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公开(公告)号：US12125689B2
公开(公告)日：2024-10-22
申请号：US17940513
申请日：2022-09-08
发明人： Kartik Ramaswamy , Andrew Nguyen , Yang Yang , Sathya Ganta , Fernando Silveira , Yue Guo , Lu Liu
IPC分类号： H01J37/32
CPC分类号： H01J37/32862 , H01J37/32082 , H01J2237/334
摘要： Methods and apparatus for forming plasma in a process chamber use an annular exciter formed of a first conductive material with a first end electrically connected to an RF power source that provides RF current and a second end connected to a ground and an annular applicator, physically separated from the annular exciter, formed of a second conductive material with at least one angular split with an angle forming an upper overlap portion and a lower overlap portion separated by a high K dielectric material which is configured to provide capacitance in conjunction with an inductance of the annular applicator to form a resonant circuit that is configured to resonate when the annular exciter flows RF current that inductively excites the annular applicator to a resonant frequency which forms azimuthal plasma from the annular applicator.
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公开(公告)号：US20190204032A1
公开(公告)日：2019-07-04
申请号：US16297474
申请日：2019-03-08
发明人： Fernando Silveira , Brad L. Mays
CPC分类号： F28F27/02 , F28D2021/0077 , H01J37/32724
摘要： Methods and systems for controlling temperatures in plasma processing chamber via pulsed application of heating power and pulsed application of cooling power. In an embodiment, fluid levels in each of a hot and cold reservoir coupled to the temperature controlled component are maintained in part by a coupling each of the reservoirs to a common secondary reservoir. Heat transfer fluid is pumped from the secondary reservoir to either the hot or cold reservoir in response to a low level sensed in the reservoir. In an embodiment, both the hot and cold reservoirs are contained in a same platform as the secondary reservoir with the hot and cold reservoirs disposed above the secondary reservoir to permit the secondary reservoir to catch gravity driven overflow from either the hot or cold reservoir.
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公开(公告)号：US11972924B2
公开(公告)日：2024-04-30
申请号：US17835864
申请日：2022-06-08
发明人： A N M Wasekul Azad , Kartik Ramaswamy , Yang Yang , Yue Guo , Fernando Silveira
CPC分类号： H01J37/32091 , H03K17/687 , H01J2237/327
摘要： Embodiments provided herein generally include apparatus, e.g., plasma processing systems, and methods for the plasma processing of a substrate in a processing chamber. Some embodiments are directed to a waveform generator. The waveform generator generally includes a first voltage stage having: a first voltage source; a first switch; a ground reference; a transformer having a first transformer ratio, the first transformer comprising: a primary winding coupled to the first voltage source and the ground reference; and a secondary winding having a first end and a second end, wherein the first end is coupled to the ground reference, and the second end is configured to be coupled to a load through a common node; and a first diode coupled in parallel with the primary winding of the first transformer. The waveform generator generally also includes one or more additional voltage stages coupled to a load through the common node.
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公开(公告)号：US10537013B2
公开(公告)日：2020-01-14
申请号：US13863226
申请日：2013-04-15
IPC分类号： H05H1/00
摘要： Embodiments of the invention include an apparatus, system, and method for cooling a pedestal for supporting a workpiece during plasma processing. An embodiment of a pedestal includes: a base over which the workpiece is to be disposed, a plurality of nozzles to supply a fluid from a supply plenum to impinge on a surface of the base, and a plurality of return conduits to return the supplied fluid to a return plenum. The fluid to be supplied by the plurality of nozzles can be projected as one or more jets submerged in surrounding fluid or as a spray that emerges from a surrounding fluid within a volume between the plurality of nozzles and the base to impinge on the surface of the base.
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公开(公告)号：US12111341B2
公开(公告)日：2024-10-08
申请号：US17960666
申请日：2022-10-05
发明人： Yue Guo , Yang Yang , Kartik Ramaswamy , Fernando Silveira , A N M Wasekul Azad
IPC分类号： G01R29/08
CPC分类号： G01R29/0885
摘要： Embodiments of the disclosure include an electric field measurement system that includes a first light source, a first light sensor configured to receive electromagnetic energy transmitted from the first light source, an electro-optic sensor, and a controller. The electro-optic sensor may include a package comprising a first electro-optic crystal disposed within a body; and at least one optical fiber. The optical fiber is configured to transmit electromagnetic energy transmitted from the first light source to a surface of the first electro-optic crystal, and transmit at least a portion of the electromagnetic energy transmitted to the surface of the first electro-optic crystal and subsequently passed through at least a portion of the first electro-optic crystal to the first light sensor that is configured to generate a signal based on an attribute of the electromagnetic energy received by the first light sensor from the at least one optical fiber. The controller is configured to generate a command signal based on a signal received from the first light sensor.
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公开(公告)号：US10928145B2
公开(公告)日：2021-02-23
申请号：US16297474
申请日：2019-03-08
发明人： Fernando Silveira , Brad L. Mays
摘要： Methods and systems for controlling temperatures in plasma processing chamber via pulsed application of heating power and pulsed application of cooling power. In an embodiment, fluid levels in each of a hot and cold reservoir coupled to the temperature controlled component are maintained in part by a coupling each of the reservoirs to a common secondary reservoir. Heat transfer fluid is pumped from the secondary reservoir to either the hot or cold reservoir in response to a low level sensed in the reservoir. In an embodiment, both the hot and cold reservoirs are contained in a same platform as the secondary reservoir with the hot and cold reservoirs disposed above the secondary reservoir to permit the secondary reservoir to catch gravity driven overflow from either the hot or cold reservoir.
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公开(公告)号：US10274270B2
公开(公告)日：2019-04-30
申请号：US13647314
申请日：2012-10-08
发明人： Fernando Silveira , Brad L. Mays
摘要： Methods and systems for controlling temperatures in plasma processing chamber via pulsed application of heating power and pulsed application of cooling power. In an embodiment, fluid levels in each of a hot and cold reservoir coupled to the temperature controlled component are maintained in part by a coupling each of the reservoirs to a common secondary reservoir. Heat transfer fluid is pumped from the secondary reservoir to either the hot or cold reservoir in response to a low level sensed in the reservoir. In an embodiment, both the hot and cold reservoirs are contained in a same platform as the secondary reservoir with the hot and cold reservoirs disposed above the secondary reservoir to permit the secondary reservoir to catch gravity driven overflow from either the hot or cold reservoir.
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公开(公告)号：US10010912B2
公开(公告)日：2018-07-03
申请号：US14276289
申请日：2014-05-13
发明人： Jared Ahmad Lee , Dmitry Lubomirsky , Martin Jeff Salinas , Andrew Nguyen , Tom K. Cho , Eric A. Englhardt , Fernando Silveira
CPC分类号： B08B9/0325 , F16K3/02 , F16K51/02 , H01L21/67017 , H01L21/67253 , Y10T137/0419 , Y10T137/4259
摘要： Methods and apparatus for particle reduction in throttle gate valves used in substrate process chambers are provided herein. In some embodiments, a gate valve for use in a process chamber includes a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a plurality of gas ports disposed in the gate valve configured to direct a gas flow into a portion of the gate valve fluidly coupled to the opening.
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