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公开(公告)号:US10541169B2
公开(公告)日:2020-01-21
申请号:US15593502
申请日:2017-05-12
Applicant: Applied Materials, Inc.
Inventor: Chong Jiang , Lei Jing , Mingte Liu , Adolph Miller Allen , Michael W. Johnson , Pallavi Zhang , Michael D. Armacost
IPC: H01L21/683
Abstract: Embodiments of the disclosure relate to methods and a system for adjusting the chucking voltage of an electrostatic chuck. In one embodiment, a system for plasma processing a substrate includes a plasma processing chamber, a radio-frequency (RF) matching circuit coupled to the chamber, a sensor and a controller. The chamber includes a chamber body having an inner volume, a bipolar electrostatic chuck disposed in the inner volume and a power supply configured to provide chucking voltage to a pair of electrodes embedded within the electrostatic chuck. When plasma is energized within the chamber by the application of RF power through an RF matching circuit, the sensor is configured to detect a change in an electrical characteristic at the RF matching circuit. The controller is coupled to the power supply and configured to adjust the chucking voltage in response to the change in the electrical characteristic detected by the sensor.
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公开(公告)号:US12203828B2
公开(公告)日:2025-01-21
申请号:US17240677
申请日:2021-04-26
Applicant: Applied Materials, Inc.
Inventor: Ryan T. Downey , Hemant P. Mungekar , James L'Heureux , Andreas Neuber , Michael W. Johnson , Joseph A. Van Gompel , Gino Gerardo Crispieri , Tony H. Tong , Maxime Cayer , John L Koenig , Mike M. Huang
IPC: G01M99/00
Abstract: The present disclosure relates to systems and methods for detecting anomalies in a semiconductor processing system. According to certain embodiments, one or more external sensors are mounted to a sub-fab component, communicating with the processing system via a communication channel different than a communication channel utilized by the sub-fab component and providing extrinsic sensor data that the sub-fab component is not configured to provide. The extrinsic sensor data may be combined with sensor data from a processing tool of the system and/or intrinsic sensor data of the sub-fab component to form virtual sensor data. In the event the virtual data exceeds or falls below a threshold, an intervention or a maintenance signal is dispatched, and in certain embodiments, an intervention or maintenance action is taken by the system.
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3.
公开(公告)号:US12068180B2
公开(公告)日:2024-08-20
申请号:US16247026
申请日:2019-01-14
Applicant: Applied Materials, Inc.
Inventor: Xuesong Lu , Lin Zhang , Joseph C. Werner , Jang Seok Oh , Balaji Pasupathy , Michael W. Johnson
IPC: H01L21/67 , C23C16/455 , C23C16/50 , C23C16/52 , G01K3/00 , G01K3/04 , G01K3/10 , G05B11/00 , G05B13/02 , G05B15/00 , G05B15/02 , H01J37/32 , H01L21/02 , H01L21/687
CPC classification number: H01L21/67248 , C23C16/455 , C23C16/45544 , C23C16/50 , C23C16/52 , G01K3/005 , G01K3/04 , G01K3/10 , G05B11/00 , G05B13/02 , G05B15/00 , G05B15/02 , H01J37/3244 , H01J37/32899 , H01L21/02 , H01L21/02312 , H01L21/67 , H01L21/67017 , H01L21/67103 , H01L21/67109 , H01L21/67167 , H01L21/67207 , H01L21/67253 , H01L21/68742 , H01J2237/24585 , H01J2237/3321
Abstract: Embodiments herein provide methods of monitoring temperatures of fluid delivery conduits for delivering fluids to, and other components external to, a processing volume of a processing chamber used in electronic device fabrication manufacturing, and monitoring systems related thereto. In one embodiment, a method of monitoring a processing system includes receiving, through a data acquisition device, temperature information from one or more temperature sensors and receiving context information from a system controller coupled to a processing system comprising the processing chamber. Here, the one or more temperature sensors are disposed in one or more locations external to a processing volume of a processing chamber. The context information relates to instructions executed by the system controller to control one or more operations of the processing system.
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