摘要:
A method for milling a structure. A single- or multi-layer resist having no undercut is added to a surface of a structure to be milled, the surface to be milled defining a plane. A milling process, such as ion milling, is performed. The milling process includes milling the structure at high incidence and milling the structure at razing incidence. The milling process can be performed only once, or repeated multiple times. High incidence can be defined as about 65 to about 90 degrees from the plane of the surface being milled. Razing incidence can be defined as about 0 to about 30 degrees from the plane of the surface being milled.
摘要:
The present invention is a magnetic head having a helical induction coil and includes hard disk drive devices that utilize the magnetic head. The helical coil is fabricated around a magnetic pole yoke in a series of process steps that include a reactive ion etch (RIE) process step which is utilized to simultaneously form vertical interconnect vias and upper helical coil member trenches. Thereafter, in a single fabrication step, such as by electroplating, the vertical interconnect lines and the upper helical coil traces are created in a single fabrication step, such that they are integrally formed. The vertical interconnect lines provide an electrical connection between outer ends of previously formed lower helical coil traces and outer ends of the integrally formed upper helical coil traces, such that a helical coil is fabricated. In the preferred embodiment, the helical coil is composed of copper.
摘要:
A write head has a second pole tip layer, a coil layer and a write coil insulation layer that are planarized at their top surfaces. A thin top insulation layer insulates the top of the coil layer from a yoke portion of the second pole piece which is connected to the second pole tip layer in the pole tip region and connected to a first pole piece layer in a back gap region. In a preferred embodiment the write gap layer extends throughout the yoke region and provides the only insulation between the first pole piece layer and the coil layer. Further, it is preferred that the write coil insulation layer be an inorganic material such as silicon dioxide (SiO2). Several embodiments of the write head are provided along with novel methods of making.
摘要:
A write head has a second pole tip layer, a coil layer and a write coil insulation layer that are planarized at their top surfaces. A thin top insulation layer insulates the top of the coil layer from a yoke portion of the second pole piece which is connected to the second pole tip layer in the pole tip region and connected to a first pole piece layer in a back gap region. In a preferred embodiment the write gap layer extends throughout the yoke region and provides the only insulation between the first pole piece layer and the coil layer. Further, it is preferred that the write coil insulation layer be an inorganic material such as silicon dioxide (SiO2). Several embodiments of the write head are provided along with novel methods of making.
摘要:
A method for manufacturing a pole tip structure for a magnetic head is provided. An etch stop layer is initially deposited after which a transfer layer is deposited. Further deposited is at least one masking layer. Reactive ion etching is then performed to define a trench in at least the transfer layer. A pole tip layer is then deposited in the trench to define a pole tip structure flanked at least in part by the transfer layer. A surface of the transfer layer or etch stop layer then remains in co-planar relationship with a surface of the pole tip structure.
摘要:
A magnetic head having a helical induction coil. The helical coil is fabricated around a magnetic pole yoke in a series of process steps that include a reactive ion etch (RIE) process step which is utilized to simultaneously form vertical interconnect vias and upper helical coil member trenches. Thereafter, in a single fabrication step, such as by electroplating, the vertical interconnect lines and the upper helical coil traces are created in a single fabrication step, such that they are integrally formed. The vertical interconnect lines provide an electrical connection between outer ends of previously formed lower helical coil traces and outer ends of the integrally formed upper helical coil traces, such that a helical coil is fabricated. In the preferred embodiment, the helical coil is composed of copper.
摘要:
A method comprises depositing first and second lead layers in end regions which surround a central region; and forming a read sensor in the central region such that a first edge of the read sensor is disposed above an edge of the first lead layer and a second edge of the read sensor is disposed above an edge of the second lead layer. In one approach, first and second bias layers are deposited in end regions over the first and the second lead layers. The read sensor is formed in the central region such that the first edge of the read sensor is disposed above an edge of the first bias layer and the second edge of the read sensor is disposed above an edge of the second bias layer. Third and fourth bias layers are deposited adjacent the read sensor. Methods taking different approaches are also presented.
摘要:
A method for fabricating a magnetic head includes forming a first pole and a flux shaping layer in spaced relation to the first pole. A nonmagnetic layer is formed adjacent the flux shaping layer and positioned on an air bearing surface (ABS) side of the flux shaping layer. A tapered recess is created in the nonmagnetic layer, the taper of the recess increasing (i.e., becoming deeper) towards the flux forming layer. The recess is filled with a magnetic material. A probe layer is formed such that it is in electrical communication with the magnetic material filling the recess.
摘要:
A method for determining a characteristic of a magnetic head during its fabrication process on the surface of a wafer substrate. The method involves the fabrication of a test magnetic pole artifact in a field area of the substrate surface adjacent to the actual magnetic pole that is being fabricated. A test pole structure is fabricated simultaneously with, and utilizing the same fabrication conditions and parameters as, the actual pole such that the test pole is nearly identical to the actual pole. During a field etch step undertaken in the fabrication of the actual pole, portions of the test pole structure are removed, leaving a test pole artifact on the wafer surface. The test pole artifact can thus be easily measured as an accurate indication of characteristics of the actual magnetic pole that are difficult to measure directly, thereby saving time and expense in the magnetic head fabrication process. This method is particularly suited to determining the width of the base of the P2 pole tip of a magnetic head, where measurement of the base of the actual magnetic head pole tip is made difficult by the presence of the pole tip, and where the test artifact is easily measured because the test pole tip structure has been etched away, leaving only the artifact for measurement.
摘要:
A merged magnetic head has a top first pole tip layer and a bottom second pole tip layer which are located entirely between an air bearing surface and a coil layer. A write gap layer separates the pole tip layers from one another at the ABS. A zero throat height (ZTH) defining layer is located adjacent the top gap layer between the pole tip layers and is recessed from the ABS so as to further separate the pole tip layers from one another at a location recessed from the ABS so as to define the zero throat height of the write head where the first and second pole pieces first commence to separate from one another after the ABS. A method of construction, which may be substantially a dry process or substantially a wet process, employs ion milling to form the shapes of the pole tip layers while protecting a bottom first pole piece layer from thinning except for notching of the bottom first pole piece layer adjacent side walls of the top first pole tip layer, the protection being provided by the ZTH defining layer in field regions of the head.