公开(公告)号：US20240012332A1

公开(公告)日：2024-01-11

申请号：US18038601

申请日：2021-11-12

Applicant: ASML Netherlands B.V.

Inventor： Luc Roger Simonne HASPESLAGH ,  Nitesh PANDEY ,  Ties Wouter VAN DER WOORD ,  Halil Gökay YEGEN ,  Guilherme BRONDANI TORRI ,  Sebastianus Adrianus GOORDEN ,  Alexander Ludwig KLEIN ,  Jim Vincent OVERKAMP ,  Edgar Alberto OSORIO OLIVEROS

IPC: G03F7/00 ,  G02B26/08 ,  H02N2/10 ,  H02N2/00 ,  H10N30/50 ,  H10N30/05

CPC classification number: G03F7/70116 ,  G02B26/0858 ,  H02N2/108 ,  H02N2/009 ,  H10N30/50 ,  H10N30/05 ,  G03F7/70625 ,  G03F7/7015 ,  G03F7/706849

Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one multilayer piezoelectric actuator for displacing the mirror, wherein the at least one multilayer piezoelectric actuator is connected to the substrate, and wherein the at least one multilayer piezoelectric actuator comprises a plurality of piezoelectric layers of piezoelectric material interleaved with a plurality of electrode layers to form a stack of layers. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

公开(公告)号：US20230350301A1

公开(公告)日：2023-11-02

申请号：US17800649

申请日：2021-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Evgenia KURGANOVA ,  Gosse Charles DE VRIES ,  Alexey Olegovich POLYAKOV ,  Jim Vincent OVERKAMP ,  Teis Johan COENEN ,  Tamara DRUZHININA ,  Sonia CASTELLANOS ORTEGA ,  Olivier Christian Maurice LUGIER

IPC: G03F7/16 ,  G03F7/36 ,  H01L21/027

CPC classification number: G03F7/167 ,  G03F7/36 ,  H01L21/027

Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.

公开(公告)号：US20180267412A1

公开(公告)日：2018-09-20

申请号：US15918478

申请日：2018-03-12

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20240004184A1

公开(公告)日：2024-01-04

申请号：US18037957

申请日：2021-11-08

Applicant: ASML Netherlands B.V.

Inventor： Luc Roger Simonne HASPESLAGH ,  Nitesh PANDEY ,  Ties Wouter VAN DER WOORD ,  Halil Gökay YEGEN ,  Sebastianus Adrianus GOORDEN ,  Alexis HUMBLET ,  Alexander Ludwig KLEIN ,  Jim Vincent OVERKAMP ,  Guilherme BRONDANI TORRI ,  Edgar Alberto OSORIO OLIVEROS

IPC: G02B26/08 ,  G03F7/00 ,  B81B7/02

CPC classification number: G02B26/0858 ,  G03F7/70291 ,  G03F7/70116 ,  B81B7/02 ,  B81B2207/11 ,  B81B2207/015

Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.

公开(公告)号：US20210079519A1

公开(公告)日：2021-03-18

申请号：US16971012

申请日：2019-02-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Pieter Willem Herman DE JAGER ,  Sander Frederik WUISTER ,  Marie-Claire VAN LARE ,  Ruben Cornelis MAAS ,  Alexey Olegovich POLYAKOV ,  Tamara DRUZHININA ,  Victoria VORONINA ,  Evgenia KURGANOVA ,  Jim Vincent OVERKAMP ,  Bernardo KASTRUP ,  Maarten VAN KAMPEN ,  Alexandr DOLGOV

IPC: C23C16/04 ,  C23C16/455 ,  C23C16/48

Abstract: Methods and apparatuses for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated with electromagnetic radiation having a wavelength of less than 100 nm during a deposition process. Furthermore, an electric field controller is configured to apply an electric field that is oriented so as to force secondary electrons away from the substrate. The irradiation locally drives the deposition process in the selected portion and thereby causes the deposition process to, for example, form a layer of material in a pattern defined by the selected portion.

公开(公告)号：US20230384694A1

公开(公告)日：2023-11-30

申请号：US18269387

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Abdullah ALIKHAN ,  Tammo UITTERDIJK ,  Johannes Bernardus Charles ENGELEN ,  Daniel KAMIENIECKI ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Thomas POIESZ ,  Leon Martin LEVASIER ,  Jim Vincent OVERKAMP ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Koos VAN BERKEL ,  Gregory James DIGUIDO ,  Anthony C. SOCCI, JR. ,  Iliya SIGAL ,  Bram Antonius Gerardus LOMANS ,  Michel Ben Isel HABETS

IPC: G03F7/00 ,  H01L21/683 ,  H01L21/687

CPC classification number: G03F7/70708 ,  G03F7/7095 ,  G03F7/70783 ,  H01L21/6838 ,  H01L21/68757

Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.

公开(公告)号：US20180173116A1

公开(公告)日：2018-06-21

申请号：US15568122

申请日：2016-04-04

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Hendrik KOEVOETS ,  Erik Johan ARLEMARK ,  Sander Catharina Reinier DERKS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Wilfred Edward ENDENDIJK ,  Franciscus Johannes Joseph JANSSEN ,  Raymond Wilhelmus Louis LAFARRE ,  Leon Martin LEVASIER ,  Jim Vincent OVERKAMP ,  Nicolaas TEN KATE ,  Jacobus Cornelis Gerardus VAN DER SANDEN

IPC: G03F7/20 ,  H01L21/67

CPC classification number: G03F7/70875 ,  G03F7/2041 ,  G03F7/70258 ,  G03F7/70783 ,  H01L21/67098 ,  H01L21/683

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus (40) for cooling the substrate, wherein the cooling apparatus comprises a cooling element (42, 44) located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.

公开(公告)号：US20170315454A1

公开(公告)日：2017-11-02

申请号：US15629399

申请日：2017-06-21

Applicant: ASML Netherlands B.V.

Inventor： Thibault Simon Mathieu LAURENT ,  Johannes Henricus Wilhelmus JACOBS ,  Wilhelmus Franciscus Johannes SIMONS ,  Martijn HOUBEN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Han Henricus Aldegonda LEMPENS ,  Rogier Hendrikus Magdalena CORTIE ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Gerben PIETERSE ,  Siegfried Alexander TROMP ,  Theodorus Wilhelmus POLET ,  Jim Vincent OVERKAMP ,  Van Vuong VY

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70716 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/682

Abstract: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway.

公开(公告)号：US20160103398A1

公开(公告)日：2016-04-14

申请号：US14975481

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdalena CORTIE ,  Nicolaas TEN KATE ,  Niek Jacobus Johannes ROSET ,  Michel RIEPEN ,  Henricus Jozef CASTELIJNS ,  Cornelius Maria ROPS ,  Jim Vincent OVERKAMP

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341

Abstract: A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size.

公开(公告)号：US20220213593A1

公开(公告)日：2022-07-07

申请号：US17600493

申请日：2020-03-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Tamara DRUZHININA ,  Jim Vincent OVERKAMP ,  Alexey Olegovich POLYAKOV ,  Teis Johan COENEN ,  Evgenia KURGANOVA ,  Ionel Mugurel CIOBICA ,  Alexander Ludwig KLEIN ,  Albertus Victor Gerardus MANGNUS ,  Marijke SCOTUZZI ,  Bastiaan Maurice VAN DEN BROEK

IPC: C23C16/26 ,  C23C16/48 ,  C23C16/56 ,  G03F7/20 ,  G03F1/22

Abstract: Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a selected portion of a surface of a substrate is irradiated during a deposition process, the irradiation being such as to locally drive the deposition process in the selected portion to form a layer of deposited material in a pattern defined by the selected portion. The deposited material is annealed to modify the deposited material.