公开(公告)号：US20060027878A1

公开(公告)日：2006-02-09

申请号：US10710847

申请日：2004-08-06

申请人： Anil Chinthakindi ,  Douglas Coolbaugh ,  Vidhya Ramachandran ,  Robert Rassel

发明人： Anil Chinthakindi ,  Douglas Coolbaugh ,  Vidhya Ramachandran ,  Robert Rassel

IPC分类号： H01L29/76 ,  H01L29/00

CPC分类号： H01L28/24 ,  H01L27/0629 ,  H01L29/7833

摘要： A FEOL/MEOL metal resistor that has tight sheet resistance tolerance (on the order of about 5% or less), high current density (on the order of about 0.5 mA/micron or greater), lower parasitics than diffused resistors and lower TCR than standard BEOL metal resistors as well as various methods of integrating such a metal resistor structure into a CMOS technology are provided.

摘要翻译： FEOL / MEOL金属电阻器具有紧密的薄层电阻公差（约5％或更低），高电流密度（约0.5 mA /微米或更大），比扩散电阻器更低的寄生效应和更低的TCR比 提供了标准的BEOL金属电阻器以及将这种金属电阻器结构集成到CMOS技术中的各种方法。

公开(公告)号：US20070065966A1

公开(公告)日：2007-03-22

申请号：US11162661

申请日：2005-09-19

申请人： Anil Chinthakindi ,  Douglas Coolbaugh ,  Keith Downes ,  Ebenezer Eshun ,  Zhong-Xiang He ,  Robert Rassel ,  Anthony Stamper

发明人： Anil Chinthakindi ,  Douglas Coolbaugh ,  Keith Downes ,  Ebenezer Eshun ,  Zhong-Xiang He ,  Robert Rassel ,  Anthony Stamper

IPC分类号： H01L21/00 ,  H01L29/84

CPC分类号： H01L21/32139 ,  H01L21/32136 ,  H01L28/75

摘要： Method of fabricating a MIM capacitor and MIM capacitor. The method includes providing a substrate including a dielectric layer formed on a first conductive layer and a second conductive layer formed over the dielectric layer, and patterning a mask on the second conductive layer. Exposed portions of the second conductive layer are removed to form an upper plate of a MIM capacitor having edges substantially aligned with respective edges of the mask. The upper plate is undercut so that edges of the upper plate are located under the mask. Exposed portions of the dielectric layer and the first conductive layer are removed using the mask to form a capacitor dielectric layer and a lower plate of the MIM capacitor having edges substantially aligned with respective edges of the mask.

摘要翻译： 制造MIM电容器和MIM电容器的方法。 该方法包括提供包括形成在第一导电层上的电介质层和形成在电介质层上的第二导电层的衬底，以及在第二导电层上构图掩模。 去除第二导电层的暴露部分以形成具有与掩模的相应边缘基本对齐的边缘的MIM电容器的上板。 上板被切下，使得上板的边缘位于掩模下方。 使用掩模去除电介质层和第一导电层的暴露部分，以形成MIM电容器的电容器电介质层和具有基本上与掩模的各个边缘对准的边缘的MIM电容器的下板。

公开(公告)号：US20070194390A1

公开(公告)日：2007-08-23

申请号：US11276282

申请日：2006-02-22

申请人： Anil Chinthakindi ,  Douglas Coolbaugh ,  Keith Downes ,  Ebenezer Eshun ,  John Florkey ,  Heidi Greer ,  Robert Rassel ,  Anthony Stamper ,  Kunal Vaed

发明人： Anil Chinthakindi ,  Douglas Coolbaugh ,  Keith Downes ,  Ebenezer Eshun ,  John Florkey ,  Heidi Greer ,  Robert Rassel ,  Anthony Stamper ,  Kunal Vaed

IPC分类号： H01L29/76

CPC分类号： H01L29/8605 ,  H01L27/0802 ,  H01L28/20

摘要： The present invention provides a semiconductor structure including a buried resistor with improved control, in which the resistor is fabricated in a region of a semiconductor substrate beneath a well region that is also present in the substrate. In accordance with the present invention, the inventive structure includes a semiconductor substrate containing at least a well region; and a buried resistor located in a region of the semiconductor substrate that is beneath said well region. The present invention also provides a method of fabricating such a structure in which a deep ion implantation process is used to form the buried resistor and a shallower ion implantation process is used in forming the well region.

摘要翻译： 本发明提供一种包括具有改进控制的掩埋电阻器的半导体结构，其中电阻器制造在半导体衬底的也存在于衬底中的阱区域下方的区域中。 根据本发明，本发明的结构包括至少含有一个阱区的半导体衬底; 以及位于半导体衬底的位于所述阱区之下的区域中的掩埋电阻器。 本发明还提供一种制造这样的结构的方法，其中使用深离子注入工艺来形成掩埋电阻器，并且在形成阱区域中使用较浅的离子注入工艺。

公开(公告)号：US20070057343A1

公开(公告)日：2007-03-15

申请号：US11162471

申请日：2005-09-12

申请人： Anil Chinthakindi ,  Douglas Coolbaugh ,  Keith Downes ,  Ebenezer Eshun ,  Zhong-Xiang He ,  Robert Rassel ,  Anthony Stamper ,  Kunal Vaed

发明人： Anil Chinthakindi ,  Douglas Coolbaugh ,  Keith Downes ,  Ebenezer Eshun ,  Zhong-Xiang He ,  Robert Rassel ,  Anthony Stamper ,  Kunal Vaed

IPC分类号： H01L29/00

CPC分类号： H01L28/40

摘要： A Metal Insulator-Metal (MIM) capacitor is formed on a semiconductor substrate with a base comprising a semiconductor substrate having a top surface and including regions formed in the surface selected from a Shallow Trench Isolation (STI) region and a doped well having exterior surfaces coplanar with the semiconductor substrate. An ancillary MIM capacitor plate is selected either a lower electrode formed on the STI region in the semiconductor substrate or a doped well formed in the top surface of the semiconductor substrate. A capacitor HiK dielectric layer is formed on or above the MIM capacitor lower plate. A second MIM capacitor plate is formed on the HiK dielectric layer above the MIM capacitor lower plate.

摘要翻译： 金属绝缘体 - 金属（MIM）电容器形成在半导体衬底上，其基底包括具有顶表面的半导体衬底，并且包括形成在从浅沟槽隔离（STI）区域中形成的区域和具有外表面的掺杂阱 与半导体衬底共面。 辅助MIM电容器板选择形成在半导体衬底中的STI区域上的下电极或形成在半导体衬底的顶表面中的掺杂阱。 在MIM电容器下板上形成电容器HiK电介质层。 在MIM电容器下板上方的HiK电介质层上形成第二MIM电容器板。

公开(公告)号：US20070105354A1

公开(公告)日：2007-05-10

申请号：US11164108

申请日：2005-11-10

申请人： Douglas Coolbaugh ,  Xuefeng Liu ,  Robert Rassel ,  David Sheridan

发明人： Douglas Coolbaugh ,  Xuefeng Liu ,  Robert Rassel ,  David Sheridan

IPC分类号： H01L21/425

CPC分类号： H01L21/8249 ,  H01L29/0821 ,  H01L29/66272

摘要： A method of fabricating a buried subcollector in which the buried subcollector is implanted to a depth in which during subsequent epi growth the buried subcollector remains substantially below the fictitious interface between the epi layer and the substrate is provided. In particular, the inventive method forms a buried subcollector having an upper surface (i.e., junction) that is located at a depth from about 3000 Å or greater from the upper surface of the semiconductor substrate. This deep buried subcollector having an upper surface that is located at a depth from about 3000 Å or greater from the upper surface of the substrate is formed using a reduced implant energy (as compared to a standard deep implanted subcollector process) at a relative high dose. The present invention also provides a semiconductor structure including the inventive buried subcollector which can be used as cathode for passive devices in high frequency applications.

摘要翻译： 一种制造掩埋子集电极的方法，其中将埋入的子集电极注入深度，其中在随后的外延生长期间，掩埋子集电极基本上保持在外延层和衬底之间的虚拟界面的下方。 特别地，本发明的方法形成了具有从半导体衬底的上表面位于距离大约或更大的深度的上表面（即结）的掩埋子集电极。 该深埋底部集电器具有从衬底的上表面位于距离大约等于或更大的深度的上表面，其使用相对高剂量的减少的注入能量（与标准深度植入子集电极过程相比） 。 本发明还提供了一种半导体结构，其包括本发明的掩埋子集电极，其可以用作高频应用中的无源器件的阴极。

公开(公告)号：US20070099386A1

公开(公告)日：2007-05-03

申请号：US11163791

申请日：2005-10-31

申请人： Douglas Coolbaugh ,  Ebenezer Eshun ,  Robert Rassel ,  James Slinkman ,  Michael Zierak

发明人： Douglas Coolbaugh ,  Ebenezer Eshun ,  Robert Rassel ,  James Slinkman ,  Michael Zierak

IPC分类号： H01L21/336 ,  H01L29/788

CPC分类号： H01L29/66659 ,  H01L21/26586

摘要： A method for fabricating high gain FETs that substantially reduces or eliminates unwanted variation in device characteristics caused by using a prior art shadow masking process is provided. The inventive method employs a blocking mask that at least partially extends over the gate region wherein after extension and halo implants an FET having an asymmetric halo region asymmetric extension regions or a combination thereof is fabricated. The inventive method thus provides high gain FETs in which the variation of device characteristics is substantially reduced. The present invention also relates to the resulting asymmetric high gain FET device that is fabricated utilizing the method of the present invention.

摘要翻译： 提供了一种制造高增益FET的方法，其基本上减少或消除了由使用现有技术的阴影掩蔽处理引起的器件特性的不必要的变化。 本发明的方法采用阻挡掩模，其在栅极区域上至少部分地延伸，其中在延伸和卤素注入之后，制造具有不对称卤素区域不对称延伸区域或其组合的FET。 因此，本发明的方法提供了高增益FET，其中器件特性的变化显着降低。 本发明还涉及利用本发明的方法制造的非对称高增益FET器件。

公开(公告)号：US20070096257A1

公开(公告)日：2007-05-03

申请号：US11163882

申请日：2005-11-02

申请人： Douglas Coolbaugh ,  Alvin Joseph ,  Seong-dong Kim ,  Louis Lanzerotti ,  Xuefeng Liu ,  Robert Rassel

发明人： Douglas Coolbaugh ,  Alvin Joseph ,  Seong-dong Kim ,  Louis Lanzerotti ,  Xuefeng Liu ,  Robert Rassel

IPC分类号： H01L27/102

CPC分类号： H01L27/0814 ,  H01L27/0664 ,  H01L27/0823 ,  H01L29/0821 ,  H01L29/7371 ,  H01L29/868

摘要： A structure comprises a single wafer with a first subcollector formed in a first region having a first thickness and a second subcollector formed in a second region having a second thickness, different from the first thickness. A method is also contemplated which includes providing a substrate including a first layer and forming a first doped region in the first layer. The method further includes forming a second layer on the first layer and forming a second doped region in the second layer. The second doped region is formed at a different depth than the first doped region. The method also includes forming a first reachthrough in the first layer and forming a second reachthrough in second layer to link the first reachthrough to the surface.

摘要翻译： 一种结构包括具有形成在具有第一厚度的第一区域中的第一子集电极的单晶片和形成在具有不同于第一厚度的第二厚度的第二区域中的第二子集电极。 还可以设想一种方法，其包括提供包括第一层并在第一层中形成第一掺杂区的衬底。 该方法还包括在第一层上形成第二层并在第二层中形成第二掺杂区域。 第二掺杂区形成在与第一掺杂区不同的深度。 该方法还包括在第一层中形成第一通道并在第二层中形成第二通道以将第一通道连接到表面。

公开(公告)号：US20060145300A1

公开(公告)日：2006-07-06

申请号：US10905486

申请日：2005-01-06

申请人： Douglas Coolbaugh ,  Stephen Furkay ,  Jeffrey Johnson ,  Robert Rassel

发明人： Douglas Coolbaugh ,  Stephen Furkay ,  Jeffrey Johnson ,  Robert Rassel

IPC分类号： H01L29/93 ,  H01L21/20

CPC分类号： H01L29/93

摘要： A semiconductor structure comprising a hyperabrupt junction varactor with a compensated cathode contact as well as a method of fabricating the same are disclosed. The method includes a single implant mask which is used in forming the subcollector/cathode, collector/well and hyperabrupt junction.

摘要翻译： 公开了一种半导体结构，其包括具有补偿的阴极接触的超级连接变容二极管及其制造方法。 该方法包括用于形成子集电极/阴极，集电极/阱和超破裂结的单个注入掩模。

公开(公告)号：US20060145296A1

公开(公告)日：2006-07-06

申请号：US10905473

申请日：2005-01-06

申请人： Douglas Coolbaugh ,  Ebenezer Eshun ,  Richard Rassel ,  Robert Rassel

发明人： Douglas Coolbaugh ,  Ebenezer Eshun ,  Richard Rassel ,  Robert Rassel

IPC分类号： H01L29/00

CPC分类号： H01L28/20

摘要： Tunable TCR resistors incorporated into integrated circuits and a method fabricating the tunable TCR resistors. The tunable TCR resistors including two or more resistors of two or more different materials having opposite polarity and different magnitude TCRs, the same polarity and different magnitude TCRs or having opposite polarity and about the same TCRs.

摘要翻译： 整合在集成电路中的可调TCR电阻和制造可调TCR电阻的方法。 可调TCR电阻器包括具有相反极性和不同幅度TCR，相同极性和不同幅度TCR或具有相反极性和大约相同TCR的两种或更多种不同材料的两个或更多个电阻器。

公开(公告)号：US20060043454A1

公开(公告)日：2006-03-02

申请号：US10711144

申请日：2004-08-27

申请人： Douglas Coolbaugh ,  Douglas Hershberger ,  Robert Rassel

发明人： Douglas Coolbaugh ,  Douglas Hershberger ,  Robert Rassel

IPC分类号： H01L29/94 ,  H01L21/20

CPC分类号： H01L29/93 ,  H01L29/94

摘要： The present invention provides a varactor that has increased tunability and a high quality factor Q as well as a method of fabricating the varactor. The method of the present invention can be integrated into a conventional CMOS processing scheme or into a conventional BiCMOS processing scheme. The method includes providing a structure that includes a semiconductor substrate of a first conductivity type and optionally a subcollector or isolation well (i.e., doped region) of a second conductivity type located below an upper region of the substrate, the first conductivity type is different from said second conductivity type. Next, a plurality of isolation regions are formed in the upper region of the substrate and then a well region is formed in the upper region of the substrate. In some cases, the doped region is formed at this point of the inventive process. The well region includes outer well regions of the second conductivity type and an inner well region of the first conductivity type. Each well of said well region is separated at an upper surface by an isolation region. A field effect transistor having at least a gate conductor of the first conductivity type is then formed above the inner well region.

摘要翻译： 本发明提供一种具有增加的可调性和高品质因数Q的变容二极管以及制造变容二极管的方法。 本发明的方法可以集成到常规的CMOS处理方案中，或者被整合到常规的BiCMOS处理方案中。 该方法包括提供包括第一导电类型的半导体衬底和位于衬底的上部区域下方的第二导电类型的子集电极或隔离阱（即，掺杂区）的结构，第一导电类型不同于 所述第二导电类型。 接下来，在基板的上部区域形成多个隔离区域，然后在基板的上部区域形成阱区域。 在一些情况下，在本发明方法的这一点形成掺杂区域。 阱区包括第二导电类型的外阱区和第一导电类型的内阱区。 所述阱区的每个阱在上表面被隔离区分开。 然后形成至少具有第一导电类型的栅极导体的场效应晶体管，并在内部阱区域的上方形成。