公开(公告)号：US11302512B2

公开(公告)日：2022-04-12

申请号：US16809519

申请日：2020-03-04

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie Baggen ,  Antonius Henricus Arends ,  Lucas Kuindersma ,  Johannes Hubertus Antonius Van De Rijdt ,  Peter Paul Hempenius ,  Robertus Jacobus Theodorus Van Kempen ,  Niels Johannes Maria Bosch ,  Henricus Martinus Johannes Van De Groes ,  Kuo-Feng Tseng ,  Hans Butler ,  Michael Johannes Christiaan Ronde

IPC: H01J37/20

Abstract: An electron beam apparatus includes an electron optics system to generate an electron beam, an object table to hold the specimen at a target position so that a target portion of the specimen is irradiated by the electron beam, and a positioning device to displace the object table relative to the electron beam. The positioning device includes a stage actuator and a balance mass. The stage actuator exerts a force onto the object table to cause an acceleration of the object table. The force onto the object table results in a reaction force onto the balance mass. The balance mass moves in response to the reaction force. The positioning device enables the balance mass to move in a first direction in response to a component of the reaction force in the first direction.

公开(公告)号：US11621142B2

公开(公告)日：2023-04-04

申请号：US16992058

申请日：2020-08-12

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie Baggen ,  Peter Paul Hempenius ,  Maarten Frans Janus Kremers ,  Robertus Jacobus Theodorus Van Kempen ,  Sven Antoin Johan Hol ,  Henricus Martinus Johannes Van De Groes ,  Johannes Hubertus Antonius Van De Rijdt ,  Niels Johannes Maria Bosch ,  Maarten Hartger Kimman

IPC: H01J37/20 ,  H01J37/28 ,  H01L21/66

Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.

公开(公告)号：US09383659B2

公开(公告)日：2016-07-05

申请号：US14407038

申请日：2013-06-13

Applicant: ASML Netherlands B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Andre Bernardus Jeunink ,  Marinus Maria Johannes Van De Wal ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Richard Henricus Adrianus Van Lieshout ,  Henricus Martinus Johannes Van De Groes ,  Saartje Willemijn Van Der Hoeven

IPC: G03B27/58 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70783

Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.

Abstract translation: 提供了一种用于将物体定位在光刻设备中的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。

公开(公告)号：US11372343B2

公开(公告)日：2022-06-28

申请号：US17435115

申请日：2020-02-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Henricus Martinus Johannes Van De Groes ,  Johannes Hubertus Antonius Van De Rijdt ,  Marcel Pieter Jacobus Peeters ,  Chien-Hung Tseng ,  Henricus Petrus Maria Pellemans

IPC: G03F9/00

Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.

公开(公告)号：US11315752B2

公开(公告)日：2022-04-26

申请号：US17118456

申请日：2020-12-10

Applicant: ASML Netherlands B.V.

Inventor： Peter Paul Hempenius ,  Sven Antoin Johan Hol ,  Maarten Frans Janus Kremers ,  Henricus Martinus Johannes Van De Groes ,  Niels Johannes Maria Bosch ,  Marcel Koenraad Marie Baggen

IPC: H01J37/20 ,  H01J37/09 ,  H01J37/317

Abstract: An e-beam apparatus is disclosed, the tool comprising an electron optics system configured to project an e-beam onto an object, an object table to hold the object, and a positioning device configured to move the object table relative to the electron optics system. The positioning device comprises a short stroke stage configured to move the object table relative to the electron optics system and a long stroke stage configured to move the short stroke stage relative to the electron optics system. The e-beam apparatus further comprises a magnetic shield to shield the electron optics system from a magnetic disturbance generated by the positioning device. The magnetic shield may be arranged between the positioning device and the electron optics system.

公开(公告)号：US10809634B2

公开(公告)日：2020-10-20

申请号：US15921124

申请日：2018-03-14

Applicant: ASML Netherlands B.V.

Inventor： Peter Paul Hempenius ,  Marcel Koenraad Marie Baggen ,  Thomas Jan De Hoog ,  Sinar Juliana ,  Henricus Martinus Johannes Van De Groes

IPC: G03B27/58 ,  G03F7/20 ,  G01N21/95 ,  G01N21/47

Abstract: Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuator for displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balance mass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement.

公开(公告)号：US10416567B2

公开(公告)日：2019-09-17

申请号：US15443681

申请日：2017-02-27

Applicant: ASML Netherlands B.V.

Inventor： Johannes Matheus Marie De Wit ,  Kim Gerard Feijen ,  Anko Jozef Cornelus Sijben ,  Martinus Maassen ,  Henricus Martinus Johannes Van De Groes

IPC: G03F7/20 ,  G01N21/88 ,  G02B21/08 ,  G02B21/36

Abstract: Disclosed is an illumination system for a metrology apparatus and a metrology apparatus comprising such an illumination system. The illumination system comprises an illumination source; and a linear variable filter arrangement configured to filter a radiation beam from said illumination source and comprising one or more linear variable filters. The illumination system is operable to enable selective control of a wavelength characteristic of the radiation beam subsequent to it being filtered by the linear variable filter arrangement.

公开(公告)号：US20150168852A1

公开(公告)日：2015-06-18

申请号：US14407038

申请日：2013-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Andre Bernardus Jeunink ,  Marinus Maria Johannes Van De Wal ,  Wilhelmus Henricus Theodorus Maria Aangenent ,  Richard Henricus Adrianus Van Lieshout ,  Henricus Martinus Johannes Van De Groes ,  Saartje Willemijn Van Der Hoeven

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70783

Abstract: There is provided a positioning system for positioning an object in a lithographic apparatus. The positioning system includes a support, a position measurement device, a deformation sensor and a processor. The support is constructed to hold the object. The position measurement device is configured to measure a position of the support. The position measurement device includes at least one position sensor target and a plurality of position sensors to cooperate with the at least one position sensor target to provide a redundant set of position signals representing the position of the support. The deformation sensor is arranged to provide a deformation signal representing a deformation of one of the support and the position measurement device. The processor is configured to calibrate one of the position measurement device and the deformation sensor based on the deformation signal and the redundant set of position signals.

Abstract translation: 提供了一种用于在光刻设备中定位物体的定位系统。 定位系统包括支撑件，位置测量装置，变形传感器和处理器。 构造支撑件来保持对象。 位置测量装置被配置为测量支撑件的位置。 所述位置测量装置包括至少一个位置传感器目标和多个位置传感器，以与所述至少一个位置传感器目标配合，以提供代表所述支撑件的位置的冗余的一组位置信号。 变形传感器被布置成提供表示支撑件和位置测量装置之一的变形的变形信号。 处理器被配置为基于变形信号和冗余的位置信号集来校准位置测量装置和变形传感器之一。