公开(公告)号：US20050079660A1

公开(公告)日：2005-04-14

申请号：US10917165

申请日：2004-08-11

申请人： Anand Murthy ,  Boyan Boyanov ,  Ravindra Soman ,  Robert Chau

发明人： Anand Murthy ,  Boyan Boyanov ,  Ravindra Soman ,  Robert Chau

IPC分类号： H01L21/225 ,  H01L21/336 ,  H01L21/8238 ,  H01L29/165 ,  H01L29/45 ,  H01L29/78 ,  H01L21/8234

CPC分类号： H01L29/66477 ,  H01L21/2254 ,  H01L21/823814 ,  H01L21/823835 ,  H01L29/165 ,  H01L29/41783 ,  H01L29/456 ,  H01L29/66628 ,  H01L29/66636 ,  H01L29/7834

摘要： Transistors are manufactured by growing germanium source and drain regions, implanting dopant impurities into the germanium, and subsequently annealing the source and drain regions so that the dopant impurities diffuse through the germanium. The process is simpler than a process wherein germanium is insitu doped with p-type or n-type impurities. The dopant impurities diffuse easily through the germanium but not easily through underlying silicon, so that an interface between the germanium and silicon acts as a diffusion barrier and ensures positioning of the dopant atoms in the regions of the device where they improve transistor performance.

摘要翻译： 晶体管通过生长锗源极和漏极区域，将掺杂杂质注入到锗中并随后对源极和漏极区域进行退火来制造，使得掺杂剂杂质扩散通过锗。 该方法比其中锗掺杂有p型或n型杂质的方法简单。 掺杂剂杂质易于通过锗扩散，但不容易通过下面的硅，使得锗和硅之间的界面充当扩散势垒，并确保掺杂剂原子在其中提高晶体管性能的区域中的位置。

公开(公告)号：US06723622B2

公开(公告)日：2004-04-20

申请号：US10081099

申请日：2002-02-21

申请人： Anand Murthy ,  Ravindra Soman ,  Boyan Boyanov

发明人： Anand Murthy ,  Ravindra Soman ,  Boyan Boyanov

IPC分类号： H01L21365

CPC分类号： C30B25/02 ,  C30B29/08 ,  H01L21/02381 ,  H01L21/0245 ,  H01L21/0251 ,  H01L21/02532 ,  H01L21/02576 ,  H01L21/02579 ,  H01L21/0262 ,  H01L21/02636 ,  H01L29/66916 ,  Y10T428/12674

摘要： A composite of germanium film for a semiconductor device and methods of making the same. The method comprises growing a graded germanium film on a semiconductor substrate in a deposition chamber while simultaneously decreasing a deposition temperature and decreasing a silicon source gas and increasing a germanium source gas over a predetermined amount of time. The graded germanium film comprises an ultra-thin silicon-germanium buffer layer and a germanium film.

摘要翻译： 用于半导体器件的锗膜的复合材料及其制造方法。 该方法包括在沉积室中在半导体衬底上生长渐变锗膜，同时降低沉积温度并减少硅源气体并增加锗源气体超过预定时间量。 分级锗膜包括超薄硅 - 锗缓冲层和锗膜。

公开(公告)号：US06933589B2

公开(公告)日：2005-08-23

申请号：US10917165

申请日：2004-08-11

申请人： Anand S. Murthy ,  Boyan Boyanov ,  Ravindra Soman ,  Robert S. Chau

发明人： Anand S. Murthy ,  Boyan Boyanov ,  Ravindra Soman ,  Robert S. Chau

IPC分类号： H01L21/225 ,  H01L21/336 ,  H01L21/8238 ,  H01L29/165 ,  H01L29/45 ,  H01L29/78 ,  H01L31/117 ,  H01L31/0288

CPC分类号： H01L29/66477 ,  H01L21/2254 ,  H01L21/823814 ,  H01L21/823835 ,  H01L29/165 ,  H01L29/41783 ,  H01L29/456 ,  H01L29/66628 ,  H01L29/66636 ,  H01L29/7834

摘要： Transistors are manufactured by growing germanium source and drain regions, implanting dopant impurities into the germanium, and subsequently annealing the source and drain regions so that the dopant impurities diffuse through the germanium. The process is simpler than a process wherein germanium is insitu doped with p-type or n-type impurities. The dopant impurities diffuse easily through the germanium but not easily through underlying silicon, so that an interface between the germanium and silicon acts as a diffusion barrier and ensures positioning of the dopant atoms in the regions of the device where they improve transistor performance.

公开(公告)号：US06812086B2

公开(公告)日：2004-11-02

申请号：US10197041

申请日：2002-07-16

申请人： Anand S. Murthy ,  Boyan Boyanov ,  Ravindra Soman ,  Robert S. Chau

发明人： Anand S. Murthy ,  Boyan Boyanov ,  Ravindra Soman ,  Robert S. Chau

IPC分类号： H01L218238

CPC分类号： H01L29/66477 ,  H01L21/2254 ,  H01L21/823814 ,  H01L21/823835 ,  H01L29/165 ,  H01L29/41783 ,  H01L29/456 ,  H01L29/66628 ,  H01L29/66636 ,  H01L29/7834

摘要： Transistors are manufactured by growing germanium source and drain regions, implanting dopant impurities into the germanium, and subsequently annealing the source and drain regions so that the dopant impurities diffuse through the germanium. The process is simpler than a process wherein germanium is insitu doped with p-type or n-type impurities. The dopant impurities diffuse easily through the germanium but not easily through underlying silicon, so that an interface between the germanium and silicon acts as a diffusion barrier and ensures positioning of the dopant atoms in the regions of the device where they improve transistor performance.

摘要翻译： 晶体管通过生长锗源极和漏极区域，将掺杂杂质注入到锗中并随后对源极和漏极区域进行退火来制造，使得掺杂剂杂质扩散通过锗。 该方法比其中锗掺杂有p型或n型杂质的方法简单。 掺杂剂杂质易于通过锗扩散，但不容易通过下面的硅，使得锗和硅之间的界面充当扩散势垒，并确保掺杂剂原子在其中提高晶体管性能的区域中的位置。

公开(公告)号：US20130153965A1

公开(公告)日：2013-06-20

申请号：US13764675

申请日：2013-02-11

申请人： Boyan Boyanov ,  Anand Murthy ,  Brian S. Doyle ,  Robert Chau

发明人： Boyan Boyanov ,  Anand Murthy ,  Brian S. Doyle ,  Robert Chau

IPC分类号： H01L29/78

CPC分类号： H01L29/7849 ,  H01L21/02381 ,  H01L21/0245 ,  H01L21/0251 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/02636 ,  H01L27/092 ,  H01L29/78

摘要： Various embodiments of the invention relate to a CMOS device having (1) an NMOS channel of silicon material selectively deposited on a first area of a graded silicon germanium substrate such that the selectively deposited silicon material experiences a tensile strain caused by the lattice spacing of the silicon material being smaller than the lattice spacing of the graded silicon germanium substrate material at the first area, and (2) a PMOS channel of silicon germanium material selectively deposited on a second area of the substrate such that the selectively deposited silicon germanium material experiences a compressive strain caused by the lattice spacing of the selectively deposited silicon germanium material being larger than the lattice spacing of the graded silicon germanium substrate material at the second area.

摘要翻译： 本发明的各种实施例涉及一种CMOS器件，其具有（1）选择性地沉积在渐变硅锗衬底的第一区域上的硅材料的NMOS沟道，使得选择性沉积的硅材料经历由晶格间隔引起的拉伸应变 硅材料小于第一区域处的渐变硅锗衬底材料的晶格间距，以及（2）选择性地沉积在衬底的第二区域上的硅锗材料的PMOS沟道，使得选择性沉积的硅锗材料经历 由选择性沉积的硅锗材料的晶格间距引起的压缩应变大于第二区域处的分级硅锗衬底材料的晶格间距。

公开(公告)号：US08373154B2

公开(公告)日：2013-02-12

申请号：US12609711

申请日：2009-10-30

申请人： Boyan Boyanov ,  Anand Murthy ,  Brian S. Doyle ,  Robert Chau

发明人： Boyan Boyanov ,  Anand Murthy ,  Brian S. Doyle ,  Robert Chau

IPC分类号： H01L29/08 ,  H01L31/0312 ,  H01L29/12 ,  H01L27/092 ,  H01L21/8238

CPC分类号： H01L29/7849 ,  H01L21/02381 ,  H01L21/0245 ,  H01L21/0251 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/02636 ,  H01L27/092 ,  H01L29/78

摘要： Various embodiments of the invention relate to a CMOS device having (1) an NMOS channel of silicon material selectively deposited on a first area of a graded silicon germanium substrate such that the selectively deposited silicon material experiences a tensile strain caused by the lattice spacing of the silicon material being smaller than the lattice spacing of the graded silicon germanium substrate material at the first area, and (2) a PMOS channel of silicon germanium material selectively deposited on a second area of the substrate such that the selectively deposited silicon germanium material experiences a compressive strain caused by the lattice spacing of the selectively deposited silicon germanium material being larger than the lattice spacing of the graded silicon germanium substrate material at the second area.

公开(公告)号：US07968957B2

公开(公告)日：2011-06-28

申请号：US12893983

申请日：2010-09-29

申请人： Anand Murthy ,  Boyan Boyanov ,  Suman Datta ,  Brian S. Doyle ,  Been-Yih Jin ,  Shaofeng Yu ,  Robert Chau

发明人： Anand Murthy ,  Boyan Boyanov ,  Suman Datta ,  Brian S. Doyle ,  Been-Yih Jin ,  Shaofeng Yu ,  Robert Chau

IPC分类号： H01L21/00

CPC分类号： H01L29/1054 ,  H01L21/823807 ,  H01L21/823814 ,  H01L21/823842 ,  H01L21/823857 ,  H01L29/66636 ,  H01L29/7842 ,  H01L29/7848

摘要： Various embodiments of the invention relate to a PMOS device having a transistor channel of silicon germanium material on a substrate, a gate dielectric having a dielectric constant greater than that of silicon dioxide on the channel, a gate electrode conductor material having a work function in a range between a valence energy band edge and a conductor energy band edge for silicon on the gate dielectric, and a gate electrode semiconductor material on the gate electrode conductor material.

摘要翻译： 本发明的各种实施例涉及在衬底上具有硅锗材料的晶体管沟道的PMOS器件，介电常数大于沟道上的二氧化硅的介电常数的栅极电介质，具有功函数的栅电极导体材料 在栅极电介质上的硅的价态能带边缘和导体能带边缘之间的范围，以及栅电极导体材料上的栅电极半导体材料。

公开(公告)号：US20110186912A1

公开(公告)日：2011-08-04

申请号：US13082305

申请日：2011-04-07

申请人： Anand Murthy ,  Boyan Boyanov ,  Suman Datta ,  Brian S. Doyle ,  Been-Yih Jin ,  Shaofeng Yu ,  Robert Chau

发明人： Anand Murthy ,  Boyan Boyanov ,  Suman Datta ,  Brian S. Doyle ,  Been-Yih Jin ,  Shaofeng Yu ,  Robert Chau

IPC分类号： H01L29/772 ,  H01L27/092

CPC分类号： H01L29/1054 ,  H01L21/823807 ,  H01L21/823814 ,  H01L21/823842 ,  H01L21/823857 ,  H01L29/66636 ,  H01L29/7842 ,  H01L29/7848

摘要： Various embodiments of the invention relate to a PMOS device having a transistor channel of silicon germanium material on a substrate, a gate dielectric having a dielectric constant greater than that of silicon dioxide on the channel, a gate electrode conductor material having a work function in a range between a valence energy band edge and a conductor energy band edge for silicon on the gate dielectric, and a gate electrode semiconductor material on the gate electrode conductor material.

摘要翻译： 本发明的各种实施例涉及在衬底上具有硅锗材料的晶体管沟道的PMOS器件，介电常数大于沟道上的二氧化硅的介电常数的栅极电介质，具有功函数的栅电极导体材料 在栅极电介质上的硅的价态能带边缘和导体能带边缘之间的范围，以及栅电极导体材料上的栅电极半导体材料。

公开(公告)号：US20110018031A1

公开(公告)日：2011-01-27

申请号：US12893983

申请日：2010-09-29

申请人： Anand Murthy ,  Boyan Boyanov ,  Suman Datta ,  Brian S. Doyle ,  Been-Yih Jin ,  Shaofeng Yu ,  Robert Chau

发明人： Anand Murthy ,  Boyan Boyanov ,  Suman Datta ,  Brian S. Doyle ,  Been-Yih Jin ,  Shaofeng Yu ,  Robert Chau

IPC分类号： H01L29/78

CPC分类号： H01L29/1054 ,  H01L21/823807 ,  H01L21/823814 ,  H01L21/823842 ,  H01L21/823857 ,  H01L29/66636 ,  H01L29/7842 ,  H01L29/7848

摘要： Various embodiments of the invention relate to a PMOS device having a transistor channel of silicon germanium material on a substrate, a gate dielectric having a dielectric constant greater than that of silicon dioxide on the channel, a gate electrode conductor material having a work function in a range between a valence energy band edge and a conductor energy band edge for silicon on the gate dielectric, and a gate electrode semiconductor material on the gate electrode conductor material.

公开(公告)号：US20080044968A1

公开(公告)日：2008-02-21

申请号：US11899881

申请日：2007-09-07

申请人： Anand Murthy ,  Boyan Boyanov ,  Glenn Glass ,  Thomas Hoffmann

发明人： Anand Murthy ,  Boyan Boyanov ,  Glenn Glass ,  Thomas Hoffmann

IPC分类号： H01L21/8238

CPC分类号： H01L29/7848 ,  H01L21/28518 ,  H01L21/823807 ,  H01L21/823814 ,  H01L29/0653 ,  H01L29/0847 ,  H01L29/165 ,  H01L29/167 ,  H01L29/36 ,  H01L29/41725 ,  H01L29/6628 ,  H01L29/665 ,  H01L29/6653 ,  H01L29/6656 ,  H01L29/6659 ,  H01L29/66628 ,  H01L29/66636 ,  H01L29/78 ,  H01L29/7833 ,  H01L29/7842 ,  Y10S438/933

摘要： An embodiment of the invention reduces the external resistance of a transistor by utilizing a silicon germanium alloy for the source and drain regions and a nickel silicon germanium self-aligned silicide (i.e., salicide) layer to form the contact surface of the source and drain regions. The interface of the silicon germanium and the nickel silicon germanium silicide has a lower specific contact resistivity based on a decreased metal-semiconductor work function between the silicon germanium and the silicide and the increased carrier mobility in silicon germanium versus silicon. The silicon germanium may be doped to further tune its electrical properties. A reduction of the external resistance of a transistor equates to increased transistor performance both in switching speed and power consumption.

摘要翻译： 本发明的一个实施例通过利用用于源极和漏极区域的硅锗合金和镍硅锗自对准硅化物（即，自对准硅化物）层来形成源极和漏极区域的接触表面来降低晶体管的外部电阻 。 基于硅锗和硅化物之间的金属半导体功函数降低，硅锗与硅硅锗硅的界面具有较低的比接触电阻率，并且硅锗与硅中的载流子迁移率增加。 可以掺杂硅锗以进一步调整其电性能。 降低晶体管的外部电阻等同于在开关速度和功耗方面提高晶体管的性能。