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公开(公告)号:US20220181193A1
公开(公告)日:2022-06-09
申请号:US17457605
申请日:2021-12-03
Applicant: ASM IP HOLDING B.V.
Inventor: Peipei Gao , Wentao Wang , Xing Lin , Han Ye , Ion Hong Chao , Siyao Luan , Alexandros Demos , Fan Gao
IPC: H01L21/687
Abstract: A substrate support and lift assembly configured to support and lift a substrate from a susceptor is disclosed. The substrate support and lift assembly can include a susceptor support and a lift pin. The susceptor support can be configured to support the susceptor thereon. The susceptor support includes a plurality of support arms each extending radially from a central portion of the susceptor support to a terminus. Each of the plurality of support arms includes an aperture extending therethrough. The lift pin can be configured to fit through the aperture of a corresponding support arm to lift a substrate on the susceptor.
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公开(公告)号:US12006572B2
公开(公告)日:2024-06-11
申请号:US17060507
申请日:2020-10-01
Applicant: ASM IP Holding B.V.
Inventor: Xing Lin , Peipei Gao , Prajwal Nagaraj , Mingyang Ma , Wentao Wang , Ion Hong Chao , Alexandros Demos , Paul Ma , Hichem M'Saad
IPC: H01J37/32 , C23C16/40 , C23C16/455 , C23C16/50
CPC classification number: C23C16/45582 , C23C16/403 , C23C16/405 , C23C16/45536 , C23C16/45565 , C23C16/50 , H01J37/32357 , H01J37/3244
Abstract: A reactor system including a gas distribution assembly and method of using the reactor system are disclosed. The gas distribution assembly includes a gas distribution device, a gas expansion area, and a showerhead plate downstream of the gas distribution device and the expansion area.
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公开(公告)号:US20250038039A1
公开(公告)日:2025-01-30
申请号:US18785702
申请日:2024-07-26
Applicant: ASM IP Holding B.V.
Inventor: Ion Hong Chao , Kai Zhou , Peipei Gao , Wentao Wang , Han Ye , Kishor Patil , Fan Gao , Xing Lin , Alexandros Demos
IPC: H01L21/687
Abstract: A lift pin includes a lift pin body arranged along a lift pin axis having a contact pad, a stem segment, a neck segment, and a span feature. The contact pad is defined at a first end of the lift pin body, the stem segment extends from the contact pad, and the neck segment extends from the stem segment. The span feature is defined at a second end of the lift pin body, is connected to the contact pad by the neck segment and the stem segment, and has a minor and major widths. The minor width is equivalent to a neck diameter defined by the neck segment, the major with is greater than the minor width, and the major width is greater than a stem diameter defined by the stem segment. Lift pin arrangements, semiconductor processing systems, and methods of making semiconductor processing systems are also described.
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公开(公告)号:USD1031676S1
公开(公告)日:2024-06-18
申请号:US29760951
申请日:2020-12-04
Applicant: ASM IP HOLDING B.V.
Designer: Peipei Gao , Wentao Wang , Xing Lin , Han Ye , Ion Hong Chao , Siyao Luan , Alexandros Demos , Fan Gao
Abstract: FIG. 1 is a front perspective view of a combined susceptor, support, and lift system;
FIG. 2 is a back perspective view thereof;
FIG. 3 is a side view thereof;
FIG. 4 is a cross-sectional view taken along line 4-4 as indicated in FIG. 3;
FIG. 5 is an enlarged view of FIG. 4 shown without broken line environmental subject matter for clarity of the claimed subject matter;
FIG. 6 is a top perspective view of the lift pin thereof;
FIG. 7 is a bottom perspective view of the lift pin thereof;
FIG. 8 is a front view of the lift pin thereof;
FIG. 9 is a back view of the lift pin thereof;
FIG. 10 is a left view of the lift pin thereof;
FIG. 11 is a right view of the lift pin thereof;
FIG. 12 is a top view of the lift pin thereof; and,
FIG. 13 is a bottom view of the lift pin thereof.
The dash-dash broken lines within the shaded area and the dash-dash broken lines in FIGS. 1-13 depicting various components of the susceptor, support, and lift system are for the purpose of illustrating environmental subject matter and portions of the article that form no part of the claimed design. The dot-dash broken line in FIG. 3 is for the purpose of defining the cross-sectional view shown in FIG. 4.-
公开(公告)号:US20210102292A1
公开(公告)日:2021-04-08
申请号:US17060507
申请日:2020-10-01
Applicant: ASM IP Holding B.V.
Inventor: Xing Lin , Peipei Gao , Prajwal Nagaraj , Mingyang Ma , Wentao Wang , Ion Hong Chao , Alexandros Demos , Paul Ma , Hichem M'Saad
IPC: C23C16/455 , C23C16/40
Abstract: A reactor system including a gas distribution assembly and method of using the reactor system are disclosed. The gas distribution assembly includes a gas distribution device, a gas expansion area, and a showerhead plate downstream of the gas distribution device and the expansion area.
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