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    ROLLER FOR SPREADING OF A FLEXIBLE SUBSTRATE, APPARATUS FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD OF OPERATING THEREOF
    5.
    发明申请
    ROLLER FOR SPREADING OF A FLEXIBLE SUBSTRATE, APPARATUS FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD OF OPERATING THEREOF 审中-公开
    用于扩展柔性基板的滚子，用于处理柔性基板的装置及其操作方法

    公开(公告)号：US20160340776A1

    公开(公告)日：2016-11-24

    申请号：US15112800

    申请日：2014-01-22

    Applicant: Andreas Sauer ,  Florian Ries ,  Thomas Deppisch ,  Applied Materials, Inc.

    Inventor： Andreas SAUER ,  Florian RIES ,  Thomas DEPPISCH

    IPC: C23C14/56 ,  C23C14/34 ,  C23C14/54 ,  C23C16/505 ,  C23C16/46 ,  C23C14/24 ,  C23C16/52

    CPC classification number: C23C14/562 ,  C23C14/24 ,  C23C14/34 ,  C23C14/50 ,  C23C14/541 ,  C23C14/568 ,  C23C16/463 ,  C23C16/505 ,  C23C16/52 ,  C23C16/545

    Abstract: A processing apparatus for processing a flexible substrate in a vacuum chamber is described. The processing apparatus includes a processing drum for processing the flexible substrate while being guided on the processing drum, a roller arrangement having one or more rollers configured to contact the flexible substrate along a portion of one or more circumferences of the one or more rollers before the flexible substrate is guided on the processing drum, wherein the combined length of contact along one or more portions of the one or more circumferences of the one or more rollers is 270 mm or above, and wherein an individual length of contact along each of the one or more portions of the one or more circumferences of the one or more rollers is 500 mm or below, and a temperature adjustment element adjusting the temperature of the one or more rollers.

    Abstract translation: 描述了一种在真空室中处理柔性基板的处理装置。 处理装置包括处理滚筒，用于在处理滚筒上被引导时处理柔性基板;滚筒装置，其具有一个或多个辊子，该滚筒装置构造成沿着一个或多个滚筒的一个或多个圆周的一部分接触柔性基板 柔性基底在处理滚筒上引导，其中沿一个或多个滚筒的一个或多个圆周的一个或多个部分的组合接触长度为270mm或更大，并且其中沿着一个或多个滚筒中的每一个的单独的接触长度 一个或多个辊的一个或多个圆周的多个部分或更多部分为500mm以下，以及调节一个或多个辊的温度的温度调节元件。

    CLEANING METHOD FOR THIN-FILM PROCESSING APPLICATIONS AND APPARATUS FOR USE THEREIN
    6.
    发明申请
    CLEANING METHOD FOR THIN-FILM PROCESSING APPLICATIONS AND APPARATUS FOR USE THEREIN 有权
    薄膜加工应用的清洗方法及其使用的装置

    公开(公告)号：US20150020847A1

    公开(公告)日：2015-01-22

    申请号：US13965968

    申请日：2013-08-13

    Applicant: APPLIED MATERIALS, INC.

    Inventor： Florian RIES ,  Stefan HEIN ,  Stefan LORENZ ,  Neil MORRISON ,  Tobias STOLLEY

    IPC: C23C16/44

    CPC classification number: C23C16/4405 ,  H01J37/3277 ,  H01J37/32862 ,  Y10T428/18 ,  Y10T428/192

    Abstract: According to the present disclosure, a method for cleaning the processing chamber of a flexible substrate processing apparatus without breaking the vacuum in the processing chamber is provided. The method for cleaning the processing chamber includes guiding a sacrificial foil into the processing chamber; initiating a first pump process in the processing chamber; plasma cleaning the processing chamber while the sacrificial foil is provided in the processing chamber; initiating a second pump process in the processing chamber; and guiding a flexible substrate into the processing chamber.

    Abstract translation: 根据本公开，提供了一种用于清洁柔性基板处理设备的处理室而不破坏处理室中的真空的方法。 用于清洁处理室的方法包括将牺牲箔引导到处理室中; 在处理室中启动第一泵过程; 等离子体清洁处理室，同时牺牲箔设置在处理室中; 在处理室中启动第二泵过程; 并将柔性基板引导到处理室中。

    DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF
    7.
    发明申请
    DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF 审中-公开

    公开(公告)号：US20170058404A1

    公开(公告)日：2017-03-02

    申请号：US15351279

    申请日：2016-11-14

    Applicant: Applied Materials, Inc.

    Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Morrison NEIL

    IPC: C23C16/54 ,  C23C16/44

    Abstract: An apparatus for processing a flexible substrate is described. The apparatus includes a vacuum chamber having a first chamber portion, a second chamber portion and a third chamber portion, an unwinding shaft for supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate having the thin film deposited thereon, wherein the unwinding shaft and the winding shaft are arranged in the first chamber portion, at least one gap sluice for separating the first chamber portion from the second chamber portion, wherein the gap sluice is configured such that the flexible substrate can move there through and the gap sluice can be opened and closed for providing a vacuum seal, a coating drum having a rotation axis and a curved outer surface for guiding the substrate along the curved outer surface through a first vacuum processing region and at least one second vacuum processing region, wherein a first portion of the coating drum is provided in the second chamber portion and the remaining portion of the coating drum is provided in the third chamber portion, a first processing station corresponding to the first processing region and at least one second processing station corresponding to the at least one second vacuum processing region, wherein the first processing station and the second processing station each includes a flange portion for providing a vacuum connection. Further, the third chamber portion has a convex shaped chamber wall portion, wherein the third chamber portion has at least two openings provided therein, particularly wherein the at least two openings are essentially parallel to the convex shaped chamber wall portion; and wherein the first processing station and the at least one second processing station are configured to be received in the at least two openings, wherein the flange portions of the first processing station and the second processing station provide a vacuum tight connection with the third chamber.

    DEPOSITION SOURCE WITH ADJUSTABLE ELECTRODE
    8.
    发明申请
    DEPOSITION SOURCE WITH ADJUSTABLE ELECTRODE 审中-公开
    具有可调节电极的沉积源

    公开(公告)号：US20140212599A1

    公开(公告)日：2014-07-31

    申请号：US13871874

    申请日：2013-04-26

    Applicant: Applied Materials, Inc.

    Inventor： Wolfgang BUSCHBECK ,  Florian RIES ,  Tobias STOLLEY

    IPC: C23C16/52

    CPC classification number: C23C16/52 ,  C23C14/562 ,  H01J37/32568 ,  H01J37/3277

    Abstract: An apparatus for depositing a thin film on a substrate is described. The apparatus includes a substrate support having an outer surface for guiding the substrate through a vacuum processing region, a plasma deposition source for depositing the thin film on the substrate in the vacuum processing region, wherein the plasma deposition source comprises an electrode, and an actuator configured for adjusting the distance between the electrode and the outer surface.

    Abstract translation: 描述了一种在衬底上沉积薄膜的装置。 该装置包括具有用于引导基板通过真空处理区域的外表面的基板支撑件，用于在真空处理区域中将薄膜沉积在基板上的等离子体沉积源，其中等离子体沉积源包括电极和致动器 被配置为调节电极和外表面之间的距离。

    GAS SEPARATION BY ADJUSTABLE SEPARATION WALL
    9.
    发明申请
    GAS SEPARATION BY ADJUSTABLE SEPARATION WALL 审中-公开
    通过可调隔离壁进行气体分离

    公开(公告)号：US20140208565A1

    公开(公告)日：2014-07-31

    申请号：US13871789

    申请日：2013-04-26

    Applicant: Applied Materials, Inc.

    Inventor： Hans-Georg LOTZ ,  Neil MORRISON ,  Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Wolfgang BUSCHBECK

    IPC: C23C16/458

    CPC classification number: C23C16/458 ,  C23C14/562 ,  C23C16/45519 ,  C23C16/545 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32761 ,  H01J37/3277 ,  Y10T29/49826

    Abstract: An apparatus for coating a thin film on a flexible substrate is described. The apparatus includes a coating drum having an outer surface for guiding the flexible substrate through a first vacuum processing region and at least one second vacuum processing region, a gas separation unit for separating the first vacuum processing region and at least one second vacuum processing region and adapted to form a slit through which the flexible substrate can pass between the outer surface of the coating drum and the gas separation unit, wherein the gas separation unit is adapted to control fluid communication between the first processing region and the second processing region by adjusting the position of the gas separation unit.

    Abstract translation: 描述了在柔性基板上涂覆薄膜的设备。 该设备包括：涂层滚筒，其具有用于引导柔性基板穿过第一真空处理区域和至少一个第二真空处理区域的外表面;气体分离单元，用于分离第一真空处理区域和至少一个第二真空处理区域;以及 适于形成狭缝，柔性基底可以通过该狭缝在涂布滚筒的外表面和气体分离单元之间通过，其中气体分离单元适于通过调节第一处理区域和第二处理区域之间的流体连通 气体分离单元的位置。

    DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF
    10.
    发明申请
    DEPOSITION PLATFORM FOR FLEXIBLE SUBSTRATES AND METHOD OF OPERATION THEREOF 审中-公开

    公开(公告)号：US20200299842A1

    公开(公告)日：2020-09-24

    申请号：US16894256

    申请日：2020-06-05

    Applicant: Applied Materials, Inc.

    Inventor： Jose Manuel DIEGUEZ-CAMPO ,  Heike LANDGRAF ,  Tobias STOLLEY ,  Stefan HEIN ,  Florian RIES ,  Neil MORRISON

    IPC: C23C16/54 ,  C23C16/44 ,  C23C16/509 ,  C23C16/455 ,  C23C14/56

    Abstract: An apparatus for processing a flexible substrate is provided including a vacuum chamber having a first chamber portion, second chamber portion and third chamber portion. The apparatus further includes an unwinding shaft supporting the flexible substrate to be processed and a winding shaft supporting the flexible substrate after processing, wherein the unwinding shaft and the winding shaft are disposed in the first chamber portion, a first wall separating the first chamber portion from the second chamber portion, wherein the first wall is inclined with respect to a vertical and horizontal orientation, a coating drum having a first portion disposed in the second chamber portion and a second portion disposed in the third chamber portion, and a plurality of processing stations disposed at least partially in the third chamber portion, wherein a majority of the plurality of the processing stations are disposed below a rotational axis of the coating drum.

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