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    Positive resist composition and method of forming resist pattern
    3.
    发明授权
    Positive resist composition and method of forming resist pattern 有权
    正型抗蚀剂组合物和形成抗蚀剂图案的方法

    公开(公告)号：US08206891B2

    公开(公告)日：2012-06-26

    申请号：US12573686

    申请日：2009-10-05

    申请人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

    发明人： Takehiro Seshimo ,  Yoshiyuki Utsumi ,  Akiya Kawaue ,  Takahiro Dazai ,  Tomoyuki Hirano ,  Fumitake Kaneko ,  Kotaro Endo

    IPC分类号： G03F7/004 ,  G03F7/30

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/123

    摘要： A positive resist composition including: a base component (A) which includes a polymeric compound (A1) containing a structural unit (a0) represented by the general formula (a0-1) and a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group; and an acid generator component (B) which includes an acid generator (B1) containing an anion moiety represented by the general formula (I): (in the formula (a0-1), R1 represents a hydrogen atom, a lower alkyl group of 1 to 5 carbon atoms or a halogenated lower alkyl group of 1 to 5 carbon atoms; R2 represents a bivalent linking group; and R3 represents a cyclic group containing —SO2— within the ring skeleton. In the formula (I), X represents a cyclic group of 3 to 30 carbon atoms, Q1 represents a bivalent linking group containing an oxygen atom; Y1 represents an alkylene group of 1 to 4 carbon atoms or a fluorinated alkylene group of 1 to 4 carbon atoms).

    摘要翻译： 一种正型抗蚀剂组合物，其包含：包含含有由通式（a0-1）表示的结构单元（a0）的聚合化合物（A1）和由具有由通式（a0-1）表示的结构单元（a0））的结构单元（a1）的基础组分（A） 酸解离，溶解抑制组; 和含有由通式（I）表示的阴离子部分的酸发生剂（B1）的酸产生剂成分（B）：（式（a0-1）中，R 1表示氢原子，低级烷基 1〜5个碳原子的卤代低级烷基或1〜5个碳原子的卤代低级烷基; R2表示二价连接基团; R3表示环状骨架中含有-SO2-的环状基团，式（I）中，X表示 3〜30个碳原子的环状基团，Q1表示含有氧原子的二价连接基团，Y1表示碳原子数1〜4的亚烷基或碳原子数1〜4的氟化亚烷基。

    NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN
    6.
    发明申请
    NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN 有权
    新型化合物及其制造方法，酸发生器，耐蚀组合物和形成耐蚀图案的方法

    公开(公告)号：US20090208871A1

    公开(公告)日：2009-08-20

    申请号：US12371876

    申请日：2009-02-16

    申请人： Akiya Kawaue ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Yoshiyuki Utsumi ,  Hiroaki Shimizu

    发明人： Akiya Kawaue ,  Keita Ishiduka ,  Kensuke Matsuzawa ,  Yoshiyuki Utsumi ,  Hiroaki Shimizu

    IPC分类号： G03F7/20 ,  G03F7/004 ,  C07D307/77

    CPC分类号： C07D493/08 ,  C07D493/18 ,  G03F7/0045 ,  G03F7/0397

    摘要： A resist composition including a base component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) consisting of a compound represented by general formula (b1-2) shown below: [Chemical Formula 1] A+Z−  (b1-2) wherein A+ represents an organic cation; and Z− represents an anionic cyclic group, wherein the cyclic group includes an ester linkage within the ring structure, two mutually different groups are bonded to the ring structure, one of these groups includes an ester linkage in which a carbon atom that constitutes part of the ester linkage is bonded directly to the ring structure, and the other group includes an anion moiety.

    摘要翻译： 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中表现出改变的溶解性的碱成分（A）和曝光时产生酸的酸产生剂成分（B），其中，所述酸发生剂成分（B）含有酸 发生器（B1）由以下所示的通式（b1-2）表示的化合物组成：<？in-line-formula description =“In-line Formulas”end =“lead”？> [化学式1] < -line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> A + Z-（b1-2） <？in-line-formula description =“In-line formula”end =“tail”？>其中A +表示有机阳离子; Z-表示阴离子性环状基团，其中环状基团在环结构中包含酯键，两个相互不同的基团与环结构键合，这些基团之一包括酯键，其中构成 酯键直接键合到环结构上，另一个基团包括阴离子部分。

    Resist composition, method of forming resist pattern, novel compound, and acid generator
    7.
    发明授权
    Resist composition, method of forming resist pattern, novel compound, and acid generator 有权
    抗蚀剂组合物，抗蚀剂图案形成方法，新型化合物和酸发生剂

    公开(公告)号：US08703387B2

    公开(公告)日：2014-04-22

    申请号：US13478390

    申请日：2012-05-23

    申请人： Akiya Kawaue ,  Yoshiyuki Utsumi

    发明人： Akiya Kawaue ,  Yoshiyuki Utsumi

    IPC分类号： G03F1/00 ,  G03F7/00 ,  C07C309/25 ,  C07C317/04 ,  C07D327/10

    CPC分类号： C07D497/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/325

    摘要： A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an —SO2— bond or an —O—SO2— bond, and at least one carbon atom which is not adjacent to the —SO2— bond or the —O—SO2— bond has an oxygen atom as a substituent; Q1 represents a divalent linking group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A+ represents an organic cation]. [Chemical Formula 1] X-Q1-Y1—SO3⊖A⊕  (b1-1)

    摘要翻译： 一种抗蚀剂组合物，其包含在酸作用下在显影液中显示改变的溶解度的碱成分（A）和曝光时产生酸的酸发生剂组分（B），所述酸产生剂组分（B）包含酸产生剂 B1），其由下述通式（b1-1）表示的化合物[其中，X表示可以具有取代基的3〜30个碳原子的环状基团，条件是环状基团的环状骨架包含-SO 2 - 键或-O-SO2-键，并且与-SO 2 - 键或-O-SO 2 - 键不相邻的至少一个碳原子具有氧原子作为取代基; Q1表示二价连接基团或单键; Y1表示可以具有取代基的亚烷基或可以具有取代基的氟化亚烷基; A +表示有机阳离子]。 [化学式1] X-Q1-Y1-SO3⊖A⊕（b1-1）

    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND
    8.
    发明申请
    RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND 有权
    耐蚀组合物，形成耐火图案的方法和新化合物

    公开(公告)号：US20120148955A1

    公开(公告)日：2012-06-14

    申请号：US13312013

    申请日：2011-12-06

    申请人： Yoshiyuki Utsumi ,  Kenichiro Miyashita ,  Akiya Kawaue

    发明人： Yoshiyuki Utsumi ,  Kenichiro Miyashita ,  Akiya Kawaue

    IPC分类号： G03F7/20 ,  C07D405/02 ,  C07D409/02 ,  C07D411/02 ,  G03F7/027 ,  C07D213/79

    CPC分类号： C07D213/79 ,  C07D213/80 ,  C07D215/48 ,  C07D215/50 ,  C07D215/54 ,  C07D219/04 ,  C07D221/10 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/123

    摘要： A resist composition including: a base component (A) which exhibits changed solubility in a developing solution under action of acid; a nitrogen-containing organic compound component (C) containing a compound (C1) represented by general formula (c1) shown below; and an acid generator component (B) which generates acid upon exposure, provided that the compound (C1) is excluded from the acid generator component (B): wherein RN represents a nitrogen-containing heterocyclic group which may have a substituent; X0 represents a linear or branched divalent aliphatic hydrocarbon group of 1 to 10 carbon atoms, a cyclic divalent aliphatic hydrocarbon group of 3 to 20 carbon atoms or a divalent aliphatic hydrocarbon group of 3 to 20 carbon having a cyclic partial structure, or any one of these groups in which some or all of the hydrogen atoms thereof have been substituted with fluorine atoms; and M+ represents an organic cation.

    摘要翻译： 一种抗蚀剂组合物，其包含：在酸的作用下在显影液中表现出改变的溶解度的碱成分（A） 含有下述通式（c1）表示的化合物（C1）的含氮有机化合物成分（C） 以及暴露后产生酸的酸产生剂组分（B），条件是化合物（C1）不在酸产生剂组分（B）中：其中RN表示可以具有取代基的含氮杂环基; X 0表示1〜10个碳原子的直链或支链的二价脂族烃基，3〜20个碳原子的环状二价脂族烃基或具有环状部分结构的3〜20个碳的二价脂肪族烃基， 这些基团中的一部分或全部氢原子被氟原子取代; M +表示有机阳离子。