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    Heat-treatable dichroic mirrors
    1.
    发明授权
    Heat-treatable dichroic mirrors 有权
    热处理二向色镜

    公开(公告)号：US06262850B1

    公开(公告)日：2001-07-17

    申请号：US09185305

    申请日：1998-11-03

    申请人： Annette J. Krisko ,  Scott A. Maxwell

    发明人： Annette J. Krisko ,  Scott A. Maxwell

    IPC分类号： G02B2714

    CPC分类号： C03C17/3618 ,  B60R1/088 ,  B60R1/1207 ,  C03C17/36 ,  C03C17/3649 ,  C03C17/3663 ,  C03C2217/734 ,  C03C2217/78 ,  G02B5/10

    摘要： A heat-treatable dichroic mirror, comprising a transparent substrate having a glass transition temperature in the range of 650-800° C., and a plurality of sputtered films carried on said substrate and forming at least two pairs of contiguous films in which the films of each pair have disparate refractive indices differing by at least about 0.2 so as to provide between them a reflective interface. The films include an oxide of a metal such as titanium, a second film comprising an oxidizable metal or semi-metal such as silicon, and a protective overcoat of a thickness and composition sufficient to substantially prevent permeation of oxygen therethrough when heat treated at said glass transition temperature. The mirror, after said heat treatment, exhibits a transmittance of at least 24% in the wavelength range of 550-650 nm, a reflectance of at least 45%, and a haze of not greater than about 1%.

    摘要翻译： 一种可热处理的分色镜，包括玻璃化转变温度在650-800℃范围内的透明基底，以及多个溅射的薄膜，所述薄膜承载在所述基底上并形成至少两对邻接薄膜，其中薄膜 每对具有不同的折射率至少约0.2，以便在它们之间提供反射界面。 这些膜包括诸如钛的金属的氧化物，包含可氧化金属或半金属如硅的第二膜，以及当在所述玻璃上热处理时足以基本上防止氧渗透的厚度和组成的保护外涂层 转变温度。 在所述热处理之后，所述反射镜在550-650nm的波长范围，至少45％的反射率和不大于约1％的雾度下表现出至少24％的透射率。

    Heat-treatable dichroic mirrors
    2.
    发明授权
    Heat-treatable dichroic mirrors 有权

    公开(公告)号：US06292302B1

    公开(公告)日：2001-09-18

    申请号：US09522981

    申请日：2000-03-10

    申请人： Annette J. Krisko ,  Scott A. Maxwell

    发明人： Annette J. Krisko ,  Scott A. Maxwell

    IPC分类号： G02B2714

    CPC分类号： G02B5/0833 ,  B60R1/088 ,  B60R1/1207 ,  C03C17/36 ,  C03C17/3618 ,  C03C17/3626 ,  C03C17/3649 ,  C03C17/3663 ,  C03C17/3681 ,  C03C2217/734 ,  C03C2217/78 ,  G02B5/10

    摘要： A heat-treatable dichroic mirror, comprising a transparent substrate having a glass transition temperature in the range of 650-800° C., and a plurality of sputtered films carried on said substrate and forming at least two pairs of contiguous films in which the films of each pair have disparate refractive indices differing by at least about 0.2 so as to provide between them a reflective interface. The films include an oxide of a metal such as titanium, a second film comprising an oxidizable metal or semi-metal such as silicon, and a protective overcoat of a thickness and composition sufficient to substantially prevent permeation of oxygen therethrough when heat treated at said glass transition temperature. The mirror, after said heat treatment, exhibits a transmittance of at least 24% in the wavelength range of 550-650 nm, a reflectance of at least 45%, and a haze of not greater than about 1%.

    TRANSPARENT CONDUCTIVE SUBSTRATE
    5.
    发明申请
    TRANSPARENT CONDUCTIVE SUBSTRATE 审中-公开
    透明导电基板

    公开(公告)号：US20120125423A1

    公开(公告)日：2012-05-24

    申请号：US13112355

    申请日：2011-05-20

    申请人： Annette J. Krisko

    发明人： Annette J. Krisko

    IPC分类号： H01L31/02 ,  H01L31/18 ,  H01L31/0224

    CPC分类号： H01L31/022466 ,  H01L31/03925 ,  H01L31/073 ,  Y02E10/543

    摘要： A photovoltaic element for photovoltaic applications includes a transparent substrate having a first side and a second side. A transparent electrically conductive oxide is disposed over the first side of the transparent substrate. Similarly, a hydrophilic oxide coating is disposed over and contacts the transparent electrically conductive oxide. Finally, a removable protective coating is disposed over the hydrophilic oxide coating.

    摘要翻译： 用于光伏应用的光伏元件包括具有第一侧和第二侧的透明衬底。 透明导电氧化物设置在透明基板的第一侧上。 类似地，亲水氧化物涂层设置在透明导电氧化物上并与透明导电氧化物接触。 最后，将可移除的保护涂层设置在亲水氧化物涂层上。

    Plasma enhanced chemical vapor deposition of oxide film stack
    9.
    发明授权
    Plasma enhanced chemical vapor deposition of oxide film stack 失效
    等离子体增强化学气相沉积的氧化膜堆叠

    公开(公告)号：US5352505A

    公开(公告)日：1994-10-04

    申请号：US73230

    申请日：1993-06-04

    申请人： Annette J. Krisko ,  James W. Proscia

    发明人： Annette J. Krisko ,  James W. Proscia

    IPC分类号： C03C17/34 ,  C23C16/40 ,  C23C16/50 ,  C23C16/511 ,  C23C28/00 ,  G02F1/15 ,  G02F1/17

    CPC分类号： G02F1/1523 ,  C03C17/3417 ,  C23C16/405 ,  Y10T428/24942 ,  Y10T428/24975

    摘要： A plasma enhanced chemical vapor deposition method is provided for depositing an oxide film onto a substrate surface. Deposition is achieved even onto a surface of a glass or other relatively non-receptive substrate. A sub-film is deposited under plasma enhanced chemical vapor deposition conditions more strongly favoring deposition, followed by deposition of the desired oxide film under second plasma enhanced chemical vapor deposition conditions less strongly favoring deposition. High quality oxide films can be achieved by deposition at second plasma enhanced chemical vapor deposition conditions only marginally favoring deposition over etching.

    摘要翻译： 提供了一种用于在衬底表面上沉积氧化膜的等离子体增强化学气相沉积方法。 甚至在玻璃或其他相对不接受的基底的表面上也实现沉积。 在等离子体增强化学气相沉积条件下沉积子膜更有利于沉积，随后在不利于沉积的第二等离子体增强化学气相沉积条件下沉积所需的氧化物膜。 通过在第二等离子体增强化学气相沉积条件下的沉积可以实现高质量的氧化膜，这仅仅是有利于沉积在蚀刻上。