Wafer testing and structures for wafer testing

    公开(公告)号:US11650249B1

    公开(公告)日:2023-05-16

    申请号:US16941422

    申请日:2020-07-28

    申请人: XILINX, INC.

    发明人: Yan Wang Nui Chong

    CPC分类号: G01R31/318511 G01R31/2884

    摘要: Examples described herein generally relate to wafer testing and structures implemented on a wafer for wafer testing. In an example method for testing a wafer, power is applied to a first pad in a test site (TS) region on the wafer. The TS region is electrically connected to a device under test (DUT) region on the wafer. The DUT region includes a DUT. The TS region and DUT region are in a first and second scribe line, respectively, on the wafer. A third scribe line is disposed on the wafer between the TS region and the DUT region. A signal is detected from a second pad in the TS region on the wafer. The signal is at least in part a response of the DUT to the power applied to the first pad.

    Embedded shield for protection of memory cells

    公开(公告)号:US11508667B1

    公开(公告)日:2022-11-22

    申请号:US16717708

    申请日:2019-12-17

    申请人: XILINX, INC.

    发明人: James Karp Yan Wang

    摘要: Some examples described herein provide for a shield in an integrated circuit (IC) structure for memory protection. In an example, an IC structure includes a semiconductor material, an interconnect structure, and a shield. The semiconductor material has a protected region. Devices are disposed in a first side of the semiconductor material in the protected region. The interconnect structure is disposed on the first side of the semiconductor material. The interconnect structure interconnects the devices in the protected region. The shield is disposed on a second side of the semiconductor material opposite from the first side of the semiconductor material. The shield is positioned aligned with the protected region.

    Testing of bonded wafers and structures for testing bonded wafers

    公开(公告)号:US11119146B1

    公开(公告)日:2021-09-14

    申请号:US16997630

    申请日:2020-08-19

    申请人: XILINX, INC.

    IPC分类号: G01R31/28 H01L21/66

    摘要: Examples described herein generally relate to testing of bonded wafers and structures implemented for such testing. In an example method, power is applied to a first pad on a stack of bonded wafers. A wafer of the stack includes a process control monitor (PCM) region that includes structure regions. Each structure region is a device under test region, dummy region, and/or chain interconnect region (CIR). The stack includes a serpentine chain test structure (SCTS) electrically connected between first and second metal features in the wafer in first and second CIRs, respectively, in the PCM region. The SCTS includes segments, one or more of which are disposed between neighboring structure regions in the PCM region that are not the first and second CIRs. A signal is detected from a second pad on the stack. The first and second pads are electrically connected to the first and second metal features, respectively.