公开(公告)号：US20060110665A1

公开(公告)日：2006-05-25

申请号：US10994201

申请日：2004-11-22

申请人： Arno Bleeker ,  Dominicus Jacobus Franken ,  Stephen Roux ,  Michael Nelson

发明人： Arno Bleeker ,  Dominicus Jacobus Franken ,  Stephen Roux ,  Michael Nelson

IPC分类号： G03F9/00 ,  G03C5/00 ,  G01B11/00 ,  G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70258 ,  G03F7/70308

摘要： A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.

公开(公告)号：US20060119815A1

公开(公告)日：2006-06-08

申请号：US11005231

申请日：2004-12-07

申请人： Dominicus Jacobus Franken ,  Arno Bleeker ,  Wilhelmus Box ,  Martinus Hendricus Hoeks ,  Henricus Tegenbosch ,  Kars Troost ,  Lambertus Kessels

发明人： Dominicus Jacobus Franken ,  Arno Bleeker ,  Wilhelmus Box ,  Martinus Hendricus Hoeks ,  Henricus Tegenbosch ,  Kars Troost ,  Lambertus Kessels

IPC分类号： G03B27/42

CPC分类号： G03F7/70875 ,  G03F7/70291

摘要： A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.

摘要翻译： 使用系统和方法来补偿单独可控元件阵列的热输出。 这可以通过在不使用阵列投影光束来控制阵列的温度时将控制信号输入到阵列来完成。 可以提供加热元件以保持阵列的温度。 可以提供热储存器以保持阵列的温度或者可以提供冷却元件以在使用期间降低阵列的温度。

公开(公告)号：US20070273853A1

公开(公告)日：2007-11-29

申请号：US11655999

申请日：2007-01-22

申请人： Arno Bleeker ,  Donis Flagello ,  Robert Socha ,  James Greeneich ,  Kars Troost

发明人： Arno Bleeker ,  Donis Flagello ,  Robert Socha ,  James Greeneich ,  Kars Troost

IPC分类号： G03B27/32

CPC分类号： G03B27/54 ,  G03F7/70116 ,  G03F7/705

摘要： A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.

摘要翻译： 将图案布局的图像转印到基板的表面上的方法，包括为图案布局的第一区域选择第一照明轮廓，以及为图案布局的第二区域选择第二照明轮廓; 在图案布局的图像传送期间切换照明轮廓，使得图案布局的第一区域被第一照明轮廓照亮，并且第二区域被第二照明轮廓照亮; 以及将照射的第一和第二区域的图像投影到基板的表面上。

公开(公告)号：US07274502B2

公开(公告)日：2007-09-25

申请号：US11018483

申请日：2004-12-22

申请人： Nabila Baba-Ali ,  Arno Bleeker

发明人： Nabila Baba-Ali ,  Arno Bleeker

IPC分类号： G02B26/00

CPC分类号： G03F7/70291 ,  G02B26/0833

摘要： A tilting mirror design for maskless lithography is proposed. In this mirror, the tilting portion occupies about 60% of the entire element area. The surrounding space is made 100% reflective and out-of-phase with respect to the tilting portion. The ratio between the tilting portion of the mirror and the out-of-phase portion is optimized in order to result in equal positive and negative maximum amplitudes over a complete range of tilt angles.

摘要翻译： 提出了一种用于无掩模光刻的倾斜镜设计。 在该反射镜中，倾斜部分占整个元件面积的大约60％。 周围空间相对于倾斜部分被制成100％反射和异相。 反射镜的倾斜部分和异相部分之间的比率被优化，以便在整个倾斜角范围内产生相等的正和负最大幅度。

公开(公告)号：US20070139633A1

公开(公告)日：2007-06-21

申请号：US11311640

申请日：2005-12-20

申请人： Arno Bleeker ,  Kars Troost

发明人： Arno Bleeker ,  Kars Troost

IPC分类号： G03B27/54

CPC分类号： G03F7/7045 ,  G03F7/70291 ,  G03F7/70341 ,  G03F7/70408 ,  G03F7/70466

摘要： A lithographic system combining an interference exposure unit and a lithography unit. The lithography unit can comprise an array of individually controllable elements. The lithography system can be arranged such that a pitch of the lines exposed by the interference exposure unit is an integer multiple of a size of an exposure area of the lithography unit corresponding to a single individually controllable element.

摘要翻译： 组合干涉曝光单元和光刻单元的光刻系统。 光刻单元可以包括单独可控元件的阵列。 光刻系统可以布置成使得由干涉曝光单元曝光的线的间距是与单个可单独控制的元件对应的光刻单元的曝光区域的尺寸的整数倍。

公开(公告)号：US20070058145A1

公开(公告)日：2007-03-15

申请号：US11595968

申请日：2006-11-13

申请人： Arno Bleeker

发明人： Arno Bleeker

IPC分类号： G03F7/26

CPC分类号： G03F1/32 ,  G03F7/70283 ,  G03F7/70291

摘要： Pixel element for a programmable patterning structure (e.g. a spatial light modulator) which can simultaneously modulate both phase and amplitude. Use of such a programmable patterning structure with lithographic projection apparatus is also described.

摘要翻译： 用于可同时调制相位和幅度的可编程图案结构（例如空间光调制器）的像素元件。 还描述了使用这种可编程图案结构与光刻投影装置。

公开(公告)号：US20070030471A1

公开(公告)日：2007-02-08

申请号：US11580134

申请日：2006-10-13

申请人： Kars Troost ,  Arno Bleeker

发明人： Kars Troost ,  Arno Bleeker

IPC分类号： G03B27/54

CPC分类号： G03F7/70058 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70425

摘要： A system and method are used to manufacture a device using at least one exposure step. Each exposure step projects a patterned beam of radiation onto a substrate. The patterned beam includes a plurality of pixels. Each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step and/or at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel or compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step.

摘要翻译： 使用系统和方法来制造使用至少一个曝光步骤的装置。 每个曝光步骤将图案化的辐射束投射到衬底上。 图案化的波束包括多个像素。 每个像素在曝光步骤中向目标部分提供不大于预定正常最大剂量的辐射剂量，和/或至少一个所选择的像素传递大于正常最大剂量的增加的辐射剂量。 可以递送增加的剂量以补偿阵列中与已选择像素相邻的像素处的已知位置处的有缺陷元件的影响，或者补偿由于该位置的曝光导致的所选像素的位置处的目标部分的曝光不足 涉及在另一曝光步骤中受已知缺陷元件影响的像素。

公开(公告)号：US20070013889A1

公开(公告)日：2007-01-18

申请号：US11179056

申请日：2005-07-12

申请人： Laurentius Jorritsma ,  Johannes Baselmans ,  Arno Bleeker ,  Jacob Klinkhamer

发明人： Laurentius Jorritsma ,  Johannes Baselmans ,  Arno Bleeker ,  Jacob Klinkhamer

IPC分类号： G03B27/54

CPC分类号： G03F7/70275 ,  G03F7/70575 ,  G03F7/70641

摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, an array of individually controllable elements serving to impart the beam with a pattern in its cross-section, a substrate table for supporting a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. The beam of radiation comprises a plurality of beam components. The plurality of beam components includes a first beam component having a first frequency spectrum about a first frequency and at least a second beam component having a second frequency spectrum about a second frequency. The second frequency is different from the first frequency. The projection system focuses the first and second beam components at different heights with respect to the substrate table.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于在其横截面中赋予光束的单独可控元件的阵列，用于支撑衬底的衬底台，以及用于将图案化的投影系统 光束到基板的目标部分上。 辐射束包括多个光束分量。 多个光束分量包括具有关于第一频率的第一频谱的第一光束分量和具有关于第二频率的第二频谱的至少第二光束分量。 第二频率与第一频率不同。 投影系统将第一和第二光束分量相对于衬底台聚焦在不同的高度。

公开(公告)号：US07133121B2

公开(公告)日：2006-11-07

申请号：US11098561

申请日：2005-04-05

申请人： Arno Bleeker ,  Wenceslao A. Cebuhar ,  Justin Kreuzer ,  Azat Latypov ,  Yuli Vladimirsky

发明人： Arno Bleeker ,  Wenceslao A. Cebuhar ,  Justin Kreuzer ,  Azat Latypov ,  Yuli Vladimirsky

IPC分类号： G03B27/32 ,  G03B27/68 ,  G03B27/54

CPC分类号： G03F7/70475 ,  G03B21/18 ,  G03B27/42 ,  G03F7/70091 ,  G03F7/70291 ,  G03F7/70466

摘要： A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.

摘要翻译： 提供了一种使用空间光调制器（SLM）在感光表面上印刷图案的方法和系统。 示例性方法包括在感光表面上限定两个或更多个曝光区域，曝光区域沿着曝光区域的相应边缘部分重叠以在它们之间形成重叠区域。 暴露两个或更多个曝光区域以在其中打印图像，曝光延伸穿过重叠区域。 然后在重叠区域内的曝光被衰减。

公开(公告)号：US20060203220A1

公开(公告)日：2006-09-14

申请号：US11252877

申请日：2005-10-19

申请人： Kars Troost ,  Johannes Baselmans ,  Arno Bleeker ,  Louis Markoya ,  Neal Callan ,  Nicholas Eib

发明人： Kars Troost ,  Johannes Baselmans ,  Arno Bleeker ,  Louis Markoya ,  Neal Callan ,  Nicholas Eib

IPC分类号： G03B27/54

CPC分类号： G03F7/70291 ,  G03F7/70275 ,  G03F7/70358

摘要： The tilt and position of individually controllable element are simultaneously adjusted to allow a greater range of contrasts to be achieved. This can also be used to compensate for cupping of individually controllable elements. Simultaneous adjustment of both the position and tilt of the individually controllable elements can be achieved by two electrodes operable over a range of values.