Semiconductor Device and Manufacturing Method Thereof
    9.
    发明申请
    Semiconductor Device and Manufacturing Method Thereof 有权
    半导体器件及其制造方法

    公开(公告)号:US20160284824A1

    公开(公告)日:2016-09-29

    申请号:US15005195

    申请日:2016-01-25

    发明人: Nao Nagata

    摘要: An improvement is achieved in the performance of a semiconductor device. The semiconductor device includes a first trench gate electrode and second and third trench gate electrodes located on both sides of the first trench gate electrode interposed therebetween. In each of a semiconductor layer located between the first and second trench gate electrodes and the semiconductor layer located between the first and third trench gate electrodes, a plurality of p+-type semiconductor regions are formed. The p+-type semiconductor regions are arranged along the extending direction of the first trench gate electrode in plan view to be spaced apart from each other.

    摘要翻译: 在半导体器件的性能方面实现了改进。 半导体器件包括位于其间的第一沟槽栅电极的两侧的第一沟槽栅极电极和第二和第三沟槽栅电极。 在位于第一和第二沟槽栅电极之间的半导体层和位于第一和第三沟槽栅电极之间的半导体层的每个中,形成多个p +型半导体区。 p +型半导体区域在平面图中沿着第一沟槽栅电极的延伸方向布置成彼此间隔开。