公开(公告)号：US5073243A

公开(公告)日：1991-12-17

申请号：US459243

申请日：1989-12-29

申请人： Akira Gotoh ,  Yukinobu Yamazaki ,  Naoyuki Kikuchi ,  Shinkichi Horigome ,  Motoyasu Terao ,  Horoyuki Suzuki ,  Makoto Kitoh ,  Yuichi Kokaku ,  Mitsuru Shimizu

发明人： Akira Gotoh ,  Yukinobu Yamazaki ,  Naoyuki Kikuchi ,  Shinkichi Horigome ,  Motoyasu Terao ,  Horoyuki Suzuki ,  Makoto Kitoh ,  Yuichi Kokaku ,  Mitsuru Shimizu

IPC分类号： G11B7/24 ,  G11B7/243 ,  G11B7/253 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/2575

CPC分类号： G11B7/24 ,  G11B7/2575 ,  G11B2007/24312 ,  G11B2007/24316 ,  G11B7/2533 ,  G11B7/2534 ,  Y10S428/913 ,  Y10S430/146 ,  Y10T428/261 ,  Y10T428/266 ,  Y10T428/31507 ,  Y10T428/31511 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31681 ,  Y10T428/31692 ,  Y10T428/31721 ,  Y10T428/31786 ,  Y10T428/3183

摘要： An optical recording medium is made by sputtering a polymeric material in an evacuated chamber to form an under layer on a substrate having a preformed grooved pattern of prepits and pregrooves, and then forming a recording layer on the underlayer in the chamber continuously after forming the underlayer. Said under layer is made of a high polymeric material which can be melted, sublimated, or decomposed at a lower temperature than the melting point, the sublimating point, or the decomposing temperature of said recording layer. Accordingly, said under layer can relax the thermal shock transferred from said substrate into said recording layer, and the deformation of said substrate can be prevented, even though a laser beam for playback is repeatedly radiated onto said recording layer, and said optical recording medium has a larger recording sensitivity than the recording sensitivity of an optical recording disc of a prior art.

公开(公告)号：US4908250A

公开(公告)日：1990-03-13

申请号：US246925

申请日：1988-09-19

申请人： Akira Gotoh ,  Yukinobu Yamazaki ,  Naoyuki Kikuchi ,  Shinkichi Horigome ,  Motoyasu Terao ,  Hiroyuki Suzuki ,  Makoto Kitoh ,  Yuichi Kokaku ,  Mitsuru Shimizu

发明人： Akira Gotoh ,  Yukinobu Yamazaki ,  Naoyuki Kikuchi ,  Shinkichi Horigome ,  Motoyasu Terao ,  Hiroyuki Suzuki ,  Makoto Kitoh ,  Yuichi Kokaku ,  Mitsuru Shimizu

IPC分类号： G11B7/24 ,  G11B7/243 ,  G11B7/253 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/2575

CPC分类号： G11B7/24 ,  G11B7/2575 ,  G11B2007/24312 ,  G11B2007/24316 ,  G11B7/2533 ,  G11B7/2534 ,  Y10S428/913 ,  Y10S430/146 ,  Y10T428/261 ,  Y10T428/266 ,  Y10T428/31507 ,  Y10T428/31511 ,  Y10T428/3154 ,  Y10T428/31544 ,  Y10T428/31681 ,  Y10T428/31692 ,  Y10T428/31721 ,  Y10T428/31786 ,  Y10T428/3183

摘要： In an optical recording medium, an under layer is formed between an even pattern of a substrate and a recording layer, and said under layer is made of a high polymeric material which can be melted, sublimated, or decomposed at a lower temperature than the melting point, the sublimating point, or the decomposing temperature of said recording layer. Accordingly, said under layer can relax the thermal shock transferred from said substrate into said recording layer, and the deformation of said substrate can be prevented, even through a laser beam for playback is repeatedly radiated onto said recording layer, and said optical recording medium has a larger recording sensitivity than the recording sensitivity of an optical recording disc of a prior art.

摘要翻译： 在光记录介质中，在基板的偶数图形和记录层之间形成下层，所述下层由可在比熔化的温度低的温度下熔化，升华或分解的高分子材料制成 点，升华点或所述记录层的分解温度。 因此，所述下层可以放松从所述基板转移到所述记录层中的热冲击，并且即使通过用于回放的激光束被重复地辐射到所述记录层上，也可以防止所述基板的变形，并且所述光记录介质 比现有技术的光记录盘的记录灵敏度更大的记录灵敏度。

公开(公告)号：US5651867A

公开(公告)日：1997-07-29

申请号：US591935

申请日：1990-10-02

申请人： Yuichi Kokaku ,  Hiroyuki Kataoka ,  Makoto Kitoh ,  Shigehiko Fujimaki ,  Satoshi Matsunuma ,  Kenji Furusawa ,  Nobuo Nakagawa ,  Katsuo Abe ,  Masaaki Hayashi

发明人： Yuichi Kokaku ,  Hiroyuki Kataoka ,  Makoto Kitoh ,  Shigehiko Fujimaki ,  Satoshi Matsunuma ,  Kenji Furusawa ,  Nobuo Nakagawa ,  Katsuo Abe ,  Masaaki Hayashi

IPC分类号： C23C14/34 ,  C23C14/56 ,  C23C16/509 ,  G11B5/84 ,  G11B5/851 ,  H01J37/32

CPC分类号： H01J37/32623 ,  C23C14/566 ,  C23C16/5096 ,  G11B5/84 ,  G11B5/851 ,  H01J37/32743

摘要： A plasma processing apparatus comprising: a vacuum container; an evacuation means for keeping the interior of the vacuum container at a pressure not higher than atmospheric pressure; a substrate support device for supporting a substrate to be subjected to plasma processing; an electrode for generating plasma in cooperation with the substrate support; a voltage supply for applying a voltage to the electrode; a gas introducing system for introducing a gaseous material into a space where the plasma is produced; a surrounding member for enclosing the space above the substrate support, and a drive for relatively moving the surrounding member to space an end of the surrounding member proximate from the substrate from at least one of the substrate support and the substrate supported thereon by a distance which is short enough to suppress plasma leakage during the plasma processing and to position the end of the surrounding member away from said at least one of the substrate support and the substrate thereon for charging and discharging of the substrate.

摘要翻译： 一种等离子体处理装置，包括：真空容器; 用于将真空容器的内部保持在不高于大气压的压力的排气装置; 用于支撑待进行等离子体处理的基板的基板支撑装置; 用于与衬底支撑件协作产生等离子体的电极; 用于向电极施加电压的电压源; 用于将气态物质引入制造等离子体的空间中的气体导入系统; 用于封闭衬底支撑件上方的空间的周围构件以及用于相对移动周围构件的驱动器，用于将基板支撑件和支撑在其上的衬底中的至少一个上的衬底附近的邻近基板的一端远离一定距离， 足够短以抑制等离子体处理期间的等离子体泄漏并且使周围部件的端部远离所述至少一个基板支撑件和其上的基板，以对基板进行充电和放电。

公开(公告)号：US5300189A

公开(公告)日：1994-04-05

申请号：US51701

申请日：1987-05-20

申请人： Yuichi Kokaku ,  Makoto Kitoh ,  Yoshinori Honda

发明人： Yuichi Kokaku ,  Makoto Kitoh ,  Yoshinori Honda

IPC分类号： C23C14/02 ,  B29C59/14 ,  C23C16/50 ,  C23F4/00 ,  B05D5/00 ,  B01J15/00

CPC分类号： B29C59/14 ,  B29C2037/90

摘要： A surface treatment method and apparatus permitting the treatment of a film with plasma with a high treatment speed and a high efficiency without uselessly complicating the construction of a device for realizing it are disclosed. The area where the counter electrode is in contact with the plasma is sufficiently larger than the area where the rotating electrode is in contact therewith. The ratio of the areas is preferably not smaller than 1.5 and the etching speed may be increased to a value more than ten times as great as that obtained by a prior art method.

摘要翻译： 公开了一种能够以高处理速度和高效率处理具有等离子体的膜的表面处理方法和装置，而没有使实现装置的结构无任何复杂化。 对电极与等离子体接触的区域比旋转电极与其接触的面积充分大。 面积比优选为1.5以上，蚀刻速度可以提高到通过现有技术得到的数值的10倍以上的值。

公开(公告)号：US5275850A

公开(公告)日：1994-01-04

申请号：US755589

申请日：1991-09-04

申请人： Makoto Kitoh ,  Yuichi Kokaku ,  Makiko Itoh

发明人： Makoto Kitoh ,  Yuichi Kokaku ,  Makiko Itoh

IPC分类号： C23C16/26 ,  G11B5/72 ,  G11B5/84 ,  G11B05/00 ,  C23C16/00

CPC分类号： G11B5/8408 ,  C23C16/26 ,  G11B5/72 ,  Y10S428/90 ,  Y10T428/30

摘要： A magnetic disk comprising a nonmagnetic substrate, a metallic thin film magnetic layer provided on the substrate and a hard carbon protective layer provided on the magnetic layer, the hard carbon protective layer containing at least one metal element of silicon, germanium, tin and lead, or further containing fluorine, formed by bias plasma CVD treatment, has a high attrition resistance, a high peeling resistance and a high crack resistance or further a higher corrosion resistance.

摘要翻译： 一种磁盘，包括非磁性基板，设置在所述基板上的金属薄膜磁性层和设置在所述磁性层上的硬质碳保护层，所述硬质碳保护层含有至少一种硅，锗，锡和铅的金属元素， 或进一步含有通过偏压等离子体CVD处理形成的氟，具有高抗磨损性，高剥离性和高抗裂性，或进一步具有较高的耐腐蚀性。

公开(公告)号：US5409738A

公开(公告)日：1995-04-25

申请号：US216287

申请日：1994-03-23

申请人： Satoshi Matsunuma ,  Yuichi Kokaku ,  Makoto Kitoh ,  Shigehiko Fujimaki

发明人： Satoshi Matsunuma ,  Yuichi Kokaku ,  Makoto Kitoh ,  Shigehiko Fujimaki

IPC分类号： C10M107/38 ,  B05D5/08 ,  C08G65/00 ,  C08G65/02 ,  C08G65/04 ,  C10M177/00 ,  C10N30/06 ,  C10N30/12 ,  C10N40/18 ,  C10N50/08 ,  C10N70/00 ,  G11B5/64 ,  G11B5/71 ,  G11B5/72 ,  G11B5/725 ,  G11B5/73 ,  G11B5/738 ,  G11B5/84 ,  B05D5/12

CPC分类号： B05D5/08 ,  C10M107/38 ,  G11B5/725 ,  C10M2213/00 ,  C10M2213/04 ,  C10M2213/06 ,  C10N2240/20 ,  C10N2240/201 ,  C10N2240/202 ,  C10N2240/203 ,  C10N2240/204 ,  C10N2240/205

摘要： Disclosed are a recording medium comprising a substrate, a thin film for recording formed on at least one side of the substrate, a protective layer formed on the thin film, and a lubricative film formed on the protective layer, the lubricative film comprising an oxidative polymerization product having main molecular chains chemically bonded to the protective film; and a process for producing the recording medium. This recording medium is excellent in lubricity and durability, and the layers formed thereon can be very thin.

摘要翻译： 公开了一种记录介质，包括基板，形成在基板的至少一侧上的用于记录的薄膜，形成在薄膜上的保护层，以及形成在保护层上的润滑膜，该润滑膜包括氧化聚合 具有化学键合到保护膜的主分子链的产物; 以及用于制造记录介质的方法。 该记录介质的润滑性和耐久性优异，并且其上形成的层可以非常薄。

公开(公告)号：US5104709A

公开(公告)日：1992-04-14

申请号：US540187

申请日：1990-06-19

申请人： Yuichi Kokaku ,  Satoshi Matsunuma ,  Shigehiko Fujimaki ,  Makoto Kitoh ,  Kenji Furusawa

发明人： Yuichi Kokaku ,  Satoshi Matsunuma ,  Shigehiko Fujimaki ,  Makoto Kitoh ,  Kenji Furusawa

IPC分类号： G11B5/64 ,  G11B5/72 ,  G11B5/725 ,  G11B5/73 ,  G11B5/738 ,  G11B5/84

CPC分类号： G11B5/72 ,  G11B5/725 ,  Y10S428/90 ,  Y10T428/30

摘要： The magnetic recording medium of the present invention comprises(a) a non-magnetic substrate,(b) a magnetic recording layer containing at least one ferromagnetic substance on at least one side of the substrate,(c) a protective layer the magnetic recording layer, and(d) a lubricant layer on the protective layer, wherein an adhesion-strengthening substance which is at least one member selected from the group consisting of metals and metal compounds is distributed substantially uniformly on the layer (c) at the interface between the layer (c) and the layer (d) so as not to cover the whole surface of the layer (c) and so as to contact also with the layer (d).

摘要翻译： 本发明的磁记录介质包括（a）非磁性基片，（b）在基片的至少一侧含有至少一种铁磁物质的磁记录层，（c）保护层，该磁记录层 和（d）保护层上的润滑剂层，其中，选自金属和金属化合物中的至少一种的粘合强化物质基本均匀地分布在层（c）上的界面处 层（c）和层（d），以便不覆盖层（c）的整个表面，并且也与层（d）接触。

公开(公告)号：US5958542A

公开(公告)日：1999-09-28

申请号：US656911

申请日：1996-06-03

申请人： Mitsuyoshi Ootake ,  Yuichi Kokaku ,  Yoshinori Honda ,  Akira Kato ,  Hiroaki Hagimae ,  Heigo Ishihara ,  Kenji Furusawa

发明人： Mitsuyoshi Ootake ,  Yuichi Kokaku ,  Yoshinori Honda ,  Akira Kato ,  Hiroaki Hagimae ,  Heigo Ishihara ,  Kenji Furusawa

IPC分类号： G11B5/72 ,  G11B5/82 ,  G11B5/84 ,  G11B5/66

CPC分类号： G11B5/82 ,  B82Y10/00 ,  G11B5/72 ,  G11B5/743 ,  G11B5/8408 ,  Y10S428/90 ,  Y10T428/24355 ,  Y10T428/265

摘要： A thin film magnetic disc in which dot-like scattered bumps, made of a material different from that of the protective layer, are formed on the protective layer, and a lubricant layer is formed on the surfaces of the protective layer and the scattered bumps. A protective layer excellent in strength and disk durability is obtained by using a material different from that of the bumps. The functions of the protective layer and scattered bumps are separated from each other and make full use of the different materials. Such a protective layer is effective to reduce spacing between a head and the disc.

摘要翻译： 在保护层上形成有由不同于保护层的材料制成的点状散射凸块的薄膜磁盘，并且在保护层和散射凸块的表面上形成润滑剂层。 通过使用与凸点不同的材料，可获得强度和耐久性优异的保护层。 保护层和散射凸起的功能彼此分离，充分利用不同的材料。 这样的保护层对于减小头部和盘之间的间隔是有效的。

公开(公告)号：US20060121317A1

公开(公告)日：2006-06-08

申请号：US11288546

申请日：2005-11-28

申请人： Yuichi Kokaku ,  Mitsuhiro Shoda ,  Hiroyuki Matsumoto ,  Mikio Suzuki ,  Takehiko Hamaguchi ,  Yuzuru Hosoe

发明人： Yuichi Kokaku ,  Mitsuhiro Shoda ,  Hiroyuki Matsumoto ,  Mikio Suzuki ,  Takehiko Hamaguchi ,  Yuzuru Hosoe

IPC分类号： B05D5/12

CPC分类号： G11B20/10009 ,  G11B5/4555 ,  G11B5/65 ,  G11B5/667 ,  G11B5/8404 ,  G11B20/1816

摘要： The present invention restricts defect density on the magnetic disk based on predetermined polishing conditions by applying a magnetic field to the entire surface of a magnetic disk in a direction vertical thereto, rotating the magnetic disk, loading a magnetic head to the magnetic disk, reproducing signals from the magnetic disk, processing the reproduced signals by a waveform analyzer, counting pulse waveforms of 0.9 times or more a servo-bit length at ½ threshold value of an average output, and measuring the defect density on the magnetic disk giving an undesired effect on the I/O performance of the magnetic disk drive. In a case of a magnetic recording medium using a vertical magnetic recording system, even with fine defect of magnetic layer, a servo pattern cannot be judged correctly. This provides degradation of the I/O performance of increasing the time necessary for reading out large capacity data, lowering the performance of the entire magnetic disk drive.

摘要翻译： 本发明基于预定的抛光条件来限制磁盘上的缺陷密度，通过向垂直于其的方向的磁盘的整个表面施加磁场，旋转磁盘，将磁头加载到磁盘，再现信号 通过波形分析器对再生信号进行处理，对平均输出的1/2阈值的伺服位长度的0.9倍以上的脉冲波形进行计数，并测量磁盘上的缺陷密度，给出不期望的影响 磁盘驱动器的I / O性能。 在使用垂直磁记录系统的磁记录介质的情况下，即使磁性层的细小缺陷，也不能正确判断伺服图案。 这提供了I / O性能的劣化，从而增加了读取大容量数据所需的时间，降低了整个磁盘驱动器的性能。

公开(公告)号：US20060044688A1

公开(公告)日：2006-03-02

申请号：US11215533

申请日：2005-08-29

申请人： Yuichi Kokaku ,  Tomonori Kozaki ,  Toshinori Ono ,  Kazuhiro Ura

发明人： Yuichi Kokaku ,  Tomonori Kozaki ,  Toshinori Ono ,  Kazuhiro Ura

IPC分类号： G11B5/82

CPC分类号： G11B5/84 ,  G11B5/8408

摘要： Embodiments of the invention provide a magnetic disk capable of maintaining a satisfactory sliding resistance and having a high corrosion resistance and a manufacturing method thereof. The magnetic disk and the manufacturing method thereof are realized by forming a protection film having a less film thickness distribution on a magnetic film surface, particularly by reducing a film thickness distribution in a load/unload zone in addition to a reduction in film thickness of the protection film. In one embodiment, a shortest distance between a substrate and a supporting member is 10 mm or more in a step of forming the protection film, the substrate being mounted on a holder having claws for holding the substrate and supporting members for supporting the claws. In addition, the method is characterized by chamfering the face confronting the substrate of the supporting member and setting the shortest distance between the substrate and the supporting member to 5 mm or more.

摘要翻译： 本发明的实施例提供一种能够保持令人满意的滑动阻力并具有高耐腐蚀性的磁盘及其制造方法。 磁盘及其制造方法通过在磁性膜表面上形成具有较小膜厚分布的保护膜，特别是通过降低负载/卸载区域中的膜厚度分布，除了减小膜厚度 保护膜 在一个实施例中，在形成保护膜的步骤中，衬底和支撑构件之间的最短距离为10mm以上，衬底安装在具有用于保持衬底的支架和用于支撑爪的支撑构件的保持器上。 此外，该方法的特征在于使面对面的支撑构件的基板倒角并将基板和支撑构件之间的最短距离设定为5mm以上。