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    Wafer inspection
    1.
    发明授权
    Wafer inspection 有权
    晶圆检查

    公开(公告)号：US09279774B2

    公开(公告)日：2016-03-08

    申请号：US13544954

    申请日：2012-07-09

    申请人： Anatoly Romanovsky ,  Ivan Maleev ,  Daniel Kavaldjiev ,  Yury Yuditsky ,  Dirk Woll ,  Stephen Biellak ,  Mehdi Vaez-Iravani ,  Guoheng Zhao

    发明人： Anatoly Romanovsky ,  Ivan Maleev ,  Daniel Kavaldjiev ,  Yury Yuditsky ,  Dirk Woll ,  Stephen Biellak ,  Mehdi Vaez-Iravani ,  Guoheng Zhao

    IPC分类号： G01N21/00 ,  G01N21/95 ,  G01N21/47 ,  G01N21/956

    CPC分类号： G01N21/9501 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/8851 ,  G01N21/956

    摘要： Systems configured to inspect a wafer are provided. One system includes an illumination subsystem configured to simultaneously form multiple illumination areas on the wafer with substantially no illumination flux between each of the areas. The system also includes a scanning subsystem configured to scan the multiple illumination areas across the wafer. In addition, the system includes a collection subsystem configured to simultaneously and separately image light scattered from each of the areas onto two or more sensors. Characteristics of the two or more sensors are selected such that the scattered light is not imaged into gaps between the two or more sensors. The two or more sensors generate output responsive to the scattered light. The system further includes a computer subsystem configured to detect defects on the wafer using the output of the two or more sensors.

    摘要翻译： 提供了配置用于检查晶片的系统。 一个系统包括照明子系统，该照明子系统配置成在晶片上同时形成多个照明区域，其中每个区域之间基本上没有照明通量。 该系统还包括扫描子系统，被配置为扫描晶片上的多个照明区域。 另外，该系统包括一个收集子系统，该收集子系统配置成同时并分别将从每个区域散射的光分别映射到两个或更多个传感器上。 选择两个或更多个传感器的特征，使得散射光不被成像到两个或更多个传感器之间的间隙中。 两个或多个传感器响应散射光产生输出。 该系统还包括被配置为使用两个或更多个传感器的输出来检测晶片上的缺陷的计算机子系统。

    System for detecting anomalies and/or features of a surface
    2.
    发明授权
    System for detecting anomalies and/or features of a surface 有权
    用于检测表面的异常和/或特征的系统

    公开(公告)号：US07869023B2

    公开(公告)日：2011-01-11

    申请号：US12123393

    申请日：2008-05-19

    申请人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    发明人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

    IPC分类号： G01N21/00

    CPC分类号： G01N21/9501

    摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

    摘要翻译： 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

    Fourier filters and wafer inspection systems
    5.
    发明授权
    Fourier filters and wafer inspection systems 有权
    傅立叶滤波器和晶圆检查系统

    公开(公告)号：US07345754B1

    公开(公告)日：2008-03-18

    申请号：US11228584

    申请日：2005-09-16

    申请人： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Andrew V. Hill ,  Avijit K. Ray-Chaudhuri

    发明人： Guoheng Zhao ,  Mehdi Vaez-Iravani ,  Andrew V. Hill ,  Avijit K. Ray-Chaudhuri

    IPC分类号： G01N21/00 ,  G02B27/46

    CPC分类号： G01N21/9501 ,  G01N21/4738 ,  G01N21/956 ,  G03F7/7065

    摘要： Fourier filters and wafer inspection systems are provided. One embodiment relates to a one-dimensional Fourier filter configured to be included in a bright field inspection system such that the bright field inspection system can be used for broadband dark field inspection of a wafer. The Fourier filter includes an asymmetric illumination aperture configured to be positioned in an illumination path of the inspection system. The Fourier filter also includes an asymmetric imaging aperture complementary to the illumination aperture. The imaging aperture is configured to be positioned in a light collection path of the inspection system such that the imaging aperture blocks light reflected and diffracted from structures on the wafer and allows light scattered from defects on the wafer to pass through the imaging aperture.

    摘要翻译： 提供傅立叶滤波器和晶片检测系统。 一个实施例涉及被配置为包括在明场检查系统中的一维傅立叶滤波器，使得明场检查系统可以用于晶片的宽带暗视场检查。 傅里叶滤波器包括被配置为定位在检查系统的照明路径中的非对称照明孔。 傅立叶滤波器还包括与照明孔径互补的非对称成像孔。 成像孔被配置为定位在检查系统的光采集路径中，使得成像孔口阻挡从晶片上的结构反射和衍射的光，并允许从晶片上的缺陷散射的光通过成像孔。

    Sample inspection system
    6.
    发明授权
    Sample inspection system 有权

    公开(公告)号：US07119897B2

    公开(公告)日：2006-10-10

    申请号：US11007729

    申请日：2004-12-07

    申请人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    发明人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    IPC分类号： G01N21/00

    CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/9501

    摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

    Sample inspection system
    7.
    发明申请
    Sample inspection system 有权

    公开(公告)号：US20050099621A1

    公开(公告)日：2005-05-12

    申请号：US11007729

    申请日：2004-12-07

    申请人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    发明人： Mehdi Vaez-Iravani ,  Stanley Stokowski ,  Guoheng Zhao

    IPC分类号： G01N21/47 ,  G01N21/95 ,  G01N21/88

    CPC分类号： G01N21/956 ,  G01N21/47 ,  G01N21/9501

    摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

    Air bearing for substrate inspection device
    8.
    发明授权
    Air bearing for substrate inspection device 有权
    基板检查装置用空气轴承

    公开(公告)号：US08817250B2

    公开(公告)日：2014-08-26

    申请号：US13226032

    申请日：2011-09-06

    申请人： Paul Doyle ,  Guoheng Zhao ,  Alexander Belyaev ,  Christian H. Wolters ,  Howard W. Dando ,  Mehdi Vaez-Iravani ,  Carmela C. Moreno

    发明人： Paul Doyle ,  Guoheng Zhao ,  Alexander Belyaev ,  J. Rex Runyon ,  Christian H. Wolters ,  Howard W. Dando ,  Mehdi Vaez-Iravani

    IPC分类号： G01N21/00

    CPC分类号： H01L21/6838

    摘要： A tool for investigating a substrate, where the tool has a tool head for investigating the substrate, a chuck for disposing an upper surface of the substrate in proximity to the tool head, and an air bearing disposed on the tool head adjacent the substrate. The air bearing has a pressure source and a vacuum source, where the vacuum source draws the substrate toward the air bearing and the pressure source prevents the substrate from physically contacting the air bearing. The pressure source and the vacuum source work in cooperation to dispose the upper surface of the substrate at a known distance from the tool head. By using the air bearing as part of the tool in this manner, registration of the substrate to the tool head is accomplished relative to the upper surface of the substrate, not the back side of the substrate.

    摘要翻译： 一种用于调查基板的工具，其中该工具具有用于检查基板的工具头，用于将基板的上表面设置在工具头附近的卡盘以及设置在与基板相邻的工具头上的空气轴承。 空气轴承具有压力源和真空源，其中真空源将基板拉向空气轴承，并且压力源防止基板物理接触空气轴承。 压力源和真空源协同工作，将衬底的上表面设置在与工具头一段已知距离处。 通过以这种方式使用空气轴承作为工具的一部分，基板相对于基板的上表面而不是基板的背面完成对准工具头。

    Wafer Inspection
    9.
    发明申请
    Wafer Inspection 有权
    晶圆检验

    公开(公告)号：US20140009759A1

    公开(公告)日：2014-01-09

    申请号：US13822281

    申请日：2011-12-07

    申请人： Guoheng Zhao ,  Jenn-Kuen Leong ,  Mehdi Vaez-Iravani

    发明人： Guoheng Zhao ,  Jenn-Kuen Leong ,  Mehdi Vaez-Iravani

    IPC分类号： G01N21/88

    CPC分类号： G01N21/9501 ,  G01N21/21 ,  G01N21/47 ,  G01N21/8806 ,  G01N2201/06113 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

    摘要： Systems and methods for inspecting a wafer are provided. One system includes an illumination subsystem configured to illuminate the wafer; a collection subsystem configured to collect light scattered from the wafer and to preserve the polarization of the scattered light; an optical element configured to separate the scattered light collected in different segments of the collection numerical aperture of the collection subsystem, where the optical element is positioned at a Fourier plane or a conjugate of the Fourier plane of the collection subsystem; a polarizing element configured to separate the scattered light in one of the different segments into different portions of the scattered light based on polarization; and a detector configured to detect one of the different. portions of the scattered light and to generate output responsive to the detected light, which is used to detect defects on the wafer.

    摘要翻译： 提供了用于检查晶片的系统和方法。 一个系统包括配置成照亮晶片的照明子系统; 收集子系统，被配置为收集从晶片散射的光并保持散射光的偏振; 光学元件，被配置为将收集在收集子系统的收集数值孔径的不同段中的散射光分离，其中所述光学元件位于所述收集子系统的傅立叶平面或所述傅立叶平面的共轭处; 偏振元件，被配置为基于极化将所述不同段中的一个中的散射光分离成所述散射光的不同部分; 以及检测器，被配置为检测不同的一个。 散射光的一部分并且响应于检测到的光而产生输出，用于检测晶片上的缺陷。

    LED Solar Illuminator
    10.
    发明申请
    LED Solar Illuminator 失效
    LED太阳能照明器

    公开(公告)号：US20120256559A1

    公开(公告)日：2012-10-11

    申请号：US13081734

    申请日：2011-04-07

    申请人： Guoheng Zhao ,  Ady Levy ,  Alex Salnik ,  Mehdi Vaez-Iravani ,  Lena Nicolaides ,  Samuel S.H. Ngai

    发明人： Guoheng Zhao ,  Ady Levy ,  Alex Salnik ,  Mehdi Vaez-Iravani ,  Lena Nicolaides ,  Samuel S.H. Ngai

    IPC分类号： H05B37/02

    CPC分类号： H05B33/0803

    摘要： An apparatus for illuminating a target surface, the apparatus having a plurality of LED arrays, where each of the arrays has a plurality of individually addressable LEDs, and where at least one of the arrays is disposed at an angle of between about forty-five degrees and about ninety degrees relative to the target surface, where all of the arrays supply light into a light pipe, the light pipe having interior walls made of a reflective material, where light exiting the light pipe illuminates the target surface, and a controller for adjusting an intensity of the individually addressable light sources.

    摘要翻译： 一种用于照射目标表面的装置，该装置具有多个LED阵列，其中每个阵列具有多个独立可寻址的LED，并且其中至少一个阵列以大约四十五度之间的角度设置 并且相对于目标表面大约九十度，其中所有的阵列将光提供到光管中，光管具有由反射材料制成的内壁，其中离开光管的光照射目标表面，以及用于调节的控制器 独立寻址光源的强度。