摘要:
Methods and ferroelectric devices are presented, in which pulses are selectively applied to ferroelectric memory cell wordlines to discharge cell storage node disturbances while the cell plateline and the associated bitline are held at substantially the same voltage.
摘要:
Systems and methods fatigue a ferroelectric memory device. Within a single cycle, a group of selected ferroelectric memory cells is fatigued by reading a first logical value from the cells while also writing a second logical value to the memory cells. The first logical value is temporarily stored into latches of sense amplifiers associated with the selected memory cells in order to decipher logical values. Subsequently, the first logical value is written back to the ferroelectric memory cells and a cycle of the fatigue operation is ended.
摘要:
Reference generator systems (108, 130) and methods (200) are presented for providing bitline reference voltages for memory access operations in a ferroelectric memory device (102). The reference generator system (108, 130) comprises a primary capacitance (130), a precharge system (132) that charges the primary capacitance, and a reference system (108) with a plurality of local reference circuits (108a) associated with corresponding array columns that individually comprise a staging capacitance (Cs), a first switching device (S1) coupled between the staging capacitance and the primary capacitance (130), and a second switching device (S2, S3) coupled between the staging capacitance (Cs) and a bitline of the corresponding array column. The first switching device (S1) couples the staging capacitance (Cs) to the precharged primary capacitance (130) and then isolates the precharged staging capacitance (Cs) from the primary capacitance (130), and the second switching device (S2, S3) isolates the staging capacitance (Cs) from the bitline while the staging capacitance Cs is coupled to the primary capacitance (130), and then couples the precharged staging capacitance (Cs) to the bitline to provide a reference voltage to the bitline during the memory access operation.
摘要翻译:参考发生器系统(108,130)和方法(200)被提供用于为铁电存储器件(102)中的存储器存取操作提供位线参考电压。 参考发生器系统(108,130)包括初级电容(130),对初级电容充电的预充电系统(132)以及具有多个与相应的电压相关联的多个局部参考电路(108a)的参考系统(108) 单独地包括分级电容(Cs)的阵列列,耦合在所述分级电容和所述初级电容(130)之间的第一开关器件(S1)以及耦合在所述分级电容之间的第二开关器件(S 2,S 3) (Cs)和相应阵列列的位线。 第一开关器件(S1)将分级电容(Cs)耦合到预充电的初级电容(130),然后将预充电的分级电容(Cs)与主电容(130)隔离,并且第二开关器件(S2, S 3)将分级电容(Cs)与位线分离,而分级电容Cs耦合到初级电容(130),然后将预充电分级电容(Cs)耦合到位线,以在位线期间向位线提供参考电压 内存访问操作。
摘要:
Systems and methods fatigue a ferroelectric memory device. Within a single cycle, a group of selected ferroelectric memory cells is fatigued by reading a first logical value from the cells while also writing a second logical value to the memory cells. The first logical value is temporarily stored into latches of sense amplifiers associated with the selected memory cells in order to decipher logical values. Subsequently, the first logical value is written back to the ferroelectric memory cells and a cycle of the fatigue operation is ended.
摘要:
Methods and ferroelectric devices are presented, in which pulses are selectively applied to ferroelectric memory cell wordlines to discharge cell storage node disturbances while the cell plateline and the associated bitline are held at substantially the same voltage.
摘要:
A method of screening complementary metal-oxide-semiconductor CMOS integrated circuits, such as integrated circuits including CMOS static random access memory (SRAM) cells, for n-channel transistors susceptible to transistor characteristic shifts over operating time. For the example of SRAM cells formed of cross-coupled CMOS inverters, static noise margin and writeability (Vtrip) screens are provided. Each of the n-channel transistors in the CMOS SRAM cells are formed within p-wells that are isolated from p-type semiconductor material in peripheral circuitry of the memory and other functions in the integrated circuit. Forward and reverse body node bias voltages are applied to the isolated p-wells of the SRAM cells under test to determine whether such operations as read disturb, or write cycles, disrupt the cells under such bias. Cells that are vulnerable to threshold voltage shift over time can thus be identified.
摘要:
A method of screening complementary metal-oxide-semiconductor CMOS integrated circuits, such as integrated circuits including CMOS static random access memory (SRAM) cells, for n-channel transistors susceptible to transistor characteristic shifts over operating time. For the example of SRAM cells formed of cross-coupled CMOS inverters, static noise margin and writeability (Vtrip) screens are provided. Each of the n-channel transistors in the CMOS SRAM cells are formed within p-wells that are isolated from p-type semiconductor material in peripheral circuitry of the memory and other functions in the integrated circuit. Forward and reverse body node bias voltages are applied to the isolated p-wells of the SRAM cells under test to determine whether such operations as read disturb, or write cycles, disrupt the cells under such bias. Cells that are vulnerable to threshold voltage shift over time can thus be identified.
摘要:
A first integrated circuit containing a single sided write SRAM cell array, each SRAM cell having a bit passgate and an auxiliary bit-bar driver transistor. A process of operating the first integrated circuit including a single sided read operation in which source nodes of the auxiliary drivers in both addressed cells and half-addressed cells are floated. A second integrated circuit containing an SRAM cell array, in which each SRAM cell includes a bit-side write passgate, a bit-bar-side read passgate and a bit-bar auxiliary driver transistor. A process of operating the second integrated circuit including a single sided read operation in which source nodes of the auxiliary drivers in both addressed cells and half-addressed cells are biased to a low bias voltage.
摘要:
A method of accelerating a Monte Carlo (MC) simulation for a system including a first component having a first input parameter and a second component having a second input parameter. The simulation model provided includes a first component model including a first model parameter corresponding to the first input parameter and a second component model having a second model parameter corresponding to the second input parameter. A first acceleration factor for the first component and a second acceleration factor for the second component are calculated based on at least the respective number of instances. A first scaled distribution is computed from the first distribution and a second scaled distribution is computed from the second distribution based on the respective acceleration factors. The MC simulation for the system is run, wherein values for the first model parameter value and second model parameter value are obtained based on the respective scaled distributions.
摘要:
An SRAM cell containing an auxiliary driver transistor is configured for a single sided write operation. The auxiliary driver transistor may be added to a 5-transistor single-sided-write SRAM cell or to a 7-transistor single-sided-write SRAM cell. The SRAM cell may also include a read buffer. During read operations, the auxiliary drivers are biased. During write operations, the auxiliary drivers in half-addressed SRAM cells are biased and the auxiliary drivers in the addressed SRAM cells may be floated or biased.