Scheduling delivery of products via the internet
    3.
    发明授权
    Scheduling delivery of products via the internet 有权
    计划通过互联网交付产品

    公开(公告)号:US07139721B2

    公开(公告)日:2006-11-21

    申请号:US09810891

    申请日:2001-03-16

    IPC分类号: G06Q99/00

    摘要: Methods and apparatus for scheduling delivery of an order via a wide area network. A computer system associates a customer point value with each customer according to a customer point system. The customer point values is determined with reference to customer order data. The computer system then divides the customers into customer groups, each of which has a range of customer point values. The system determines an actual capacity allocation distribution among the customer groups based on the customer order data. The system adjusts the range of customer point values for customer groups to cause the actual capacity allocation distribution to converge to a target capacity allocation distribution.

    摘要翻译: 用于通过广域网调度订单的方法和装置。 计算机系统根据客户点系统将客户点值与每个客户相关联。 客户点值是参照客户订单数据确定的。 然后,计算机系统将客户分成客户群,每个客户群具有一系列客户点值。 系统根据客户订单数据确定客户组之间的实际容量分配分配。 系统调整客户群的客户点值的范围,使实际的容量分配分配收敛到目标容量分配分配。

    Scheduling delivery of products via the Internet
    4.
    发明申请
    Scheduling delivery of products via the Internet 审中-公开
    通过互联网安排产品交付

    公开(公告)号:US20070016463A1

    公开(公告)日:2007-01-18

    申请号:US11524810

    申请日:2006-09-20

    IPC分类号: G05B19/418

    摘要: Methods and apparatus for scheduling delivery of an order via a wide area network. A computer system associates a customer point value with each customer according to a customer point system. The customer point values is determined with reference to customer order data. The computer system then divides the customers into customer groups, each of which has a range of customer point values. The system determines an actual capacity allocation distribution among the customer groups based on the customer order data. The system adjusts the range of customer point values for customer groups to cause the actual capacity allocation distribution to converge to a target capacity allocation distribution.

    摘要翻译: 用于通过广域网调度订单的方法和装置。 计算机系统根据客户点系统将客户点值与每个客户相关联。 客户点值是参照客户订单数据确定的。 然后,计算机系统将客户分成客户群,每个客户群具有一系列客户点值。 系统根据客户订单数据确定客户组之间的实际容量分配分配。 系统调整客户群的客户点值的范围,使实际的容量分配分配收敛到目标容量分配分配。

    METHOD OF UNIFORM SELENIZATION AND SULFERIZATION IN A TUBE FURNACE
    8.
    发明申请
    METHOD OF UNIFORM SELENIZATION AND SULFERIZATION IN A TUBE FURNACE 有权
    在管道中均匀放大和硫化的方法

    公开(公告)号:US20130295748A1

    公开(公告)日:2013-11-07

    申请号:US13461495

    申请日:2012-05-01

    IPC分类号: H01L21/36

    摘要: A method for high temperature selenization of Cu—In—Ga metal precursor films comprises ramping the precursor film to a temperature between about 350 C and about 450 C in an inert gas and at a pressure between about 1 atmosphere and about 2 atmospheres. A partial selenization is performed at a temperature between about 350 C and about 450 C in a Se-containing atmosphere. The film is then ramped to a temperature between about 450 C and about 550 C in an inert gas and at a pressure between about 1 atmosphere and about 2 atmospheres, followed by an additional selenization step at a temperature between about 450 C and about 550 C in a Se-containing atmosphere. The film is then annealed at a temperature between about 550 C and about 650 C in an inert gas.

    摘要翻译: Cu-In-Ga金属前体膜的高温硒化方法包括在惰性气体中和约1大气压至约2个大气压之间的压力下将前驱体膜倾斜至约350℃至约450℃的温度。 部分硒化在含硒气氛中在约350℃至约450℃的温度下进行。 然后将膜在惰性气体中和在约1大气压和约2个大气压之间的压力下升高至约450℃至约550℃之间的温度,随后在约450℃至约550℃之间的温度下进行额外的硒化步骤 在含Se的气氛中。 然后将膜在惰性气体中在约550℃和约650℃之间的温度下退火。

    CVD APPARATUS
    10.
    发明申请
    CVD APPARATUS 审中-公开
    CVD装置

    公开(公告)号:US20110121503A1

    公开(公告)日:2011-05-26

    申请号:US12850738

    申请日:2010-08-05

    IPC分类号: B23Q3/00

    摘要: Embodiments of the present invention generally relate to methods and apparatus for chemical vapor deposition (CVD) on a substrate, and, in particular, to a process chamber and components for use in metal organic chemical vapor deposition. The apparatus comprises a chamber body defining a process volume. A showerhead in a first plane defines a top portion of the process volume. A carrier plate extends across the process volume in a second plane forming an upper process volume between the showerhead and the susceptor plate. A transparent material in a third plane defines a bottom portion of the process volume forming a lower process volume between the carrier plate and the transparent material. A plurality of lamps forms one or more zones located below the transparent material. The apparatus provides uniform precursor flow and mixing while maintaining a uniform temperature over larger substrates thus yielding a corresponding increase in throughput.

    摘要翻译: 本发明的实施方案一般涉及用于基板上的化学气相沉积(CVD)的方法和装置,特别涉及用于金属有机化学气相沉积中的处理室和组件。 该装置包括限定处理量的室主体。 第一平面中的喷头定义了处理量的顶部。 载体板在第二平面中延伸过程体积,形成在喷头和基座板之间的上过程体积。 在第三平面中的透明材料限定了处理体积的底部,其在承载板和透明材料之间形成较低的处理体积。 多个灯形成位于透明材料下方的一个或多个区域。 该装置提供均匀的前体流动和混合,同时在较大的底物上保持均匀的温度,从而产生相应的生产量的增加。