mario Dagio Cornejo ,  Amritanshu Sinha ,  Yan Zhao ,  Ranga Rao Arnepalli ,  Fred C. Redeker

IPC分类号： B24B37/24 ,  B24B37/16 ,  B24B37/20 ,  B24B37/26 ,  B24D11/04 ,  B24D18/00 ,  B29C64/112 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y80/00 ,  H01L21/306

CPC分类号： B24B37/245 ,  B24B37/26 ,  B24D11/04 ,  B24D18/00 ,  B29C64/112 ,  B33Y10/00 ,  B33Y80/00 ,  B24B37/16 ,  B24B37/20 ,  B24D2203/00 ,  B33Y30/00 ,  H01L21/30625

摘要： Embodiments described herein relate to integrated abrasive (IA) polishing pads, and methods of manufacturing IA polishing pads using, at least in part, surface functionalized abrasive particles in an additive manufacturing process, such as a 3D inkjet printing process. In one embodiment, a method of forming a polishing article includes dispensing a first plurality of droplets of a first precursor, curing the first plurality of droplets to form a first layer comprising a portion of a sub-polishing element, dispensing a second plurality of droplets of the first precursor and a second precursor onto the first layer, and curing the second plurality of droplets to form a second layer comprising portions of the sub-polishing element and portions of a plurality of polishing elements. Here, the second precursor includes functionalized abrasive particles having a polymerizable group chemically bonded to surfaces thereof.

公开(公告)号：US20240123568A1

公开(公告)日：2024-04-18

申请号：US18212285

申请日：2023-06-21

申请人： Applied Materials, Inc.

发明人： Sivapackia GANAPATHIAPPAN ,  Boyi FU ,  Ashwin CHOCKALINGAM ,  Daniel REDFIELD ,  Rajeev BAJAJ ,  Mahendra C. ORILALL ,  Hou T. NG ,  Jason G. FUNG ,  Mayu YAMAMURA

IPC分类号： B24B37/24 ,  B24B37/22 ,  B24B37/26 ,  B24D3/28 ,  B24D11/00 ,  B24D11/04 ,  B29C35/08 ,  B29C64/112 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C09D4/00 ,  C09G1/16

CPC分类号： B24B37/24 ,  B24B37/22 ,  B24B37/26 ,  B24D3/28 ,  B24D11/001 ,  B24D11/04 ,  B29C35/0805 ,  B29C64/112 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C09D4/00 ,  C09G1/16 ,  B33Y70/10

摘要： Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and methods of manufacturing the same. According to one or more embodiments, a method for forming or otherwise preparing a polishing article by sequentially forming a plurality of polymer layers is provided and includes: (a) dispensing a plurality of droplets of a polymer precursor composition onto a surface of a previously formed at least partially cured polymer layer, where the polymer precursor composition contains a first precursor component containing an epoxide group and a photoinitiator component which generates a photoacid when exposed to UV light, (b) at least partially curing the plurality of droplets to form an at least partially cured polymer layer, and (c) repeating (a) and (b).

公开(公告)号：US11806838B2

公开(公告)日：2023-11-07

申请号：US16635332

申请日：2018-07-09

申请人： 3M INNOVATIVE PROPERTIES COMPANY

发明人： Lijun Zu ,  Andrew C. Anderson ,  Sarah L. Hagen ,  Jesse D. Lund ,  Qihong Nie ,  David C. Raithel ,  Kim C. Sachs, Jr.

IPC分类号： B24D11/04 ,  B24D11/06 ,  B24D3/28

CPC分类号： B24D11/04 ,  B24D11/06 ,  B24D3/28

摘要： A surface-treating article, comprising a circular substrate (100) comprising a first major surface, an abrasive disposed on the first major surface, the abrasive having a first concentration at a first radius (110) measured from the center of the substrate, the abrasive having a second concentration not equal to the first concentration at a second radius (120) measured from the center of the substrate, wherein the first radius (110) and the second radius (120) are different lengths.

公开(公告)号：US11745302B2

公开(公告)日：2023-09-05

申请号：US17209137

申请日：2021-03-22

申请人： Applied Materials, Inc.

发明人： Sivapackia Ganapathiappan ,  Boyi Fu ,  Ashwin Chockalingam ,  Daniel Redfield ,  Rajeev Bajaj ,  Mahendra C. Orilall ,  Hou T. Ng ,  Jason G. Fung ,  Mayu Yamamura

IPC分类号： B24B37/24 ,  B33Y70/00 ,  B24D3/28 ,  B33Y10/00 ,  B33Y80/00 ,  C09G1/16 ,  B33Y70/10 ,  B29K33/04 ,  B24B37/22 ,  B24B37/26 ,  B29C64/112 ,  B24D11/00 ,  B24D11/04 ,  B29C35/08 ,  C09D4/00

CPC分类号： B24B37/24 ,  B24B37/22 ,  B24B37/26 ,  B24D3/28 ,  B24D11/001 ,  B24D11/04 ,  B29C35/0805 ,  B29C64/112 ,  B33Y10/00 ,  B33Y70/00 ,  B33Y80/00 ,  C09D4/00 ,  C09G1/16 ,  B24D2203/00 ,  B29C2035/0827 ,  B29K2033/04 ,  B29K2995/0077 ,  B29K2995/0092 ,  B33Y70/10

摘要： Embodiments of the present disclosure relate to advanced polishing pads with tunable chemical, material and structural properties, and new methods of manufacturing the same. According to one or more embodiments of the disclosure, it has been discovered that a polishing pad with improved properties may be produced by an additive manufacturing process, such as a three-dimensional (3D) printing process. Embodiments of the present disclosure thus may provide an advanced polishing pad that has discrete features and geometries, formed from at least two different materials that include functional polymers, functional oligomers, reactive diluents, addition polymer precursor compounds, catalysts, and curing agents. For example, the advanced polishing pad may be formed from a plurality of polymeric layers, by the automated sequential deposition of at least one polymer precursor composition followed by at least one curing step, wherein each layer may represent at least one polymer composition, and/or regions of different compositions. Embodiments of the disclosure further provide a polishing pad with polymeric layers that may be interpenetrating polymer networks.

公开(公告)号：US11524384B2

公开(公告)日：2022-12-13

申请号：US16048574

申请日：2018-07-30

申请人： Applied Materials, Inc.

发明人： Ashwin Chockalingam ,  Rajeev Bajaj ,  Ashavani Kumar ,  Daniel Redfield

IPC分类号： B24B37/26 ,  B24B37/24 ,  B24D3/34 ,  B24D11/04 ,  B24D3/20 ,  B24D3/28 ,  B24D11/00

摘要： Embodiments of the present disclosure provide for abrasive delivery (AD) polishing pads and manufacturing methods thereof. In one embodiment, a method of forming a polishing article includes forming a sub-polishing element from a first curable resin precursor composition and forming a plurality of polishing elements extending from the sub-polishing element. Forming the plurality of polishing elements includes forming a continuous polymer phase from a second curable resin precursor composition and forming a plurality of discontinuous abrasive delivery features disposed within the continuous polymer phase. The sub-polishing element is formed by dispensing a first plurality of droplets of the first curable resin precursor composition. The plurality polishing elements are formed by dispensing a second plurality of droplets of the second curable resin precursor composition. In some embodiments, the discontinuous abrasive delivery features comprise a water soluble material having abrasive particles interspersed therein.

公开(公告)号：US11504783B2

公开(公告)日：2022-11-22

申请号：US16147329

申请日：2018-09-28

申请人： SAINT-GOBAIN ABRASIVES, INC. ,  SAINT-GOBAIN ABRASIFS

发明人： Maureen A. Brosnan ,  Joseph L. Citrone ,  Steffi Kaminski ,  Charles W. Bleakney, IV ,  Yinggang Tian ,  Ankit Thakur

IPC分类号： B23D61/18 ,  B24B27/06 ,  B24D11/00 ,  B24D18/00 ,  B24D11/04

摘要： An abrasive article comprising a substrate having an elongated body and abrasive particles attached to the elongated body, the content of the abrasive particles oscillates along the length of the body between a minimum and maximum value, and the minimum content is greater than 0.

公开(公告)号：US20210046613A1

公开(公告)日：2021-02-18

申请号：US16978727

申请日：2019-03-11

申请人： Mirka Ltd

发明人： Stefan LINDVALL

IPC分类号： B24D11/04 ,  B24B21/00 ,  B24B21/02

摘要： A continuous abrasive product includes predetermined length and number of predetermined kind of abrasive areas on an abrasive surface, A method for abrading a workpiece, includes arranging an abrasive area of an abrasive product at an abrading zone for abrading the workpiece, and after abrading, replacing the abrasive area at the abrading zone with an another abrasive area of the abrasive product for abrading the workpiece according to a subsequent abrading phase. The used abrasive area is replaced by an unused abrasive area of a different kind. The abrasive product comprises a continuous longitudinal abrasive material including at least two longitudinally sequential different abrasive areas having different kind of abrasive properties.

公开(公告)号：US20200376628A1

公开(公告)日：2020-12-03

申请号：US16955037

申请日：2018-11-15

申请人： BANDO CHEMICAL INDUSTRIES, LTD.

发明人： Soichiro NAKANE ,  Tomoki IWANAGA

IPC分类号： B24D11/04 ,  B24D3/28

摘要： An object of the present invention is to provide a grinding material in which grinding portions can be increased in thickness while a decrease in grinding rate is inhibited. The grinding material according to the present invention includes a base, and a grinding layer overlaid on a front face side of the base and containing abrasive grains and a binder. The grinding layer includes a plurality of columnar grinding portions. The plurality of the grinding portions are configured so that the grinding portions are arranged in a staggered manner. The average thickness of the grinding portions is no less than 300 μm. The area of a top face of each of the grinding portions is no less than 6 mm2. The average thickness of the base is no less than 300 μm and no greater than 3,000 μm.

公开(公告)号：US10702967B2

公开(公告)日：2020-07-07

申请号：US15852901

申请日：2017-12-22

申请人： Samsung Electronics Co., Ltd.

发明人： Do Soo Sung ,  Sung Wook Kim ,  Jin O Kwak ,  Young Tae Kim

IPC分类号： B24B21/04 ,  B24B27/00 ,  B24B21/00 ,  B44C1/22 ,  B24B19/02 ,  B24B21/12 ,  B24D11/04 ,  B44C5/04 ,  A47B96/20

摘要： Disclosed herein are a metal plate including a plurality of pattern portions, a patterning apparatus configured to form a plurality of patterns on the metal plate, and a patterning method using the same. The metal plate to be used in a household appliance includes a plurality of pattern portions in which a hairline pattern is formed on a surface of the metal plate, wherein the plurality of pattern portions includes a first pattern portion having a first hairline pattern and a second pattern portion having a second hairline pattern different from the first hairline pattern.